JP2000190229A - Abrasive body - Google Patents

Abstract

PROBLEM TO BE SOLVED: To secure polishing performance equivalent to diamond powders and reduce cost, by coating with a diamond layer the surface of a base material powder as an abrasive material of an abrasive body having an abrasive layer made of abrasive powders and binder on a support body. SOLUTION: As an abrasive material, base material powders by SiC (average grain size is 2 μm) are washed and placed on a substrate in a CVD device (vacuum vapor deposition device). Under methanol gas atmosphere, by generating carbon radical on a W filament at 1200 deg.C, and by depositing carbon on SiC particles, the abrasive material coated with a diamond layer is provided. At this time, gas concentration is controlled, for example, the diamond layer with thickness of 0.3 μm is adhered in 60 minutes. Next, coating liquids containing this abrasive material are uniformly kneaded and dispersed, viscosity is adjusted, and a hardener is added to form abrasive layer coating liquid. This is applied and dried as the abrasive layer on a polyester film with thickness of 75 μm, and a sample of an abrasive body is made.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing body having a polishing layer formed by dispersing an abrasive having the same polishing characteristics as an abrasive made of diamond powder in a binder on a support.

[0002]

2. Description of the Related Art Conventionally, a compound used for an abrasive is a single substance, and diamond, alumina, chromium oxide, silicon carbide, silica, red iron oxide and the like have been used.

[0003] Polished bodies (polishing sheets, polishing tapes, etc.) using diamond powder are widely used industrially, and are particularly suitably used for applications such as ultra-precision polishing of optical fibers and magnetic heads.

[0004]

The polishing body using the above-mentioned diamond powder as a polishing material has excellent polishing characteristics, but the price of the polishing body is high because industrial diamond is expensive. Have the problem of becoming expensive.

[0005] From the above point, it is conceivable to reduce the thickness of the polishing layer in order to reduce the amount of diamond powder used. However, if the polishing layer is made thinner, the polishing power is reduced, the polishing efficiency is reduced, and the polishing target is reduced. The polishing cost for the polishing amount of the body is rather increased.

In view of the above, the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a polishing body capable of reducing the cost while ensuring the same polishing performance as diamond powder.

[0007]

According to another aspect of the present invention, there is provided a polishing body having a polishing layer comprising an abrasive powder and a binder on a support, wherein the abrasive is a base material powder. Characterized in that a diamond layer is coated on the surface of the substrate.

[0008] It is preferable that the diamond layer of the abrasive is coated by a CVD method. Further, the diamond layer of the abrasive may be diamond-like carbon (amorphous carbon).

[0009] An intermediate layer made of silicon, a tungsten compound or the like may be provided between the base material powder of the abrasive and the diamond layer.

[0010]

According to the polishing body of the present invention as described above,
By using an abrasive in which a diamond layer is coated on the surface of a base material powder by a CVD method or the like, a polishing layer that secures the same polishing power without using diamond powder can be formed, and costs can be reduced. A highly versatile and inexpensive polishing body having good polishing characteristics corresponding to various uses such as precision polishing of optical fibers and magnetic heads can be manufactured.

Further, by using hard particles such as SiC and alumina as the core substrate powder, the formed abrasive can be made robust. Further, in the case where the intermediate layer is provided,
The diamond layer can be easily coated.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the polishing body of the present invention will be shown, and the present invention will be described in more detail.

The polishing body of the present invention is obtained by coating an abrasive having a hard film of a diamond layer (including diamond-like carbon) on the surface of a base powder to improve the polishing ability on a support made of a polyester film or the like. And a polishing layer dispersed in a binder.

The coating of the diamond powder on the surface of the substrate powder can be suitably performed by a CVD method (chemical vapor deposition method) or the like. Although not described in detail as the diamond coating CVD method, a known hot filament CVD method, a microwave plasma CVD method, an electron impact CVD method, a direct current plasma CVD method, or the like can be used.

The diamond layer may be made of diamond-like carbon (amorphous carbon). The diamond-like carbon may be coated by ion beam deposition, high-frequency plasma CVD, ion beam sputtering, ion plating, or the like. The law can be used.

Further, an intermediate layer (underlayer) is provided between the base material powder and the diamond layer in the abrasive,
The coating of the base material powder with the diamond layer may be facilitated. As the intermediate layer, silicon, tungsten compound, Si, Mo, silicon carbide, WC, BN and the like are preferable.

