JPH08248409A - Color filter for liquid crystal display device and its production - Google Patents

Abstract

PURPOSE: To form a color filter having a flat surface equipped with a light- shielding body having low reflectance and high light-shielding property by selectively forming a transparent resin as a spacer under the color filter part in such a manner that the resin has the same film thickness as that of the black matrix to fill the step part between the light-shielding body and the color filter. CONSTITUTION: This color filter consists of a glass substrate and a red filter 35, green filter 36, blue filter 37 and light-shielding body 32 which shields the border part between color filters from light formed on the glass substrate. A light-shielding body 32 has low reflectance and high light-shielding property. A transparent spacer 34 having the same film thickness as that of the light- shielding body 32 is formed only under the color filters.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a color filter used in a liquid crystal display device and a manufacturing method thereof.

[0002]

2. Description of the Related Art A general liquid crystal display device includes a liquid crystal and a color display for controlling the amount of light transmission between two glass substrates on which transparent electrodes made of indium tin oxide (hereinafter referred to as ITO) are formed. It has a structure including a color filter that enables the above, and a backlight including a fluorescent tube and a diffusion plate.

On one of the glass substrates, signal electrodes made of ITO for applying a voltage to the liquid crystal are patterned. Further, in order to enable color display on the other glass substrate, a color filter including a red filter, which is the three primary colors, a green filter, and a blue filter is configured.

Further, in order to improve the display quality, a protective film is formed on the color filter for the purpose of flattening the surface irregularities. On the protective film, a scanning electrode formed of ITO is also patterned to apply a voltage to the liquid crystal layer.

The signal electrodes and the scanning electrodes are regularly arranged in a direction perpendicular to each other so as to form intersecting portions (pixels) with the liquid crystal sandwiched therebetween. On the signal electrode and the scanning electrode, an alignment film that has been subjected to a treatment for regularly aligning the liquid crystal molecules is formed.

The color filter is a red color of a liquid crystal display device,
Corresponding to the green and blue pixels, red, green and blue color filters are arranged at regular intervals in a stripe or mosaic pattern.

Further, in order to prevent the color mixture between adjacent pixels and the light emitted from the backlight from leaking without passing through the color filters and deteriorating the image quality, the boundary of each color filter is prevented. It forms a light shield.

Printing means and photolithography means are generally used as means for producing such color filters.

In the manufacturing method using printing means or photolithography means, after forming a metal light shielding film of chromium or the like on a glass substrate, a light shielding pattern formed on a photomask using photolithography means is used as a resist image. Transfer to the metal light-shielding film.

After that, the openings corresponding to the pixels of the liquid crystal display device are removed by chrome etching to form a light shield on the glass substrate.

In the printing means, a red filter is printed with red ink by using a printing plate in which a color filter pattern is formed on the opening of the light shield with unevenness of resin or metal. Similarly, print a green filter with green ink and a blue filter with blue ink.

Further, in the photolithography means, a photosensitive resin in which red, green, and blue pigments or dyes are dispersed in a photosensitive resin is formed on a light shielding body, and an opening portion of the light shielding body formed on a glass substrate is formed. The color filter pattern formed on the photomask is aligned with the portion for forming the color filter, and an exposure process and a development process are performed.

In this processing step, a color filter pattern is formed on the exposed photosensitive resin portion which is not dissolved in the developing solution by utilizing the difference in solubility between the exposed portion and the unexposed portion in the developing solution. When forming red, green, and blue color filters in the openings of the light shield, after forming the light shield, the same steps as above are repeated three times for each of red, green, and blue.

[0014]

However, when a chrome metal light-shielding film is used for the light-shielding body, reflection of external light radiated on the screen of the liquid crystal display device is caused due to the high reflectance of the surface of the metal light-shielding film. The display quality is significantly impaired by the effect of.

As a means for solving such a problem, there has been attempted a method of forming a light shield with a material whose surface has a low reflectance.

For example, a method of forming an oxide film having a low reflectance at the interface between the glass substrate on the display screen side and the light shield formed of a metal light shielding film, or a photosensitive resin in which a black coloring material is added to the resin is used. This is a method of forming a light shield using a photolithography means.

