JP2000111925A - Liquid crystal cell and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To optimize a gap between both electrode substrates by once forming respective partitions on an inside surface of one of the electrode substrate, reducing and adjusting a height of at least one partition. SOLUTION: Heights of respective partitions, formed in a partition forming step S7, are measured in a height measuring step S81. Next, in an organic solvent treatment step S82, IPA(isopropyl alcohol) is kept at a temperature of treatment T to adjust heights of respective partitions to a desired height and an electrode substrate on which partitions is previously formed is immersed in the IPA for a treatment time(t) and washed. After the treatment in the organic solvent treatment step S82 and a succeeding washing and drying step S83, heights of respective partitions are measured in a height measuring step S84. Thereby it is confirmed that the heights of respective partitions are reduced to a desired height.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal cell having a plurality of resin partitions interposed between both electrode substrates and a method of manufacturing the same.

[0002]

2. Description of the Related Art In recent years, as this type of liquid crystal cell, for example, there is a liquid crystal cell having a partition structure as disclosed in Japanese Patent Application Laid-Open No. 7-318912. In producing this liquid crystal cell,
The partition structure is formed as follows. That is, a photosensitive resin material, for example, a photoresist material is applied to the inner surface of one of the alignment films of both electrode substrates, and preliminarily baked to form a resist film. Next, by applying a mask of a predetermined pattern to the resist film and patterning the resist film by photolithography, unnecessary portions of the resist film are removed, and a plurality of partition walls are formed in one of the alignment films. Form on the surface.

[0003]

By the way, in the above-mentioned liquid crystal cell, by adopting the above-mentioned partition structure, the distance between the two electrode substrates can be kept constant by the height of each partition. Here, each of these partitions is described in
As described in JP-A-318912, generally, although it is formed with the intention of achieving a substantially uniform height between both electrode substrates by spin coating or the like, the composition of a material applied in this formation The absolute value of the height of each partition fluctuates due to fluctuations in viscosity, spin conditions, and the like, and is not always constant.

[0004] Therefore, when the two electrode substrates are overlapped with each other through the partition in such a state, the interval between the two electrode substrates may not be a desired value, and the yield in manufacturing the liquid crystal cell is reduced. On the other hand, the interval between the two electrode substrates is designed to a predetermined value based on the transmittance, chromaticity, etc. of the liquid crystal cell,
The distance between the two electrode substrates does not always have an absolute optimum value, and may vary depending on the relationship with the backlight of the liquid crystal cell, the use environment, the purpose of use, and the like.

In view of the display characteristics of the liquid crystal cell, even if the distance between the two electrode substrates is partially changed, when the coating film is formed by spin coating or the like, the thickness of the coating film becomes substantially constant. Therefore, it is difficult to change the height of the partition walls in the application step. Therefore, the present invention, in order to deal with the above, on the inner surface of the electrode substrate, once formed a plurality of barrier ribs, by reducing the height of at least one of the barrier ribs, It is an object of the present invention to provide a liquid crystal cell in which a distance between both electrode substrates is made appropriate and a method for manufacturing the same.

[0006]

In order to solve the above problems, according to the first and second aspects of the present invention, the inner surface (2) of one of the two electrode substrates (10, 10A, 20) is provided.
5) A plurality of partition walls (40b, 90) made of a resin material
Forming step (S7) for patterning and forming, and after this forming step, a height adjusting step (S8, S81) of adjusting at least one of the plurality of partitions so that the height of the partition is reduced by an organic solvent. , S82), and after the height adjusting step, a superposing step (S11) of superposing the two electrode substrates so as to face each other via a plurality of partition walls;
After this overlapping step, there is provided a method of manufacturing a liquid crystal cell including a liquid crystal sealing step (S13) of sealing a liquid crystal (30) between both electrode substrates.

As described above, since the height of at least one of the plurality of partition walls is adjusted to be reduced by the organic solvent after the partition wall forming step, the interval between the two electrode substrates can be properly secured. In this case, for example, even if there is variation in the height of each partition formed in the partition formation step, if the height of each partition is reduced and adjusted so as to be uniform with an organic solvent, the distance between the two electrode substrates is uniform. To be uniform.

