JP2000127191A - Device and method for laminating - Google Patents
Device and method for laminatingInfo
- Publication number
- JP2000127191A JP2000127191A JP32594998A JP32594998A JP2000127191A JP 2000127191 A JP2000127191 A JP 2000127191A JP 32594998 A JP32594998 A JP 32594998A JP 32594998 A JP32594998 A JP 32594998A JP 2000127191 A JP2000127191 A JP 2000127191A
- Authority
- JP
- Japan
- Prior art keywords
- film
- lower plate
- upper plate
- resin
- laminating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、被成形体、特には
プリント回路基板の表面や隆起した表面、例えば導電性
のトレースを有するその他の基板の表面にフィルム状樹
脂を積層するのに用いる積層装置及びその積層方法に関
するものであり、更に詳しくは、フィルム状樹脂端部よ
り滲みだす樹脂成分を効率よく取り除くことができる積
層装置及び積層方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laminate used for laminating a film-like resin on a molded object, in particular, a surface of a printed circuit board or a raised surface, for example, the surface of another substrate having conductive traces. The present invention relates to an apparatus and a method of laminating the same, and more particularly, to a laminating apparatus and a method of laminating which can efficiently remove a resin component exuding from a film-like resin end.
【0002】[0002]
【従来の技術】近年、電子機器の小型化、高性能化に伴
いプリント回路基板の高密度化、多層化が進行してい
る。かかるプリント回路基板の多層化においては、熱硬
化型樹脂又は感光性樹脂組成物を絶縁層として使用し、
予め形成した内層回路の上に該熱硬化型樹脂又は感光性
樹脂組成物を塗布し、あるいは該熱硬化型樹脂又は感光
性樹脂組成物からなるフィルム状樹脂を積層し、更にそ
の樹脂上に無電解銅メッキを施した後、感光性ドライフ
ィルムレジストを用いて光によるパターニングを行い、
回路を形成する簡便な多層化の方法、ビルドアップ法が
有効とされている。2. Description of the Related Art In recent years, with the miniaturization and high performance of electronic devices, printed circuit boards have been increased in density and multilayered. In such a multilayer printed circuit board, using a thermosetting resin or a photosensitive resin composition as an insulating layer,
The thermosetting resin or the photosensitive resin composition is applied on a pre-formed inner layer circuit, or a film-like resin made of the thermosetting resin or the photosensitive resin composition is laminated, and furthermore, a non-woven fabric is formed on the resin. After applying electrolytic copper plating, perform patterning by light using a photosensitive dry film resist,
A simple multi-layering method for forming a circuit and a build-up method are considered to be effective.
【0003】特に絶縁層として用いる熱硬化型樹脂又は
感光性樹脂組成物層の積層において、フィルム状樹脂を
用いる場合は、特開平5−200880号公報に記載の
如き真空積層装置が用いられる。When laminating a thermosetting resin or a photosensitive resin composition layer used as an insulating layer and using a film-like resin, a vacuum laminating apparatus as described in JP-A-5-200880 is used.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、特開平
5−200880号公報に記載の装置では、フィルム状
樹脂の基板の凹凸への追従性や、フィルム状樹脂と基板
との間に生じる気泡(マイクロボイド)の抑制を向上さ
せるためには、フィルム状樹脂の流動性を上げる必要が
あり、かかる流動性を上げるには積層条件の温度や圧力
を上げて行われていた。However, in the apparatus described in Japanese Patent Application Laid-Open No. 5-200880, the ability of the film-like resin to follow the unevenness of the substrate and the air bubbles generated between the film-like resin and the substrate (micro In order to improve the suppression of voids, it is necessary to increase the fluidity of the film-like resin, and such fluidity has been increased by increasing the temperature and pressure of the lamination conditions.