As an example of a specific CVD coating method,
A carbon radical is generated from a carbon source (methane, methanol, ethanol, graphite, or the like) by a hot filament (1200 ° C. or higher) or the like, and is deposited on the surface of the base material powder at a low pressure. As the carbon radical, hydrogen gas may be used to prevent graphitization.

As the base powder for coating the diamond layer of the abrasive used in the abrasive layer of the present invention, an abrasive in a general abrasive body can be used. For example, α-alumina,
γ-alumina, α, γ-alumina, fused alumina, silicon carbide, chromium oxide, corundum, α-iron oxide, silicon nitride, boron nitride, molybdenum carbide, boron carbide, tungsten carbide, titanium carbide, silica, zirconia, titanium oxide , Cerium oxide, red iron oxide, garnet, and the like, and materials having a Mohs hardness of 7 or more can be used in combinations of 1 to 4 types. The abrasive has an average particle size of 0.1 to 10
One having a size of 0 μm is used. In the case of a polishing layer, the abrasive is a binder 10 to 1 with respect to 100 parts by weight of the abrasive.
It is used in the range of 000 parts by weight.

As the binder used in the polishing layer of the present invention, conventionally known thermoplastic resins, thermosetting resins, reactive resins, electron beam curing resins, ultraviolet ray curing resins, visible ray curing resins, and the like. Is used.

The thermoplastic resin has a softening temperature of 200
C. or lower, having an average molecular weight of 10,000 to 300,000 and a degree of polymerization of about 50 to 2,000, more preferably 20 to 2,000.
It is about 0 to 800. For example, vinyl chloride vinyl acetate copolymer, vinyl chloride copolymer, vinyl chloride vinyl acetate vinyl alcohol copolymer, vinyl chloride vinyl alcohol copolymer, vinyl chloride vinylidene copolymer, vinyl acrylonitrile copolymer, acrylic acid Ester acrylonitrile copolymer, acrylate vinylidene chloride copolymer, acrylate styrene copolymer, methacrylate acrylonitrile copolymer,
Methacrylic acid ester vinylidene chloride copolymer, methacrylic acid ester styrene copolymer, urethane elastomer, nylon-silicone resin, nitrocellulose-polyamide resin, polyfucca vinyl, vinylidene chloride acrylonitrile copolymer, butadiene acrylonitrile copolymer, polyamide Resins, polyvinyl butyral, cellulose derivatives (cellulose acetate butyrate, cellulose diacetate, cellulose triacetate, cellulose propionate, nitrocellulose, ethyl cellulose, methyl cellulose, propyl cellulose, methyl ethyl cellulose, carboxymethyl cellulose,
Acetylcellulose), various synthetic rubber-based thermoplastic resins such as styrene-butadiene copolymer, polyester resin, polycarbonate resin, chlorovinyl ether acrylate copolymer, amino resin, polyamide resin, and mixtures thereof. .

Examples of these resins are described in JP-B-37-68.
No. 77, JP-B-39-12528, JP-B-39-19
No. 282, No. 40-5349, No. 40-20
No. 907, JP-B-41-9463, JP-B-41-14
No. 059, JP-B-41-16985, JP-B-42-6
No. 428, JP-B-42-11621, JP-B-43-4
No. 623, JP-B-43-15206, JP-B-44-2
No. 889, No. 44-17947, No. 44-1
No. 8232, No. 45-14020, No. 45-
14500, JP-B-47-18573, JP-B-47
-22063, JP-B-47-2264, JP-B-4
7-22068, JP-B-47-22069, JP-B-47-22070, JP-B-47-27886, JP-A-57-133521, JP-A-58-137133, JP-A-58-166533, and JP-A-58-166533. 58-222433,
JP-A-59-58642 and the like, U.S. Pat.
And U.S. Pat. No. 4,752,530.

The thermosetting resin or the reactive resin has a molecular weight of 200,000 or less in the state of a coating liquid, and becomes infinite by a reaction such as condensation and addition by heating and humidifying after coating and drying. Is preferred. Among these resins, those which do not soften or melt before the resin is thermally decomposed are preferable. Specifically, for example, a phenol resin, a phenoxy resin, an epoxy resin, a polyurethane resin, a polyester resin, a polyurethane polycarbonate resin, a urea resin, a melamine resin, an alkyd resin, a silicone resin, an acrylic reaction resin (an electron beam curing resin), and an epoxy-polyamide Resin, nitrocellulose melamine resin, mixture of high molecular weight polyester resin and isocyanate prepolymer, mixture of methacrylate copolymer and diisocyanate prepolymer, mixture of polyester polyol and polyisocyanate, urea formaldehyde resin, low molecular weight glycol / high molecular weight A diol / triphenylmethane triisocyanate mixture, a polyamine resin, a polyimine resin, and mixtures thereof.