Further, even when the distance between the two electrode substrates is partially different due to the shape of at least one of the two electrode substrates, the height of each partition is adjusted to match such a difference in the distance. If the reduction is adjusted with an organic solvent, it is possible to provide a liquid crystal cell in which the distance between the two electrode substrates is partially different. Here, according to the second aspect of the invention, the height adjusting step includes a height measuring step (S81) of measuring the height of each partition formed in the partition forming step, and treating the organic solvent. Based on the relationship between the predetermined amount of decrease in the height of the partition walls as a parameter and the processing time, a processing temperature and a processing time are selected in accordance with the height measured in the height measuring step. Adjust with the maintained organic solvent to reduce the height of the partition walls for the selected treatment time.

Thus, the function and effect of the invention described in claim 1 can be more appropriately achieved. According to the third aspect of the present invention, the liquid crystal cell is provided with each alignment film (1).
6, 25), the two electrode substrates (10, 10A, 20), a plurality of partitions (40b, 90) sandwiched between the two electrode substrates, And a liquid crystal (30) sealed between a plurality of partitions.

Further, in the liquid crystal cell, the height of a predetermined portion of the plurality of partitions is set to be different from that of the other portions. Accordingly, in a case where the interval between the two electrode substrates is varied due to the constituent elements (electrodes, alignment films, etc.) formed on the two electrode substrates, the height of the partition in the defective part is increased by the other parts. By adjusting the height as compared with the height of the partition, the variation can be eliminated. Alternatively, by adjusting the height of the partition, it is possible to positively rescue a portion where a difference in the movement of liquid crystal occurs in a region between the two electrode substrates or a portion where the illuminance distribution of the backlight varies. Thus, according to the third aspect of the present invention, it is possible to properly secure the interval between the two electrode substrates.

[0011]

Embodiments of the present invention will be described below with reference to the drawings. (First Embodiment) FIG. 1 shows a first embodiment of a liquid crystal cell according to the present invention.
2 shows a partial cross-sectional structure of the embodiment.

This liquid crystal cell includes two electrode substrates 10 and 20 which are superposed on each other, and the peripheral portions of the two electrode substrates 10 and 20 are bonded and supported via a band-shaped seal (not shown). . In addition, the said seal is, for example,
It is formed of a thermosetting resin adhesive or the like. The electrode substrate 10 has a transparent substrate 11 made of a transparent glass material. On the inner surface of the transparent substrate 11, a plurality of resin color filters 12, a plurality of black mask layers (not shown), An overcoat film 13, a plurality of transparent electrodes 14, an insulating film 15, and an alignment film 16 are sequentially laminated. The color filter 12, the insulating film 15, and the alignment film 16 are provided on the inner peripheral side of the seal. Further, instead of the plurality of black mask layers, a dot black mask layer may be employed.

On the other hand, the electrode substrate 20 has a transparent substrate 21 made of a transparent glass material.
On the inner surface, a plurality of metal auxiliary electrodes 22, a plurality of transparent electrodes 23, an insulating film 24, and an alignment film 25 are sequentially laminated. The alignment film 25 is provided on the inner peripheral side of the seal. The plurality of transparent electrodes 23 are positioned opposite to the plurality of transparent electrodes 14 at right angles, and these transparent electrodes 23 and 14 form a plurality of grid-like pixels together with the antiferroelectric liquid crystal 30 (described later). . In addition, portions of these lattice pixels other than the auxiliary electrode 22 function as a display unit on which display is performed when the liquid crystal cell is driven.

Here, the transparent electrodes 14 and 23 are made of Indiu.
It is formed of m Tin Oxide (hereinafter referred to as ITO) or the like, and the alignment films 16 and 25 are formed of a polyimide resin. Each color filter 12 has a configuration in which pixels having colors of R (red), G (green), and B (blue) are arranged in the above-described lattice-shaped pixels. Each black mask (not shown) is provided between each pixel of the color filter 12, and a portion of the liquid crystal cell opposed to each of the black masks is shielded from light and is not involved in display. .

