JP2000207730A - Glass substrate of magnetic recording medium - Google Patents
Glass substrate of magnetic recording mediumInfo
- Publication number
- JP2000207730A JP2000207730A JP560899A JP560899A JP2000207730A JP 2000207730 A JP2000207730 A JP 2000207730A JP 560899 A JP560899 A JP 560899A JP 560899 A JP560899 A JP 560899A JP 2000207730 A JP2000207730 A JP 2000207730A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- substrate
- disk substrate
- magnetic recording
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は磁気記録媒体用のガ
ラスディスク基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass disk substrate for a magnetic recording medium.
【0002】[0002]
【従来の技術】従来、磁気記録媒体用基板は、アルミ製
基板やカーボン製基板、ポリカーボネート基板などによ
り提供されてきたが、近年ハードディスクの記録容量の
増大化に伴い、表面平滑性が優れることから、この要求
に応えられる可能性を持ち、しかも低コストが期待でき
ることからガラス製基板が注目されている。研磨技術の
発展によりガラス製基板の表面平滑性はガラスに結晶粒
界がないため、理論的には原子レベルまで表面粗さを低
下させることが可能である。また、ディスク平坦度の低
下もあわせて、読み取り磁気ヘッドの浮上高さをより低
下させることが可能となり、単位面積あたりの記録密度
は上昇し、記録容量の増加につながっている。2. Description of the Related Art Conventionally, substrates for magnetic recording media have been provided by aluminum substrates, carbon substrates, polycarbonate substrates, and the like. Glass substrates have attracted attention because they have the potential to meet this demand and can be expected to have low costs. As the surface smoothness of the glass substrate has no crystal grain boundaries due to the development of the polishing technology, it is theoretically possible to reduce the surface roughness to the atomic level. In addition, the flying height of the read magnetic head can be further reduced along with the decrease in the disk flatness, and the recording density per unit area increases, which leads to an increase in the recording capacity.
【0003】しかし、記録容量の増加のために、ヘッド
浮上高さのさらなる低下が要求されており、なかでもデ
ィスク基板の平坦度は記録された磁気記録の書き込み、
読み取りの際に重要であり、現ディスク基板の有利性を
損なわずに強化処理工程を経るガラス製ディスク基板が
求められていた。However, in order to increase the recording capacity, a further reduction in the flying height of the head is required. In particular, the flatness of the disk substrate depends on the writing of the recorded magnetic recording,
There is a need for a glass disk substrate that is important during reading and that undergoes a strengthening process without losing the advantages of the current disk substrate.
【0004】[0004]
【本発明が解決しようとする課題】本発明は上記した従
来の問題点を解決して、磁気ヘッドの低浮上化を達成す
るとともに、低コストでガラス製ディスク基板を提供す
ることを課題とする。SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned conventional problems and achieve a low flying height of a magnetic head and to provide a glass disk substrate at low cost. .
【0005】[0005]
【課題を解決するための手段】上記の課題を達成するた
めになされた本発明の磁気ディスク用ガラス基板は、強
化処理されたドーナツ状のガラス基板内外周端面部分以
外の、基板主表面にある強化層を研磨除去することによ
って、基板主表面の圧縮応力値をほぼ0にすることを特
徴とするものである。The magnetic disk glass substrate of the present invention, which has been made to achieve the above object, is provided on the main surface of the substrate other than the inner and outer peripheral end surfaces of the toughened doughnut-shaped glass substrate. The compression stress value of the main surface of the substrate is reduced to almost zero by polishing and removing the reinforcing layer.
【0006】特に、ガラス製ディスク基板はその材料特
性として脆性材料であることから強化処理が必要とな
る。しかし、この強化処理は強化後の基板の研磨や、強
化塩除去のためにタッチポリッシュをすることにより、
ディスク主表面の上下面に存在する強化層の厚みにバラ
ツキが発生し、そのためディスクは変形し、平坦度を悪
化せることが既知の事実である。In particular, a glass disk substrate needs to be strengthened because it is a brittle material. However, this strengthening process is performed by polishing the substrate after strengthening and touch polishing to remove the strengthening salt,
It is a known fact that the thickness of the reinforcing layers existing on the upper and lower surfaces of the main surface of the disk varies, thereby deforming the disk and deteriorating the flatness.