Examples of these resins are described in JP-B-39-810.
No. 3, JP-B-40-9779, JP-B-41-7192
No., JP-B-41-8016, JP-B-41-14275
No., JP-B-42-18179, JP-B-43-1208
No. 1, Japanese Patent Publication No. 44-28023, Japanese Patent Publication No. 45-145
No. 01, JP-B-45-24902, JP-B-46-13
103, JP-B-47-2265, JP-B-47-2
No. 2066, JP-B-47-22067, JP-B-47-
22072, JP-B-47-22073, JP-B-47
-28045, JP-B-47-28048, JP-B-4
It is described in publications such as 7-28922.

These thermoplastic resins, thermosetting resins, and reactive resins have carboxylic acid (COOM), sulfinic acid, sulfenic acid, sulfonic acid (SO ₃ M), phosphoric acid (PO (OM) (OM)), phosphonic acid, sulfuric acid (OSO ₃ M), and acidic groups such as ester groups thereof (M is H, an alkali metal, an alkaline earth metal,
Hydrocarbon groups), amino acids; aminosulfonic acids, sulfuric acid or phosphoric acid esters of amino alcohols, amphoteric groups such as alkyl betaine, amino groups, imino groups, imide groups,
An amide group, etc., a hydroxyl group, an alkoxyl group, a thiol group, an alkylthio group, a halogen group (F, Cl, Br,
I) a silyl group, a siloxane group, an epoxy group, an isocyanato group, a cyano group, a nitrile group, an oxo group, an acryl group, and a phosphine group. ^-6 eq ~ 1 × 10 ^-2
It is preferable to include eq.

The polyisocyanate as a curing agent used in the polishing layer of the present invention includes tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, hexamethylene diisocyanate, xylylene diisocyanate, naphthylene-1,5-diisocyanate, o-
Isocyanates such as toluidine diisocyanate, isophorone diisocyanate, triphenylmethane triisocyanate, isophorone diisocyanate, products of the isocyanates and polyalcohols, polyisocyanates of 2 to 10-mers produced by condensation of isocyanates, polyisocyanates and polyurethanes And those whose terminal functional groups are isocyanates can be used. The average molecular weight of these polyisocyanates is preferably 100 to 20,000.

Commercially available trade names of these polyisocyanates include Coronate L, Coronate HL, Coronate 2030, Coronate 2031, Millionate MR, Millionate MTL (all manufactured by Nippon Polyurethane), Takenate D-102, Takenate D-110.
N, Takenate D-200, Takenate D-202, Takenate 300S, Takenate 500 (manufactured by Takeda Pharmaceutical Co., Ltd.), Sumidur T-80, Sumidur 44S, Sumidur PF, Sumidur L, Sumidur N, Desmodur L , Death module IL, death module N, death module HL, death module T65, death module 15, death module R, death module R
F, death module SL, death module Z4273
(Manufactured by Sumitomo Bayer Co., Ltd.), and these can be used alone or in combination of two or more by utilizing the difference in curing reactivity.

For the purpose of accelerating the curing reaction, a hydroxyl group (butanediol, hexanediol, having a molecular weight of 100
A compound having an amino group (such as monomethylamine, dimethylamine, or trimethylamine), a metal oxide catalyst, or a catalyst such as iron acetylacetonate can also be used in combination. It is desirable that these compounds having a hydroxyl group or an amino group are polyfunctional. These polyisocyanates have a total amount of binder resin and polyisocyanate of 10 in the polishing layer and the back layer.
It is preferably used in an amount of 2 to 70 parts by weight per 0 parts by weight, more preferably 5 to 50 parts by weight. Examples of these are disclosed in JP-A-60-131622 and JP-A-61-741.
No. 38 and the like.

In addition, compounds having various functions are added to the polishing layer as additives. For example, a dispersant, a lubricant, an antistatic agent, an antioxidant, a fungicide, a coloring agent, a solvent, and the like are added.

