JP2000119029A - Heating of glass substrate for forming gap and apparatus therefor - Google Patents

Heating of glass substrate for forming gap and apparatus therefor

Info

Publication number
JP2000119029A
JP2000119029A JP10287454A JP28745498A JP2000119029A JP 2000119029 A JP2000119029 A JP 2000119029A JP 10287454 A JP10287454 A JP 10287454A JP 28745498 A JP28745498 A JP 28745498A JP 2000119029 A JP2000119029 A JP 2000119029A
Authority
JP
Japan
Prior art keywords
plate
heating
resin
glass substrate
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10287454A
Other languages
Japanese (ja)
Inventor
Shogo Nakajima
中島章五
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintokogio Ltd
Original Assignee
Sintokogio Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintokogio Ltd filed Critical Sintokogio Ltd
Priority to JP10287454A priority Critical patent/JP2000119029A/en
Publication of JP2000119029A publication Critical patent/JP2000119029A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06Joining glass to glass by processes other than fusing
    • C03C27/10Joining glass to glass by processes other than fusing with the aid of adhesive specially adapted for that purpose

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To uniformly heat a glass substrate change the heating temperature and heat-up speed and heat the substrate with a high energy efficiency by heating the lower part of a substrate holding plate carrying a glass substrate temporarily joined thereto with a thermosetting resin at a temperature for softening the resin, then bringing a hot plate heated at a high temperature into close contact therewith, heating the resin and curing the resin. SOLUTION: A step for softening a resin is carried out by heating the resin with infrared radiations and a curing step is performed by heat conduction with a hot plate H. A vacuum pad 10 and a substrate holding plate 5 are kept in a separated state and the surface temperature of the hot plate H is regulated to a temperature for curing the resin. The substrate holding plate 5 is lowered and made to communicate with the vacuum pad 10. The undersurface of the plate 5 is brought into pressure contact with an annular packing 22 in the upper part of a heat shielding cover 21. The resin is then heated to a softening temperature with far infrared radiations from the plate H. A lifting and lowering cylinder 15 is extended to bring the plate H into close contact with the plate 5 to provide a curing temperature.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、内面に透明電極を
配設した2枚のガラス板間に熱硬化性樹脂を塗布して仮
合せしたガラス基板を上下方向から加圧して均一なギャ
ップを出すと共に加熱して前記熱硬化性樹脂を加熱硬化
させるギャップ出しガラス基板の加熱方法及びその装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for applying a thermosetting resin between two glass plates having a transparent electrode disposed on the inner surface thereof, and temporarily pressing the glass substrates to form a uniform gap. The present invention relates to a method and an apparatus for heating a gapped glass substrate, wherein the glass substrate is ejected and heated to heat and cure the thermosetting resin.

【0002】[0002]

【従来の技術】従来、上記のようなギャップ出しガラス
基板の加熱方法としては、加圧機構を有するギャップ出
し治具を組み立てて熱風循環炉に入れて熱硬化性樹脂を
加熱硬化させる方法が特開平10−39319号公報等
により公知になっている。一方液晶セルを製造するユー
ザからはガラス基板の加熱を、1)ガラス基板全面を均
一な温度で加熱可能なこと、2)熱硬化性樹脂の特性に
合わせて加熱温度及び昇温スピードが変更可能であるこ
と、等が要望されている。
2. Description of the Related Art Conventionally, as a method of heating a glass substrate having a gap as described above, a method of assembling a gap forming jig having a pressurizing mechanism, placing the jig in a hot air circulating furnace, and heat-curing a thermosetting resin is known. It is publicly known, for example, from Japanese Unexamined Patent Publication No. 10-39319. On the other hand, from the user who manufactures the liquid crystal cell, the heating of the glass substrate can be performed 1) The entire surface of the glass substrate can be heated at a uniform temperature, 2) The heating temperature and the heating rate can be changed according to the characteristics of the thermosetting resin. And so on.

