JPS62253124A - Formation of color filter - Google Patents
Formation of color filterInfo
- Publication number
- JPS62253124A JPS62253124A JP61097423A JP9742386A JPS62253124A JP S62253124 A JPS62253124 A JP S62253124A JP 61097423 A JP61097423 A JP 61097423A JP 9742386 A JP9742386 A JP 9742386A JP S62253124 A JPS62253124 A JP S62253124A
- Authority
- JP
- Japan
- Prior art keywords
- transparent
- photoresist
- exposure mask
- light
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 47
- 238000000034 method Methods 0.000 claims description 19
- 238000004043 dyeing Methods 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 abstract description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- 229910000423 chromium oxide Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000012192 staining solution Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は、カラー液晶表示装置における透明基板の透
明電極の上に設けるカラーフィルタの形成方法に関する
。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for forming a color filter provided on a transparent electrode of a transparent substrate in a color liquid crystal display device.
一般に液晶表示装置は、走査電極透明基板と信号電極透
明基板とを液晶を挟んで対向配置し、上記両透明基板の
任意の部分の電極間に電圧を印加してその部分の液晶分
子の配列を変化させ、この変化で光の透過を制御し、こ
の制御に基づいて画像等を表示するものである。そして
カラー液晶表示装置においては、光の三原色である赤、
緑、青の三種のカラーフィルタを順次交互に信号電極透
明基板における透明電極の上にそれぞれ形成し、これら
カラーフィルタを通してカラー表示を行なうようになっ
ている。また、透明電極の相互間には、非電極部分から
の光の漏れを抑制し、画像の表示コントラストを向上さ
せるためにブラックストライプとしての遮光膜が形成さ
れている。Generally, in a liquid crystal display device, a scanning electrode transparent substrate and a signal electrode transparent substrate are placed facing each other with a liquid crystal in between, and a voltage is applied between the electrodes at a desired part of both transparent substrates to change the arrangement of liquid crystal molecules in that part. This change controls the transmission of light, and images and the like are displayed based on this control. In color liquid crystal display devices, the three primary colors of light are red,
Three types of color filters, green and blue, are sequentially and alternately formed on the transparent electrodes of the signal electrode transparent substrate, and color display is performed through these color filters. Further, a light shielding film in the form of black stripes is formed between the transparent electrodes in order to suppress leakage of light from non-electrode portions and improve display contrast of images.
カラーフィルタを形成する従来の工程を第４図に示し、
図中１がガラス製の透明基板で、この透明基板１の上に
並列して複数の透明電極２を形成し、さらにこれら透明
電極２の相互間にブラックストライプを構成する遮光膜
３を形成する（■程ａ）。つぎに、これら透明電極２お
よび遮光膜３を覆うように透明基板１の上に一様に染色
性を有するネガタイプのホトレジスト４を塗布する（工
程ｂ）。そして、透明基板１の上方側に露光マスク５を
対向配置し、この露光マスク５の透光窓５ａを通してホ
トレジスト４の所要部分、すなわち第一色目（赤色）の
カラーフィルタを施すべき透明電極２に対応する部分に
紫外線を照射して露光し、光重合により硬化させる（工
程ｂ）。こののち、ホトレジスト４の非露光部を水、有
機溶剤などで洗い流して、露光部を現像し、カラーフィ
ルタの基質６を形成する（工程Ｃ）。そして基質６を所
定の色特性を有する染色液で染色して赤色のカラーフィ
ルタ６Ｒを形成する（■程ｄ）。The conventional process of forming a color filter is shown in FIG.
In the figure, reference numeral 1 denotes a transparent substrate made of glass, on which a plurality of transparent electrodes 2 are formed in parallel, and a light-shielding film 3 forming a black stripe is formed between these transparent electrodes 2. (■Procedure a). Next, a negative type photoresist 4 having dyeability is uniformly applied onto the transparent substrate 1 so as to cover the transparent electrode 2 and the light shielding film 3 (step b). Then, an exposure mask 5 is disposed facing above the transparent substrate 1, and a desired portion of the photoresist 4, that is, the transparent electrode 2 on which the first color (red) color filter is to be applied, is exposed through the transparent window 5a of the exposure mask 5. The corresponding portions are exposed to ultraviolet rays and cured by photopolymerization (step b). Thereafter, the unexposed areas of the photoresist 4 are washed away with water, an organic solvent, etc., and the exposed areas are developed to form the substrate 6 of the color filter (step C). Then, the substrate 6 is dyed with a dyeing liquid having predetermined color characteristics to form a red color filter 6R (Step d).