However, the method of forming an oxide film causes an increase in manufacturing steps and an increase in cost. Further, in the method of forming with the black photosensitive resin, since the light-shielding property is lower than that of metal, in order to sufficiently shield the light from the light source, the thickness of the black photosensitive resin is increased in the light transmitting direction. Need to be formed.

The red, green and blue color filters constituting the color filter are formed by a photolithography means using a photosensitive resin in which red, green and blue pigments are respectively dispersed as described above, or It is formed by printing means using green, green and blue ink materials.

At this time, in order to obtain a predetermined spectral characteristic, the film thickness of the color filter is usually 1.0 μ depending on the content of the pigments in the red, green, and blue photosensitive coloring materials or the ink material.
m to 2.0 μm is required.

Even when a light-shielding body is formed by using a black photosensitive resin or an ink material, a film thickness of 1.0 μm to 2.0 μm is required to secure a sufficient light-shielding property.

On the other hand, in the photolithography means or the printing means, the red, green, and blue color filters and the light shield are displaced from each other due to the misalignment between the formation positions of the color filters and the light shield. Occurs.

Since the light from the light source is displayed on the screen of the liquid crystal display device without passing through the color filter, the gap portion causes uneven display.

In order to prevent such display unevenness and widen the alignment accuracy in the manufacturing process, the end portions of the color filters are formed so as to overlap each other on the light shield.

FIG. 13 is a plan view showing a conventional color filter using a metal light-shielding film as a light-shielding body, and FIG. 14 is a sectional view showing a section taken along the line GG. See also FIG.
5 is a plan view of a color filter in which a light shield is formed by using a black photosensitive resin having a low reflectance, and FIG.
It is sectional drawing which shows the cross section in the -H line.

A conventional color filter shown in FIGS. 13 and 14 is a light-shielding body 11 formed of a metal light-shielding film on a glass substrate 10 and light-shielding corresponding to red, green and blue pixels of a liquid crystal display device. A red filter 12, a green filter 13, and a blue filter 14 are provided at the openings of the body, respectively.

Further, each color filter is formed so that its end portion overlaps with the light shield.

The light shield 11 is formed of a metal light shielding film,
A sufficient light-shielding property is obtained with a film thickness of about 100 nm, and almost no step is formed in the overlapping portion of the red filter 12, the green filter 13, the end portion of the blue filter 14, and the light shield 11.

However, like the color filters shown in FIGS. 15 and 16, when the light shield 15 is formed by using a black photosensitive resin or ink material having a low reflectance, the light shield 1
In the overlapping portion 19 of each of the five color filters, the red filter 16, the green filter 17, and the blue filter 18, the thickness of the color filter and the thickness of the light shield 15 are overlapped.

The thickness of the light shield 15 is from 1 μm to 2 μm.
Since the thickness is m, a step is generated between the overlap portion and the color filter formed in the pixel portion. Such a step disturbs the alignment of the liquid crystal layer and impairs the display characteristics of the liquid crystal display device.

It is an object of the present invention to solve the above problems and provide a structure of a color filter having a low-reflectance light shield and having a flat surface shape, and a method for manufacturing the same.

[0031]

In order to achieve the above object, a color filter for a liquid crystal display device and a method for producing the same according to the present invention employ the means described below.

The color filter for a liquid crystal display device of the present invention comprises red, green, and blue color filters formed on a glass substrate and a light-shielding body for shielding the boundary between them, red, and green.
It is characterized by having a transparent spacer having the same film thickness as the light shield under the blue color filter.

The method of manufacturing a color filter for a liquid crystal display device of the present invention comprises a step of forming a light-shielding body having an opening with a photosensitive resin in which a black coloring material is dispersed on a glass substrate, and a transparent step for forming the opening. A step of forming a spacer having the same film thickness as the light shield with a photosensitive resin, and a step of forming a red, green, and blue color filter with a photosensitive resin in which a pigment is dispersed on the spacer formed in the opening. It is characterized by having.

The method of manufacturing a color filter for a liquid crystal display device of the present invention comprises a step of forming a light-shielding body having openings on a glass substrate with a photosensitive resin in which a black coloring material is dispersed,
The process of forming a spacer with the same film thickness as the light shield using a transparent photosensitive resin in this opening, and the photosensitivity above the spacer formed in the opening each time the red, green, and blue color filters are formed. Form a color filter pattern with dyeable resin,
And the step of dyeing the color filter with a red, green, and blue dye.