【0003】[0003]

【発明が解決しようとする課題】しかし上記のような熱
風循環炉による加熱方法でユーザの要望に応えるように
するには高価な温度調節器を装備する必要があると共に
装置機構も複雑になり装置価格が高くなる問題があっ
た。また熱風循環炉による加熱では、ギャップ出し治
具、ガラス基板以外に炉構成部材、炉内雰囲気等の余分
な物も併せて加熱しなければならず、逆に冷却の際は加
熱された全ての物を冷却しなければならないためエネル
ギー効率を高めることができない問題もあった。本発明
は、上記の問題に鑑みて成されたもので、ガラス基板全
面を均一な温度で加熱できると共に加熱温度、昇温スピ
ードを変更でき、かつ高エネルギー効率の加熱ができる
安価なギャップ出しガラス基板の加熱方法及びその装置
を提供することを目的とする。
However, in order to meet the needs of the user with the above-described heating method using a hot-air circulating furnace, it is necessary to equip an expensive temperature controller and the mechanism of the apparatus becomes complicated. There was a problem that the price became high. In addition, in the heating with the hot-air circulation furnace, in addition to the gap setting jig and the glass substrate, it is necessary to heat the furnace components, the furnace atmosphere, and other extraneous materials. There was also a problem that energy efficiency could not be improved because the object had to be cooled. The present invention has been made in view of the above-mentioned problems, and is capable of heating the entire surface of a glass substrate at a uniform temperature, changing a heating temperature and a heating rate, and inexpensive gapping glass capable of heating with high energy efficiency. It is an object of the present invention to provide a method and an apparatus for heating a substrate.

【0004】[0004]

【課題を解決するための手段】上記の目的を達成するた
めに本発明におけるギャップ出しガラス基板の加熱方法
は、熱硬化性樹脂により仮合せされたガラス基板を載置
した基板保持プレートの下部を、前記熱硬化性樹脂が軟
化する温度で一定時間遠赤外線放射により加熱する樹脂
軟化工程と、前記基板保持プレートの下面に前記熱硬化
性樹脂が硬化する高温度に加熱されたホットプレートを
密着させて熱伝導により加熱する樹脂硬化工程と、から
成ることを特徴とするものである。
In order to achieve the above object, a method for heating a glass substrate with a gap according to the present invention comprises the steps of: heating a lower portion of a substrate holding plate on which a glass substrate temporarily bonded by a thermosetting resin is placed; A resin softening step in which the thermosetting resin is heated by far-infrared radiation at a temperature at which the thermosetting resin softens, and a hot plate heated to a high temperature at which the thermosetting resin is hardened to adhere to the lower surface of the substrate holding plate. And a resin curing step of heating by heat conduction.

【0005】また本発明におけるギャップ出しガラス基
板の加熱装置は、熱硬化性樹脂により仮合せされたガラ
ス基板を載置した基板保持プレートを支持する昇降可能
な支持体間の下方に、昇降シリンダを配設し、かつ該昇
降シリンダのピストンロッド先端に、中央ゾーンと外側
ゾーンに分割されると共に下面に断熱材を接着したラバ
ーヒータを固着し、該ラバーヒータの上面に、表面を平
滑に加工したステンレス板あるいはアルミ板の表面にセ
ラミックスを溶着させた加熱板を接着して全体としてホ
ットプレートを構成し、前記加熱板の前記中央ゾーンと
外側ゾーンに対応する位置にそれぞれの温度を検出する
熱電対を前記断熱材側から装入すると共に各熱電対を温
度調節器を介して前記ラバーヒータに電気的に接続した
ことを特徴とするものである。
[0005] In the heating apparatus of the present invention, a lifting cylinder is provided below a vertically movable support for supporting a substrate holding plate on which a glass substrate temporarily joined by a thermosetting resin is placed. A rubber heater divided into a central zone and an outer zone and having a heat insulating material adhered to the lower surface is fixed to the end of the piston rod of the elevating cylinder, and the upper surface of the rubber heater has a smooth surface. A thermocouple for forming a hot plate as a whole by bonding a heating plate in which ceramics are welded to the surface of a stainless plate or an aluminum plate, and detecting respective temperatures at positions corresponding to the central zone and the outer zone of the heating plate And the thermocouples are electrically connected to the rubber heater via a temperature controller. Than it is.