【0007】この現象は主表面強化層の圧縮応力層の厚
み差による、ガラス基板内部の引張りと圧縮の応力バラ
ンスが崩れるためである。また、上下面の研磨量をミク
ロンオーダーで一致させることは非常に困難であり、不
可能ではないが生産コストが非常に高価になってしま
う。本来、ガラス製ディスクの強化処理はドライブ組み
込み時や、磁気記録媒体スパッタリング時のハンドリン
グにおける破損を防止するために成される工程である。
しかし、この場合の破損はすべて基板内外周端面部分か
らのクラック進行や接触による破損であり、主表面にオ
リジンが発生して破損するケースは非常に少ない。[0007] This phenomenon is because the balance between the tensile and compressive stress inside the glass substrate is lost due to the difference in thickness of the compressive stress layer of the main surface reinforcing layer. Further, it is very difficult to match the polishing amounts of the upper and lower surfaces on the order of microns, and the production cost is extremely high, if not impossible. Originally, the strengthening process of a glass disk is a process performed in order to prevent breakage in handling at the time of assembling a drive or at the time of sputtering a magnetic recording medium.
However, all of the damages in this case are damages due to crack progress or contact from the inner peripheral end face portion of the substrate, and there are very few cases in which the origin is generated on the main surface and is damaged.
【0008】つまり、ガラス製ディスク基板の強化処理
が必要な部分は特に内外周端面部分にあるといえる。よ
って、本発明ではこの内外周端面部分を除く基板主表面
の強化層を研磨により除去することを特徴とした。That is, it can be said that the portion of the glass disk substrate that needs to be strengthened is located particularly at the inner and outer peripheral end surfaces. Therefore, the present invention is characterized in that the reinforcing layer on the main surface of the substrate except for the inner and outer peripheral end faces is removed by polishing.
【0009】[0009]
【発明の実施の形態】次に本発明を詳細に説明する。Next, the present invention will be described in detail.
【0010】本発明者は、特にガラス製ディスク基板の
平坦度に注目し、基板強化後の研磨工程において、基板
主表面の強化層を研磨除去することによって、基板強化
前の平坦度を維持し、さらにディスク基板内外周端面部
分の強化層の残置により、外力による破損を抑制できる
ことを見い出し、本発明を成し得たものである。つま
り、ガラス製ディスク基板を化学強化処理した後に、研
磨により強化層を除去する磁気記録用ガラス製ディスク
の製造方法およびその方法で作られた磁気記録用ガラス
製ディスク基板に関するものである。The present inventor pays particular attention to the flatness of the glass disk substrate, and maintains the flatness before the substrate reinforcement by polishing and removing the reinforcing layer on the main surface of the substrate in the polishing step after the substrate reinforcement. Further, it has been found that the remaining of the reinforcing layer on the inner and outer peripheral end faces of the disk substrate can suppress breakage due to an external force, thereby achieving the present invention. In other words, the present invention relates to a method for manufacturing a magnetic recording glass disk in which a glass disk substrate is chemically strengthened and then a reinforcing layer is removed by polishing, and a magnetic recording glass disk substrate manufactured by the method.
【0011】本発明を適応することによりディスク基板
の平坦度悪化を防ぎ磁気ヘッドの低浮上化を促進し、さ
らに生産性向上とコストダウンを図ることができる。ガ
ラス基板の組成は特に限定なく、また強化処理を行う前
のディスク基板の表面粗さも限定は無い。ただし、ディ
スク研磨の工程における生産性を鑑みて、好ましくは表
面粗さRa=1.00μm以下にすることが望ましい。強
化処理後の研磨工程においてRa=1.00μm以上のデ
ィスクでは、最終仕上げのディスク表面のRaを3Å以下
にするために、研磨時間が非常に長くかかり、生産性悪
化につながるからである。By applying the present invention, it is possible to prevent the flatness of the disk substrate from deteriorating, promote the low flying height of the magnetic head, and further improve the productivity and reduce the cost. The composition of the glass substrate is not particularly limited, and the surface roughness of the disk substrate before the strengthening treatment is not limited. However, in view of the productivity in the disk polishing process, it is desirable that the surface roughness Ra is preferably not more than 1.00 μm. This is because, in the polishing step after the strengthening treatment, in the case of a disk having Ra = 1.00 μm or more, the polishing time is extremely long in order to make the Ra of the disk surface of the final finish 3 ° or less, which leads to a decrease in productivity.