[0035]

In the present invention, the step between the opening of the light-shielding body that forms the color filter and the light-shielding body formed of the photosensitive resin in which the black coloring material is dispersed is made of transparent resin only in the opening. The spacer is formed with the same thickness as the light shield. As a result, this step portion can be compensated.
Therefore, by forming a color filter on this surface, it is possible to form a flat color filter surface.

By using the structure and manufacturing method of such a color filter, a photosensitive resin having a black colorant dispersed therein is used without impairing the display characteristics, and has a sufficient light-shielding property and a low-reflectance light-shielding property. Can form a body.

[0037]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A color filter for a liquid crystal display device and a method for manufacturing the same in an embodiment of the present invention will be described below with reference to the drawings.

First, the structure of a liquid crystal display device capable of color display will be described with reference to FIG. 17, and the color filter of the present invention, which is a constituent member thereof, and a manufacturing method thereof will be described.

FIG. 17 is a back view consisting of a liquid crystal for controlling the amount of light transmission between two glass substrates having transparent electrodes formed of ITO, a color filter for enabling color display, a fluorescent tube and a diffusion plate. 2 is a cross-sectional view of a liquid crystal display device having a structure including a light.

On the glass substrate 20, a signal electrode 22 made of ITO for applying a voltage to the liquid crystal 21 is patterned.

Furthermore, in order to enable color display on the glass substrate 23, a red filter 24, which is the three primary colors, is used.
And a green filter 25 and a blue filter 26 constitute a color filter.

Further, in order to make the thickness of the liquid crystal layer and the orientation of the liquid crystal 21 uniform and improve the display quality, a protective film 28 is formed on the color filter for the purpose of flattening the surface irregularities.

On the protective film 28, the scanning electrode 27 formed of ITO is also patterned to apply a voltage to the liquid crystal 21.

The scanning electrodes 27 and the signal electrodes 22 are regularly arranged in a direction perpendicular to each other so as to form intersecting portions (pixels) with the liquid crystal 21 sandwiched therebetween.

The color filters of the respective colors are arranged at regular intervals corresponding to the pixels of the liquid crystal display device. Further, the light shield 30 is formed in order to prevent the color mixture between the adjacent pixels and the light emitted from the backlight 29 from leaking without passing through the color filter and deteriorating the image quality. .

The structure of the color filter of the present invention will be described below with reference to FIGS. 1 and 2, and then the method of manufacturing the color filter of the present invention will be described with reference to FIGS. 3 to 12 alternately.

FIG. 1 is a plan view showing a color filter for a liquid crystal display device of the present invention, and FIG. 2 is a sectional view showing a section taken along the line AA of FIG. Hereinafter, description will be given by alternately referring to FIG. 1 and FIG.

On the transparent glass substrate 31, on the display screen of the liquid crystal display device, in order to prevent reflection of external light,
A low-reflectance light shield 32 made of a photosensitive resin in which a black colorant is dispersed is formed.

The film thickness of the light shield 32 depends on the content of the black coloring material dispersed in the photosensitive coloring material,
In order to obtain a sufficient light-shielding property, the film is formed with a film thickness of 1.5 μm.

In the opening 33 of the light shield 32 on the glass substrate corresponding to the red, green and blue pixels of the liquid crystal display device,
In order to fill the step between the light shield 32 and the opening 33 and form a color filter having a flat surface, a spacer 34 made of a transparent photosensitive resin is formed in the same thickness as the light shield 32.

Further, the spacer 34 of the opening 33 is provided so that the red, green, and blue pixels of the liquid crystal display device correspond to each other.
Above that, a red filter 35, a green filter 36,
Blue filters 37 are formed respectively.

Each color filter is formed so that the end portion of the color filter overlaps with the light shield for the purpose of preventing leakage of light from the light source through the gap caused by the positional deviation with the light shield 32 during formation.

The array of the color filters is formed in a stripe shape or a mosaic shape according to the arrangement of the scanning electrodes and the signal electrodes of the liquid crystal display device. Although the color filters shown in FIG. 1 are arranged in a stripe shape, the shape of the color filters of the present invention is not particularly limited, and they may be arranged in a mosaic shape.