【0005】しかし、積層時の温度は樹脂組成に依存す
るが、一般的に積層時の温度を上昇させると樹脂の流動
性が上がり、フィルム状樹脂の端部から樹脂成分が滲み
だし、基板やロール、上部プレート1の膜体3や下部プ
レート2の膜体4を汚染する等の問題が生じ、該汚染が
生じると、次の積層される基板表面に付着したり、該付
着により追従性の低下やマイクロボイドの発生が起こ
り、良好な回路基板を得ることができなくなる。逆に積
層時の温度を下げるとフィルム状樹脂の樹脂成分の滲み
だしはなくなるが、追従性の不足やマイクロボイドの発
生が生じる等の問題がある。However, the temperature at the time of lamination depends on the resin composition. Generally, when the temperature at the time of lamination is increased, the fluidity of the resin increases, and the resin component oozes out from the end of the film-like resin, and the substrate and Problems such as contamination of the roll, the film body 3 of the upper plate 1 and the film body 4 of the lower plate 2 occur, and when the contamination occurs, the film adheres to the surface of the next substrate to be laminated, or the adherence becomes poor due to the adhesion. Lowering and generation of microvoids occur, making it impossible to obtain a good circuit board. Conversely, when the temperature at the time of lamination is lowered, the bleeding of the resin component of the film-like resin is eliminated, but there are problems such as insufficient followability and generation of microvoids.
【0006】そこで、本発明はこのような背景下におい
て、プリント回路基板の高密度化、多層化に伴い、絶縁
層用のフィルム状樹脂の樹脂成分の滲みだしによる汚染
を効率よく取り除き、追従性に優れ、マイクロボイドの
発生しない良好なプリント回路基板を得る積層装置及び
積層方法を提供することを目的とするものである。Under such circumstances, the present invention efficiently removes contamination due to bleeding of the resin component of the film-like resin for the insulating layer with the increase in the density and the number of layers of the printed circuit board. It is an object of the present invention to provide a laminating apparatus and a laminating method for obtaining a good printed circuit board which is excellent in microvoids and which is free from microvoids.
【0007】[0007]
【問題を解決するための手段】そこで本発明者は、かか
る事情に鑑み、鋭意研究をした結果、上部プレート1及
び下部プレート2を有し、上部プレート1及び下部プレ
ート2の対向面にそれぞれ膜体3、4を載置し、上部プ
レートの膜体3と下部プレートの膜体4の間に狭持され
るように被成形体5を載置し、下部プレート2を持ち上
げて上部プレート1と密封係合状態にして積層する積層
装置において、上部プレート1の膜体3と被成形体5及
び下部プレート2の膜体4と被成形体5の間にそれぞれ
フィルム6、7を設けた積層装置が上記目的に合致する
ことを見いだし、本発明を完成した。Means for Solving the Problems In view of such circumstances, the present inventors have made intensive studies and as a result, have an upper plate 1 and a lower plate 2, and have a film on the opposing surfaces of the upper plate 1 and the lower plate 2, respectively. The bodies 3 and 4 are placed, and the molded body 5 is placed so as to be held between the film body 3 of the upper plate and the film body 4 of the lower plate. In a laminating apparatus for laminating in a sealing engagement state, a laminating apparatus in which films 6, 7 are provided between the film body 3 of the upper plate 1 and the molded body 5 and between the film body 4 of the lower plate 2 and the molded body 5, respectively. Found that the above object was met, and completed the present invention.
【0008】本発明では特に、上部プレート1の膜体3
と被成形体5及び下部プレート2の膜体4と被成形体5
の間にそれぞれ設けたフィルム6、7が連続走行可能な
フィルムであることが好ましく、効率よくプリント回路
基板を得ることができる。In the present invention, in particular, the film body 3 of the upper plate 1
And the molded body 5 and the film body 4 of the lower plate 2 and the molded body 5
It is preferable that the films 6 and 7 provided between the films are films capable of running continuously, and a printed circuit board can be efficiently obtained.
【0009】[0009]
【発明の実施の形態】以下に、本発明を図1を参考して
詳細に述べる。但し、これに限定されるわけではない。
本発明の積層装置は、熱、真空及び機械的圧力を組み合
わせて自動的に加え、フィルム状樹脂と回路基板又はそ
の他の基板の表面との間の空気を全て完全に取り除き、
エッチングした回路トレースのまわりにフィルム状樹脂
を確実に形状一致させるようにするものである。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to FIG. However, it is not limited to this.