このようにして第一色目のカラーフィルタ６Ｒを形成し
た後に、上記ｂ−ｄの工程を再び繰返して、他の残りの
透明電極２の上に第二色目（緑色）および第三色目（青
色）のカラーフィルタをそれぞれ形成する。なお、カラ
ーフィルタを形成した際には、その都度、各色ごとのカ
ラーフィルタの上に防染処理を施して、他の色のカラー
フィルタの染色液が染着しないようにする。After forming the first color filter 6R in this way, the steps b to d above are repeated again to form a second color (green) and a third color (blue) on the other remaining transparent electrodes 2. color filters are formed respectively. It should be noted that each time a color filter is formed, a resist dyeing process is performed on the color filter for each color to prevent the staining solution of the color filter of another color from being dyed.
ところが、このような従来のカラーフィルタの形成方法
においては、ホトレジスト４の所要部分を露光する際に
、透明基板１の上方に露光マスク５を配置してそれを行
なうため、露光マスク５の透光窓５ａの幅Ｓ１と透明電
極２の幅ｓ２との寸法を精度よく一致させ、かつその透
光窓５ａが透明電極２に確実に対向合致するように厳格
に位置合わせを行なわなくてはならず、このため作業管
理が相当面倒となり、作業能率の低下を招いてしまうと
いう難点があった。However, in such a conventional color filter forming method, when exposing a required portion of the photoresist 4, the exposure mask 5 is disposed above the transparent substrate 1. The width S1 of the window 5a and the width s2 of the transparent electrode 2 must be precisely aligned, and alignment must be performed strictly so that the transparent window 5a is reliably aligned with the transparent electrode 2. Therefore, there was a problem in that work management became quite troublesome, leading to a decrease in work efficiency.
この発明はこのような点に着目してなされたもので、そ
の目的とするところは、露光マスクの厳格な位置合わせ
を要することなく、容易に能率よく透明電極の上にカラ
ーフィルタを形成することができるようにしたカラーフ
ィルタの形成方法を提供することにある。This invention was made with attention to these points, and its purpose is to easily and efficiently form a color filter on a transparent electrode without requiring strict alignment of an exposure mask. An object of the present invention is to provide a method for forming a color filter that enables the following.
この発明はこのような目的を達成するために、透明基板
の上に並列して複数の透明電極を形成し、かつこれら透
明電極の相互間に遮光膜を形成し、これら透明電極およ
び遮光膜を覆うように透明基板の上に染色性を有するネ
ガタイプのホトレジストを塗布し、この状態で上記ホト
レジストの反対側において透明基板に対向して露光マス
クを配置し、この露光マスクの透光窓を通して所定の透
明電極に対応する部分のホトレジストを露光し、そして
非露光部のホトレジストを除去し、露光部のホトレジス
トを現像し、現像したホトレジストを染色してカラーフ
ィルタを形成するようにしたものである。In order to achieve such an object, the present invention forms a plurality of transparent electrodes in parallel on a transparent substrate, forms a light-shielding film between these transparent electrodes, and connects these transparent electrodes and light-shielding film. A negative-type photoresist with dyeability is applied onto the transparent substrate so as to cover it, and in this state, an exposure mask is placed facing the transparent substrate on the opposite side of the photoresist, and a predetermined area is exposed through the light-transmitting window of this exposure mask. The photoresist in the area corresponding to the transparent electrode is exposed, the photoresist in the unexposed area is removed, the photoresist in the exposed area is developed, and the developed photoresist is dyed to form a color filter.
以下、この発明の一実施例について第１図を参照して説
明する。An embodiment of the present invention will be described below with reference to FIG.
