JP2000199850A - Projection optical system, projection aligner and production of device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a projection optical system made achromatic in wide spectral width by providing a 4th lens group having negative refractive power and a 5th lens group having positive refractive power, and further providing at least one or more aspherical shape surfaces and constituting the optical system to satisfy a specified condition. SOLUTION: This projection optical system projecting the image of a mask M on a pattern P is provided with a 1st lens group G1 having positive refractive power and a 2nd lens group G2 having at least a pair of combined lens components of a positive lens component L21 and a negative lens component L22 and having negative refractive power in order from the mask M side. Furthermore, it is provided with a 3rd lens group G3 having the positive refractive power, the 4th lens group G4 having at least a pair of combined lens components of a negative lens L43 and a positive lens component L44 and having the negative refractive power, and the 5th lens group G5 having the positive refractive power. Then, it is provided with at least one or more aspherical shape surfaces and made to satisfy the specified condition.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection optical system for projecting a pattern of a first object onto a substrate or the like as a second object, a projection exposure apparatus using the optical system, and more particularly, to a projection exposure system using the optical system. A projection optical system suitable for projecting and exposing a semiconductor or liquid crystal pattern formed on a reticle (mask) onto a substrate (such as a wafer plate) as a second object, and projection exposure using the projection optical system The present invention relates to an apparatus and a device manufacturing method.

[0002]

2. Description of the Related Art As the patterning of integrated circuits becomes finer, the performance required for a projection optical system used for printing a wafer is becoming more and more severe. Under such circumstances, the resolution of the projection optical system is improved by shortening the exposure wavelength λ or by setting the numerical aperture N. A. May be increased.

In such a projection exposure apparatus, the g-line (λ = 43
Exposure is performed using a light source that supplies exposure light from a 6 nm line to an i-line (λ = 365 nm). In the projection optical system, what is required with the improvement of the resolving power is to reduce image distortion. Here, the image distortion is caused not only by distortion (distortion aberration) caused by the projection optical system, but also by warpage of a wafer printed on the image side of the projection optical system and by a circuit pattern on the object side of the projection optical system. May be due to warping of the reticle, etc.

In recent years, transfer patterns have been increasingly miniaturized, and the demand for reducing image distortion has become even more severe. Therefore, in order to reduce the influence on the image distortion due to the warpage of the wafer, a so-called image-side telecentric optical system in which the exit pupil position on the image side of the projection optical system is located far away has conventionally been used.

On the other hand, in order to reduce image distortion due to warping of the reticle, it is conceivable to use a so-called object-side telecentric optical system in which the entrance pupil position of the projection optical system is located far from the object plane. It has been proposed to position an entrance pupil of an optical system far from an object plane.

[0006]

In recent years, a projection optical system has been required to have a wide exposure area while improving resolution. Therefore, Japanese Patent Application Laid-Open No. H10-549
A projection optical system as disclosed in Japanese Patent Publication No. 36 is also proposed.

However, if the exposure field is widened as it is, the length of the projection optical system becomes longer, which makes not only the overall configuration of the projection exposure apparatus difficult but also the size of the projection exposure apparatus. It may be difficult to install the apparatus on a factory floor or the like of a user who uses the apparatus.

Accordingly, the present invention provides a compact and high-performance projection optical system which uses an aspherical surface and is capable of correcting various aberrations extremely well over an extremely wide exposure area while being telecentric on both sides. For one purpose.

Further, in a projection exposure apparatus using short-wavelength exposure light, it is required to use a glass material having a high transmittance in an ultraviolet region where fluorescence emission due to ultraviolet absorption and solarization are unlikely to occur. Therefore, the degree of freedom (type) of usable glass materials is small, and since these glass materials have a low refractive index, it is difficult to perform aberration correction.

In order to solve this problem, in a conventional exposure apparatus, light from a light source is passed through a wavelength selection filter to restrict the spectral width to a narrow spectral width such that chromatic aberration can be substantially ignored. The design constraints are reduced, and other aberrations are corrected well. However,
Since the energy loss increases as the spectral width of the exposure light decreases, it is difficult to reduce the exposure time.

It is another object of the present invention to provide a projection optical system which is achromatized for a wide spectral width in an extremely wide exposure area.

[0012]

In order to achieve the above object, according to the present invention, in a projection optical system for projecting an image of a first object onto a second object, a positive optical system is used in order from the first object side. A first lens group having a refractive power, and at least one combination lens component of a positive lens component and a negative lens component;
A second lens group having a negative refractive power, a third lens group having a positive refractive power, and at least one combination lens component of a negative lens component and a positive lens component; The projection optical system includes four lens groups and a fifth lens group having a positive refractive power, and the projection optical system has at least one surface having an aspherical shape.

In the present invention, it is desirable to satisfy the following conditions. (1) 0.2 <| f1 / f2 | <2.0 (2) 0.4 <| f5 / f4 | <4.0 (3) 0.4 <f2 / f4 <5.5 (4) 0 0.1 <νp2 / νn2 <0.95 (5) 0.1 <νp4 / νn4 <0.95 where f1 is the focal length of the first lens group, f2 is the focal length of the second lens group, f3 Is the focal length of the third lens group, f4 is the focal length of the fourth lens group, f5 is the focal length of the fifth lens group, L is the distance from the first object to the second object, and νp2 is the Abbe number of at least one positive lens component in the second lens group, vn2
Is the Abbe number of at least one of the negative lens components in the second lens group, vp4 is the Abbe number of at least one of the positive lens components in the fourth lens group, and vn4 is at least one of the Abbe numbers of the fourth lens group. And the Abbe numbers of the two negative lens components.

Further, each Abbe number is a dispersion value of the glass material of each lens component, and the dispersion value is a wavelength λ (unit: n).
When the refractive index with respect to m) is n (λ), ν = {n (436) −1} / {n (400) −n (44)
0)｝.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The basic structure of a projection optical system according to the present invention will be described with reference to the reference numerals shown in the accompanying drawings.
The present invention is a projection optical system that projects an image of a first object (mask M) onto a second object (pattern P), and has a positive refractive power in order from the first object (mask M) side. One lens group G1, a positive lens component L21, and a negative lens component L22
, A second lens group G2 having a negative refractive power, a third lens group G3 having a positive refractive power, a negative lens L43, and a positive lens component L.
44, a fourth lens group G4 having a negative refractive power and a fifth lens group G5 having a positive refractive power, wherein the projection optical system has an aspherical shape. Has at least one surface.

In the present invention, it is desirable to satisfy the following conditional expressions (1) and (1): 0.2 <| f1 / f2 | <2.0. Here, f1 represents the focal length of the first lens group G1, and f2 represents the focal length of the second lens group G2.

Conditional expression (1) defines an optimum ratio between the focal length of the first lens group G1 having a positive refractive power and the focal length of the second lens group G2 having a negative refractive power. Conditional expression (1) is a condition for mainly correcting distortion in a well-balanced manner and favorably correcting Petzval sum. If the lower limit of conditional expression (1) is not reached, a large positive distortion will occur, and the Petzval sum will increase to a positive value. On the other hand, when the value exceeds the upper limit value of the conditional expression (1), a large negative distortion occurs, and the Petzval sum increases to a negative value, so that it becomes difficult to correct the curvature of field. Further, the total length of the projection optical system is undesirably increased.

In the present invention, it is desirable to satisfy the following conditional expressions (2) and (2): 0.4 <| f5 / f4 | <4.0. Here, f4 represents the focal length of the fourth lens group G4, and f5 represents the focal length of the fifth lens group G5.

Conditional expression (2) defines an optimum ratio between the focal length of the fifth lens unit G5 having a positive refractive power and the focal length of the fourth lens unit G4 having a negative refractive power, and mainly balances distortion. This is a condition for good correction and good correction for Petzval sum. If the lower limit of conditional expression (2) is not reached, a large negative distortion is generated, and the Petzval sum increases to a positive value, which makes field curvature correction difficult, which is not preferable. On the other hand, when the value exceeds the upper limit of conditional expression (2), a large positive distortion occurs, and the Petzval sum increases to a negative value, so that it becomes difficult to correct the curvature of field.
This is not preferable because the overall length of the projection optical system becomes long.

In the present invention, it is desirable to satisfy the following conditional expressions (3) and (3): 0.4 <f2 / f4 <5.5.

Conditional expression (3) defines an optimum ratio between the focal length of the second lens unit G2 having a negative refractive power and the focal length of the fourth lens unit G4 having a negative refractive power. Is set to be small, preferably close to 0, and a wide exposure area is ensured, while favorably correcting the field curvature. When falling below a lower limit value of conditional expression (3), the fourth lens unit G
Since the refractive power of No. 4 becomes relatively weaker than the refractive power of the second lens group G2, the Petzval sum increases to a positive value. Conversely, if the value exceeds the upper limit of conditional expression (3), the refractive power of the second lens group G2 becomes relatively weaker than the refractive power of the fourth lens group G4, so that the Petzval sum increases to a positive value. And both are not preferred.