The antiferroelectric liquid crystal 30 is provided on both electrode substrates 1.
It is enclosed between 0 and 20. In addition, both electrode substrates 1
The interval between 0 and 20 (hereinafter referred to as cell gap) is 1.
It is about 5 μm. In addition, the plurality of barrier ribs 40
It is interposed between the two electrode substrates 10 and 20 at a portion other than the display section (pixel). Each partition 40 is formed along the auxiliary electrode 22 on a portion of the alignment film 26 facing the auxiliary electrode 22 and has a stripe shape.

In the first embodiment, each partition 4
The width of 0 is about several tens of μm. Further, each partition wall 40 does not need to be positioned to face all the auxiliary electrodes 22, and may be positioned to face any auxiliary electrodes 22. Further, it may be located between the transparent electrodes 23 which are not involved in display. Each partition 40 is formed of an acrylic photoresist as described later, and each partition 40 is adhered to each inner surface of both electrode substrates 10 and 20, that is, to both alignment films 16 and 25.

In other words, the two electrode substrates 10 and 20 are adhered and supported by each partition 40 on the inner peripheral side of the seal. Each partition wall 40 functions as a spacer for setting the two electrode substrates 10 and 20 at a predetermined interval (about 1.5 μm), and resists shock and vibration applied to the two electrode substrates 10 and 20. Next, a method of manufacturing the liquid crystal cell thus configured will be described with reference to FIGS.

Step S1 of forming an original substrate on the electrode substrate 10 side in FIG.
Then, on the inner surface of the transparent substrate 11, a plurality of color filters 12, an overcoat film 13, and a plurality of transparent electrodes 14 are formed.
And an insulating film 15 are sequentially formed. Each of the black mask layers is formed alternately with each of the color filters 12. In the alignment film forming step S2, the alignment film 16 is provided on the color filters 12 and the black mask layers via the overcoat film 13, the transparent electrodes 14 and the insulating film 15 by offset printing, and the electrode substrate 10 is formed. Form.

In the rubbing step S3, a rubbing process is performed on the alignment film 16 of the electrode substrate 10 in a certain direction.
Subsequently, in a seal printing step S4, a seal is formed in a band shape on the peripheral portion of the inner surface of the electrode substrate 10 by printing a sealant. A liquid crystal injection port is formed in a part of the seal.

On the other hand, in the electrode substrate 20-side original substrate forming step S5 in FIG. 3, a plurality of auxiliary electrodes 22, a plurality of transparent electrodes 23, and an insulating film 24 are sequentially formed on the inner surface of the transparent substrate 21. In the next alignment film forming step S6, the alignment film 25 is formed.
Is provided on the plurality of auxiliary electrodes 22, the plurality of transparent electrodes 23, and the insulating film 24 to form the electrode substrate 20.

Next, the processing in the partition forming step S7 in FIG. 3 will be described with reference to FIGS. FIG. 4 shows how a resist (resin) film is formed. 7 cc of an acrylic resin negative resist solution ("CT" manufactured by Fuji Film Orin Co., Ltd.) is dropped on the alignment film 25 of the electrode substrate 20, and rotated at 1300 rpm for 10 seconds to form a photoresist film 40a. 1 on the plate
Prebaking (temporary firing) is performed at 00 ° C. for 270 seconds to remove the organic solvent. By removing the organic solvent, polymerization at the time of exposure to ultraviolet light described below can be improved.

Subsequently, as shown in FIG.
The photoresist film 40a is covered with a photomask 50 having a stripe-shaped opening at a portion corresponding to
Ultraviolet light was irradiated from the direction shown by the arrow in FIG. 5 at an exposure energy of 0 mJ / cm ² . Thereby, a necessary portion (a portion between the two broken lines in FIG. 5) is made insoluble in the developing solution.