Next, a method for manufacturing a color filter for a liquid crystal display device according to the embodiment of the present invention shown in FIGS. 1 and 2 will be specifically described.

FIG. 3 is a plan view showing the glass substrate 31 forming the light shield 32, and FIG. 4 is a sectional view showing a section taken along the line BB in FIG.

A negative type black color resist manufactured by Fuji Hunt Electronics Technology Co., Ltd. was used as a photosensitive resin in which a black colorant was dispersed as a material of the light shield 32 on a transparent glass substrate by a roll coating method or a spin coating method. It is formed flat so as to have a film thickness of 1.5 μm.

Next, through the photomask on which the light shielding pattern is formed, the g-line and the h-line are applied to the black color resist on the glass substrate where the light-shielding body is formed by using a projection exposure apparatus or a contact exposure apparatus. , Ultraviolet light including i-ray
Irradiation is performed so that the energy amount is 400 mJ / cm ^{2 in} line conversion, and exposure processing is performed.

Next, this glass substrate is immersed in a resist developing solution CD manufactured by Fuji Hunt Electronics Technology Co., Ltd. for 1 minute to dissolve the black color resist in the unexposed portion not irradiated with light in the developing solution.

As shown in FIGS. 3 and 4, the glass substrate 31
A light shield 32 is formed of a black color resist insolubilized in the developing solution, and an opening 33 is formed in the black color resist portion which is dissolved and removed in the developing solution.

FIG. 5 shows a glass substrate 31 shown in FIGS. 3 and 4 on which a spacer 34 having the same thickness as that of the light shield is formed of a transparent photosensitive resin on the glass substrate 31 on which the light shield 32 is formed. 6 is a plan view shown in FIG. 6, and FIG. 6 is a cross-sectional view showing a cross section taken along the line C-C in FIG. 5.

A transparent negative photosensitive resin V-259PA manufactured by Nippon Steel Chemical Co., Ltd. is used as a light-shielding member forming surface spacer 34 material on the glass substrate 31 shown in FIGS. 3 and 4 by a roll coating method or a spin coating method. Is used to form a flat film having a thickness of 1.5 μm.

Next, this glass substrate is heat-treated on a hot plate at a temperature of 80 ° C. to 90 ° C. for 5 minutes.

After that, the light shield 32 formed on the glass substrate 31 shown in FIGS. 3 and 4 is used as a photomask and the g line, h from the rear surface of the surface of the glass substrate 31 on which the light shield 32 is formed.
Rays including i-ray and 500-mJ / cm ² converted to i-ray
Irradiate so that the amount of energy becomes. Here, light is transmitted only through the opening 33 excluding the light shield forming portion, and the opening 3
The photosensitive resin of No. 3 is exposed.

Next, this glass substrate is immersed in an alkali developing solution at a temperature of 23 ° C. for 1 minute, and the photosensitive resin in the unexposed portion on the light shield is dissolved and removed in the developing solution.

As shown in FIGS. 5 and 6, the opening 33 on the glass substrate 31 is made of a photosensitive resin insolubilized in the developer so as to fill the step between the light shield 32 and the opening 33. A transparent spacer 34 having a film thickness is formed.

FIG. 7 is a plan view showing the glass substrate 31 having the red filter 35 formed on the glass substrate 31 having the light shield 32 and the spacer 34 shown in FIGS. 5 and 6, and FIG. It is sectional drawing which shows the cross section in the DD line of FIG.

A red color resist CR-2000 manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is a photosensitive resin in which a red pigment is dispersed as a red filter 35 material on the surface of the glass substrate 31 on which the light shield 32 is formed as shown in FIGS. 5 and 6.
Is formed by a roll coating method or a spin coating method so as to have a film thickness of 1.5 μm. Then, this glass substrate is heat-treated on a hot plate at a temperature of 80 ° C. to 90 ° C. for 5 minutes.

Next, using a projection exposure apparatus or a contact exposure apparatus, a red filter pattern formed on the photomask is formed on a portion of the spacer 34 formed in the opening 33 of the light shield 32 where a red filter is formed. Align.