The laminating apparatus of the present invention automatically applies a combination of heat, vacuum and mechanical pressure, completely removes all air between the film-like resin and the surface of the circuit board or other substrate,
This ensures that the film-like resin conforms around the etched circuit trace.
【0010】図1は本発明の積層装置の主要部の構造図
であり、1は上部プレート、2は下部プレート、3は上
部プレート1の膜体、4は下部プレート2の膜体、5は
被成形体、6は上部プレート1の膜体3と被成形体5の
間に設けたフィルム、7は下部プレート2の膜体4と被
成形体5の間に設けたフィルム、8及び9は上部プレー
ト1と下部プレート2とを密封係合するためのシールで
ある。10及び11はフィルム6及び7を連続走行させ
るためのフィルム巻きだしロールと巻き取りロールであ
る。12は上部プレート1と下部プレート2を密封係合
した後に、該密封内を真空状態にするための真空引き吸
引口である。FIG. 1 is a structural view of a main part of a laminating apparatus according to the present invention, wherein 1 is an upper plate, 2 is a lower plate, 3 is a film of the upper plate 1, 4 is a film of the lower plate 2, and 5 is a film of the lower plate 2. The molded body, 6 is a film provided between the film body 3 of the upper plate 1 and the molded body 5, 7 is a film provided between the film body 4 of the lower plate 2 and the molded body 5, 8 and 9 are This is a seal for sealingly engaging the upper plate 1 and the lower plate 2. Reference numerals 10 and 11 denote a film unwinding roll and a winding roll for continuously running the films 6 and 7, respectively. Reference numeral 12 denotes a vacuum suction port for bringing the upper plate 1 and the lower plate 2 into a vacuum state after sealingly engaging the upper plate 1 and the lower plate 2.
【0011】膜体3及び4は耐熱性のものであれば特に
限定されないが、例えばシリコンゴム、フッ素ゴム等が
挙げられる。被成形体5は特に限定されないが、特には
基板5aとフィルム状樹脂5bよりなるものである。フ
ィルム6及び7は特に限定されないが、ポリエチレンテ
レフタレートフィルム、ポリエチレンフィルム、ポリプ
ロピレンフィルム、ナイロンフィルム、ポリイミドフィ
ルム、ポリスチレンフィルム、フッ素化オレフィンフィ
ルムのいずれかであることが好ましい。膜厚は10〜1
00μmであることが好ましく、更には20〜50μm
が好ましい。The membranes 3 and 4 are not particularly limited as long as they are heat-resistant, and include, for example, silicone rubber and fluorine rubber. The molded object 5 is not particularly limited, but is particularly composed of a substrate 5a and a film-like resin 5b. The films 6 and 7 are not particularly limited, but are preferably any of a polyethylene terephthalate film, a polyethylene film, a polypropylene film, a nylon film, a polyimide film, a polystyrene film, and a fluorinated olefin film. The film thickness is 10-1
00 μm, more preferably 20 to 50 μm
Is preferred.
【0012】本発明の積層装置では、下部プレート2の
膜体4上のフィルム7の上に被成形体5を載置し、下部
プレート2を持ち上げて上部プレート1と密封係合し、
上下の真空引き吸引口12より吸引し、2hpa以下、
好ましくは1hpa以下の状態まで真空にした後、上部
より大気を中に入れて真空状態を解放し、下部プレート
2を上部プレート1から離して下方に移動させ、被成形
体5の積層が完了するのである。In the laminating apparatus of the present invention, the molded object 5 is placed on the film 7 on the film body 4 of the lower plate 2, and the lower plate 2 is lifted up and sealingly engaged with the upper plate 1.
Suction from upper and lower vacuum suction ports 12, 2 hpa or less,
Preferably, the vacuum is released to a state of 1 hpa or less, then the atmosphere is introduced from above to release the vacuum, and the lower plate 2 is moved downward away from the upper plate 1 to complete the lamination of the molded object 5. It is.