The powdery lubricant used in the polishing layer of the present invention includes graphite, molybdenum disulfide, boron nitride, graphite fluoride, calcium carbonate, barium sulfate, silicon oxide, titanium oxide, zinc oxide, tin oxide, and the like. Inorganic fine powder such as tungsten disulfide, acrylic styrene resin fine powder, benzoguanamine resin fine powder, melamine resin fine powder,
There are resin fine powders such as polyolefin resin fine powder, polyester resin fine powder, polyamide resin fine powder, polyimide resin fine powder, and polyhooker ethylene resin fine powder.

As the organic compound-based lubricant, silicone oil (dialkyl polysiloxane, dialkoxy polysiloxane, phenyl polysiloxane, fluoroalkyl polysiloxane (KF96, KF69 manufactured by Shin-Etsu Chemical Co., Ltd.)
)), Fatty acid-modified silicone oil, fluoroalcohol, polyolefin (polyethylene wax, polypropylene, etc.), polyglycol (ethylene glycol, polyethylene oxide wax, etc.), tetrafluoroethylene oxide wax, polytetrafluoroglycol, perfluoroalkyl ether, perfluoro Fatty acids, perfluoro fatty acid esters, perfluoroalkyl sulfates, perfluoroalkyl sulfonates, perfluoroalkylbenzene sulfonates, perfluoroalkyl phosphates, and other compounds containing fluorine or silicon, alkyl sulfates, alkyl sulfonates , Alkyl phosphonic acid triester,
Organic acids and organic acid ester compounds such as alkyl phosphonic acid monoesters, alkyl phosphonic acid diesters, alkyl phosphates, succinates, etc., triazaindolizine, tetraazaindene, benzotriazole, benzotriazine, benzodiazole, EDTA, etc. nitrogen·
Heterocyclic compound containing sulfur, having 10 to 40 carbon atoms
Consisting of a monobasic fatty acid of formula (I) and any one or more of monohydric or dihydric alcohols having 2 to 40 carbon atoms, trihydric alcohol, tetrahydric alcohol, and hexahydric alcohol Esters, fatty acid esters of monohydric to hexavalent alcohols having a total of 11 to 70 carbon atoms in total with monobasic fatty acids having 10 or more carbon atoms and carbon atoms of the fatty acids, 8 to 40 carbon atoms And fatty acid amides, fatty acid alkyl amides and aliphatic alcohols.

Specific examples of these compounds include butyl caprylate, octyl caprylate, ethyl laurate, butyl laurate, octyl laurate, ethyl myristate, butyl myristate, octyl myristate, 2-ethylhexyl myristate, Ethyl palmitate, butyl palmitate, octyl palmitate, 2 ethylhexyl palmitate, ethyl stearate, butyl stearate, isobutyl stearate, octyl stearate, 2 ethyl hexyl stearate, amyl stearate, isoamyl stearate, 2 stearic acid
Ethylpentyl, 2-hexyldecyl stearate, isotridecyl stearate, stearic acid amide, alkyl stearate, butoxyethyl stearate,
Anhydrosorbitan monostearate, anhydrosorbitan distearate, anhydrosorbitan tristearate, anhydrosorbitan tetrastearate, oleyl oleate, oleyl alcohol, lauryl alcohol, montan wax, carnauba wax, etc. used alone or in combination it can.

The lubricant used in the present invention includes:
Lubricating oil additives can be used alone or in combination. Antioxidants known as rust inhibitors (metal chelates such as alkylphenol, benzotriazine, tetraazaindene, sulfamide, guanidine, nucleic acid, pyridine, amine, hydroquinone, EDTA, etc.) Agents), rust inhibitors (naphthenic acid, alkenyl succinic acid, phosphoric acid, dilauryl phosphate, etc.), oil agents (rapeseed oil, lauryl alcohol, etc.), extreme pressure agents (dibenzyl sulfide, tricresyl phosphate, tributyl) Phosphite, etc.), detergents / dispersants, viscosity index improvers, pour point depressants, foaming agents and the like. These lubricants are added in the range of 0.01 to 30 parts by weight based on 100 parts by weight of the binder. These are described in JP-B-43-23889 and JP-B-48-24.
No. 041, JP-B-48-18482, JP-B-44-1
No. 8221, JP-B-47-28043, JP-B-57-
No. 56132, JP-A-59-8136, JP-A-59-8136
No. 8139, JP-A-61-85621, U.S. Pat.
No. 23233, US Pat. No. 3470021, US Pat.
492235, U.S. Patent No. 3,497,411, U.S. Patent No. 3,523,086, U.S. Patent No. 3,625,760, U.S. Patent No. 3,630,772, U.S. Patent No.
US Patent No. 4,552,794, IBM Technical
Disclosure Bulletin (IBM Technica
l Disclosure Bulletin) Vo
l. 9, No7, p779 (December 1966), Electronic (ELEKTRONIK) 1961 No1
2, p380, Handbook of Chemistry, Application, p954-967,
It is described in the publication of Maruzen shares in 1980.