Further, the present invention provides the following conditional expression (4) or (5): (4) 0.1 <νp2 / νn2 <0.95 (5) 0.1 <νp4 / νn4 <0.95 It is desirable to satisfy each condition. Here, νp2 is the Abbe number of at least one positive lens component of the second lens group G2, vn2 is the Abbe number of at least one negative lens component of the second lens group G2, and νp4 is the Abbe number of the fourth lens group G4. The Abbe number of at least one positive lens component and vn4 represent the Abbe number of at least one negative lens component of the fourth lens group G4. Further, each Abbe number is a dispersion value of each lens glass material, and a refractive index for a wavelength λ (unit: nm) is n (λ).
Ν = {n (436) −1} / {n (400) −n (44
0)｝.

Conditional expression (4) or (5) is a condition for favorably correcting chromatic aberration of curvature of field and chromatic aberration of magnification mainly in a wide exposure area. If there is no lens group that satisfies the conditional expression (4) or (5), it becomes extremely difficult to satisfactorily correct chromatic aberration.

In the present invention, it is desirable that the third lens group G3 or the fourth lens group G4 has at least one surface having an aspherical shape.

Further, the present invention provides the following conditional expression (6):
(7), (6) 0.5 ≦ | β | ≦ 3.0 (7) It is desirable to satisfy each condition of 0.04 <Y / L <0.8. Here, β represents the lateral magnification of the projection optical system, Y represents the maximum image height, and L represents the distance from the first object (mask M) surface to the second object (pattern P) surface.

Condition (6) defines an appropriate range of the lateral magnification of the projection optical system. Conditional expression (7) indicates that, when the lateral magnification of the projection optical system is within the range of conditional expression (6), physical production is possible while maintaining good aberration balance, and production cost is reduced. Stipulates the condition of the projection optical system which is superior.

When the value exceeds the upper limit of conditional expression (7), it is not possible to maintain a good aberration balance of the entire exposure region where good aberration is required to be maintained. Conversely, when the value goes below the lower limit of conditional expression (7), the length of the projection optical system becomes longer, which is not suitable for practical use. More preferably, the lower limit of conditional expression (7) is set to 0.07 in order to realize a more compact projection optical system by fully utilizing the effect of using an aspherical surface in the projection optical system. desirable.

In the present invention, it is desirable to satisfy the following conditional expressions (8) and (8): -2.0 <f4N / L <-0.01. Here, f4N represents the focal length of at least one negative lens component closest to the third lens group in the fourth lens group G4, and L represents the distance from the first object plane to the second object plane. ing.

Conditional expression (8) is a condition for obtaining a wide exposure area in a compact optical system.

In the present invention, the fourth lens group G4
Has at least one positive lens component adjacent to the second object side of the negative lens component, and has the following conditional expressions (9) and (9) −1.5 <f4 (N + P) / L It is desirable to satisfy <−0.05. Here, f4 (N + P) is a composite focal length of the positive lens component and the negative lens component, and L is the first focal length.
It represents the distance from the object (mask M) plane to the second object (pattern P) plane.

By satisfying conditional expression (9), a wider exposure area can be realized in a more compact optical system. Such a condition can be applied to an optical system having only a spherical system without using an aspheric surface.

First, consider a case where the present invention is applied to a spherical optical system. Higher-order aberrations also occur in the third lens group G3 due to the enlargement of the exposure area. However, by arranging a negative lens component satisfying conditional expression (8), the higher-order aberrations can be canceled. . For this reason, aberration can be favorably corrected in a wide exposure region. More preferably, when the conditional expression (9) is satisfied, the above-mentioned effect can be obtained in a more emphasized manner.

Next, consider a case in which an aspheric lens is applied to a negative lens component satisfying conditional expression (8). In this case, contrary to the case of the spherical system, the third lens group G3
, The occurrence of higher-order aberrations can be suppressed. Therefore, it is possible to satisfactorily correct aberrations in a wide exposure area. More preferably, when the conditional expression (9) is satisfied, the above-mentioned effect can be obtained more emphasized.

Further, according to the present invention, the second lens group G2 has at least two sets of combination lenses of a positive lens component and a negative lens component, and the following conditional expressions (10), (11) and (10) 0 .1 <vp2 / vn2 <0.95 (11) (| rp22 |-| rn21 |) / (| rp22 | + | rn
21 |) <1.0. Conditional expressions (10), (11)
Is satisfied, it is possible to more effectively correct the field curvature related to color.

Where νp2 is the Abbe number of the positive lens component, νn2 is the Abbe number of the negative lens component, rp22 is the radius of curvature of the second object side surface of the positive lens component, and rn21 is the first radius of the negative lens component. The radius of curvature of the side surface of the object is shown.

Further, in the present invention, the fourth lens group G4 has at least two sets of combined lens components of a negative lens component and a positive lens component, and the following conditional expressions (12), (13), and (12). ) 0.1 <vp4 / vn4 <0.95 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn
42 |) <1.0. Here, νp4 is the Abbe number of the positive lens component, vn4 is the Abbe number of the negative lens component, rp41 is the radius of curvature of the first object side surface of the positive lens component, and rn42 is the second radius of the negative lens component.
The respective radii of curvature of the object-side surface are shown.

By satisfying conditional expressions (12) and (13), it is possible to more effectively correct the color field curvature.

More preferably, said first lens group G1
Are, in order from the first object (mask M) side, a negative lens component having a concave surface facing the second object (pattern P) side, and the first object (mask M) disposed adjacent to the negative lens component. ) Has a negative / positive combination lens component consisting of a positive lens component with the convex surface facing the side, and the following conditional expressions (14) and (1).
5), (14) 0.1 <vn / vp <0.95 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn
12 |) <1.0. Conditional expression (14),
By satisfying (15), lateral chromatic aberration can be corrected more effectively. Here, νp1 is the Abbe number of the positive lens component, vn2 is the Abbe number of the negative lens component, rp11 is the radius of curvature of the surface of the positive lens component on the first object (mask M) side, and rn12 is the negative lens component. Of the second object (pattern P) side.

More preferably, the fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component having a convex surface facing the second object (pattern P) side; A positive / negative combination lens component comprising a negative lens component disposed adjacent to the lens component and having a concave surface facing the first object side, and the following conditional expressions (16), (17), and (16): 1 <vn5 / vp5 <0.95 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn
61 |) <1.0. Conditional expression (16),
By satisfying (17), lateral chromatic aberration can be corrected more effectively. Here, νp5 is the Abbe number of the positive lens component, vn5 is the Abbe number of the negative lens component, rp62
Is the radius of curvature of the surface of the positive lens component on the second object side, rn61
Represents the radius of curvature of the surface on the first object side of the negative lens component.

According to the present invention, there is provided a projection exposure apparatus for projecting and exposing a projection original onto a substrate by a projection optical system, wherein the projection optical system is as defined in any one of claims 1 to 7. It is characterized by.

Further, according to the present invention, there is provided a device manufacturing method for projecting and exposing a circuit pattern of a device onto a substrate by a projection optical system, wherein the projection optical system is any one of claims 1 to 7. It is characterized by being.

Next, an example in which the projection optical system according to the embodiment of the present invention is applied to a projection exposure apparatus will be described. FIG. 1 is a perspective view showing an example in which a projection optical system according to an embodiment of the present invention is applied to a batch exposure type projection exposure apparatus. FIG. 2 is a perspective view showing an example in which the projection optical system according to the embodiment of the present invention is applied to a scanning exposure apparatus.

The projection exposure apparatus shown in FIG. 1 or FIG. 2 is used in an exposure step when forming a circuit pattern of a device such as an integrated circuit element or a liquid crystal panel.
First, in the example of FIG. 1, a mask M as a projection master on which a predetermined circuit pattern is drawn is placed on the object plane of the projection optical system PL.
(First object) is arranged, and a plate P (second object) as a substrate is arranged on the image plane of the projection optical system PL. Here, the mask M is held on a mask stage MS, and a plate P movable in the XY directions in the figure is held on a plate stage PS. Further, above the mask M (on the Z direction side), an illumination optical device IL for uniformly illuminating the illumination area IA of the mask M with ultraviolet exposure light.
Is arranged. In this embodiment, the illumination optical device IL supplies ultraviolet light from a g-line (λ = 435.8 nm) line to an h-line (λ = 404.7 nm).