Thereafter, the electrode substrate 20 is immersed in a developing solution ("CD" manufactured by Fuji Film Ohlin Co., Ltd.) at room temperature for 60 seconds, further developed in another container for 60 seconds, and washed with running pure water for 20 minutes. And spinning (800 rpm, 8 minutes). Thus, patterning is performed by the etching action of the developer. Then, as shown in FIG. 6, unnecessary portions of the photoresist film 40a are substantially removed, and a plurality of barrier ribs 4 are formed on the alignment film 25 on the auxiliary electrode 22.
0b is formed. Thereby, the process of the partition wall forming step S7 ends.

After this, the height adjusting step S8 in FIG. 3 is performed as follows. First, in the height measuring step S81, the height H1 (see FIG. 7) of each partition 40b formed in the partition forming step S7 is measured. Next, in the organic solvent treatment step S82, the height of each partition 40b is set to a desired height H.
2 (see FIG. 7), the isopropyl alcohol (hereinafter, referred to as IPA) in the circulating organic solvent tank (hereinafter, referred to as IPA tank) is set to the processing temperature T,
The electrode substrate 20 after the formation of the partition wall 40b therein is immersed for a processing time t for cleaning.

Specifically, the height decrease ΔH of the partition 40b
= H1-H2, each graph LI in FIG.
To the desired processing temperature T and processing time t from any one of L4 to L4. For example, the height of the partition 40b is H1 =
When the height is 1.7 μm and the desired height is H2 = 1.4 μm, the processing temperature T = 4 based on the graph L3 in FIG.
0 ° C. and processing time t = 16 minutes are selected.

Then, after the IPA is heated to the selected processing temperature T selected in this way, the electrode substrate 20 after the formation of the partition 40b is immersed in the IPA for the selected processing time t to be washed. Thereby, the height of each partition 40b is adjusted to a desired height H2. However, in the first embodiment, each graph of FIG. 8 focuses on the fact that the height of the partition 40b can be adjusted by the IPA under predetermined processing conditions, and the material of the partition 40b and the solvent thereof are used. Is required depending on the type of the device.

More specifically, each graph shows the relationship between the reduction amount of the height of the partition wall 40b and the processing time t using the processing temperature T of the IPA as a parameter. Organic solvent treatment process S
After the process of 82, in a water washing / drying step S83, the electrode substrate 20 is moved into a pure water tank, washed with pure water to remove IPA attached to the electrode substrate 20, and then dried. .

Thus, even if the IPA has the effect of dissolving the photoresist forming the partition walls, the IPA is reliably removed from the electrode substrate 20 by the pure water in the pure water tank. At the time of drying, the photoresist constituting the partition wall 40 does not melt and does not become a residual film again. As a result, the IPA used in the first embodiment
Is desirably water-soluble to facilitate removal in a pure tank.

Next, in a height measuring step S84, the height of each partition 40b is measured. Thereby, each partition 40b
Can be confirmed to have decreased to the desired height H2.
That is, the partition wall 40 having the desired height H2 is obtained by the processing of the height adjustment step S8 and the washing and drying processing (see FIG. 7).
Can be formed. Next, the rubbing step S10
Then, the alignment film 25 of the electrode substrate 20 is rubbed in a certain direction. The rubbing step S10 is preferably performed after the partition wall forming step S7 in consideration of the possibility that the inner surface of the rubbed alignment film 25 is deteriorated by the developer and the alignment regulating force may be reduced.

After the rubbing step S10, in the superposition step S11, the electrode substrates 10 are positioned on the electrode substrate 20 so that the rubbing directions thereof are in a predetermined direction (for example, parallel or anti-parallel). To do. Then, the two electrode substrates 10 and 20 are overlapped via the seal and the respective partition walls 40. Then, in the seal curing step S12, the two electrode substrates 1
The entire outer surfaces of 0 and 20 are fired while being pressed in a direction in which both substrates come into close contact with each other. In the first embodiment, the pressure is
It is about 0.4 kg / cm ^{2 to} 1.0 kg / cm ² , the firing temperature is about 150 ° C., and the firing time is 120 minutes.