【0013】更に本発明では、上記積層装置を用いて基
板5aとフィルム状樹脂5bを積層する場合、回路基板
への追従性の向上やマイクロボイド発生の抑制を行うた
めに、積層時の温度を50〜120℃、好ましくは70
〜100℃で行うことが好ましいが、かかる温度で積層
を行うと、フィルム状樹脂端部から樹脂成分が滲みだし
てくる。かかる滲みだした樹脂成分をフィルム6及び7
に付着させ、該フィルム6及び7を取り除くことによ
り、良好な回路基板が形成できるのである。上記フィル
ム6及び7は、必要に応じて、使用後は汚染部分を取り
除き再利用することもできるし、又、汚染部分を取り除
く工程を設け、回転式に連続に供給して再利用すること
もできる。Further, according to the present invention, when the substrate 5a and the film-like resin 5b are laminated by using the above-mentioned laminating apparatus, the temperature at the time of lamination is set in order to improve the followability to the circuit board and to suppress the generation of microvoids. 50-120 ° C, preferably 70
Although it is preferable to carry out at a temperature of about 100 ° C., if the lamination is carried out at such a temperature, the resin component oozes out from the end of the film-like resin. The exuded resin component is applied to films 6 and 7
, And removing the films 6 and 7, a good circuit board can be formed. After use, the films 6 and 7 can be used after removing the contaminated portion, or a process for removing the contaminated portion can be provided. it can.
【0014】尚、上記フィルム状樹脂5bと基板5aか
らなる被成形体5のフィルム状樹脂5bは、熱硬化型樹
脂組成物又は感光性樹脂組成物より形成される。該熱硬
化型樹脂組成物又は感光性樹脂組成物は特に限定されな
いが、熱硬化型樹脂組成物は主にエポキシ系樹脂からな
るものであり、感光性樹脂組成物は高分子有機ポリマ
ー、エチレン性不飽和化合物、光重合開始剤からなるも
のである。The film-like resin 5b of the molded body 5 composed of the film-like resin 5b and the substrate 5a is formed of a thermosetting resin composition or a photosensitive resin composition. The thermosetting resin composition or the photosensitive resin composition is not particularly limited, but the thermosetting resin composition is mainly composed of an epoxy resin, and the photosensitive resin composition is a high-molecular organic polymer, an ethylenic resin. It comprises an unsaturated compound and a photopolymerization initiator.
【0015】[0015]
【実施例】以下、実施例を挙げて本発明を具体的に説明
する。 実施例1 図1に示す如き積層装置を用い、基板5aとフィルム状
樹脂5bの積層を行った。フィルム6及び7はポリエチ
レンテレフタレートフィルム(厚さ20μm)であり、
連続走行可能なフィルムである。フィルム状樹脂5b
は、エポキシ樹脂からなる熱硬化型樹脂組成物とポリエ
チレンテレフタレートフィルムからなる積層体であり、
熱硬化型樹脂組成物層面が基板表面に接している。The present invention will be specifically described below with reference to examples. Example 1 A substrate 5a and a film-like resin 5b were laminated using a laminating apparatus as shown in FIG. Films 6 and 7 are polyethylene terephthalate films (thickness 20 μm),
It is a film that can run continuously. Film-like resin 5b
Is a laminate composed of a thermosetting resin composition composed of an epoxy resin and a polyethylene terephthalate film,
The surface of the thermosetting resin composition layer is in contact with the substrate surface.
【0016】下部プレート2を持ち上げ、上部プレート
1と密封係合して、2hpaまで真空状態にし、50秒
後上部より大気を中に入れて真空を解放し、基板5aと
フィルム状樹脂5bの積層を行った(積層時の温度は9
0℃であった。)。同様の操作を20回繰り返した。上
記積層装置及び積層方法により、フィルム状樹脂端部よ
り滲みだす樹脂成分をフィルム6及び7が連続的に取り
除くため、積層操作を繰り返し行っても基板を汚染する
ことなく、追従性に優れ、マイクロボイドの発生しない
回路基板を得ることができた。The lower plate 2 is lifted up, and sealingly engaged with the upper plate 1 to make a vacuum state up to 2 hpa. After 50 seconds, the vacuum is released from the upper part by releasing the air thereinto, and the substrate 5a and the film-like resin 5b are laminated. (The temperature during lamination was 9
It was 0 ° C. ). The same operation was repeated 20 times. By the laminating apparatus and the laminating method, since the films 6 and 7 continuously remove the resin component exuding from the film-shaped resin end portion, even if the laminating operation is repeatedly performed, the substrate is not contaminated, the followability is excellent, and A circuit board free of voids was obtained.