Then, ultraviolet light including g-line, h-line and i-line is converted to i-line equivalent to 300 on the red resist through the photomask.
Irradiation with an energy amount of mJ / cm ² .

This glass substrate was dipped in a resist developing solution CD manufactured by Fuji Hunt Electronics Technology Co., Ltd. for 1 minute to dissolve the red color resist in the unexposed portion in the developing solution, and exposed as shown in FIGS. 7 and 8. Then, the red color filter 35 is formed on the spacer 34 formed in the opening 33 of the light shield 32 with the red color resist insoluble in the developing solution.

Here, the red filters 35 are arranged in stripes, and the ends are formed so as to overlap the light shield.

FIG. 9 is a plan view showing the glass substrate 31 on which the green filter 36 is formed after forming the red filter 35 shown in FIGS. 7 and 8, and FIG. 10 is shown in FIG.
It is sectional drawing which shows the cross section in the EE line of FIG.

As a material for the green filter 36, a color resist CG-5000 manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is a photosensitive resin in which a green pigment is dispersed, is used as a light shielding surface on the glass substrate 31 shown in FIGS. 7 and 8. Then, a roll coating method or a spin coating method is used to form a film having a thickness of 1.5 μm.

In the same process as the red filter forming process, a green filter is formed on the spacer 34 formed in the opening 33 of the light shield 32 on the glass substrate 31 using a projection exposure apparatus or a contact exposure apparatus. The green filter pattern formed on the photomask is aligned with the portion to be formed.

Then, ultraviolet light including g-line, h-line, and i-line is converted to i-line by 300 through the photomask on the green resist.
Irradiation with an energy amount of mJ / cm ² .

Next, a developing process is performed in the same manner as the red color filter forming step, and as shown in FIGS. 9 and 10, a green color resist which is exposed to light and is insoluble in the developing solution is formed in the opening 33 of the light shield 32. A green filter 36 is formed on the existing spacer 34.

Here, the green filters 36 are arranged in a striped pattern like the red filters 35, and are formed so that their ends overlap with the light shields.

FIG. 11 is a plan view showing the glass substrate 31 on which the blue filter 37 is formed after the green filter 36 shown in FIGS. 9 and 10 is formed, and FIG. 12 is a line FF of FIG. It is sectional drawing which shows the cross section in.

As a photosensitive resin in which a blue pigment is dispersed, a color resist CB-2000 manufactured by Fuji Hunt Electronics Technology Co., Ltd. is applied on the light-shielding body forming surface on the glass substrate 31 shown in FIGS. A coating method is used to apply a film having a thickness of 1.5 μm.

Red filter 35 and green filter 36
Similar to the forming step, a projection exposure apparatus or a contact exposure apparatus is used to open the opening 33 of the light shield 32 on the glass substrate 31.
The blue filter pattern formed on the photomask is aligned with the portion of the spacer 34 on which the blue filter is to be formed.

Then, the blue color resist is irradiated with ultraviolet light including g-line, h-line and i-line through a photomask at an energy amount of 300 mJ / cm ^{2 in} terms of i-line.

Next, as in the steps of forming the red filter and the green filter, the developing process and the heating process are performed, and the blue is formed on the spacer 34 formed in the opening 33 of the light shield 32 as shown in FIGS. 11 and 12. The color filter 37 is formed.

Here, the blue filters 37 are arranged in stripes like the red filters 35, and are formed so that the end portions overlap the light shields.

Next, a method of manufacturing a color filter for a liquid crystal display device according to another embodiment of the present invention will be described.

A negative type black color resist manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is a photosensitive coloring material in which a black coloring material is dispersed, is used as a light shielding material 32 on a transparent glass substrate by a roll coating method or a spin coating method. So that the film thickness is 1.5 μm.

Next, through the photomask on which the light shielding pattern is formed, the g-line and the h-line are applied to the black color resist on the glass substrate where the light-shielding body is to be formed by using a projection exposure apparatus or a contact exposure apparatus. , Ultraviolet light including i-ray
Irradiation is performed so that the energy amount is 400 mJ / cm ^{2 in} line conversion, and exposure processing is performed.

This glass substrate is dipped in a resist developing solution CD manufactured by Fuji Hunt Electronics Technology Co., Ltd. for 1 minute to dissolve the black color resist in the unexposed portion not irradiated with light in the developing solution.