With the above-described configuration, the exposure light in the ultraviolet region supplied from the illumination optical device IL emits the illumination region I on the mask M.
A is uniformly illuminated, and the exposure light from the mask M forms a light source image at the position of the aperture stop AS of the projection optical system PL. That is, the mask M is Koehler-illuminated by the illumination optical device IL. Then, in the exposure area EA on the plate P,
An image in the illumination IA of the mask M is formed, whereby the circuit pattern of the mask M is transferred to the plate P.

Next, the example of FIG. 2 differs from the example of FIG. 1 in that the mask stage MS holding the mask M and the plate stage PS holding the plate P scan in opposite directions during exposure. Is different. Thereby, the image of the mask M is scanned and exposed on the plate P. In the above embodiments of FIGS. 1 and 2, the projection optical system PL
The object (mask M) side and the second object side (plate P side) are substantially telecentric and have a magnification.

[0046]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, numerical embodiments of a projection optical system according to the present invention will be described with reference to the accompanying drawings. In each embodiment, the NA on the image side is 0.1, the projection magnification is 1 / 0.6, the radius of the exposure area on the image side is 117.6 mm, and the wavelength range from the g-line to the h-line is considered. To correct chromatic aberration. (First Embodiment) FIG. 3 is a diagram showing a lens configuration of a projection optical system according to a first embodiment of the present invention. The projection optical system of this embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power and a second lens group G2 having a negative refractive power.
, A third lens group G3 having a positive refractive power, a fourth lens group G4 having a negative refractive power, and a fifth lens group G5 having a positive refractive power.

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 has a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, and a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24.
The fourth lens group G4 has at least one negative lens component L41 closest to the third lens group G3 and a positive lens component L42 near the second object (pattern P) adjacent to the negative lens component. A negative / positive combination lens component including a lens component L43 and a positive lens component L44; and a negative lens component L45.
And a negative / positive combination lens component comprising a positive lens component L46. The fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component L57 having a convex surface facing the second object (pattern P) side, and the fifth lens group G5 disposed adjacent to the positive lens component L57. A positive / negative combination lens component including a negative lens component L58 having a concave surface facing one object (mask M) side.

Table 1 below shows the specification values of the projection optical system according to the present embodiment. In the table, the surface number is the order of the lens surfaces counted from the first object (mask M) side, r is the radius of curvature of the lens surface (however, STO indicates a stop surface), d is the air gap of the lens surface, and n ( g) is the g-line (λ = 435.83)
5 nm), and ν represents dispersion. d0 is the distance from the first object (mask M) to the first lens group G1.
, Β is the projection magnification of the projection optical system, NA is the numerical aperture of the projection optical system on the second object side, and WD is the second object (plate P) from the final surface of the fifth lens G5. The distance to the surface, ΦEX, represents the radius of the exposure area on the surface of the second object (plate P).

The aspherical surface is expressed by the following equation: Z = cy ² / (1+ (1- (1 + k) c ² y ² ) ^1/2 ) + Ay ⁴ + By ⁶ + Cy ⁸ + Dy ¹⁰ Is done. Here, y is the height from the optical axis, Z is the amount of sag, c is the curvature, k is the conic constant, and A, B, C, and D are the aspherical coefficients. In addition, the following specification values of all the examples,
In the aspherical formula, the same reference numerals as those in the first embodiment are used.

[0050]

Table 1 d0 = 71.280029 β = -1 / 0.6 NA = 0.1 WD = 82.824696 ΦEX = 117.6 Surface number rdn (g) ν 1) -4010.24588 20.000000 1.45814 164.86 2) -415.68323 1.500000 1.00000 3) 2251.29134 18.022063 1.59417 68.74 4) 591.58755 5.155707 1.00000 5) 1242.80518 22.616519 1.45814 164.86 6) -771.15182 1.500000 1.00000 7) 938.61649 22.020243 1.60353 106.44 8) -969.98447 1.500000 1.00000 9) 401.07382 23.200000 1.60353 106.44 10) -1395.27409 1.500000 1.00000 11) 6000. 1.500000 1.00000 13) 236.00907 17.500000 1.60353 106.44 14) 105.19538 29.332837 1.00000 15) -1868.01561 22.385413 1.59417 68.74 16) -445.49596 2.693356 1.00000 17) -718.54134 15.000000 1.45814 164.86 18) 355.20158 13.374065 1.00000 19) -016. 1.00000 21) -211.77189 15.000000 1.45814 164.86 22) 333.37137 27.793796 1.00000 23) -114.51515 16.000000 1.60353 106.44 24) -220.68730 32.421482 1.00000 25) -639.12878 18.000000 1. 59417 68.74 26) 545.43665 1.500000 1.00000 27) 507.92592 30.000000 1.45814 164.86 28) -503.08235 1.803457 1.00000 29) 3023.63682 22.000000 1.45814 164.86 30) -587.31910 1.502071 1.00000 31) 1078.79605 27.000000 1.45814 164.86 32) -357.17626 0.000000 1.00000 3300000 3824.13157 26.146269 1.45814 164.86 35) -252.38006 2.031981 1.00000 36) -244.75740 19.000000 1.59417 68.74 37) -383.22858 4.807088 1.00000 38) 0.0 (STO) 1.627090 1.00000 39) 315.25973 19.000000 1.59417 68.74 40) 203.81669 5.588627 1.00000 41) 230. 1620.60458 1.500000 1.00000 43) 347.65410 29.000000 1.45814 164.86 44) -925.96379 1.500000 1.00000 45) 234.25979 27.000000 1.45814 164.86 46) 700.00000 2.629830 1.00000 47) 183.97635 26.000000 1.45814 164.86 48) 318.26464 3.309424 1.00000 49) 183.77. -348.43853 16.000000 1.46674 124.00 52) 194.29748 22.378220 1.00000 53) 296.56457 23.000000 1.60353 106.44 54) 1135 .79206 24.531418 1.00000 55) -183.35250 16.000000 1.45814 164.86 56) -3004.70974 1.595480 1.00000 57) 1020.26792 24.707572 1.59417 68.74 58) -879.55136 13.894156 1.00000 59) -179.85670 17.000000 1.45814 164.86 60) 10672.87842 1.500000 1.00000 61) 1364.9 2001. 444.55364 18.887856 1.00000 63) -167.84348 20.000000 1.49597 127.66 64) -375.88082 24.213925 1.00000 65) -119.31287 20.269697 1.60353 106.44 66) -237.25252 1.517561 1.00000 67) -733.25110 27.584947 1.60353 106.44 68) -373.78332.651. ) -383.78611 1.725053 1.00000 71) -865.21636 27.014946 1.60353 106.44 72) -566.72380 1.790324 1.00000 73) 2722.77759 27.000030 1.60353 106.44 74) -744.86680 2.335884 1.00000 75) 1796.68210 34.000268 1.45814 164.86 76) -631.90173 9.74 1.68314. ) -536.21994 4.247237 1.00000 79) 1451.28424 28.000000 1.60353 106.44 80) 0.00000 82.824696 1.00000 (Aspherical coefficient) Surface 51 is aspherical Surface, and the aspheric coefficient is shown below. k = -1.314260 A = 0.863064 × 10 ^-9 B = 0.200391 × 10 ^-11 C = 0.167288 × 10 ^-16 D = 0.626884 × 10 ^-20 (Values corresponding to conditional expressions) (1 ) | F1 / f2 | = 0.625 (2) | f5 / f4 | = 2.324 (3) f2 / f4 = 2.066 (4) vp2 / vn2 = 0.417 (5) vp4 / vn4 = 0 .417 (6) β = -1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = -0.196 (9) f4 (N + P) / L = -0.347 (10) vp2 / vn2 = 0.417 (11) (| rp22 |-| rn21 |) / (| rp22 | + | rn21 |) =-0.23
5, −0.053 (12) vp4 / vn4 = 0.417 (13) (| rp41 | − | rn42 |) / (| rp41 | + | rn42 |) = − 0.49
3, -0.773 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.355 (16) vn5 / vp5 = 0 .417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) = 0.194

FIG. 4 is a view showing various aberrations of the projection optical system of the present embodiment. In the aberration diagrams, NA indicates the numerical aperture of the projection optical system, and Y indicates the image height. In the coma diagram, the solid line indicates the g-line (λ = 435.84 nm), and the dotted line indicates the h-line (λ = 404.7 nm). The same reference numerals as in the present embodiment are used in the various aberration diagrams of all the embodiments below. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

(Second Embodiment) FIG. 5 is a diagram showing a lens configuration of a projection optical system according to a second embodiment of the present invention. The projection optical system of the present embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power, a second lens group G2 having a negative refractive power, and a third lens group having a positive refractive power. G3, a fourth lens group G4 having a negative refractive power, and a fifth lens group G5 having a positive refractive power
It is composed of

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 includes a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24, and a positive lens component L25. And a positive / negative combination lens component composed of a negative lens component L26. The fourth lens group G4 includes at least one negative lens component L4 closest to the third lens group G3.
1 and a second object (pattern P) adjacent to the negative lens component
And a negative lens component L43.
And a positive and negative lens component L44, a negative and positive combination lens component including a negative lens component L45 and a positive lens component L46, and a negative and positive lens component including a negative lens component L47 and a positive lens component L48. And a combination lens component. The fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component L54 having a convex surface facing the second object (pattern P) side, and the fifth lens group G5 disposed adjacent to the positive lens component L54. It has a positive / negative combination lens component consisting of a negative lens component L55 having a concave surface facing one object (mask M).