【0012】ガラス製ディスク基板に対する化学強化処
理は、基板組成や強化処理時におけるワークの厚みによ
り、または処理条件により様々であるが、本発明におい
ては最終研磨品(スーパーポリッシュ品)において、表
面の応力をほぼ0にすることを特徴としているため、い
かなる化学強化ディスク製品に対しても適応可能な技術
であると言えるが、ディスク基板の内外周端面部分に十
分な強化層厚みを導入するため、ディスク基板全体への
強化層厚みは、好ましくは30μm以上200μm以下の
厚みに導入し、そのディスク基板の主表面を、好ましく
は30μm以上200μm以下の厚みを、研磨することに
よりディスク主表面の応力値を0〜4.5Kg/mm2、
好ましくは0〜0.5Kg/mm2にすることが望ましい。The chemical strengthening treatment for a glass disk substrate varies depending on the composition of the substrate, the thickness of the work at the time of the strengthening treatment, or the processing conditions. In the present invention, the surface of the final polished product (super polished product) is used. Since it is characterized by making the stress almost zero, it can be said that it is a technology that can be applied to any chemically strengthened disk product, but in order to introduce a sufficient reinforcing layer thickness to the inner and outer peripheral end surfaces of the disk substrate, The thickness of the reinforcing layer over the entire disk substrate is preferably introduced to a thickness of 30 μm or more and 200 μm or less, and the main surface of the disk substrate is preferably polished to a thickness of 30 μm or more and 200 μm or less. From 0 to 4.5 kg / mm 2 ,
It is desirable to set it to 0 to 0.5 kg / mm 2 .
【0013】ディスク基板主表面の強化層を除去するこ
とによってディスク厚み方向における引張り応力と圧縮
応力のバラツキ発生を皆無にし、ディスクの変形を避け
ることができる。このため非常に良好な平坦度を保持し
たまま磁気記録媒体のスパッタリング工程に入ることが
出来る。By removing the reinforcing layer on the main surface of the disk substrate, there is no variation in the tensile stress and the compressive stress in the thickness direction of the disk, and the deformation of the disk can be avoided. Therefore, it is possible to start the step of sputtering the magnetic recording medium while maintaining a very good flatness.
【0014】また、従来までハンドリング工程や、スパ
ッタリング工程において強化ガラス製ディスク基板が破
損した場合、表面の圧縮応力が一気に緩和するために粉
々に破壊し、その後の破損ワークの除去、マシンの洗浄
が非常に困難であったが、本発明の基板を使用する場合
は、ガラス製ディスク基板の主表面には応力がほぼ0で
あるため、その作業は不必要であり生産性アップにもつ
ながると考えられる。In the past, when a tempered glass disk substrate was damaged in the handling step or the sputtering step, the compressive stress on the surface was alleviated at once, so that the substrate was broken into pieces. Although it was very difficult, when using the substrate of the present invention, since the stress is almost zero on the main surface of the glass disk substrate, it is considered that the work is unnecessary and leads to an increase in productivity. Can be
【0015】[0015]
【実施例】(実施例1)アルミノシリケートガラスを9
5mmφの円盤に切り出し、厚み1mm、表面粗さRa=
0.3μmに調整したディスク基板をサンプルとして用
いた。このディスク基板を360℃の、硝酸カリウムと
硝酸ナトリウムとを重量比で8対2の割合で混合した溶
融塩中に60分間浸漬してイオン交換強化処理した後、
ディスク基板の両面を所定の厚さで研磨し、研磨量に対
する基板表面の平坦度、残留する強化層の有無、及び残
留する基板内部の引張り応力値を測定した。その結果を
表1に示した。EXAMPLES (Example 1) Aluminosilicate glass was mixed with 9
Cut out into a 5mmφ disk, thickness 1mm, surface roughness Ra =
A disk substrate adjusted to 0.3 μm was used as a sample. The disk substrate was immersed in a molten salt at 360 ° C. in which potassium nitrate and sodium nitrate were mixed at a weight ratio of 8: 2 for 60 minutes to perform ion exchange strengthening treatment.