The dispersing agent and dispersing agent for the abrasive used in the present invention include caprylic acid, capric acid, lauric acid, myristic acid, palmitic acid, stearic acid, oleic acid, elaidic acid, linoleic acid, linolenic acid, C2 of stearic acid, behenic acid, maleic acid, phthalic acid, etc.
40 pieces of fatty acids (R ₁ COOH, R ₁ is a carbon number 1 to 39
Alkyl groups, phenyl groups, aralkyl groups), alkali metals (Li, Na, K, NH ₄ ^+, etc.) or alkaline earth metals (Mg, Ca, Ba, etc.) of the above fatty acids, Cu, P
Metallic soaps (copper oleate), fatty acid amides, lecithin (soybean oil lecithin) and the like comprising b. In addition, higher alcohols having 4 to 40 carbon atoms (butanol, octyl alcohol, myristyl alcohol, stearyl alcohol) and their sulfates, sulfonic acids,
Phenylsulfonic acid, alkylsulfonic acid, sulfonic acid ester, phosphoric acid monoester, phosphoric diester, phosphoric triester, alkylphosphonic acid, phenylphosphonic acid, amine compounds and the like can also be used. In addition, polyethylene glycol, polyethylene oxide, sulfosuccinic acid, metal salts of sulfosuccinic acid, sulfosuccinate, and the like can also be used. One or more of these dispersants are usually used, and one kind of the dispersant is added in an amount of 0.005 to 20 parts by weight based on 100 parts by weight of the binder. Regarding the method of using these dispersants, the dispersants may be pre-applied to the surface of the abrasive or the non-abrasive fine powder, or may be added during dispersion.
Such a thing is, for example, JP-B-39-28369,
JP-B-44-17945, JP-B-44-18221
No., JP-B-48-7441, JP-B-48-15001
No., JP-B-48-15002, JP-B-48-1636
No. 3, JP-B-49-39402, U.S. Pat.
No. 93 and No. 3470021.

The antifungal agent used in the present invention includes 2- (4
-Thiazolyl) -benzimidazole, N- (fluorodichloromethylthio) -phthalimide, 10.10'-
Oxybisphenoxalcin, 2,4,5.6 tetrachloroisophthalonitrile, P-tolyldiiodomethylsulfone, triiodoallyl alcohol, dihydroacetoacid, mercury phenyloleate, bis (tributyltin) oxide, saltylani There are rides. Such a substance is described in, for example, "Microbial Disaster and Prevention Technology", Engineering Book, 1972, "Chemistry and Industry", 32, 904 (1979).

As the antistatic agent used in the present invention, carbon black can be used.
Thermal for rubber, black for color, acetylene black and the like can be used. Its specific surface area is 5-500
m ² / g, DBP oil absorption 10-400 ml / 100
g, pH 2-10, water content 0.1-10%, tap density 0.1-1 g / cm ² . As a specific example of this carbon black, BLACKPEARLS 2000, 1300, 1 manufactured by Cabot Corporation
000,900,800,700, manufactured by Mitsubishi Chemical Corporation:
650B, 950B, 3250B, 850, 900, 9
60,980,1000,2300,2400,260
0 and the like. In addition, carbon black that has been subjected to surface treatment with a dispersant or the like or graphitized with a resin can also be used.

As the antistatic agent other than carbon black used in the present invention, graphite, modified graphite,
Conductive powders such as carbon black graft polymer, tin oxide-antimony oxide, tin oxide, titanium oxide-tin oxide-antimony oxide; natural surfactants such as saponin; alkylene oxide-based, glycerin-based, glycidol-based, polyhydric alcohol, Nonionic surfactants such as polyhydric alcohol esters and alkylphenol EO adducts; higher alkylamines, cyclic amines, hydantoin derivatives, amidoamines, esteramides, quaternary ammonium salts, pyridine and other heterocycles, phosphoniums and sulfoniums Anionic surfactants containing acidic groups such as carboxylic acid, sulfonic acid, phosphonic acid, phosphoric acid, sulfate ester group, phosphonate ester, phosphate ester group; amino acids; aminosulfonic acids, sulfuric acid of amino alcohol or Phosphoric esters, amphoteric surfactants such as alkyl betaine type and the like are used.