【0006】[0006]

【発明の実施の形態】以下本発明の実施の形態を図面に
基づいて詳しく説明する。図1において箱形のフレーム
1の内側面中央部にブラケット2、2を介してシリンダ
3、3が上向きにして取付けられており、該シリンダ
3、3のピストンロッド先端には断面L字形の支持体
4、4が対向する状態にして取付けられている。該断面
L字形の支持体4、4には上面に仮合せしたガラス基板
Pを載置した基板保持プレート5の両端部が載置支持さ
れている。さらに該基板保持プレート5の上部には中央
部を加圧シートで構成すると共に周縁部を枠体で構成し
た加圧体6が載置され、該加圧体6の上部には遮熱板7
が載置されている。
Embodiments of the present invention will be described below in detail with reference to the drawings. In FIG. 1, cylinders 3 and 3 are attached to the center of the inner surface of a box-shaped frame 1 via brackets 2 and 2 with brackets 2 and 2 facing upward. The bodies 4, 4 are mounted facing each other. The cross section
Both ends of a substrate holding plate 5 on which a glass substrate P temporarily aligned on the upper surface is placed are supported on the L-shaped supports 4, 4. Further, on the upper part of the substrate holding plate 5, a pressing body 6 whose central part is formed of a pressing sheet and whose peripheral part is formed of a frame is placed.
Is placed.

【0007】前記基板保持プレート5における前記加圧
体6の枠体部分に対応する位置には複数の貫通孔8、8
が穿ってあり、該貫通孔8、8の下部にはスプリング
9、9により常に上方に押されている真空パッド10、
10が押し付けられている。なお該真空パッド10、1
0は、エヤーホース11、11を介して圧力調整器及び
圧力センサー等を備えた真空ポンプ12に連通されてい
ると共に該エヤーホース11、11、真空パッド10、
10の接続部に取付管13、13及びブラケット14、
14を介して箱形のフレーム1の内側面に固定されてい
る。
A plurality of through holes 8, 8 are provided at positions on the substrate holding plate 5 corresponding to the frame portion of the pressing body 6.
A vacuum pad 10, which is always pushed upward by springs 9, 9, is provided below the through holes 8, 8.
10 is pressed. The vacuum pads 10, 1
0 is connected to a vacuum pump 12 having a pressure regulator, a pressure sensor, and the like via the air hoses 11, 11, and the air hoses 11, 11, the vacuum pad 10,
Attachment pipes 13, 13 and bracket 14,
14 is fixed to the inner surface of the box-shaped frame 1.

【0008】さらに前記は箱形のフレーム1の内底部
(前記支持体4、4の中間位置)には昇降シリンダ15
が上向きにして設けられており、該昇降シリンダ15の
ピストンロッド先端には、中央部を中央ゾーンA、周縁
部を外側ゾーンBに分割した(図2の平面図部分参照)
ラバーヒータ16がその下面に断熱板17を取付けて固
着されている。また該ラバーヒータ16の上面には、表
面を平滑に加工したステンレス板あるいはアルミ板の表
面にセラミックスを溶着させた加熱板18が接着されて
いる。すなわちラバーヒータ16は下面を断熱板11、
上面を加熱板18に挟まれたサンドイッチ構造にされた
ホットプレートHに構成されている。
Further, an elevating cylinder 15 is provided at the inner bottom of the box-shaped frame 1 (an intermediate position between the supports 4 and 4).
At the tip of the piston rod of the elevating cylinder 15, a central portion is divided into a central zone A and a peripheral portion is divided into an outer zone B (see a plan view portion in FIG. 2).
A rubber heater 16 is fixed to a lower surface of the rubber heater 16 by attaching a heat insulating plate 17 thereto. On the upper surface of the rubber heater 16, a heating plate 18 in which ceramics are welded to the surface of a stainless steel plate or an aluminum plate whose surface is smoothed is bonded. That is, the lower surface of the rubber heater 16 is the heat insulating plate 11,
The hot plate H has a sandwich structure with the upper surface sandwiched between the heating plates 18.