Both surfaces of the disk substrate were polished to a predetermined thickness, and the flatness of the substrate surface with respect to the polishing amount, the presence or absence of the remaining reinforcing layer, and the residual tensile stress value inside the substrate were measured. The results are shown in Table 1.
【0016】 [0016]
【0017】(実施例2)実施例1と同じディスク基板
をサンプルとして用い、このディスク基板を380℃
の、硝酸カリウムと硝酸ナトリウムとを重量比で8対2
の割合で混合した溶融塩中に60分間浸漬してイオン交
換強化処理した後、ディスク基板の両面を所定の厚さで
研磨し、研磨量に対する基板表面の平坦度、残留する強
化層の有無、及び残留する基板内部の引張り応力値を測
定した。その結果を表2に示した。Example 2 The same disk substrate as in Example 1 was used as a sample, and the disk substrate was heated at 380 ° C.
Of potassium nitrate and sodium nitrate in a weight ratio of 8: 2
After immersion in a molten salt mixed at a ratio of 60 minutes for ion exchange strengthening treatment, both surfaces of the disk substrate are polished to a predetermined thickness, the flatness of the substrate surface with respect to the polishing amount, the presence or absence of a residual reinforcing layer, The residual tensile stress value inside the substrate was measured. The results are shown in Table 2.
【0018】 [0018]
【0019】(実施例3)実施例1と同じディスク基板
をサンプルとして用い、このディスク基板を400℃
の、硝酸カリウムと硝酸ナトリウムとを重量比で8対2
の割合で混合した溶融塩中に60分間浸漬してイオン交
換強化処理した後、ディスク基板の両面を所定の厚さで
研磨し、研磨量に対する基板表面の平坦度、残留する強
化層の有無、及び残留する基板内部の引張り応力値を測
定した。その結果を表3に示した。Example 3 The same disk substrate as in Example 1 was used as a sample, and the disk substrate was heated at 400 ° C.
Of potassium nitrate and sodium nitrate in a weight ratio of 8: 2
After immersion in a molten salt mixed at a ratio of 60 minutes for ion exchange strengthening treatment, both surfaces of the disk substrate are polished to a predetermined thickness, the flatness of the substrate surface with respect to the polishing amount, the presence or absence of a residual reinforcing layer, The residual tensile stress value inside the substrate was measured. Table 3 shows the results.
【0020】 [0020]
【0021】(実施例4)実施例1と同じディスク基板
をサンプルとして用い、このディスク基板を430℃
の、硝酸カリウムと硝酸ナトリウムとを重量比で8対2
の割合で混合した溶融塩中に60分間浸漬してイオン交
換強化処理した後、ディスク基板の両面を所定の厚さで
研磨し、研磨量に対する基板表面の平坦度、残留する強
化層の有無、及び残留する基板内部の引張り応力値を測
定した。その結果を表4に示した。Example 4 The same disk substrate as in Example 1 was used as a sample.
Of potassium nitrate and sodium nitrate in a weight ratio of 8: 2
After immersion in a molten salt mixed at a ratio of 60 minutes for ion exchange strengthening treatment, both surfaces of the disk substrate are polished to a predetermined thickness, the flatness of the substrate surface with respect to the polishing amount, the presence or absence of a residual reinforcing layer, The residual tensile stress value inside the substrate was measured. Table 4 shows the results.