図中１１がガラス製の透明基板で、この透明基板１１の
上に並列して複数の透明電極１２を形成し、さらにこれ
ら透明電極１２の相互間にブラックストライプを構成す
る遮光膜１３を形成する（工程ａ）。つぎに、これら透
明電極１２および遮光ｌ！１３を覆うように透明基板１
１の上に一様に染色性および感光性を有するグリユー、
ゼラチン、カゼインなどのネガタイプのホトレジスト１
４を塗布する（工程ｂ）。そして、ホトレジスト１４の
反対側、つまり透明基板１の下方側に露光マスク１５を
対向配置し、この露光マスク１５の透光窓１５ａを通し
て透明基板１１の下方側からホトレジスト１４の所要部
分、すなわち第一色目（赤色）のカラーフィルタを施す
べき透明電極１２に対応する部分に紫外線を照射して露
光し、光重合により硬化させる。こののち、従来と同様
に、非露光部のホトレジスト１４を水、有機溶剤などで
洗い流して、露光部のホトレジスト１４を現像し、カラ
ーフィルタの基質１６を形成しく工程Ｃ）、この基質６
を所定の色特性を有す払染色液で染色して赤色のカラー
フィルタ６Ｒを形成する（■程ｄ）。In the figure, reference numeral 11 denotes a transparent substrate made of glass. A plurality of transparent electrodes 12 are formed in parallel on this transparent substrate 11, and a light-shielding film 13 forming a black stripe is formed between these transparent electrodes 12. (Step a). Next, these transparent electrodes 12 and the light shielding l! Transparent substrate 1 to cover 13
a gris having uniform dyeability and photosensitivity on 1;
Negative type photoresist such as gelatin or casein 1
4 (Step b). Then, an exposure mask 15 is arranged to face the opposite side of the photoresist 14, that is, the lower side of the transparent substrate 1, and a desired portion of the photoresist 14, that is, the first A portion corresponding to the transparent electrode 12 to which the colored (red) color filter is to be applied is exposed to ultraviolet rays and cured by photopolymerization. After this, as in the conventional method, the photoresist 14 in the non-exposed area is washed away with water, an organic solvent, etc., and the photoresist 14 in the exposed area is developed to form the substrate 16 of the color filter.
is dyed with a cleaning solution having predetermined color characteristics to form a red color filter 6R (Step d).
このようにして第一色目のカラーフィルり１６Ｒを形成
したのちに、上記ｂ−ｄの工程を再び繰返して、他の残
りの透明電極２の上に第二色目（緑色）および第三色目
（青色）のカラーフィルタ１６Ｇ、１６Ｂをそれぞれ形
成する（工程ｅ）。なお、カラーフィルタ１６Ｒ，１６
Ｇ。After forming the first color fill 16R in this way, the steps b to d are repeated again to form the second color (green) and third color (green) on the other remaining transparent electrodes 2. (blue) color filters 16G and 16B are formed, respectively (step e). In addition, the color filters 16R, 16
G.
１６Ｂを形成した際には、その都度、各色ごとのカラー
フィルタ１６Ｒ，１６Ｇ、１６Ｂの上に防染処理を施し
て、他の色のカラーフィルタ１６Ｒ１１６Ｇ、１６Ｂの
染色液が染着しないようにする。When 16B is formed, each color filter 16R, 16G, 16B is subjected to anti-staining treatment to prevent staining of the color filters 16R, 116G, 16B of other colors. .
このように、透明基板１１の下方側に露光マスク１５を
配置し、この露光マスク１５の透光窓１５ａから透明基
板１１を通してホトレジスト１４の所要部分に紫外線を
照射して露光を行なうものであり、したがって透光窓１
５ａの幅３１が透明電極１２の幅Ｓ２よりも多少大きく
、また露光マスク１５が透明電極１２の幅方向に多少ず
れていても、透光窓１５ａを透過した紫外線の一部が、
透明電極１２の両側に配置する遮光膜１３により的確に
規制され、この規制により透明電極１２と対向する部分
のホトレジスト１４にのみに光が照射し、適正な露光が
行なわれる。そして、このように透光窓１５ａの幅の寸
法精度、および露光マスク１５に位置合わせの精度がラ
フでよく、このため作業管理が容易となり、作業能率の
向上を図ることができる。In this way, the exposure mask 15 is placed below the transparent substrate 11, and the required portions of the photoresist 14 are irradiated with ultraviolet rays from the transparent window 15a of the exposure mask 15 through the transparent substrate 11 to perform exposure. Therefore, transparent window 1
Even if the width 31 of the transparent electrode 12 is slightly larger than the width S2 of the transparent electrode 12, and even if the exposure mask 15 is slightly shifted in the width direction of the transparent electrode 12, a part of the ultraviolet light transmitted through the transparent window 15a,
Light is accurately regulated by light-shielding films 13 disposed on both sides of the transparent electrode 12, and due to this regulation, light is irradiated only to the portion of the photoresist 14 facing the transparent electrode 12, and proper exposure is performed. In this way, the dimensional accuracy of the width of the light-transmitting window 15a and the accuracy of alignment with the exposure mask 15 may be rough, which facilitates work management and improves work efficiency.