As shown in FIGS. 3 and 4, the light shield 3 is formed on the glass substrate 31 by the black color resist insolubilized in the developing solution.
2 is formed, and the opening 33 is formed in the black color resist portion which is dissolved in the developing solution and removed.

Next, a negative photosensitive resin V259 made by Nippon Steel Chemical Co., Ltd., which is a transparent photosensitive resin as a material of the spacer 34, is formed on the surface of the glass substrate 31 on which the light shield 32 is formed as shown in FIGS. 3 and 4. -PA is formed by roll coating or spin coating to a film thickness of 1.5 μm.

Next, this glass substrate is heated on a hot plate at a temperature of 80 ° C. to 90 ° C. for 5 minutes.

After that, the glass substrate 3 shown in FIG. 3 and FIG.
Using the light shield 32 formed on the 1 as a photomask, the energy of the ultraviolet light including the g-line, h-line and i-line from the back surface of the light-shielding body forming surface of the glass substrate becomes 300 mJ / cm ^{2 in} terms of i-line. To irradiate.

Here, light is transmitted only through the opening 33 excluding the light shield forming portion, and the photosensitive resin in the opening 33 is exposed.

Next, this glass substrate is immersed in an alkali developing solution at a temperature of 23 ° C. for 1 minute to remove the photosensitive resin in the unexposed portion on the light shield 32 by dissolving it in the developing solution.

As shown in FIGS. 5 and 6, the light shield 3 is made of a photosensitive resin insolubilized in the developing solution in the opening 33 on the glass substrate 31 so as to fill the step between the light shield 32 and the opening 33.
A transparent spacer 34 having the same thickness as 2 is formed.

Next, ammonium dichromate was added to the surface of the glass substrate 31 on which the light-shielding body 32 was formed so as to have a concentration of 2 w% in an aqueous solution of gelatin, which is a photosensitive dyeing resin and is made by Fuji Chemical Co., Ltd. The material is formed by spin coating so as to have a film thickness of 1.0 μm.

Next, this glass substrate is heated on a hot plate at a temperature of 70 ° C. to 80 ° C. for 5 minutes.

After that, using a projection exposure apparatus or a contact exposure apparatus, a photomask on which a color filter pattern is formed is aligned with a portion where a red filter 35 is to be formed on a spacer 34 formed on the glass substrate 31. Then, ultraviolet light including g-line, h-line, and i-line is irradiated so as to have an exposure amount of 400 mJ / cm ^{2 in} terms of i-line.

Thereafter, this glass substrate is immersed in an aqueous acetic acid solution having a pH (pH) adjusted to 3 at a temperature of 50 ° C. for 2 minutes to dissolve and remove the photosensitive dyeing resin in the unexposed area in the developing solution.

Next, this glass substrate was immersed in a red dyeing solution prepared by mixing Nippon Kayaku's red dye PC-RED-R136P to a concentration of 1 w% at a temperature of 60 ° C. for 10 minutes to make it insoluble in a developing solution. The exposed area is red-dyed.

Then, the dyed glass substrate was immersed in a 0.5 w% tannic acid aqueous solution at 60 ° C. for 5 minutes, and then in a 0.5 w% tartarite aqueous solution at 60 ° C. for 5 minutes. , A dye-resist hardening treatment for preventing dyeing with other dyes is performed during the dyeing process for the second color and the third color.
Then, as shown in FIG. 8, a red filter 35 is formed on the spacer 34 formed in the opening 33 of the light shield 32.

Here, the red filters 35 are arranged in stripes, and the ends are formed so as to overlap the light shield.

Then, similarly to the red filter forming step, a photosensitive dyeing resin is applied to the light-shielding body forming surface of the glass substrate 31 by a spin coating method so as to have a film thickness of 1.0 μm.

After heating this glass substrate on a hot plate at a temperature of 70 ° C. to 80 ° C. for 5 minutes, a green filter 36 on the spacer 30 formed on the glass substrate is formed by using a projection exposure apparatus or a contact exposure apparatus. A photomask on which a color filter pattern is formed is aligned with the portion to be exposed, and ultraviolet light including g-line, h-line, and i-line is irradiated so that the exposure amount is 400 mJ / cm ^{2 in} terms of i-line.