【0009】前記加熱板18におけるラバーヒータ16
の中央ゾーンAと外側ゾーンBとに対応する位置には熱
電対19A、19Bが前記断熱板17側から装入されて
いて、該熱電対19A、19Bは温度調節器20A、2
0Bを介してラバーヒータ16の中央ゾーンAと外側ゾ
ーンBに電気的に接続されている。(図2参照) したがって熱電対19A、19Bにより検出された温度
が目標温度になっていない場合には温度調節器20A、
20Bが作動してラバーヒータ16の対応する各ゾーン
A、Bの温度調節をするようにされている。さらに前記
昇降シリンダ15の上側部には該昇降シリンダ15及び
ホットプレートHを包囲すると共にその上端の開口21
Aが前記加熱板18の上昇端と同一レベルになる遮熱カ
バー21が取付けられている。なお遮熱カバー21の開
口21A周縁上部には環状パッキン22が取付けられて
いる。
The rubber heater 16 in the heating plate 18
Thermocouples 19A and 19B are inserted from the heat insulating plate 17 side at positions corresponding to the central zone A and the outer zone B, respectively, and the thermocouples 19A and 19B are connected to the temperature controllers 20A and 20B.
OB is electrically connected to the center zone A and the outer zone B of the rubber heater 16. (See FIG. 2) Therefore, when the temperature detected by the thermocouples 19A, 19B is not the target temperature, the temperature controller 20A,
20B is operated to adjust the temperature of each of the zones A and B of the rubber heater 16. Further, the upper portion of the lift cylinder 15 surrounds the lift cylinder 15 and the hot plate H and has an opening 21 at the upper end thereof.
A heat shield cover 21 in which A is at the same level as the rising end of the heating plate 18 is attached. An annular packing 22 is attached to the upper part of the periphery of the opening 21A of the heat shield cover 21.

【0010】つぎに上記のように構成されるものの作動
について図3を中心にして説明する。図3(1)はシリン
ダ3、3が伸長作動して支持体4、4を上昇させた状態
で支持体4、4上に基板保持プレート5、ガラス基板P
(図1参照)、加圧体6及び遮熱板7を載置した状態で
あり、真空パッド10、10と基板保持プレート5は離
れた状態にある。この時ホットプレートHの表面温度は
予め熱電対19A、19Bと温度調節器20A、20B
により中央ゾーンA及び外側ゾーンBが160℃になる
ように調節されている。次にシリンダ3、3が縮引作動
して基板保持プレート5を下降させ基板保持プレート5
の貫通孔8、8と真空パッド10、10とを連通させる
と共にスプリング9、9を押し下げて基板保持プレート
5の下面が遮熱カバー21の開口21A上部の環状パッ
キン22に圧着されて停止され、図3(2)の状態にさ
れる。
Next, the operation of the above configuration will be described with reference to FIG. FIG. 3A shows a state in which the cylinders 3, 3 are extended and the supports 4, 4 are raised, and the substrate holding plate 5, the glass substrate P
(See FIG. 1), a state in which the pressing body 6 and the heat shield plate 7 are placed, and the vacuum pads 10, 10 and the substrate holding plate 5 are in a state of being separated. At this time, the surface temperature of the hot plate H is previously set by the thermocouples 19A and 19B and the temperature controllers 20A and 20B.
Is adjusted so that the temperature of the center zone A and the outer zone B becomes 160 ° C. Next, the cylinders 3 and 3 are contracted to lower the substrate holding plate 5 and lower the substrate holding plate 5.
The through holes 8, 8 communicate with the vacuum pads 10, 10 and the springs 9, 9 are depressed to press the lower surface of the substrate holding plate 5 against the annular packing 22 above the opening 21A of the heat shield cover 21 and stop. The state is as shown in FIG.