【0022】 [0022]
【0023】(実施例5)実施例1と同じディスク基板
をサンプルとして用い、このディスク基板を480℃
の、硝酸カリウムと硝酸ナトリウムとを重量比で8対2
の割合で混合した溶融塩中に60分間浸漬してイオン交
換強化処理した後、ディスク基板の両面を所定の厚さで
研磨し、研磨量に対する基板表面の平坦度、残留する強
化層の有無、及び残留する基板内部の引張り応力値を測
定した。その結果を表5に示した。Example 5 The same disk substrate as in Example 1 was used as a sample, and the disk substrate was heated at 480 ° C.
Of potassium nitrate and sodium nitrate in a weight ratio of 8: 2
After immersion in a molten salt mixed at a ratio of 60 minutes for ion exchange strengthening treatment, both surfaces of the disk substrate are polished to a predetermined thickness, the flatness of the substrate surface with respect to the polishing amount, the presence or absence of a residual reinforcing layer, The residual tensile stress value inside the substrate was measured. Table 5 shows the results.
【0024】 [0024]
【0025】表1~5に、各温度における60分の強化
処理を行った場合におけるサンプルを研磨した時の平坦
度変化と内部圧縮応力値の変化を示した。表1〜5まで
の表から、強化層を段階的に研磨していく過程におい
て、一時的な平坦度の悪化と内部応力の低下がみられ、
内部応力がほぼ0になる段階まで研磨を行う、つまり導
入された強化層を研磨により除去してしまうと、平坦度
が初期の強化後の値に維持されることが観察される。Tables 1 to 5 show the change in flatness and the change in internal compressive stress value when the sample was polished when the strengthening treatment was performed at each temperature for 60 minutes. From the tables from Tables 1 to 5, in the process of polishing the reinforcing layer stepwise, temporary deterioration of flatness and reduction of internal stress are seen,
When the polishing is performed until the internal stress becomes almost zero, that is, when the introduced reinforcing layer is removed by polishing, it is observed that the flatness is maintained at the value after the initial strengthening.
【0026】(実施例6)また、ディスク基板をイオン
交換して強化処理するに際して、各温度における強化処
理時間とその時導入される強化層厚みと、その内部引張
り応力値を表6に示す。Example 6 Table 6 shows the time of the strengthening treatment at each temperature, the thickness of the strengthening layer introduced at that time, and the internal tensile stress value when the disk substrate is strengthened by ion exchange.
【0027】 [0027]
【0028】表6中の*印は強化層が導入されすぎて内
部応力が緩和されているため、各温度の短時間の処理サ
ンプルよりも内部応力が低く観測されている。一般的に
化学強化処理はガラス転移点よりも高温で処理したり、
そのガラス組成に対して不必要に長時間の処理を行うこ
とにより、深く強化層が導入されるのに対して、表面の
圧縮応力値は低下することが既知となっている。The mark * in Table 6 indicates that the internal stress was lower than that of the sample treated for a short time at each temperature because the reinforcing layer was introduced too much and the internal stress was relaxed. Generally, chemical strengthening treatment is performed at a temperature higher than the glass transition point,
It has been known that by performing an unnecessarily long treatment on the glass composition, a deep reinforcing layer is introduced, while the compressive stress value on the surface decreases.
【0029】実施例のアルミノシリケートガラスは、片
面約100μm程度から応力緩和が発生していることが
わかる。強化層はディスク主表面、エッジ部ともに導入
されるが、全体的には応力緩和が発生していることにな
る。ただし、この*印を付けた内部応力の緩和したサン
プルの表面は、未強化処理のサンプルの強度に接近する
ため、当初目的のディスク外内周端面部分のハンドリン
グ時における接触に対する耐衝撃性は低下してしまう。It can be seen that in the aluminosilicate glass of the example, stress relaxation occurs from about 100 μm on one side. Although the reinforcing layer is introduced into both the main surface and the edge of the disk, stress relaxation occurs as a whole. However, the surface of the sample with reduced internal stress marked with * is close to the strength of the unreinforced treated sample, so the impact resistance to the contact at the time of handling the inner and outer peripheral end surfaces of the disk originally intended is reduced. Resulting in.