Table 2 below shows data values of the projection optical system according to the present embodiment.

[0055]

Table 2 d0 = 70.778255 β = -1 / 0.6 NA = 0.1 WD = 85.892333 ΦEX = 117.6 Surface number rdn (g) ν 1) -5876.75706 20.000000 1.45814 164.86 2) -356.24443 1.500000 1.00000 3) 1285.67079 18.000000 1.59417 68.74 4) 347.88586 11.093335 1.00000 5) 491.05555 22.500000 1.45814 164.86 6) -1630.27023 1.500000 1.00000 7) 500.21184 22.000000 1.60353 106.44 8) -887.93043 1.500000 1.00000 9) 471.54305 23.200000 1.60353 106.44 10) -978.49591 1.500000 1.00000 11) 364.147.12 1.500000 1.00000 13) 240.49909 17.500000 1.60353 106.44 14) 105.07919 28.683584 1.00000 15) -1571.46747 24.876500 1.59417 68.74 16) -300.14306 1.724299 1.00000 17) -302.92114 15.000000 1.45814 164.86 18) 465.07651 12.595445 1.00000 19) 6377.594174.740000. 21) -191.19649 15.000000 1.49597 127.66 22) 299.17044 29.279905 1.00000 23) -111.78484 16.000000 1.60353 106.44 24) -220.36637 33.747951 1.00000 25) -900.43404 18.000000 1.59 417 68.74 26) 562.20035 1.500000 1.00000 27) 538.11569 30.000000 1.45814 164.86 28) -464.33073 1.572083 1.00000 29) -44242.23515 22.000000 1.45814 164.86 30) -492.06824 1.500000 1.00000 31) 1641.02002 27.000000 1.45814 164.86 32) -408.39673 0.000000 1.00000 3300000 ) 2119.81567 29.422638 1.45814 164.86 35) -236.64693 1.620272 1.00000 36) -235.26251 19.000000 1.59417 68.74 37) -334.86773 2.412982 1.00000 38) 0.0 (STO) 2.220296 1.00000 39) 340.00023 19.000000 1.59417 68.74 40) 203.15674 4.132041.14 41.6641. ) 2365.13346 1.500000 1.00000 43) 304.69229 29.004987 1.45814 164.86 44) -1696.99672 1.500000 1.00000 45) 246.85362 27.000000 1.45814 164.86 46) 700.00000 3.461420 1.00000 47) 186.34340 26.000000 1.45814 164.86 48) 291.55223 3.415513 1.00000 49) 189.59418.400000. ) -290.93688 16.000000 1.46674 124.00 52) 247.89316 42.540272 1.00000 53) 357.36723 23.000000 1.60353 106.44 54) 1839 .43947 27.756358 1.00000 55) -155.23327 16.000000 1.49597 127.66 56) 2518.83777 1.500000 1.00000 57) 1025.83668 24.902165 1.59417 68.74 58) -584.73072 25.710500 1.00000 59) -145.73456 16.000000 1.45814 164.86 60) -1020.06712 1.500000 1.00000 61) 7 -432.66573 21.244053 1.00000 63) -138.04066 20.000000 1.60353 106.44 64) -301.40002 1.500000 1.00000 65) -783.03500 27.000000 1.59417 68.74 66) -449.41110 1.500000 1.00000 67) -911.22262 26.000000 1.59417 68.74 68) -468.34556 1.500000 1.00000 69) 17.1178.564 70) -618.43139 1.500000 1.00000 71) 4922.99509 28.000000 1.60353 106.44 72) -649.76417 1.500000 1.00000 73) 1652.38895 34.000000 1.45814 164.86 74) -565.12497 9.744089 1.00000 75) -396.89427 25.000000 1.59417 68.74 76) -487.52137 1.5745.40072.00000 77) ) 0.00000 85.892333 1.00000 (Aspherical surface coefficient) The 51st surface is an aspherical surface, and the aspherical surface coefficient is shown below. k = -1.670748 A = 0.334932 × 10 ⁻⁸ B = 0.182646 × 10 ⁻¹¹ C = −0.793826 × 10 ⁻¹⁷ D = 0.746156 × 10 ⁻²⁰ (Value for conditional expression) ( 1) | f1 / f2 | = 1.001 (2) | f5 / f4 | = 2.626 (3) f2 / f4 = 1.825 (4) vp2 / vn2 = 0.645, 0.417, 0.
538 (5) vp4 / vn4 = 0.538, 0.417, 0.
645 (6) β = −1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = −0.210 (9) f4 (N + P) /L=−0.382 ( 10) vp2 / vn2 = 0.645, 0.417, 0.
538 (11) (| rp22 |-| rn21 |) / (| rp22 | + | rn21 |) = 0.26
4, -0.005, -0.046 (12) vp4 / vn4 = 0.538, 0.417, 0.
645 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn42 |) =-0.42
1,0.460,0.444 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.171 (16) vn5 / νp5 = 0.417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) 0.175

FIG. 6 is a diagram showing various aberrations of the projection optical system of this embodiment. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

(Third Embodiment) FIG. 7 is a diagram showing a lens configuration of a projection optical system according to a third embodiment of the present invention. The projection optical system of the present embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power, a second lens group G2 having a negative refractive power, and a third lens group having a positive refractive power. G3, a fourth lens group G4 having a negative refractive power, and a fifth lens group G5 having a positive refractive power
It is composed of

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 has a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, and a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24.
The fourth lens group G4 has at least one negative lens component L41 closest to the third lens group G3 and a positive lens component L42 near the second object (pattern P) adjacent to the negative lens component. A negative / positive combination lens component including a lens component L43 and a positive lens component L44; and a negative lens component L45.
And a positive and negative lens component L46, and a negative and positive lens component including a negative lens component L47 and a positive lens component L48. The fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component L54 having a convex surface facing the second object (pattern P) side.
And a negative lens component L55 disposed adjacent to the positive lens component L54 and having a concave surface facing the first object (mask M).
And a positive / negative combination lens component consisting of

Table 3 below shows data values of the projection optical system according to the present embodiment.

[0060]