透明電極１２の相互間にブラックストライプとしての遮
光膜１３を形成する手段としては、染色法やりフトホ７
法があり、まず第２図に染色法による工程を示し、これ
について説明を加える。As means for forming the light-shielding film 13 as a black stripe between the transparent electrodes 12, a dyeing method or a dyeing method can be used.
There is a dyeing method. First, Figure 2 shows the process using the dyeing method, and an explanation will be added regarding this.
透明基板１１の上に酸化インジュウムなどの透明導電膜
２１を、ざらにこの透明導電膜２１の上にクロム膜２２
をそれぞれ形成する（工程ａ）。A transparent conductive film 21 made of indium oxide or the like is placed on the transparent substrate 11, and a chromium film 22 is roughly placed on this transparent conductive film 21.
(Step a).
そして、クロム膜２２の上にポジタイプのホトレジスト
２３を一様に塗布し、この状態で透明基板１１の上方側
に露光マスク２４を配置し、この露光マスク２４の透光
窓２４ａを通して不要部分のホトレジスト２３を露光す
る（工程ａ）。つぎに、ホトレジスト２３の露光部を水
、有機溶剤などで洗い流して除去し、非露光部を現像し
、不要部分のクロム膜２２を露出させ、さらにその露出
させたクロム膜２２およびその下層の透明導電膜２１を
エツチングにより除去し、透明基板１１の上にストライ
プ状に残った透明導電膜２１により互いに離間して並列
する複数の透明電極１２を構成する（工程ｂ）。Then, a positive type photoresist 23 is uniformly applied on the chrome film 22, and in this state, an exposure mask 24 is placed above the transparent substrate 11, and unnecessary portions of the photoresist are exposed through the transparent window 24a of the exposure mask 24. 23 is exposed (step a). Next, the exposed portions of the photoresist 23 are washed away with water, an organic solvent, etc., the unexposed portions are developed, and unnecessary portions of the chromium film 22 are exposed. The conductive film 21 is removed by etching, and the transparent conductive film 21 left in stripes on the transparent substrate 11 constitutes a plurality of transparent electrodes 12 arranged in parallel and spaced apart from each other (step b).
こののち、各透明電極１２の上のホトレジスト２３を除
去する（工程Ｃ）。そして、透明基板１１の上に染色性
を有するネガタイプのホトレジスト２５を一様に塗布し
く工程ｄ）、この状態で透明基板１１の下方から紫外線
を照射し、所要部分つまり透明電極１２の相互間部分の
ホトレジスト２５を露光する。そして、ホトレジスト２
５の非露光部を水、有機溶剤などで洗い流して除去し、
透明電極１２の相互間に残った露光部のホトレジスト２
５を現像して遮光膜の基質１３ａを形成する（工程ｅ）
。このようにして基質１３ａを形成したのちに、この基
質１３ａを黒色染料或いは複数種の染料で染色して遮光
膜１３（ブラックストライプ）を形成する。そして最後
に、各透明電極１２の上のクロム！Ｉ！ｍ２２をエツチ
ングにより除去して透明電極１２を露出させる（工程ｆ
）。Thereafter, the photoresist 23 on each transparent electrode 12 is removed (step C). Then, in step d), a negative type photoresist 25 having dyeability is uniformly coated on the transparent substrate 11, and in this state, ultraviolet rays are irradiated from below the transparent substrate 11 to remove the required portions, that is, the portions between the transparent electrodes 12. The photoresist 25 is exposed. And photoresist 2
Remove the non-exposed areas of step 5 by washing with water, organic solvent, etc.
Photoresist 2 in exposed areas remaining between transparent electrodes 12
5 to form a substrate 13a of a light-shielding film (step e)
. After forming the substrate 13a in this manner, the substrate 13a is dyed with a black dye or a plurality of dyes to form a light shielding film 13 (black stripe). And finally, chrome on each transparent electrode 12! I! m22 is removed by etching to expose the transparent electrode 12 (step f
).