Some of the examples of the surfactant compound which can be used as the antistatic agent are described in JP-A-60-28025, US Pat. Nos. 2,271,623, 2,224,472, and 22.
88226, 2676122, 2676924
Nos. 2,676,975, 2,691,566,27
27860, 2730498, 2742379
Nos. 2739891, 3068101, 31
No. 58484, No. 3201253, No. 32010191
Nos. 3,294,540, 3,415,649 and 34
No. 41413, No. 3444254, No. 3475174
No. 3,545,974, West German Patent Publication (OLS) 19
No. 42665, British Patent Nos. 1077317 and 1198
No. 450, Ryohei Oda et al., "Synthesis of Surfactants and Their Applications" (Maki Shoten, 1972 edition); W. "Surfes Active Age Entities" by Beili (Interscience Publication Corporation 1
985); P. Encyclopedia of Surfactive Agents, Vol. 2 (Chemical publishing company, 1964 edition) by Sisley; Surfactant Handbook, 6th printing (Sangyo Tosho Co., Ltd.,
December 20, 1966); Hideo Marumo, "Antistatic Agent"
Koshobo (1968) and the like.

These surfactants may be added alone or as a mixture. The amount of these surfactants used in the abrasive body is 0.01 to 10 parts by weight per 100 parts by weight of the abrasive. The amount used in the back layer is 10 binders.
It is 0.01 to 30 parts by weight per 0 parts by weight. These are used as antistatic agents, but are sometimes applied for other purposes such as improvement of dispersion, improvement of lubricity, coating aid, wetting agent, curing accelerator, and dispersion accelerator. .

As the organic solvent used in the dispersion, kneading and coating of the present invention, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, isophorone and tetrahydrofuran in any ratio; methanol, ethanol, propanol and butanol , Isobutyl alcohol, isopropyl alcohol, alcohols such as methylcyclohexanol; methyl acetate,
Ester systems such as ethyl acetate, butyl acetate, isobutyl acetate, isopropyl acetate, ethyl lactate and glycol monoethyl ether; ether systems such as diethyl ether, tetrahydrofuran, glycol dimethyl ether, glycol monoethyl ether and dioxane; benzene, toluene, xylene, Tar-based (aromatic hydrocarbons) such as cresol, chlorobenzene, and styrene; chlorinated hydrocarbons such as methylene chloride, ethylene chloride, carbon tetrachloride, chloroform, ethylene chlorohydrin, and dichlorobenzene; NN-dimethylformaldehyde , Hexane and the like can be used. These solvents are generally used in two or more kinds at an arbitrary ratio. Further, a trace amount of impurities (polymer of the solvent itself, moisture, raw material components, etc.) may be contained in an amount of 1% by weight or less. An aqueous solvent (water, alcohol, acetone, etc.) can be used instead of the organic solvent.

The polishing layer is formed by dissolving in a solvent any combination of the above-described compositions and the like, applying the coating solution on a support as a coating solution for the polishing layer, and drying. This support has a thickness of about 2 to 500 μm, preferably 3 to 500 μm when used as a tape.
It is about 200 μm. In the case of a disk or card, the thickness is about 0.03 to 10 mm, and in the case of a drum, it can be used in a cylindrical shape. Examples of materials include polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyolefins such as polypropylene, cellulose derivatives such as cellulose triacetate and cellulose diacetate, vinyl resins such as polyvinyl chloride, polycarbonate, polyimide, polyamide, and polysulfone. In addition to plastics, metals such as aluminum and copper, ceramics such as glass, paper (coated paper) and the like can also be used. Prior to coating, these supports may be subjected to corona discharge treatment, plasma treatment, undercoating treatment, heat treatment, dust removal treatment, metal deposition treatment, and alkali treatment. Regarding these supports, for example, West German Patent 3
No. 338854A, JP-A-59-116926, JP-A-61-129731, U.S. Pat. No. 4,388,368; Yukio Mitsuishi, Textile and Industry, vol. 31, p.50-55,19.
It is described in 1975. The center line average surface roughness Ra of these supports is preferably 0.001 to 5.0 μm (cutoff value 0.08 to 5 mm). The Young's modulus (F5 value) of these supports is ^{2 to} 100 kg / mm ² (1 kg / m ² = 9.8 Pa) in the width direction and the longitudinal direction according to the purpose.
Can be selected.