[Table 3] d0 = 70.281807 β = -1 / 0.6 NA = 0.1 WD = 85.471505 ΦEX = 117.6 Surface number rdn (g) ν 1) -41537.06890 20.000000 1.45814 164.86 2) -365.09217 1.500000 1.00000 3) 1164.32419 18.000000 1.59417 68.74 4) 361.65468 8.123946 1.00000 5) 1047.00233 22.500000 1.45814 164.86 6) -723.69086 1.500000 1.00000 7) 591.06852 22.000000 1.60353 106.44 8) -1985.49335 1.500000 1.00000 9) 361.48433 23.200000 1.60353 106.44 10) -868.95858 1.500000 1.00000 11) 00002.863 1062. 1.500000 1.00000 13) 265.57204 17.500000 1.60353 106.44 14) 104.50371 28.907421 1.00000 15) -1324.62456 24.274658 1.59417 68.86 16) -348.15695 2.396312 1.00000 17) -352.77149 15.000000 1.45814 164.86 18) 395.67465 12.476109 1.00000 19) -2490.4598.725.00 1.00000 21) -215.13135 15.000000 1.45814 164.86 22) 306.07821 28.728798 1.00000 23) -114.57859 16.000000 1.60353 106.44 24) -222.35552 33.219051 1.00000 25) -930.80462 18.000000 1 .59417 68.74 26) 503.08854 1.500000 1.00000 27) 485.19248 30.000000 1.45814 164.86 28) -525.73640 1.500000 1.00000 29) 5391.80452 22.000000 1.45814 164.86 30) -540.97562 1.500000 1.00000 31) 1298.90044 27.000000 1.45814 164.86 32) -422.78132 0.000000 1.00000 3300000 ) 1554.27131 28.661453 1.45814 164.86 35) -251.58427 1.788768 1.00000 36) -247.44430 19.000000 1.59417 68.74 37) -349.83935 3.192387 1.00000 38 0.0 (STO) 2.981590 1.00000 39) 353.88726 19.000000 1.59417 68.74 40) 205.518746.14) 29.53817.46841.99) 3338.38053 1.500000 1.00000 43) 323.78845 29.069120 1.45814 164.86 44) -1212.19849 1.500000 1.00000 45) 247.83041 27.000000 1.45814 164.86 46) 700.00000 3.061593 1.00000 47) 182.81527 26.000000 1.45814 164.86 48) 300.83634 3.269873 1.00000 49) 183.287017 100000 49) 183.28702 18.049. -290.57150 16.000000 1.46674 124.00 52) 234.92471 41.901516 1.00000 53) 346.80734 23.000000 1.60353 106.44 54) 144 0.37358 27.452833 1.00000 55) -162.39441 16.000000 1.49597 127.66 56) 4641.63937 1.500000 1.00000 57) 1141.38148 24.492200 1.59417 68.74 58) -786.07607 26.046812 1.00000 59) -142.28779 16.000000 1.45814 164.86 60) -1298.32411 1.500000 1.274 61.74. 389.80064 21.535280 1.00000 63) -135.72991 20.000000 1.60353 106.44 64) -276.99403 1.500000 1.00000 65) -810.45901 27.000000 1.59417 68.74 66) -418.58658 1.500000 1.00000 67) -874.18958 26.000000 1.59417 68.74 68) -532.07303 1.500000 1.00000 69) -1791.20106 2700. ) -552.13375 1.500000 1.00000 71) 46724.57835 28.000000 1.60353 106.44 72) -742.02620 1.500000 1.00000 73) 1183.83608 34.000000 1.45814 164.86 74) -736.17611 15.200269 1.00000 75) -382.98498 25.000000 1.59417 68.74 76) -441.35918 1.500000 1.00000 778.01.360 67.1313.467 0.00000 81.471505 1.00000 (Aspherical surface coefficient) The 51st surface is an aspherical surface, and the aspherical surface coefficient is shown below. k = −1.458102 A = 0.230263 × 10 ⁻⁸ B = 0.185031 × 10 ⁻¹¹ C = −0.813867 × 10 ⁻¹⁷ D = 0.642140 × 10 ⁻²⁰ (Value corresponding to the conditional expression) ( 1) | f1 / f2 | = 0.626 (2) | f5 / f4 | = 2.665 (3) f2 / f4 = 4.363 (4) vp2 / vn2 = 0.417 (5) vp4 / vn4 = 0.538, 0.417, 0.
645 (6) β = −1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = −0.204 (9) f4 (N + P) /L=−0.354 ( 10) vp2 / vn2 = 0.417 (11) (| rp22 |-| rn21 |) / (| rp22 | + | rn21 |) =-0.00
7, -0.065 (12) vp4 / vn4 = 0.538, 0.417, 0.
645 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn42 |) =-0.60
5, 0.412, 0.491 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.487 (16) vn5 / νp5 = 0.417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) = 0.316

FIG. 8 is a diagram showing various aberrations of the projection optical system of this embodiment. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

(Fourth Embodiment) FIG. 9 is a diagram showing a lens configuration of a projection optical system according to a fourth embodiment of the present invention. The projection optical system of the present embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power, a second lens group G2 having a negative refractive power, and a third lens group having a positive refractive power. G3, a fourth lens group G4 having a negative refractive power, and a fifth lens group G5 having a positive refractive power
It is composed of

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 has a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, and a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24.
The fourth lens group G4 has at least one negative lens component L41 closest to the third lens group G3 and a positive lens component L42 near the second object (pattern P) adjacent to the negative lens component. A negative / positive combination lens component including a lens component L43 and a positive lens component L44; and a negative lens component L45.
And a positive and negative lens component L47, and a negative and positive lens component including a negative lens component L46 and a positive lens component L47. The fifth lens group G5 includes a positive lens component L56 having a convex surface facing the second object (pattern P) in order from the first object (mask M) side.
And a negative lens component L57 disposed adjacent to the positive lens component L56 and having a concave surface facing the first object (mask M).
And a positive / negative combination lens component consisting of

Table 4 below shows data values of the projection optical system according to this embodiment.

[0065]

Table 4 d0 = 70.265608 β = -1 / 0.6 NA = 0.1 WD = 85.716137 ΦEX = 117.6 Surface number rdn (g) ν 1) -51786.74290 20.000000 1.45814 164.86 2) -387.92307 1.500000 1.00000 3) 2260.31200 18.000000 1.59417 68.74 4) 462.64594 7.900393 1.00000 5) 1676.34555 22.692292 1.45814 164.86 6) -637.21315 1.500000 1.00000 7) 847.36689 22.011790 1.60353 106.44 8) -981.49278 1.500000 1.00000 9) 386.95730 23.200. 1.500000 1.00000 13) 210.55014 17.500000 1.60353 106.44 14) 104.86413 28.621841 1.00000 15) -1028.36306 22.443938 1.59417 68.74 16) -357.76601 2.017812 1.00000 17) -451.82137 15.000000 1.45814 164.86 18) 378.75816 12.810453 1.0000019) -2331.26874 68.37 1.00000 21) -224.46340 15.000000 1.45814 164.86 22) 293.82042 28.011551 1.00000 23) -116.30271 16.000000 1.60353 106.44 24) -225.53938 32.295859 1.00000 25) -749.57627 18.000000 1. 59417 68.74 26) 496.13426 1.500000 1.00000 27) 466.76405 30.000000 1.45814 164.86 28) -506.89747 1.500000 1.00000 29) 3185.31524 22.000000 1.45814 164.86 30) -594.09931 1.500000 1.00000 31) 1062.43800 27.000000 1.45814 164.86 32) -411.11423 0.000000 1.00000 3300000 1395.79139 27.152435 1.45814 164.86 35) -266.61139 2.084592 1.00000 36) -256.79917 19.000000 1.59417 68.74 37) -374.80727 4.527003 1.00000 38) 0.0 (STO) 3.319984 1.00000 39) 349.40075 19.000000 1.59417 68.74 40) 204.61813 5.436591 1.00000 41) 229.61 2623.52325 1.500000 1.00000 43) 328.57859 29.427562 1.45814 164.86 44) -938.12041 1.500000 1.00000 45) 250.93998 27.000000 1.45814 164.86 46) 700.00000 3.037883 1.00000 47) 181.95364 26.000000 1.45814 164.86 48) 311.32758 3.436129 1.00000 49) 177.33461 68.100. -310.18971 16.000000 1.46674 124.00 52) 202.84075 24.007054 1.00000 53) 320.43560 23.000000 1.60353 106.44 54) 1736 .01581 25.110904 1.00000 55) -203.59701 16.000000 1.45814 164.86 56) 3507.62409 1.501775 1.00000 57) 887.51933 24.706358 1.59417 68.74 58) -877.39272 14.106661 1.00000 59) -230.48531 18.000000 1.49597 127.66 60) -767.62098 20.680090 1.0000016.0 16.09.1091. -397.51407 1.501948 1.00000 63) -1210.70354 27.023952 1.59417 68.74 64) -268.97737 21.739781 1.00000 65) -140.31396 20.082180 1.60353 106.44 66) -286.33593 1.506870 1.00000 67) -1111.52693 27.043304 1.60353 106.44 69) -433.46527.50 1.19 70) -522.43711 1.500000 1.00000 71) -1400.29604 27.009480 1.60353 106.44 72) -523.50546 1.500992 1.00000 73) -3434.42436 27.004668 1.60353 106.44 74) -842.26028 1.503615 1.00000 75) 1131.73322 34.030167 1.45814 164.86 76) -723.50660 11.134241 1.00000 68.74 78) -476.64360 1.569802 1.00000 79) 1559.03516 28.000000 1.60353 106.44 80) 0.00000 85.716137 1.00000 (Aspherical coefficient) It is spherical, and the aspheric coefficient is shown below. k = -1.064847 A = 0.391682 × 10 ^-9 B = 0.194988 × 10 ^-11 C = 0.378441 × 10 ^-17 D = 0.734908 × 10 ^-20 (Value for conditional expression) (1) ) | F1 / f2 | = 0.646 (2) | f5 / f4 | = 2.527 (3) f2 / f4 = 2.910 (4) vp2 / vn2 = 0.417 (5) vp4 / vn4 = 0 .417,0.538 (6) β = -1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = -0.193 (9) f4 (N + P) / L = −0.345 (10) νp2 / νn2 = 0.417 (11) (| rp22 | − | rn21 |) / (| rp22 | + | rn21 |) = − 0.11
6, -0.056 (12) vp4 / vn4 = 0.417,0.538 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn42 |) =-0.59
6,0.506,0.224 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.567 (16) vn5 / νp5 = 0.417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) = 0.277

FIG. 10 is a diagram showing various aberrations of the projection optical system of this embodiment. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

(Fifth Embodiment) FIG. 11 is a diagram showing a lens configuration of a projection optical system according to a fifth embodiment of the present invention.
The projection optical system according to the present embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power and a second lens group G1 having a negative refractive power.
A lens group G2, a third lens group G3 having a positive refractive power, a fourth lens group G4 having a negative refractive power, and a fifth lens group G having a positive refractive power
And 5.