第３図にリフトホラ法により遮光膜を形成する工程を示
し、これについて説明すると、透明基板１１の上に透明
導電膜２１を設け、この透明導電膜２１の上にポジタイ
プのホトレジスト２３を一様に塗布する。そして、透明
基板１１の上方側に露光マスク２４を配置し、この露光
マスク２４の透光窓２４ａを通して不要部分のホトレジ
スト２３を露光する〈工程ａ）。つぎに、その露光した
不要部分のホトレジスト２３およびその下層の透明導電
膜２１をそれぞれ除去して透明電極１２を構成する（工
程ｂ）。FIG. 3 shows the process of forming a light-shielding film by the lift-horizon method. To explain this process, a transparent conductive film 21 is provided on a transparent substrate 11, and a positive type photoresist 23 is uniformly applied on this transparent conductive film 21. Apply. Then, an exposure mask 24 is placed above the transparent substrate 11, and unnecessary portions of the photoresist 23 are exposed through the transparent window 24a of the exposure mask 24 (step a). Next, the exposed unnecessary portions of the photoresist 23 and the underlying transparent conductive film 21 are removed to form the transparent electrode 12 (step b).
こののち、透明基板１１の上面の全体に例えば酸化クロ
ム２６を蒸着する（工程Ｃ）。そして、ホトレジスト２
３の上の酸化クロム２６を、ホトレジスト２３とともに
剥離し、透明電極１２を露出させ、透明電極１２の相互
間に残った酸化クロム２６を遮光膜１３として用いる。Thereafter, for example, chromium oxide 26 is vapor-deposited over the entire upper surface of the transparent substrate 11 (step C). And photoresist 2
The chromium oxide 26 on the photoresist 23 is removed together with the photoresist 23 to expose the transparent electrode 12, and the chromium oxide 26 remaining between the transparent electrodes 12 is used as the light shielding film 13.
このようにして透明基板１１の上に透明電極１２および
遮光膜１３を形成したのちに、第１図に示す工程に従っ
て各透明電極１２の上に所定のカラーフィルタ１６Ｒ，
１６Ｇ、１６Ｂを形成するものである。After forming the transparent electrodes 12 and the light-shielding film 13 on the transparent substrate 11 in this way, a predetermined color filter 16R is placed on each transparent electrode 12 according to the steps shown in FIG.
16G and 16B are formed.
なお、テレビ用などのマトリックス型の液晶表示装置に
おいては、一対の透明基板の上にそれぞれ透明電極およ
び遮光膜を形成するとともに、一方の透明基板の透明電
極の上にそれぞれ所定のカラーフィルタを形成し、さら
に各透明基板の上にポリイミドなどの配向膜をそれぞれ
形成し、これら透明基板をその透明電極および遮光膜の
配置側を内側にして互いに対向させ、この対向間に液晶
を充填してＴＮ配向させ、かつ各透明基板の外面に偏光
板を平行ニコルの状態に取付けて液晶表示装置を構成す
る。In matrix-type liquid crystal display devices such as those for televisions, transparent electrodes and light-shielding films are formed on each of a pair of transparent substrates, and predetermined color filters are formed on each transparent electrode of one of the transparent substrates. Then, an alignment film such as polyimide is formed on each transparent substrate, and these transparent substrates are made to face each other with the sides on which the transparent electrodes and light-shielding film are arranged inside, and liquid crystal is filled between these facing parts to form a TN. A liquid crystal display device is constructed by aligning the transparent substrates and attaching a polarizing plate to the outer surface of each transparent substrate in a parallel Nicol state.
以上説明したようにこの発明によれば、透明電極および
遮光膜を形成した透明基板の上に、染色性を有するネガ
タイプのホトレジストを塗布し、このホトレジストの反
対側において透明基板に対向して露光マスクを配置し、
この露光マスクの透光窓から透明基板を通して所定の透
明電極に対応する部分のホトレジストを露光するように
したから、露光マスクの寸法精度および露光マスクの位
置合わせが比較的ラフであっても、所定の透明電極に対
応する部分のホトレジストを適正に露光することができ
、したがって作業管理が容易となり、作業能率の向上を
確実に達成することができるという効果を奏する。As explained above, according to the present invention, a negative-type photoresist having dyeability is applied on a transparent substrate on which a transparent electrode and a light-shielding film are formed, and an exposure mask is applied on the opposite side of the photoresist, facing the transparent substrate. Place the
Since the photoresist in the portion corresponding to a predetermined transparent electrode is exposed through the transparent window of the exposure mask through the transparent substrate, even if the dimensional accuracy of the exposure mask and the alignment of the exposure mask are relatively rough, The photoresist in the portion corresponding to the transparent electrode can be properly exposed, so that work management becomes easy and work efficiency can be reliably improved.