【0011】この状態で図1の真空ポンプ12が作動し
て真空パッド10、10等を介してガラス基板Pのギャ
ップ出しが行われると共にホットプレートHから放射さ
れる遠赤外線により基板保持プレート5及びガラス基板
Pが加熱される。この時ガラス基板Pの加熱目標温度
(熱硬化性樹脂の軟化温度)を110℃とし、ホットプ
レートHの表面温度を熱硬化性樹脂の硬化温度の160
℃に設定すると、ホットプレートH上面と基板保持プレ
ート5下面の距離は約20mm必要となる。遠赤外線の
放射は昇降シリンダ15、遮熱カバー21及び基板保持
プレート5により形成される密閉室内で行われるため外
気の影響を受けず均一放射加熱が行われる。
In this state, the vacuum pump 12 shown in FIG. 1 is operated to gap the glass substrate P through the vacuum pads 10, 10, and the like. The glass substrate P is heated. At this time, the heating target temperature (softening temperature of the thermosetting resin) of the glass substrate P is set to 110 ° C., and the surface temperature of the hot plate H is set to 160 ° C., which is the curing temperature of the thermosetting resin.
When set to ° C., the distance between the upper surface of the hot plate H and the lower surface of the substrate holding plate 5 needs to be about 20 mm. Radiation of far-infrared rays is performed in a closed chamber formed by the elevating cylinder 15, the heat shield cover 21, and the substrate holding plate 5, so that uniform radiation heating is performed without being affected by outside air.

【0012】上記の遠赤外線放射による加熱が一定時間
行われると昇降シリンダ15が伸長作動してホットプレ
ートHの上面を基板保持プレート5の下面に密着させる
(図3(3)の状態)。これにより基板保持プレート5
及びガラス基板P(図1参照)がホットプレートHから
の熱伝導により加熱が行われる。この時のホットプレー
トHは熱硬化性樹脂の樹脂硬化温度である160℃に加
熱されているためガラス基板Pも160℃まで加熱され
る。この状態を所定時間保持することによりガラス基板
Pの熱硬化性樹脂が硬化しギャップ出しを終える。この
ようにして真空ポンプ12の真空作用による均一加圧
と、ホットプレートHによる樹脂の加熱硬化が行われて
ギャップ出しが終わると真空ポンプ12による真空作用
が遮断され、昇降シリンダ15が縮引作動すると共にシ
リンダ3、3が伸長作動して図3(1)の状態に戻さ
れ、基板保持プレート5等が取り除かれ次のギャップ出
しの準備がなされる。
When the above-described heating by the far-infrared radiation is performed for a certain period of time, the elevating cylinder 15 is extended to bring the upper surface of the hot plate H into close contact with the lower surface of the substrate holding plate 5 (the state of FIG. 3 (3)). Thereby, the substrate holding plate 5
Further, the glass substrate P (see FIG. 1) is heated by heat conduction from the hot plate H. Since the hot plate H at this time is heated to 160 ° C., which is the resin curing temperature of the thermosetting resin, the glass substrate P is also heated to 160 ° C. By maintaining this state for a predetermined time, the thermosetting resin of the glass substrate P is cured, and the gap is completed. In this way, uniform pressurization by the vacuum action of the vacuum pump 12 and heat hardening of the resin by the hot plate H are performed, and when the gap is completed, the vacuum action by the vacuum pump 12 is shut off, and the elevating cylinder 15 is contracted. At the same time, the cylinders 3 and 3 are extended to return to the state shown in FIG. 3 (1), the substrate holding plate 5 and the like are removed, and preparation for the next gap setting is made.

【0013】なお上記実施の形態においてはホットプレ
ートHの周囲を遮熱カバー21により包囲しているが外
気の影響が少ない場所では遮熱カバー21を省略しても
よい。また上記実施の形態においてはガラス基板Pの真
空加圧は中央部を加圧シート材で構成すると共に周縁部
を枠体で構成した加圧体6で行うようにした例を示して
あるが他の構成の加圧体であってもよく要は基板保持プ
レート5と協動して真空加圧ができるものであればよ
い。
In the above embodiment, the hot plate H is surrounded by the heat shield cover 21. However, the heat shield cover 21 may be omitted in a place where the influence of the outside air is small. Further, in the above-described embodiment, an example is shown in which the glass substrate P is vacuum-pressed by the pressurizing member 6 whose central portion is formed of a pressing sheet material and whose peripheral portion is formed of a frame. May be used as long as it can perform vacuum pressurization in cooperation with the substrate holding plate 5.