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 includes a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24, and a positive lens component L25. And a positive / negative combination lens component composed of a negative lens component L26. The fourth lens group G4 includes at least one negative lens component L4 closest to the third lens group G3.
1 and a second object (pattern P) adjacent to the negative lens component
And a negative lens component L43.
And a positive and negative lens component L44, a negative and positive combination lens component including a negative lens component L45 and a positive lens component L46, and a negative and positive lens component including a negative lens component L47 and a positive lens component L48. And a combination lens component. The fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component L54 having a convex surface facing the second object (pattern P) side, and the fifth lens group G5 disposed adjacent to the positive lens component L54. It has a positive / negative combination lens component consisting of a negative lens component L55 having a concave surface facing one object (mask M).

Table 5 below summarizes the data values of the projection optical system according to this embodiment.

[0070]

Table 5 d0 = 70.200000 β = -1 / 0.6 NA = 0.1 WD = 85.481123 ΦEX = 117.6 Surface number rdn (g) ν 1) -0.539759 / 10 ¹⁷ 20.000000 1.49597 127.66 2) -340.59311 1.500000 1.00000 3) 6206.40041 18.000000 1.59417 68.74 4) 365.41142 5.904637 1.00000 5) 653.93549 22.500000 1.45814 164.86 6) -1118.92718 1.500000 1.00000 7) 513.78429 22.000000 1.60353 106.44 8) -1175.42417 1.500000 1.00000 9) 374.98570 20.000000 1.60353 106.44 10) -2395.2113.17 1.596. 12) -1560.18271 1.500000 1.00000 13) 3615.58713 17.500000 1.60353 106.44 14) 108.11240 28.843050 1.00000 15) 854.52482 25.680955 1.59417 68.74 16) -264.16753 1.500000 1.00000 17) -287.37597 15.000000 1.60353 106.44 18) 439.41516 12.782. 182.66586 1.500000 1.00000 21) -187.65800 15.000000 1.49597 127.66 22) 287.81979 29.410913 1.00000 23) -116.29195 16.054437 1.59417 68.74 24) -249.11376 34.182274 1.00000 25) -805.33305 18.6108 39 1.59417 68.74 26) 649.09488 1.629707 1.00000 27) 630.00000 30.348748 1.45814 164.86 28) -401.23089 1.816968 1.00000 29) 19877.82065 22.000000 1.45814 164.86 30) -512.02691 1.500000 1.00000 31) 1511.10448 28.000000 1.45814 164.86 32) -3900000500 ) 5528.56394 30.833333 1.45814 164.86 35) -218.95596 1.556697 1.00000 36) -218.56963 20.000000 1.59417 68.74 37) -320.95903 1.114091 1.00000 38) 0.0 (STO) 1.500000 1.00000 39) 315.87248 19.000000 1.59417 68.74 40) 203.44240 16.797 42.16 42. ) 2145.87337 1.500000 1.00000 43) 296.00310 29.046050 1.45814 164.86 44) -2892.11305 1.521727 1.00000 45) 243.00281 28.000000 1.45814 164.86 46) 700.00000 4.080469 1.00000 47) 220.55754 26.172745 1.45814 164.86 48) 250.99123 4.002418 1.00000 498.8 15.000 18000. ) -316.96454 16.000000 1.46674 124.00 52) 241.04994 42.585159 1.00000 53) 343.67811 24.000000 1.59417 68.74 54 ) 917.77683 27.614270 1.00000 55) -153.75948 16.000000 1.49597 127.66 56) -1261.47772 1.534565 1.00000 57) 2018.29590 25.000000 1.59417 68.74 58) -720.35811 25.320974 1.00000 59) -142.02635 16.000000 1.45814 164.86 60) -520.98285 1.500000 1.00000 6100000-8.08 ) -451.46060 21.528604 1.00000 63) -137.54899 20.000000 1.60353 106.44 64) -306.84068 1.500000 1.00000 65) -682.39357 27.000000 1.59417 68.74 66) -453.45052 1.500000 1.00000 67) -832.37650 26.000000 1.59417 68.74 68) -487.92698 1.514453 1.00000 69. 68.74 70) -590.91618 1.544488 1.00000 71) 7108.35859 28.000000 1.60353 106.44 72) -610.82998 1.975986 1.00000 73) 1886.76960 34.000000 1.45814 164.86 74) -496.45448 5.263467 1.00000 75) -406.25729 25.000000 1.59417 68.74 76) -539.2922.41.500000 78) 0.00000 85.481123 1.00000 (Aspherical surface coefficient) The 51st surface is an aspherical surface, and the aspherical surface coefficient is shown below. k = −1.417969 A = 0.21239 × 10 ⁻⁸ B = 0.183680 × 10 ⁻¹¹ C = −0.298594 × 10 ⁻¹⁷ D = 0.713526 × 10 ⁻²⁰ (value corresponding to the conditional expression) ( 1) | f1 / f2 | = 1.020 (2) | f5 / f4 | = 2.663 (3) f2 / f4 = 1.964 (4) vp2 / vn2 = 0.645, 0.538 (5) νp4 / νn4 = 0.538, 0.417, 0.
645 (6) β = −1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = −0.215 (9) f4 (N + P) /L=−0.337 ( 10) νp2 / νn2 = 0.645, 0.538 (11) (| rp22 |-| rn21 |) / (| rp22 | + | rn21 |) =-0.39
7, -0.042, -0.013 (12) vp4 / vn4 = 0.538, 0.417, 0.
645 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn42 |) = 0.23
1,0.597,0.380 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.283 (16) vn5 / νp5 = 0.417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) = 0.100

FIG. 12 is a diagram showing various aberrations of the projection optical system of the present embodiment. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

(Sixth Embodiment) FIG. 13 is a view showing a lens configuration of a projection optical system according to a sixth embodiment of the present invention.
The projection optical system according to the present embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power and a second lens group G1 having a negative refractive power.
A lens group G2, a third lens group G3 having a positive refractive power, a fourth lens group G4 having a negative refractive power, and a fifth lens group G having a positive refractive power
And 5.

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 includes a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24, and a positive lens component L25. And a positive / negative combination lens component composed of a negative lens component L26. The fourth lens group G4 includes at least one negative lens component L4 closest to the third lens group G3.
1 and a second object (pattern P) adjacent to the negative lens component
And a negative lens component L43.
And a positive and negative lens component L44, a negative and positive combination lens component including a negative lens component L45 and a positive lens component L46, and a negative and positive lens component including a negative lens component L47 and a positive lens component L48. And a combination lens component. The fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component L54 having a convex surface facing the second object (pattern P) side, and the fifth lens group G5 disposed adjacent to the positive lens component L53. It has a positive / negative combination lens component consisting of a negative lens component L54 having a concave surface facing one object (mask M).

Table 6 below summarizes the data values of the projection optical system according to this embodiment.

[0075]