【0017】比較例1 実施例1において、フィルム6及び7を設けなかった以
外は同様に行い、基板5aとフィルム状樹脂5bの積層
を20回繰り返した。上記積層装置では、フィルム状樹
脂端部より滲みだす樹脂成分が膜体3及び4に付着した
ままであるため、基板を汚染するばかりでなく、積層操
作を繰り返すたびに追従性が低下し、更にマイクロボイ
ドの発生も見られるようになり、良好な回路基板を得る
ことはできなかった。Comparative Example 1 The procedure of Example 1 was repeated, except that the films 6 and 7 were not provided. The lamination of the substrate 5a and the film-like resin 5b was repeated 20 times. In the above-described laminating apparatus, the resin component oozing out from the film-shaped resin end portion remains attached to the film bodies 3 and 4, not only contaminating the substrate, but also lowering the followability each time the laminating operation is repeated. The occurrence of microvoids was observed, and a good circuit board could not be obtained.
【0018】[0018]
【発明の効果】本発明の積層装置及び積層方法は、上部
プレート1の膜体3と被成形体5及び下部プレート2の
膜体4と被成形体5の間にそれぞれフィルム6、7を設
けているため、被成形体5より樹脂成分が滲みだしても
基板を汚染することなく、追従性、マイクロボイド発生
の抑制に優れた効果を示すものであり、プリント回路基
板の多層化に非常に有用である。According to the laminating apparatus and the laminating method of the present invention, films 6 and 7 are provided between the film body 3 of the upper plate 1 and the molded body 5 and between the film body 4 of the lower plate 2 and the molded body 5, respectively. Therefore, even if the resin component oozes out of the molded object 5, it does not contaminate the substrate, and exhibits an excellent effect of followability and suppression of generation of microvoids. Useful.
【図1】 本発明の積層装置の主要部の構造図である。FIG. 1 is a structural view of a main part of a laminating apparatus of the present invention.
1・・・上部プレート 2・・・下部プレート 3・・・上部プレートの膜体 4・・・下部プレートの膜体 5・・・被成形体 5a・・・基板 5b・・・フィルム状樹脂 6・・・上部プレートの膜体と被成形体の間に設けたフ
ィルム 7・・・下部プレートの膜体と被成形体の間に設けたフ
ィルム 8、9・・・シール 10・・・フィルム巻だしロール 11・・・フィルム巻き取りロール 12・・・真空引き吸引口DESCRIPTION OF SYMBOLS 1 ... Upper plate 2 ... Lower plate 3 ... Film body of upper plate 4 ... Film body of lower plate 5 ... Molded object 5a ... Substrate 5b ... Film-shaped resin 6 ... Film provided between the film body of the upper plate and the molded object 7 ... Film provided between the film body of the lower plate and the molded object 8,9 ... Seal 10 ... Film winding Dashi roll 11: Film winding roll 12: Vacuum suction port
─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成12年2月2日(2000.2.2)[Submission date] February 2, 2000 (200.2.2)
【手続補正1】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】特許請求の範囲[Correction target item name] Claims
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【特許請求の範囲】[Claims]
Claims (6)
し、上部プレート1及び下部プレート2の対向面にそれ
ぞれ膜体3、4を載置し、上部プレートの膜体3と下部
プレートの膜体4の間に狭持されるように被成形体5を
載置し、下部プレート2を持ち上げて上部プレート1と
密封係合状態にして積層する積層装置において、上部プ
レート1の膜体3と被成形体5及び下部プレート2の膜
体4と被成形体5の間にそれぞれフィルム6、7を設け
たことを特徴とする積層装置。An upper plate (1) and a lower plate (2) are mounted on opposite surfaces of the upper plate (1) and a lower plate (2), respectively. In a laminating apparatus in which the molded body 5 is placed so as to be held between the upper and lower plates 4, and the lower plate 2 is lifted up so as to be in sealing engagement with the upper plate 1, the film body 3 of the upper plate 1 is A laminating apparatus characterized in that films (6, 7) are provided between the molded body (5) and the film body (4) of the lower plate (2) and the molded body (5), respectively.