第１図はこの発明の一実施例によるカラーフィルタの形
成工程を順に示す断面図、第２図は透明基板の上に遮光
膜を染色法により形成する工程を順に示す断面図、第３
図は同じくリフトホラ法により形成する工程を順に示す
断面図、第４図は従来のカラーフィルタの形成工程を順
に示す断面図である。
１１・・・透明基板、１２・・・透明電極、１３・・・
遮光膜、１４・・・ホトレジスト、′１５・・・露光マ
スク、１５ ａ ・・・透光膜、１６Ｒ，１６Ｇ、１６
Ｂ・・・カラーフィルタ。1 is a cross-sectional view sequentially showing the process of forming a color filter according to an embodiment of the present invention; FIG. 2 is a cross-sectional view sequentially showing the process of forming a light shielding film on a transparent substrate by a dyeing method; FIG.
The figures are sectional views sequentially showing the steps of forming a conventional color filter using the lift-hole method, and FIG. 4 is a sectional view showing the steps of forming a conventional color filter. 11... Transparent substrate, 12... Transparent electrode, 13...
Light-shielding film, 14... Photoresist, '15... Exposure mask, 15 a... Light-transmitting film, 16R, 16G, 16
B...Color filter.
Claims (1)
これら透明電極の相互間に遮光膜を形成する工程と、透
明基板の上に上記各透明電極および各遮光膜を覆う状態
に染色性を有するネガタイプのホトレジストを塗布する
工程と、上記ホトレジストの反対側において透明基板と
対向して露光マスクを配置し、この露光マスクの透光窓
を通して所定の透明電極に対応する部分のホトレジスト
を露光する工程と、非露光部のホトレジストを除去し、
露光部のホトレジストを現像する工程と、現像したホト
レジストを染色してカラーフィルタとする工程とを具備
したことを特徴とするカラーフィルタの形成方法。A step of forming a plurality of transparent electrodes in parallel on a transparent substrate and forming a light-shielding film between these transparent electrodes, and dyeing the transparent substrate to cover each of the transparent electrodes and each light-shielding film. a step of applying a negative type photoresist having a characteristic, and placing an exposure mask facing a transparent substrate on the opposite side of the photoresist, and exposing a portion of the photoresist corresponding to a predetermined transparent electrode through a light-transmitting window of this exposure mask. and removing the photoresist in the non-exposed areas.
1. A method for forming a color filter, comprising the steps of developing photoresist in exposed areas, and dyeing the developed photoresist to form a color filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61097423A JP2518207B2 (en) | 1986-04-26 | 1986-04-26 | Method for forming color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61097423A JP2518207B2 (en) | 1986-04-26 | 1986-04-26 | Method for forming color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62253124A true JPS62253124A (en) | 1987-11-04 |
| JP2518207B2 JP2518207B2 (en) | 1996-07-24 |
Family
ID=14192020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61097423A Expired - Lifetime JP2518207B2 (en) | 1986-04-26 | 1986-04-26 | Method for forming color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2518207B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6480905A (en) * | 1987-09-24 | 1989-03-27 | Fuji Photo Film Co Ltd | Production of color filter |
| JPH02115803A (en) * | 1988-10-25 | 1990-04-27 | Canon Inc | Color filter and production |
| US20120100471A1 (en) * | 2010-10-21 | 2012-04-26 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Method of manufacturing color filter substrate |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5972409A (en) * | 1982-10-19 | 1984-04-24 | Matsushita Electric Ind Co Ltd | Manufacture of color filter |
| JPS6175303A (en) * | 1984-09-21 | 1986-04-17 | Casio Comput Co Ltd | Manufacture of color filter |
-
1986
- 1986-04-26 JP JP61097423A patent/JP2518207B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5972409A (en) * | 1982-10-19 | 1984-04-24 | Matsushita Electric Ind Co Ltd | Manufacture of color filter |
| JPS6175303A (en) * | 1984-09-21 | 1986-04-17 | Casio Comput Co Ltd | Manufacture of color filter |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6480905A (en) * | 1987-09-24 | 1989-03-27 | Fuji Photo Film Co Ltd | Production of color filter |
| JPH02115803A (en) * | 1988-10-25 | 1990-04-27 | Canon Inc | Color filter and production |
| JP2749836B2 (en) * | 1988-10-25 | 1998-05-13 | キヤノン株式会社 | Color filter manufacturing method and electrode substrate manufacturing method |
| US20120100471A1 (en) * | 2010-10-21 | 2012-04-26 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Method of manufacturing color filter substrate |
| US8475979B2 (en) * | 2010-10-21 | 2013-07-02 | Boe Technology Group Co., Ltd. | Method of manufacturing color filter substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2518207B2 (en) | 1996-07-24 |
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