JP2000173900A - 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置 - Google Patents

電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置

Info

Publication number
JP2000173900A
JP2000173900A JP10349021A JP34902198A JP2000173900A JP 2000173900 A JP2000173900 A JP 2000173900A JP 10349021 A JP10349021 A JP 10349021A JP 34902198 A JP34902198 A JP 34902198A JP 2000173900 A JP2000173900 A JP 2000173900A
Authority
JP
Japan
Prior art keywords
irradiation
electron
electron beam
area
electron emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10349021A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000173900A5 (https=
Inventor
Masahiko Okunuki
昌彦 奥貫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10349021A priority Critical patent/JP2000173900A/ja
Priority to US09/457,083 priority patent/US6465797B2/en
Publication of JP2000173900A publication Critical patent/JP2000173900A/ja
Publication of JP2000173900A5 publication Critical patent/JP2000173900A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10349021A 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置 Pending JP2000173900A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10349021A JP2000173900A (ja) 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
US09/457,083 US6465797B2 (en) 1998-12-08 1999-12-07 Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10349021A JP2000173900A (ja) 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009091979A Division JP4939565B2 (ja) 2009-04-06 2009-04-06 電子ビーム露光装置

Publications (2)

Publication Number Publication Date
JP2000173900A true JP2000173900A (ja) 2000-06-23
JP2000173900A5 JP2000173900A5 (https=) 2006-01-26

Family

ID=18400963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10349021A Pending JP2000173900A (ja) 1998-12-08 1998-12-08 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置

Country Status (2)

Country Link
US (1) US6465797B2 (https=)
JP (1) JP2000173900A (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003031114A (ja) * 2001-07-16 2003-01-31 Denki Kagaku Kogyo Kk 電子源の製造方法
JP2006059513A (ja) * 2004-07-22 2006-03-02 Kuresutetsuku:Kk 電子ビーム照射装置および描画装置
KR101414943B1 (ko) * 2009-11-18 2014-07-04 케이엘에이-텐코 코포레이션 조절가능한 빔-제한 장치에 의해 인에이블되는 고감도 및 고처리율 전자빔 검사 칼럼
KR20190030703A (ko) 2016-07-19 2019-03-22 덴카 주식회사 전자원 및 그 제조 방법
WO2021130837A1 (ja) * 2019-12-24 2021-07-01 株式会社日立ハイテク 電子源、電子線装置および電子源の製造方法
CN114284124A (zh) * 2021-02-02 2022-04-05 湖州超群电子科技有限公司 一种电子束辐照增强装置及其使用方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002049065A1 (en) * 2000-12-12 2002-06-20 Ebara Corporation Electron beam device and semiconductor device production method using the device
EP1482363A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus
US7176610B2 (en) 2004-02-10 2007-02-13 Toshiba Machine America, Inc. High brightness thermionic cathode
US20090212213A1 (en) * 2005-03-03 2009-08-27 Ebara Corporation Projection electron beam apparatus and defect inspection system using the apparatus
WO2006101116A1 (ja) * 2005-03-22 2006-09-28 Ebara Corporation 電子線装置
US8067732B2 (en) * 2005-07-26 2011-11-29 Ebara Corporation Electron beam apparatus
JP2007335125A (ja) * 2006-06-13 2007-12-27 Ebara Corp 電子線装置
JP6087108B2 (ja) * 2012-10-30 2017-03-01 株式会社ニューフレアテクノロジー カソード選別方法
EP2779201A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High brightness electron gun, system using the same, and method of operating the same
KR20240007062A (ko) * 2022-07-07 2024-01-16 가부시키가이샤 뉴플레어 테크놀로지 실장 기판, 블랭킹 애퍼처 어레이 칩, 블랭킹 애퍼처 어레이 시스템 및 멀티 하전 입자 빔 조사 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4167676A (en) * 1978-02-21 1979-09-11 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
US4663559A (en) * 1982-09-17 1987-05-05 Christensen Alton O Field emission device
US4904895A (en) 1987-05-06 1990-02-27 Canon Kabushiki Kaisha Electron emission device
JP3728031B2 (ja) 1996-10-25 2005-12-21 キヤノン株式会社 電子ビーム露光装置及び電子ビーム露光用マスク
JPH10294255A (ja) 1997-04-17 1998-11-04 Canon Inc 電子ビーム照明装置、および該電子ビーム照明装置を備えた露光装置
JP3658149B2 (ja) * 1997-09-04 2005-06-08 キヤノン株式会社 電子線露光装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003031114A (ja) * 2001-07-16 2003-01-31 Denki Kagaku Kogyo Kk 電子源の製造方法
JP2006059513A (ja) * 2004-07-22 2006-03-02 Kuresutetsuku:Kk 電子ビーム照射装置および描画装置
KR101414943B1 (ko) * 2009-11-18 2014-07-04 케이엘에이-텐코 코포레이션 조절가능한 빔-제한 장치에 의해 인에이블되는 고감도 및 고처리율 전자빔 검사 칼럼
KR20190030703A (ko) 2016-07-19 2019-03-22 덴카 주식회사 전자원 및 그 제조 방법
US10553390B2 (en) 2016-07-19 2020-02-04 Denka Company Limited Electron source and production method therefor
US10957511B2 (en) 2016-07-19 2021-03-23 Denka Company Limited Electron source and production method therefor
US11152185B2 (en) 2016-07-19 2021-10-19 Denka Company Limited Electron source and production method therefor
EP4156226A2 (en) 2016-07-19 2023-03-29 Denka Company Limited Electron source and production method therefor
WO2021130837A1 (ja) * 2019-12-24 2021-07-01 株式会社日立ハイテク 電子源、電子線装置および電子源の製造方法
US12494338B2 (en) 2019-12-24 2025-12-09 Hitachi High-Tech Corporation Electron source, electron beam device, and method for manufacturing electron source
CN114284124A (zh) * 2021-02-02 2022-04-05 湖州超群电子科技有限公司 一种电子束辐照增强装置及其使用方法

Also Published As

Publication number Publication date
US20020020822A1 (en) 2002-02-21
US6465797B2 (en) 2002-10-15

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