び下部プレート2の膜体4と被成形体5の間にそれぞれ
設けたフィルム6、7が連続走行可能なフィルムである
ことを特徴とする請求項1記載の積層装置。2. It is assumed that the films 6, 7 provided between the film body 3 of the upper plate 1 and the formed body 5 and between the film body 4 of the lower plate 2 and the formed body 5 are films that can be continuously run. The laminating apparatus according to claim 1, wherein:
び下部プレート2の膜体4と被成形体5の間にそれぞれ
設けたフィルム6、7がポリエチレンテレフタレートフ
ィルム、ポリエチレンフィルム、ポリプロピレンフィル
ム、ナイロンフィルム、ポリイミドフィルム、ポリスチ
レンフィルム、フッ素化オレフィンフィルムのいずれか
であることを特徴とする請求項1又は2記載のフィル
ム。3. A film 6, 7 provided between the film body 3 of the upper plate 1 and the molded body 5 and between the film body 4 of the lower plate 2 and the molded body 5, respectively, is a polyethylene terephthalate film, a polyethylene film, a polypropylene film. 3. The film according to claim 1, wherein the film is any one of a nylon film, a polyimide film, a polystyrene film, and a fluorinated olefin film.
ト1と密封係合状態にした後、真空状態にすることを特
徴とする請求項1〜3いずれか記載の積層装置。4. The laminating apparatus according to claim 1, wherein the lower plate 2 is lifted into a sealing engagement with the upper plate 1 and then brought into a vacuum state.
脂5bからなることを特徴とする請求項1〜4いずれか
記載の積層装置。5. The laminating apparatus according to claim 1, wherein the molded object 5 comprises a substrate 5a and a film-like resin 5b.
を用いて基板5aとフィルム状樹脂5bを積層する方法
において、フィルム状樹脂5bの端部よりしみ出す樹脂
成分をフィルム6、7に付着させ、該フィルム6、7を
取り除くことを特徴とする積層方法。6. A method for laminating a substrate 5a and a film-like resin 5b using the laminating apparatus according to any one of claims 1 to 5, wherein a resin component that exudes from an end of the film-like resin 5b is a film 6,7. And laminating the films 6 and 7.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32594998A JP3043725B2 (en) | 1998-10-29 | 1998-10-29 | Laminating apparatus and laminating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32594998A JP3043725B2 (en) | 1998-10-29 | 1998-10-29 | Laminating apparatus and laminating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000127191A true JP2000127191A (en) | 2000-05-09 |
JP3043725B2 JP3043725B2 (en) | 2000-05-22 |
Family
ID=18182415
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32594998A Expired - Lifetime JP3043725B2 (en) | 1998-10-29 | 1998-10-29 | Laminating apparatus and laminating method |
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Country | Link |
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JP (1) | JP3043725B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002248644A (en) * | 2001-02-23 | 2002-09-03 | Matsushita Electric Works Ltd | Wiring board molding apparatus |
-
1998
- 1998-10-29 JP JP32594998A patent/JP3043725B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002248644A (en) * | 2001-02-23 | 2002-09-03 | Matsushita Electric Works Ltd | Wiring board molding apparatus |
JP4622118B2 (en) * | 2001-02-23 | 2011-02-02 | パナソニック電工株式会社 | Wiring board molding equipment |
Also Published As
Publication number | Publication date |
---|---|
JP3043725B2 (en) | 2000-05-22 |
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