Table 6 d0 = 70.200000 β = -1 / 0.6 NA = 0.1 WD = 86.296134 ΦEX = 117.6 Surface number rdn (g) ν 1) 0.1054082 · 10 ¹⁴ 19.000000 1.60353 106.44 2) -357.42516 1.500000 1.00000 3) -2302.95434 19.000000 1.59417 68.74 4) 350.57604 8.037814 1.00000 5) 436.09560 22.500000 1.45814 164.86 6) -970.64425 1.500000 1.00000 7) 548.20100 23.000000 1.60353 106.44 8) -1586.33595 1.500000 1.00000 9) 353.86539 20.976396 1.59417 68.74 10) -1918.510 28. 12) -39648.34887 1.500000 1.00000 13) 1169.46549 18.500000 1.60353 106.44 14) 105.46208 25.859160 1.00000 15) 15203.76748 25.334215 1.59417 68.74 16) -248.41196 1.500000 1.00000 17) -275.37580 15. 190.87481 1.500000 1.00000 21) -202.50505 15.000000 1.49597 127.66 22) 251.42433 29.443548 1.00000 23) -112.32873 16.000000 1.59417 68.74 24) -230.89087 43.052032 1.00000 25) -917.61650 19.000 000 1.59417 68.74 26) 811.84504 1.715991 1.00000 27) 670.00637 36.629748 1.45814 164.86 28) -329.20259 1.903171 1.00000 29) 927.55080 28.000000 1.45814 164.86 30) -367.61279 0.000000 1.00000 31) 0.00000 1.500000 1.00000 32) 1181.91446 33.970797 1.45814 206. ) -205.15623 20.000000 1.59417 68.74 35) -321.91350 1.922247 1.00000 36) 0.0 (STO) 0.765942 1.00000 37) 306.55823 19.000000 1.59417 68.74 38) 201.78489 13.182824 1.00000 39) 245.61686 27.658787 1.45814 164.86 40) 2336.05947 2.472164 1.00000 41) 279. -1994.67233 1.913346 1.00000 43) 238.47486 28.000000 1.45814 164.86 44) 700.00000 3.275787 1.00000 45) 196.61435 26.500569 1.60353 106.44 46) 215.86657 2.629315 1.00000 47) 194.74926 18.000000 1.59417 68.74 48) 108.87374 30.571465 1.00000 49.99. ) 370.14152 24.000000 1.59417 68.74 52) 2957.23270 27.847693 1.00000 53) -165.20352 16.000000 1.49597 127.66 5 4) 1399.68169 1.500000 1.00000 55) 1019.56807 25.000000 1.59417 68.74 56) -565.64191 24.967206 1.00000 57) -142.70668 16.000000 1.49597 127.66 58) -636.35770 1.500000 1.00000 59) -1814.65569 28.000000 1.59417 68.74 60) -387.80204 20.041049.100.61 106 62) -319.12533 1.500000 1.00000 63) -583.72167 29.097182 1.59417 68.74 64) -415.14776 1.500000 1.00000 65) -949.34273 30.051417 1.59417 68.74 66) -416.21843 1.567867 1.00000 67) -3151.97486 32.000000 1.59417 68.74 68) -490.994.81. 164.86 70) -539.43192 11.932101 1.00000 71) -400.99621 26.000000 1.59417 68.74 72) -484.15419 6.214505 1.00000 73) 1135.92662 30.000000 1.60353 106.44 74) 0.00000 86.296134 1.00000 (Aspherical coefficient) Shown in k = −1.102582 A = 0.121032 × 10 ⁻⁸ B = 0.179426 × 10 ⁻¹¹ C = 0.170500 × 10 ⁻¹⁶ D = 0.788804 × 10 ⁻²⁰ (value corresponding to the conditional expression) (1) ) | F1 / f2 | = 0.997 (2) | f5 / f4 | = 2.436 (3) f2 / f4 = 1.797 (4) vp2 / vn2 = 0.645,0.538 (5) vp4 / Vn4 = 0.538, 0.645 (6) β = -1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = -0.230 (9) f4 (N + P ) /L=−0.464 (10) vp2 / vn2 = 0.645, 0.538 (11) (| rp22 | − | rn21 |) / (| rp22 | + | rn21 |) = 0.94
3, -0.051, -0.030 (12) vp4 / vn4 = 0.538, 0.645 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn42 |) =-0 .15
7, 0.481, 0.293 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.109 (16) vn5 /Vp5=0.417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) = 0.147

FIG. 14 is a diagram showing various aberrations of the projection optical system of this embodiment. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

(Seventh Embodiment) FIG. 15 is a view showing a lens configuration of a projection optical system according to a seventh embodiment of the present invention.
The projection optical system according to the present embodiment includes, in order from the first object (mask M) side, a first lens group G1 having a positive refractive power and a second lens group G1 having a negative refractive power.
A lens group G2, a third lens group G3 having a positive refractive power, a fourth lens group G4 having a negative refractive power, and a fifth lens group G having a positive refractive power
And 5.

Here, the first lens group G1 includes, in order from the first object (mask M) side, a negative lens component L12 having a concave surface facing the second object (pattern P) side, and a negative lens component L12 adjacent to the negative lens component L12. And a positive lens component L13 having a convex surface facing the first object (mask M) side. The second lens group G2 includes a positive / negative combination lens component including a positive lens component L21 and a negative lens component L22, a positive / negative combination lens component including a positive lens component L23 and a negative lens component L24, and a positive lens component L25. And a positive / negative combination lens component composed of a negative lens component L26. The fourth lens group G4 includes at least one negative lens component L4 closest to the third lens group G3.
1 and a second object (pattern P) adjacent to the negative lens component
And a negative lens component L43.
And a positive and negative lens component L44, a negative and positive combination lens component including a negative lens component L45 and a positive lens component L46, and a negative and positive lens component including a negative lens component L47 and a positive lens component L48. And a combination lens component. The fifth lens group G5 includes, in order from the first object (mask M) side, a positive lens component L53 having a convex surface facing the second object (pattern P) side, and the fifth lens group G5 disposed adjacent to the positive lens component L53. It has a positive / negative combination lens component consisting of a negative lens component L54 having a concave surface facing one object (mask M).

Table 7 below summarizes the data values of the projection optical system according to the present embodiment.

[0080]

Table 7 d0 = 70.836224 β = -1 / 0.6 NA = 0.1 WD = 87.021963 ΦEX = 117.6 Surface number rdn (g) ν 1) -5341.93750 19.000000 1.49597 127.66 2) -350.55066 1.500000 1.00000 3) 8538.15251 19.000000 1.59417 68.74 4) 351.89013 3.112846 1.00000 5) 417.33825 22.500000 1.45814 164.86 6) -994.98089 1.500000 1.00000 7) 521.10933 23.000000 1.60353 106.44 8) -1121.65220 1.500000 1.00000 9) 375.40095 20.000000 1.59417 68.74 10) -2124.22273 1.500000 1.00000 11) 31799 31798. 7443.04294 1.500000 1.00000 13) 145.71484 18.500000 1.60353 106.44 14) 107.66491 25.254754 1.00000 15) -13844.20750 25.590919 1.59417 68.74 16) -275.78975 1.500000 1.00000 17) -279.14824 15.000000 1.49597 127.66 18) 625.64701 10.456905 1.00000 19.6291. 1.00000 21) -224.77293 15.000000 1.49597 127.66 22) 264.01261 30.354760 1.00000 23) -115.09051 16.000000 1.59417 68.74 24) -271.03937 42.310869 1.00000 25) -715.17727 19.000000 1.5 9417 68.74 26) 1014.24103 2.044443 1.00000 27) 739.44538 36.929225 1.45814 164.86 28) -307.00745 1.628752 1.00000 29) 880.35283 28.612407 1.45814 164.86 30) -371.90331 0.000000 1.00000 31) 0.00000 1.500000 1.00000 32) 803.69329 32.759846 1.45814 164.86 33. -240.56712 20.000000 1.59417 68.74 35) -385.92303 3.945808 1.00000 36) 0.0 (STO) 2.717548 1.00000 37) 361.58869 19.000000 1.59417 68.74 38) 207.80169 12.453512 1.00000 39) 236.62085 32.323864 1.45814 164.86 40) -4620.60017 1.500000 1.00000 41) 284.73351 29. -3459.32951 1.500000 1.00000 43) 228.80459 28.000000 1.45814 164.86 44) 700.00000 2.875878 1.00000 45) 202.74246 27.420599 1.45814 164.86 46) 262.14637 2.205105 1.00000 47) 205.17720 18.000000 1.60353 106.44 48) 111.26290 31.795909 1.00000 49.90. ) 412.94641 24.186869 1.59417 68.74 52) 3290.49837 28.595808 1.00000 53) -144.76524 16.000000 1.49597 127.66 54) -2 249.92414 1.500000 1.00000 55) 1991.47086 25.000000 1.59417 68.74 56) -598.04775 25.132173 1.00000 57) -141.67422 16.000000 1.49597 127.66 58) -469.96390 1.500000 1.00000 59) -962.83571 28.000000 1.59417 68.74 60) -383.39968 19.610126.106. -287.86159 1.500000 1.00000 63) -509.08423 29.423818 1.59417 68.74 64) -424.22759 1.500000 1.00000 65) -983.49427 30.339993 1.59417 68.74 66) -462.52476 1.500000 1.00000 67) -8451.87599 32.000000 1.59417 68.74 68) -510.36350 1.527940 1.00000 300000 1029.3 ) -460.07439 7.061448 1.00000 71) -373.22547 26.425620 1.59417 68.74 72) -476.67556 3.556440 1.00000 73) 1057.45543 30.000000 1.60353 106.44 74) 0.00000 87.021963 1.00000 (Aspherical coefficient) The 49th surface is aspherical, and the aspherical surface coefficient is shown below. . k = −1.040835 A = 0.256115 × 10 ⁻⁸ B = 0.193396 × 10 ⁻¹¹ C = 0.146675 × 10 ⁻¹⁶ D = 0.482865 × 10 ⁻²⁰ (value corresponding to the conditional expression) (1 ) | F1 / f2 | = 0.985 (2) | f5 / f4 | = 2.507 (3) f2 / f4 = 1.832 (4) vp2 / vn2 = 0.645, 0.538 (5) vp4 / Vn4 = 0.538, 0.645 (6) β =-1 / 0.6 (7) Y / L = 0.087 (8) f4N / L = -0.244 (9) f4 (N + P ) /L=−0.468 (10) vp2 / vn2 = 0.645, 0.538 (11) (| rp22 | − | rn21 |) / (| rp22 | + | rn21 |) = 0.67
2, -0.006, -0.045 (12) vp4 / vn4 = 0.538, 0.645 (13) (| rp41 |-| rn42 |) / (| rp41 | + | rn42 |) =-0 .06
1,0.344,0.278 (14) vn1 / vp1 = 0.417 (15) (| rp11 |-| rn12 |) / (| rp11 | + | rn12 |) = 0.085 (16) vn5 / νp5 = 0.417 (17) (| rp62 |-| rn61 |) / (| rp62 | + | rn61 |) = 0.104

FIG. 16 is a diagram showing various aberrations of the projection optical system of this embodiment. As is apparent from the aberration diagrams, various aberrations are corrected very well in a wide exposure area.