Thereafter, in a liquid crystal enclosing step S13, the antiferroelectric liquid crystal 30 is vacuum-injected in a liquid state from the liquid crystal injection port of the seal, and a portion other than the partition walls 40 between the electrode substrates 10 and 20 is formed. Fill. Further, the liquid crystal injection port of the seal is sealed with a resin adhesive or the like. Thus, the manufacture of the liquid crystal cell ends. As described above, the first
In the embodiment, the plurality of barrier ribs 40 are formed in the barrier rib forming step S7.
After b is formed on the inner surface of the electrode substrate 20 by the patterning process, in the height adjustment step S8, the height change amount ΔH = H1−H2 of each partition 40b is ensured as shown in FIG.
The processing temperature T and the processing time t of the IPA are selected according to the graph of FIG. 3, and the IPA is heated up to the selected processing temperature T thus selected. It is immersed and washed during the above-mentioned selection processing time t, washed with water and dried.

As a result, each partition 40 having a desired height H2 is formed.
Can be formed, and as a result, the overlapping step S1
In 1, as described above, if the two electrode substrates 10 and 20 are overlapped via the partition walls 40, it is possible to manufacture a liquid crystal cell having a desired cell gap. (Second Embodiment) FIG. 9 shows a main part of a second embodiment of the present invention.

In the second embodiment, unlike the first embodiment, an example is shown in which the height of the plurality of partition walls 40b formed in the processing of the partition wall forming step S7 is adjusted to be different. . Specifically, the electrode substrate 20 described in the first embodiment is divided into three substrate regions A, B, and C as shown in FIG. Then, in the same manner as described in the first embodiment, a plurality of barrier ribs 40b (both having a height H1) are formed on the inner surface of the electrode substrate 20 by the processing of the barrier rib formation step S7. Among them, the height of each partition 40b corresponding to both substrate regions A and C is set lower than the height of each partition 40b corresponding to substrate region B.

In this case, for example, if the height of each partition 40b corresponding to both substrate regions A and C is set to be lower than the height of each partition 40b corresponding to substrate region B by about 0.1 μm, FIG. Based on the graph, the processing temperature T and the processing time t of the IPA used in the organic solvent processing step S82 are set to 40 ° C. and 16 minutes for both the substrate areas A and C, and 40 ° C. and 16 minutes for the substrate area B. Choose 2 minutes.

Then, in the organic solvent treatment step S82, the partition walls 40b of both the substrate regions A and C are immersed in IPA heated to 40 ° C. for 16 minutes for cleaning, while the partition walls 40b of the substrate region B are removed. And immersion in IPA heated to 40 ° C. for 2 minutes for cleaning. Thereby, the height of each partition 40 of both substrate regions A and C can be made about 0.1 μm lower than the height of each partition 40 of substrate region B.

As a result, when the two electrode substrates 10 and 20 are overlapped via each partition wall 40, it is possible to manufacture a liquid crystal cell in which the cell gap of both substrate regions A and C is smaller than the cell gap of substrate region B. . In the liquid crystal cell manufactured in this manner, the antiferroelectric liquid crystal 3 between the two electrode substrates 10 and 20 is used.
The movement of 0 changes according to the difference in the cell gap, and for example, it becomes possible to appropriately correct the illuminance distribution and the temperature distribution of the backlight of the liquid crystal cell. Other functions and effects are the same as those of the first embodiment.

In the second embodiment, each partition 40
Although the case where both the heights of b have the same value H1 has been described, instead of this, each partition 40 of both substrate regions A and C may be used.
b is about 1.6 μm, and the height of each partition 40 b in the substrate region B is about 1.5 μm,
The height of each partition 40b of both substrate areas A and C is about 1.5 μm
In order to reduce the temperature, the processing temperature T and the processing time t of the IPA used in the organic solvent processing step S82 are based on the graph of FIG.
Is selected as 20 ° C. and 16 minutes for the substrate region B,
The same process as in the organic solvent processing step S82 is performed only on each partition 40b in the substrate region B.

