JP2000228345A5 - - Google Patents

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Publication number
JP2000228345A5
JP2000228345A5 JP1999027701A JP2770199A JP2000228345A5 JP 2000228345 A5 JP2000228345 A5 JP 2000228345A5 JP 1999027701 A JP1999027701 A JP 1999027701A JP 2770199 A JP2770199 A JP 2770199A JP 2000228345 A5 JP2000228345 A5 JP 2000228345A5
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JP
Japan
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mark image
image
mark
edge
inclination
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JP1999027701A
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English (en)
Japanese (ja)
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JP2000228345A (ja
JP4329146B2 (ja
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Priority to JP02770199A priority Critical patent/JP4329146B2/ja
Priority claimed from JP02770199A external-priority patent/JP4329146B2/ja
Publication of JP2000228345A publication Critical patent/JP2000228345A/ja
Publication of JP2000228345A5 publication Critical patent/JP2000228345A5/ja
Application granted granted Critical
Publication of JP4329146B2 publication Critical patent/JP4329146B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP02770199A 1999-02-04 1999-02-04 位置検出装置及び方法、並びに露光装置 Expired - Fee Related JP4329146B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02770199A JP4329146B2 (ja) 1999-02-04 1999-02-04 位置検出装置及び方法、並びに露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02770199A JP4329146B2 (ja) 1999-02-04 1999-02-04 位置検出装置及び方法、並びに露光装置

Publications (3)

Publication Number Publication Date
JP2000228345A JP2000228345A (ja) 2000-08-15
JP2000228345A5 true JP2000228345A5 (enExample) 2008-02-28
JP4329146B2 JP4329146B2 (ja) 2009-09-09

Family

ID=12228298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02770199A Expired - Fee Related JP4329146B2 (ja) 1999-02-04 1999-02-04 位置検出装置及び方法、並びに露光装置

Country Status (1)

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JP (1) JP4329146B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200303978A (en) * 2002-03-05 2003-09-16 Nikon Corp Position detection device, exposure device and exposure method
JP5084239B2 (ja) * 2006-12-06 2012-11-28 キヤノン株式会社 計測装置、露光装置並びにデバイス製造方法
WO2014179353A1 (en) 2013-05-02 2014-11-06 Karandikar Bhalchandra M Antimicrobial compositions and methods of making the same
JP7161322B2 (ja) * 2018-06-26 2022-10-26 キヤノン株式会社 検出方法、リソグラフィー方法、物品製造方法、光学装置および露光装置

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