【0014】[0014]

【発明の効果】本発明は、上記の説明から明らかなよう
に、仮合せしたガラス基板を基板保持プレート上にギャ
ップ出し可能にセットした状態で基板保持プレートを遠
赤外線放射により加熱してガラス基板の熱硬化性樹脂を
軟化させた後基板保持プレートに、加熱されたホットプ
レートを密着させて熱伝導により加熱して熱硬化性樹脂
を硬化させるようにしたから、装置構造が簡素化される
と共に高価な温度調節器を使用することなくガラス基板
の均一加熱ができ、さらに簡単な温度調節機構を加える
ことにより加熱温度、昇温スピードを変更できるように
なる。また加熱エネルギーも熱風循環炉のように他の部
材を加熱するムダがなくなり、高エネルギー効率の加熱
ができるように成る等その効果は著大である。
According to the present invention, as is apparent from the above description, the substrate holding plate is heated by far-infrared radiation while the preliminarily aligned glass substrate is set on the substrate holding plate so that a gap can be formed. After softening the thermosetting resin, the heated hot plate is brought into close contact with the substrate holding plate and heated by heat conduction to cure the thermosetting resin, so that the device structure is simplified and The glass substrate can be uniformly heated without using an expensive temperature controller, and the heating temperature and the temperature rising speed can be changed by adding a simple temperature control mechanism. The effect of the heating energy is remarkable. For example, there is no waste in heating other members as in the hot air circulation furnace, and high-energy efficiency heating can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態を示す一部切り欠きの正面図
である。
FIG. 1 is a partially cutaway front view showing an embodiment of the present invention.

【図2】ホットプレートの加熱機構を示す展開説明図で
ある。
FIG. 2 is a development explanatory view showing a heating mechanism of a hot plate.

【図3】ガラス基板のギャップ出しの状況を示す要部の
段階別工程図である。
FIG. 3 is a step-by-step process diagram of a main part showing a state of gap setting of a glass substrate.

【符号の説明】[Explanation of symbols]

4 支持体 5 基板保持プレート 15 昇降シリンダ 16 ラバーヒータ 17 断熱板 18 加熱板 19A 19B 熱電対 20A 20B 温度調節器 21 遮熱カバー H ホットプレート P ガラス基板 Reference Signs List 4 support 5 substrate holding plate 15 elevating cylinder 16 rubber heater 17 heat insulating plate 18 heating plate 19A 19B thermocouple 20A 20B temperature controller 21 heat shield cover H hot plate P glass substrate