The method of dispersion and kneading is not particularly limited, and the order of addition of each component (resin, powder, lubricant, solvent, etc.)
The addition position during dispersion / kneading, the dispersion temperature (0 to 80 ° C.) and the like can be appropriately set. For the preparation of the coating material, a conventional kneading machine, for example, a two-roll mill, a three-roll mill, a ball mill, a pebble mill, a tron mill, a sand grinder, a Seggari attritor, a high-speed impeller, a disperser, a high-speed stone mill, and a high-speed impact mill , Disperser, kneader, high-speed mixer, ribbon blender, co-kneader, intensive mixer, tumbler, blender, disperser, homogenizer,
A single screw extruder, a twin screw extruder, an ultrasonic disperser, or the like can be used. Usually, a plurality of these dispersing and kneading machines are provided for dispersing and kneading, and the treatment is continuously performed. For details of the technique relating to kneading and dispersion, see T.A.
C. PATTON (T.C. Patton) "Pai
ntFlow and Pigment Disper
Sion ”(Paint Flow and Pigment
Dispersion) 1964 John Wiley &
Published by Sons, Inc. (John Wiley and Sons) and Shinichi Tanaka, Industrial Materials, Vol. 25, 37 (197)
7) and the cited reference of the book. As an auxiliary material for the dispersion and kneading, a steel ball, a steel bead, a ceramic bead, a glass bead, and an organic polymer bead having an equivalent sphere diameter of 10 cmφ to 0.05 mmφ can be used in order to efficiently promote the dispersion and kneading. These materials are not limited to spherical shapes. It is also described in specifications such as U.S. Patent Nos. 2,581,414 and 2,855,156. Also in the present invention, a polishing layer coating liquid can be prepared by kneading and dispersing according to the method described in the above book or the cited document of the book.

As a method of applying the above-mentioned coating solution for a polishing layer on a support, the viscosity of the coating solution is adjusted to 1 to 20,000 centistokes (25 ° C.), and an air doctor coater, a blade coater, an air knife coater, a squeeze Coater, impregnated coater, reverse roll coater, transfer roll coater, gravure coater, kiss coater, cast coater, spray coater, rod coater, forward rotation roll coater, curtain coater, extrusion coater, bar coater, lip coater, etc. can be used, and other methods It is also possible to provide specific descriptions of these in “Coating Engineering” published by Asakura Shoten, pages 253 to 2
This is described in detail on page 77 (issued in 1963, 1963). The order of application of these coating liquids can be arbitrarily selected, and a corona discharge treatment or the like may be performed before the application of the desired liquid to improve the adhesion to the undercoat layer or the support. In addition, the multilayer structure of the polishing layer and the intermediate layer is simultaneous multilayer coating,
You may perform a multilayer coating etc. sequentially. These are described, for example, in JP-A-57-123532 and JP-B-62-3745.
No. 1, Japanese Patent Application Laid-Open No. Sho 59-142741 and Japanese Patent Application Laid-Open
This is shown in the specification of JP-A-9-165239.

By such a method, a polishing layer is applied on the support, dried at 25 to 130 ° C., cooled, and wound up. Then, the abrasive body of the present invention is manufactured by cutting into a desired shape. In these production methods, it is desirable that the steps of pretreatment / surface treatment, kneading / dispersion, coating / drying, smoothing, heat treatment, EB treatment, surface polishing treatment, cutting, and winding of the abrasive are continuously performed.

It is desirable to burnish and / or clean the polishing tape or other polishing body immediately before or before the winding of the polishing body. The burnisher uses a hard material such as a sapphire blade, a razor blade, a super hard material blade, a diamond blade, or a ceramic blade to scrape the protruding portion of the polished surface and smooth it.
The Mohs hardness of these materials is preferably 8 or more, but is not particularly limited as long as protrusions can be removed. The shape of these materials does not need to be a blade in particular, and shapes such as a square shape, a round shape, and a wheel (these materials may be provided around a rotating cylindrical shape) can be used. The cleaning of the abrasive body is performed by wiping the surface layer of the abrasive body with a nonwoven fabric or the like in order to remove dirt and excess lubricant on the surface of the abrasive body. Such wiping materials include:
For example, Japan Vilene's various Vilene and Toray's Toraysee, Ecseine, trade name Kim Wipe, Fuji Photo Film Co., Ltd., various abrasives, non-woven fabric is nylon non-woven fabric, polyester non-woven fabric, rayon non-woven fabric, acrylonitrile non-woven fabric, A tissue paper or the like such as a blended nonwoven fabric can be used. These are described, for example, in JP-B-46-3.
9309, JP-B-58-46768, and JP-A-56-
90429, JP-B-58-46767, JP-A-63
-259830, JP-A-1-201824 and the like.