When the projection optical system of each of the above embodiments is applied to the projection exposure apparatus shown in FIG. 1 or FIG.
Exposure can be realized using exposure light in a wide wavelength range from m to 440 nm, and the exposure time can be shortened. Furthermore, since the projection optical system of each embodiment can form a good image in an extremely wide exposure area, a good pattern can be obtained by projecting and exposing a device circuit pattern onto a substrate using the projection optical system of each embodiment. An image can be obtained over a wide range in a short time, and the throughput at the time of manufacturing a device such as an integrated circuit element or a liquid crystal panel can be improved.

In each of the above embodiments, the projection optical system has a magnification of -1.67 (= -1 / 0.6) times, but the present invention is not limited to a system having a magnification. For example, the reduction ratio can be obtained by using the first object side and the second object side in each of the above embodiments in a reversed state.

Further, in each of the above-described embodiments, an example is shown in which a mercury lamp that supplies g-line and h-line exposure light is used as a light source. However, the present invention is not limited to this. , Or a mercury lamp that supplies i-line (365 nm) exposure light, or 19
The present invention can be applied to a case where an extreme ultraviolet light source such as an excimer laser that supplies light of 3 nm and 248 nm is used.

[0085]

As described above, according to the projection optical system of the present invention, a compact and high-performance optical system capable of favorably correcting various aberrations over a wide exposure area can be achieved, while being telecentric on both sides. In addition, a projection optical system that is achromatized for a wide spectral width in a wide exposure region can be achieved. Further, according to the projection exposure apparatus of the present invention, a good image can be formed in an extremely wide exposure area, and the exposure time can be shortened. In addition, in the device manufacturing method of the present invention, a good pattern image can be obtained by improving the throughput.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a configuration of a batch exposure type projection exposure apparatus provided with a projection optical system according to the present invention.

FIG. 2 is a perspective view showing a configuration of a scanning projection exposure apparatus having a projection optical system according to the present invention.

FIG. 3 is a diagram illustrating a lens configuration of a projection optical system according to a first example.

FIG. 4 is a diagram illustrating various aberrations of the projection optical system according to the first example.

FIG. 5 is a diagram showing a lens configuration of a projection optical system according to Example 2.

FIG. 6 is a diagram illustrating various aberrations of the projection optical system according to the second example.

FIG. 7 is a diagram illustrating a lens configuration of a projection optical system according to a third example.

FIG. 8 is a diagram illustrating various aberrations of the projection optical system according to the third example.

FIG. 9 is a diagram showing a lens configuration of a projection optical system according to Example 4.

FIG. 10 is a diagram showing various aberrations of a projection optical system according to Example 4.

FIG. 11 is a diagram illustrating a lens configuration of a projection optical system according to a fifth example.

FIG. 12 is a diagram illustrating various aberrations of the projection optical system according to the fifth example.

FIG. 13 is a diagram illustrating a lens configuration of a projection optical system according to a sixth example.

FIG. 14 is a diagram illustrating various aberrations of the projection optical system according to the sixth example.

FIG. 15 is a diagram illustrating a lens configuration of a projection optical system according to Example 7.

FIG. 16 is a diagram illustrating various aberrations of the projection optical system according to the seventh example.

[Explanation of symbols]

 G1 First lens group G2 Second lens group G3 Third lens group G4 Fourth lens group G5 Fifth lens group AS Aperture stop

Claims (9)

[Claims] 1. A projection optical system for projecting an image of a first object onto a second object, a first lens group having a positive refractive power, a positive lens component and a negative lens component, in order from the first object side. A second lens group having at least one combination lens component having negative refractive power, a third lens group having positive refractive power, and a combination lens component of a negative lens component and a positive lens component. The projection optical system has at least one set, a fourth lens group having a negative refractive power, and a fifth lens group having a positive refractive power, wherein the projection optical system has at least one surface having an aspherical shape. The focal length of the first lens group is f1, the focal length of the second lens group is f2, the focal length of the third lens group is f3, the focal length of the fourth lens group is f4, and the fifth lens group is The focal length of f5 from the first object to the The distance to the second object is L, the Abbe number of at least one positive lens component in the second lens group is νp2, the Abbe number of at least one negative lens component in the second lens group is vn2, When the Abbe number of at least one of the positive lens components in the fourth lens group is νp4, and the Abbe number of at least one of the negative lens components in the fourth lens group is νn4, (1) 0.2 < | F1 / f2 | <2.0 (2) 0.4 <| f5 / f4 | <4.0 (3) 0.4 <f2 / f4 <5.5 (4) 0.1 <νp2 / νn2 < 0.95 (5) A projection optical system that satisfies each condition of 0.1 <νp4 / νn4 <0.95. Here, each Abbe number is a dispersion value of the glass material of each lens component, and the dispersion value is: ν = ｛n (436), where n (λ) is a refractive index for a wavelength λ (unit: nm). -1} / {n (400) -n (44
0)｝. 2. The projection optical system according to claim 1, wherein the third lens group or the fourth lens group has at least one surface having an aspherical shape. 3. When the lateral magnification of the projection optical system is β, the maximum image height is Y, and the distance from the first object plane to the second object plane is L, (6) 0.5 ≦ | β | ≦ 3.0 (7) The projection optical system according to claim 1, wherein each condition of 0.04 <Y / L <0.8 is satisfied. 4. The fourth lens group has at least one negative lens component closest to the third lens group, and the focal length of the negative lens component in the fourth lens group is f.
4N, when a distance from the first object to the second object is L, the following condition is satisfied: (8) −2.0 <f4N / L <−0.01. 4. The projection optical system according to claim 3. 5. The fourth lens group has at least one positive lens component adjacent to the second object side of the negative lens component, and the negative lens component and the positive lens component in the fourth lens group. When the combined focal length with the lens component is f4 (N + P) and the distance from the first object to the second object is L, (9) -1.5 <f4 (N + P) / L The projection optical system according to any one of claims 1 to 4, wherein a condition of <-0.05 is satisfied. 6. The second lens group has at least two sets of combined lens components of a positive lens component and a negative lens component, and sets the Abbe number of the positive lens component in the second lens group to ν.
p2, the Abbe number of the negative lens component in the second lens group is ν
n2, the radius of curvature of the surface of the positive lens component in the second lens group on the second object side is rp22, and the radius of curvature of the surface of the negative lens component in the second lens group on the first object side is rp22. When rn21 is set, (10) 0.1 <νp2 / νn2 <0.95 (11) (| rp22 | − | rn21 |) / (| rp22 | + |
The projection optical system according to any one of claims 1 to 5, wherein each condition of rn21 |) <1.0 is satisfied. 7. The fourth lens group has at least two sets of combined lens components of a negative lens component and a positive lens component, and sets the Abbe number of the positive lens component in the fourth lens group to ν.
p4, the Abbe number of the negative lens component in the fourth lens group is ν
n4, the radius of curvature of the first object side surface of the positive lens component in the fourth lens group is rp41, and the radius of curvature of the second object side surface of the negative lens component in the fourth lens group is rn42. (12) 0.1 <νp4 / νn4 <0.95 (13) (| rp41 | − | rn42 |) / (| rp41 | + |
The projection optical system according to any one of claims 1 to 6, wherein each condition of rn42 |) <1.0 is satisfied. 8. A projection exposure apparatus for projecting and exposing a projection original onto a substrate by a projection optical system, wherein the projection optical system is as described in any one of claims 1 to 7. Exposure equipment. 9. A device manufacturing method for projecting and exposing a circuit pattern of a device onto a substrate by a projection optical system, wherein the projection optical system is as described in any one of claims 1 to 7. Device manufacturing method.