Thus, the partition walls 4 of both substrate areas A and C are formed.
Even if the height of 0b is different from the height of each partition 40b in the substrate region B as described above, the height of all the partitions 40 can be adjusted to be the same. As a result, the cell gap of the liquid crystal cell can be made uniform. (Third Embodiment) FIG. 10 shows a main part of a third embodiment of the present invention.

In the third embodiment, in the liquid crystal cell described in the first embodiment, an electrode substrate 10A and a plurality of partitions 60, 70 are used instead of the electrode substrate 10 and the partitions 40. Configuration has been adopted. here,
When the electrode substrate 10A is divided into three substrate regions D, E, and F as shown in FIG. 10, a film portion 17a corresponding to the substrate region E in the alignment film 17 which is the inner surface of the electrode substrate 10A.
As shown in FIG. 10, is formed in a concave shape in cross section with reference to each film portion 17b corresponding to the substrate regions D and F in the alignment film 17. In other words, the gap portion corresponding to both substrate regions D and F in the cell gap between both electrode substrates 10A and 20 is smaller than the gap portion corresponding to substrate region E in the cell gap.

Further, each partition 60 is formed of both electrode substrates 10a,
Each of the barrier ribs 70 is formed in a gap portion corresponding to each of the substrate regions D and F of the 20 cell gaps.
Is formed in a gap portion corresponding to the substrate region E in the cell gap between the two electrode substrates 10a and 20. For this reason, each partition 60 has a lower height than each partition 70. Other configurations are the same as those of the liquid crystal cell described in the first embodiment. In FIG. 10, reference numeral 80 denotes the seal described in the first embodiment.

Next, a method of manufacturing the liquid crystal cell thus configured will be described. When the processing of the alignment film forming step S6 is completed in substantially the same manner as in the first embodiment, in the partition forming step S7, each partition 90 corresponding to each partition 40b described in the first embodiment (see FIG. 11). Is formed by a patterning process. Next, in the height measurement step S81 of the height adjustment step S8 described in the first embodiment, the height of each partition 90 described above is measured.

Then, in the organic solvent treatment step S82, the height of each partition 90 of both substrate regions D and F is set to a desired height (the height of the partition 60 of both substrate regions D and F), and 8 so that the height of each partition 90 of E is set to another desired height (the height of the partition 70 in both substrate regions E).
The processing temperature T and the processing time t of the IPA used in the organic solvent processing step S82 are respectively selected based on the graph of the above, and the organic solvent processing is performed on each partition 90 of each of the substrate regions D, E, and F according to the selection result. The processing in step S82 is performed substantially in the same manner as described in the first embodiment.

Accordingly, the height of each partition 90 in both substrate regions D and F is adjusted to the above-mentioned desired height, and the substrate region E is adjusted.
The height of each partition 90 is adjusted to the other desired height. Thereby, each partition 90 of both substrate regions D and F is formed as each partition 60, and each partition 9 of substrate region E is formed.
0 is formed as each partition 70. Thereafter, in an overlapping step S11, the two electrode substrates 10A and 20 are overlapped with each other via the partition walls 60 and 70, and the subsequent processes of the seal hardening step S12 and the liquid crystal enclosing step S13 are performed in the same manner as in the first embodiment. Thus, the production of the liquid crystal cell shown in FIG. 10 is completed.

As described above, in the third embodiment, the electrode substrate 10A is used in place of the electrode substrate 10 described in the first embodiment.
Even if it is necessary to make the gap portion corresponding to both substrate regions D and F in the cell gap between A and 20 narrower than the gap portion corresponding to substrate region E in the cell gap, the gap portion should be adjusted accordingly. The height of each corresponding partition is adjusted as described above.

As a result, it is possible to provide a liquid crystal cell in which the cell gaps of the two electrode substrates 10A and 20 are partially different. In carrying out the present invention, the present invention is not limited to an antiferroelectric liquid crystal, and may be applied to a liquid crystal cell using another liquid crystal such as a smectic liquid crystal such as a ferroelectric liquid crystal or a nematic liquid crystal. Good.