【0030】つまり、アルミノシリケート、アルミノボ
ロシリケート、ソーダライム、ボロシリケートなどの珪
酸塩系ガラスにおいて、表面の圧縮応力の緩和が発生し
ない程度の強化処理を施した後に、主表面の強化層を研
磨で除去することが重要となる。That is, in a silicate-based glass such as aluminosilicate, aluminoborosilicate, soda lime, or borosilicate, after a strengthening treatment is performed to such an extent that the compression stress on the surface is not relaxed, the reinforcing layer on the main surface is polished. It is important to remove with.
【0031】また、表面圧縮応力値が、4.5kg/m
m2を超過すると、特にその後の研磨工程において破損
が著しいため研磨前のディスクの圧縮応力値は4.5k
g/mm2以下、望ましくは0.5Kg/mm2以下が良
い。The surface compressive stress value is 4.5 kg / m
If it exceeds m 2 , the compressive stress value of the disc before polishing is 4.5 k, particularly because the breakage is remarkable in the subsequent polishing step.
g / mm 2 or less, desirably 0.5 kg / mm 2 or less.
【0032】また、最終的に圧縮応力は内外径エッジ部
分のみに残存するためエッジ部と主表面の境界には応力
差が大きく生じる。このため、破損の原因につながる恐
れがある場合は、この境界部分を更に研磨してエッジ部
分に丸みを持たせることも破損ワークの減少につなが
る。Further, since the compressive stress finally remains only at the inner and outer diameter edges, a large stress difference occurs at the boundary between the edge and the main surface. For this reason, if there is a possibility of causing a breakage, further polishing this boundary portion to make the edge portion round also leads to a reduction in broken work.
【0033】以上説明したように、本発明の磁気記録媒
体用ガラス基板の製造方法に従って、化学強化後のガラ
ス基板の主表面を研磨して、主表面の強化層を研磨除去
したガラス基板は、ガラス基板表面の平坦度が強化後の
初期の値に維持されて、ガラス基板上に成膜される情報
記録媒体の記録密度の増大記録容量の増加が図れるガラ
ス基板を提供できることで、情報記録媒体の信頼性を飛
躍的に向上させることができるものである。As described above, in accordance with the method of manufacturing a glass substrate for a magnetic recording medium of the present invention, the glass substrate after polishing the main surface of the glass substrate after chemical strengthening and polishing and removing the reinforcing layer on the main surface is as follows. The flatness of the surface of the glass substrate is maintained at the initial value after strengthening, the recording density of the information recording medium formed on the glass substrate is increased, and the glass substrate capable of increasing the recording capacity can be provided. Reliability can be dramatically improved.
Claims (4)
いて、特に化学強化後に研磨処理を施してディスク基板
主表面の強化層を除去することを特徴とするディスク基
板製造方法。1. A method of manufacturing a disk substrate made of glass for a magnetic recording medium, wherein a polishing process is performed, particularly after chemical strengthening, to remove a reinforcing layer on the main surface of the disk substrate.
いて、特に内外周端面部にのみ強化層を残存させること
を特徴とするディスク基板。2. A glass disk substrate for a magnetic recording medium, wherein the reinforcing layer is left only on the inner and outer peripheral end surfaces.
ク基板において、特に化学強化処理の内部引張り応力値
が0〜4.5kg/mm2以下,好ましくは0〜0.5kg/
mm2以下のディスク基板。3. The glass disk substrate for a magnetic recording medium according to claim 1, wherein the internal tensile stress value of the chemical strengthening treatment is 0 to 4.5 kg / mm 2 or less, preferably 0 to 0.5 kg / mm 2.
mm 2 or less of the disk substrate.
ク基板において、特に表面粗さRaが1.00μm以下の
ディスク基板。4. The glass disk substrate for a magnetic recording medium according to claim 2, wherein the surface roughness Ra is 1.00 μm or less.
Priority Applications (1)
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JP560899A JP2000207730A (en) | 1999-01-12 | 1999-01-12 | Glass substrate of magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP560899A JP2000207730A (en) | 1999-01-12 | 1999-01-12 | Glass substrate of magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000207730A true JP2000207730A (en) | 2000-07-28 |
Family
ID=11615928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP560899A Pending JP2000207730A (en) | 1999-01-12 | 1999-01-12 | Glass substrate of magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000207730A (en) |
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