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】熱硬化性樹脂により仮合せされたガラス基
板を載置した基板保持プレートの下部を、前記熱硬化性
樹脂が軟化する温度で一定時間遠赤外線放射により加熱
する樹脂軟化工程と、前記基板保持プレートの下面に前
記熱硬化性樹脂が硬化する高温度に加熱されたホットプ
レートを密着させて熱伝導により加熱する樹脂硬化工程
と、から成ることを特徴とするギャップ出しガラス基板
の加熱方法。
1. A resin softening step of heating a lower portion of a substrate holding plate on which a glass substrate temporarily joined by a thermosetting resin is mounted by far-infrared radiation for a certain time at a temperature at which the thermosetting resin softens; Heating the gapped glass substrate, comprising: a resin curing step in which a hot plate heated to a high temperature at which the thermosetting resin is cured is brought into close contact with the lower surface of the substrate holding plate and heated by heat conduction. Method.
【請求項2】前記遠赤外線の放射が前記基板保持プレー
トから間隔をおいた前記ホットプレートにより成される
ことを特徴とする請求項1記載のギャップ出しガラス基
板の加熱方法。
2. The method according to claim 1, wherein the far-infrared radiation is emitted by the hot plate spaced from the substrate holding plate.
【請求項3】熱硬化性樹脂により仮合せされたガラス基
板Pを載置した基板保持プレート5を支持する昇降可能
な支持体4、4間の下方に、昇降シリンダ15を配設
し、かつ該昇降シリンダ15のピストンロッド先端に、
中央ゾーンAと外側ゾーンBに分割されると共に下面に
断熱材17を接着したラバーヒータ16を固着し、該ラ
バーヒータ16の上面に、表面を平滑に加工したステン
レス板あるいはアルミ板の表面にセラミックスを溶着さ
せた加熱板18を接着して全体としてホットプレートH
を構成し、前記加熱板18の前記中央ゾーンAと外側ゾ
ーンBに対応する位置にそれぞれの温度を検出する熱電
対19A、19Bを前記断熱材17側から装入すると共
に各熱電対19A、19Bを温度調節器20A,20B
を介して前記ラバーヒータ16に電気的に接続したこと
を特徴とするギャップ出しガラス基板の加熱装置。
3. An elevating cylinder 15 is disposed below a vertically movable support member 4 supporting a substrate holding plate 5 on which a glass substrate P provisionally joined by a thermosetting resin is placed, and At the tip of the piston rod of the lift cylinder 15,
A rubber heater 16 which is divided into a center zone A and an outer zone B and has a heat insulating material 17 adhered to the lower surface is fixed to the lower surface, and a ceramic plate is formed on the upper surface of the rubber heater 16 on a stainless steel plate or an aluminum plate having a smooth surface. The heating plate 18 on which the hot plate H is welded is bonded as a whole.
The thermocouples 19A, 19B for detecting the respective temperatures are inserted into the heating plate 18 at positions corresponding to the central zone A and the outer zone B from the heat insulating material 17 side, and the thermocouples 19A, 19B Temperature controllers 20A, 20B
A heating device for a glass substrate having a gap, wherein the heating device is electrically connected to the rubber heater 16 through a gap.
【請求項4】前記昇降シリンダ15及びホットプレート
Hを包囲してその上部の開口21Aが前記加熱板18の
上昇端と同一レベルになる遮熱カバー21を配設したこ
とを特徴とする請求項3記載のギャップ出しガラス基板
の加熱装置。
4. A heat shield cover 21 surrounding the elevating cylinder 15 and the hot plate H and having an upper opening 21A at the same level as the rising end of the heating plate 18 is provided. 3. The heating device for a glass substrate with a gap according to 3.
JP10287454A 1998-10-09 1998-10-09 Heating of glass substrate for forming gap and apparatus therefor Pending JP2000119029A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10287454A JP2000119029A (en) 1998-10-09 1998-10-09 Heating of glass substrate for forming gap and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10287454A JP2000119029A (en) 1998-10-09 1998-10-09 Heating of glass substrate for forming gap and apparatus therefor

Publications (1)

Publication Number Publication Date
JP2000119029A true JP2000119029A (en) 2000-04-25

Family

ID=17717551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10287454A Pending JP2000119029A (en) 1998-10-09 1998-10-09 Heating of glass substrate for forming gap and apparatus therefor

Country Status (1)

Country Link
JP (1) JP2000119029A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7491580B2 (en) 2004-05-25 2009-02-17 Seiko Epson Corporation Method of manufacturing electro-optical device
CN114801408A (en) * 2022-03-11 2022-07-29 湖北宝源家居有限公司 Laminated glass sheet-combining and preheating integrated machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7491580B2 (en) 2004-05-25 2009-02-17 Seiko Epson Corporation Method of manufacturing electro-optical device
CN114801408A (en) * 2022-03-11 2022-07-29 湖北宝源家居有限公司 Laminated glass sheet-combining and preheating integrated machine
CN114801408B (en) * 2022-03-11 2023-04-18 湖北宝源家居有限公司 Laminated glass sheet-combining and preheating integrated machine

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