The abrasive used in the present invention, the binder,
Additives (lubricants, dispersants, antistatic agents, surface treatment agents, carbon black, abrasives, light-blocking agents, antioxidants, antifungal agents, etc.), solvents and supports (undercoat layer, back layer, under back) (It may have a coating layer) or the production method thereof can be referred to the production method described in JP-B-56-26890 or the like.

[0046]

EXAMPLES Examples and comparative examples of the present invention will be shown below.
Evaluate its properties. In the examples, "parts" indicates "parts by weight".

<Examples 1 to 3> First, S was used as an abrasive.
The substrate powder is washed with iC (average particle size 2 μm), placed on a substrate in a CVD apparatus (vacuum evaporation apparatus), and carbon radicals are generated on a 1200 ° C. W-line filament in a methanol gas atmosphere to produce SiC. An abrasive X having a diamond layer coated thereon by depositing carbon on the particles was obtained.
At that time, controlling the gas concentration, for example, 0.3μ in 60 minutes
A m-thick diamond layer was deposited.

When the substrate powder is allowed to stand on the substrate in the CVD apparatus, no diamond layer is formed on the entire surface of the substrate powder, and the surface on the substrate side is uncoated. .

Next, the following coating solution composition A containing the above abrasive
Is uniformly kneaded and dispersed, the viscosity is adjusted, and a coating liquid for a polishing layer containing a curing agent is coated on a support made of a polyester film (PET) having a thickness of 75 μm, the polishing layer is dried and cut into a desired size. Thus, a sample of the polished body was prepared.

In each of Examples 1 to 3, as shown in Table 1 below, the thickness of the diamond layer of the abrasive X was 0.3 to 0.0
It is different from 5 μm (particle size of 2.3 to 2.05 μm).

A polishing test was performed on the end face of the optical fiber using the polished bodies of Examples 1 to 3, and the amount of polishing (dimension difference before and after polishing) and the return loss (output) of the end face of the optical fiber were measured.
Are shown in Table 1 below. The polishing amount is shown as a relative value when the measured value of Example 1 is set to 100%. Further, the return loss (dB) is a measured value when the polishing is further performed for 30 seconds with a finished polished body (WA10000 sheet) after the polishing, and the return loss (dB) becomes smaller (large minus value) as the finished surface becomes smoother. .

<Comparative Examples 1 to 6> Table 1 shows Comparative Examples 1 to 6.
The result of the same polishing test using the abrasive body of Example 1 is also shown together with the return loss. In Comparative Examples 1 to 6, the abrasive was silicon carbide or alumina not coated with diamond, and the particle size was changed.

From the results shown in Table 1, it can be seen that the polished body with the abrasive coated with the diamond layer according to Examples 1 to 3 of the present invention has
Compared with Comparative Examples 1 to 6, the polishing amount is much larger, the polishing ability is high, the processing can be performed in a short time, the return loss is small, and the surface to be polished has good surface properties. I understand. In other words, as can be seen from the data of the comparative example, usually, while the polishing amount increases as the particle size of the abrasive increases, the surface loss tends to decrease and the return loss also increases, but according to the present invention, The polishing amount is about 4 to 5 times larger than the comparative example having the same particle size,
Moreover, the return loss is further smaller than that of the comparative example having a small particle size.

[Composition of polishing layer coating liquid: A] Abrasive: X (SiC particles coated with diamond layer) 100 parts Binder (1 × 10 ⁻⁴ eq / g containing vinyl chloride resin and SO ₃ H) 4 parts Binder ( Polyester polyurethane 12 parts Binder (polyisocyanate, coronate 3040) 6 parts Solvent (MEK: methyl ethyl ketone) 150 parts

[0055]

[Table 1]

Claims (4)

[Claims] 1. A polishing body having a polishing layer comprising an abrasive powder and a binder on a support, wherein the abrasive is obtained by coating a surface of a base powder with a diamond layer. body. 2. The polishing body according to claim 1, wherein the diamond layer of the polishing material is coated by a CVD method. 3. The polishing body according to claim 1, wherein the diamond layer of the polishing material is diamond-like carbon. 4. The polishing body according to claim 1, wherein the polishing material has an intermediate layer made of silicon, a tungsten compound, or the like provided between the base material powder and the diamond layer. .