In practicing the present invention, the water-soluble organic solvent is not limited to IPA, but may be a solvent that dissolves an acrylic monomer of a photoresist material such as acetone or ethyl lactate. In practicing the present invention, a water-insoluble organic solvent such as ethylene glycol monoethyl ether acetate is not limited to a water-soluble organic solvent.

In practicing the present invention, the photoresist material is not limited to an acrylic resin negative resist solution. In practicing the present invention, if the process is stable and the process of the height measuring step S81 is stable, the manufacturing can be performed by omitting the height measuring step S81 and the height measuring step S84. In other words, the height measurement may not be performed on all the electrode substrates, but may be performed by sampling.

[Brief description of the drawings]

FIG. 1 is an enlarged sectional view showing a main part of a liquid crystal cell according to a first embodiment of the present invention.

FIG. 2 is a part of a process chart showing a method for manufacturing the liquid crystal cell of the first embodiment.

FIG. 3 is a part of a process chart showing the above manufacturing method.

FIG. 4 is a cross-sectional view showing a state of forming a resist film in a partition wall forming step of FIG. 3;

FIG. 5 is a cross-sectional view showing a state of an exposure process in the partition wall forming step.

FIG. 6 is a cross-sectional view showing a state after a developing process in the partition wall forming step.

FIG. 7 is a cross-sectional view showing how the height of the partition is adjusted in the height adjusting step of FIG. 3;

FIG. 8 is a height reduction amount Δ of the partition wall in the first embodiment.
6 is a graph showing the relationship between H and the processing time t using the processing temperature T of IPA as a parameter.

FIG. 9 is a plan view showing a second embodiment of the liquid crystal cell according to the present invention.

FIG. 10 is a sectional view showing a third embodiment of the liquid crystal cell according to the present invention.

FIG. 11 is a cross-sectional view showing an exposure process in the partition wall forming step in the third embodiment.

[Explanation of symbols]

10, 10A, 20: electrode substrate, 16, 17, 25: alignment film, 30: antiferroelectric liquid crystal, 40b, 90: partition, S
7 ... partition wall forming step, S8 ... height adjusting step, S11 ... overlapping step, S13 ... liquid crystal sealing step, S81, S84 ...
Height measurement step, S82: Organic solvent treatment step.

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H089 KA15 LA09 LA18 LA20 MA04X NA05 NA13 NA17 NA30 QA12 QA14 RA13 SA01 TA04 TA06 5C094 AA03 AA42 AA43 AA48 BA43 CA18 DA07 DA13 EB02 EC03 EC04 FA01 FA02 FB01 FB10 FB15 GB01

Claims (3)

[Claims] 1. A partition formation step (S7) of patterning a plurality of partitions (40b, 90) with a resin material on an inner surface (25) of one of the two electrode substrates (10, 10A, 20). And a height adjusting step (S8, S81, S82) of adjusting the height of at least one of the plurality of partitions by using an organic solvent after the partition forming process.
After the height adjusting step, a superposing step (S11) of superposing the two electrode substrates so as to face each other via the plurality of partition walls; and after the superposing step, a liquid crystal (3) is interposed between the two electrode substrates.
0) a liquid crystal sealing step (S13) for sealing a liquid crystal cell. 2. The height adjusting step includes a height measuring step (S81) of measuring a height of each of the partition walls formed in the partition forming step, wherein a processing temperature of the organic solvent is used as a parameter in advance. Based on the relationship between the determined decrease in the height of the partition walls and the processing time, the processing temperature and the processing time are selected in accordance with the height measured in the height measuring step, and the selected processing temperature is maintained. The method according to claim 1, wherein the organic solvent is adjusted to reduce a height of the partition during the selection processing time. 3. The two electrode substrates (10, 10A, 2A) arranged so as to be opposed to each other by respective alignment films (16, 25).
0) and a plurality of partition walls (40) sandwiched between these two electrode substrates.
b, 90), and a liquid crystal (30) sealed between the plurality of electrode substrates and between the plurality of barrier ribs. Wherein the liquid crystal cell is set to be different from other parts.