This glass substrate is immersed in an aqueous acetic acid solution having a pH (pH) adjusted to 3 at a temperature of 50 ° C. for 2 minutes to dissolve and remove the photosensitive dyeing resin in the unexposed area in a developing solution.

Next, a green dye PC-GRE manufactured by Nippon Kayaku Co., Ltd.
It is dipped in a green dyeing solution prepared by mixing EN-FOP so as to have a concentration of 1 w% at a temperature of 60 ° C. for 10 minutes to subject the photosensitive dyeing resin of the photosensitive portion, which was insoluble in the developing solution, to a green dyeing treatment.

Next, the dyed glass substrate was immersed in a 0.5 w% tannic acid aqueous solution at a temperature of 60 ° C. for 5 minutes, and then in a 0.5 w% tartarite aqueous solution at a temperature of 60 ° C. for 5 minutes. Then, during the third color dyeing process, a dye-proof hard film treatment for preventing dyeing is performed, and a green color is formed on the spacer 34 formed in the opening 33 of the light shield 32 as shown in FIGS. 9 and 10. The filter 36 is formed.

Here, the green filters 36 are arranged in stripes, and the ends are formed so as to overlap the light shield.

Similar to the method for forming the red filter and the green filter, a photosensitive dyeing resin is formed on the light-shielding body forming surface on the glass substrate 31 by the spin coating method so as to have a film thickness of 1.0 μm. The substrate is heat-treated on a hot plate at a temperature of 70 ° C. to 80 ° C. for 5 minutes.

After that, a spacer 34 formed on the glass substrate is formed by using a projection exposure apparatus or a contact exposure apparatus.
The photomask on which the color filter pattern is formed is aligned with the portion where the blue filter 37 is formed, and the ultraviolet light including the g-line, the h-line, and the i-line is converted into i-line by 400.
Irradiation is performed so that the exposure amount is mJ / cm ² .

This glass substrate is immersed in an aqueous acetic acid solution having a pH (pH) adjusted to 3 at a temperature of 50 ° C. for 2 minutes to dissolve and remove the photosensitive dyeing resin in the unexposed area in a developing solution.

Furthermore, a blue dye PC-BLU manufactured by Nippon Kayaku
The glass substrate after the above development treatment was applied to a blue dyeing solution prepared by mixing E-B45P at a concentration of 1 w% at a temperature of 60 ° C. for 10 minutes.
After soaking for a minute, the photosensitive dyeing resin of the photosensitive portion, which was insoluble in the developing solution, is blue-dyed.

Next, the glass substrate after the dyeing treatment is 0.5
After dipping in a w% tannic acid aqueous solution at a temperature of 60 ° C. for 5 minutes, it is dipped in a 0.5 w% tartaric acid aqueous solution at a temperature of 60 ° C. for 5 minutes to carry out a dye-resist hardening treatment. As shown in, a blue filter 37 is formed on the spacer 34 formed in the opening 33 of the light shield 32 on the glass substrate 31.

Here, the blue filters 37 are arranged in stripes, and the ends are formed so as to overlap the light shield.

[0114]

As is apparent from the above description, in the color filter of the present invention, the light-shielding body is formed of the photosensitive resin in which the black coloring material is dispersed to have a film thickness capable of obtaining a sufficient optical density. It is possible to reduce the reflectance without losing the light-shielding property as compared with a light-shielding body using a metal film such as.

Further, the overlapping portion of the light shield and the color filter on the glass substrate is selectively formed under the color filter with a transparent resin as a spacer in the same film thickness as the light shield film. Without creating a step in the overlapping part with the filter,
It is possible to make the surface of the color filter flat. By using such a color filter structure and manufacturing method, it is possible to obtain a color filter equipped with a light shield having a low reflectance without impairing display characteristics.

[Brief description of drawings]

FIG. 1 is a plan view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an embodiment of the present invention.

FIG. 2 is a cross-sectional view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 3 is a plan view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 4 is a cross-sectional view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 5 is a plan view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 6 is a cross-sectional view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 7 is a plan view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 8 is a cross-sectional view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 9 is a plan view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 10 is a cross-sectional view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 11 is a plan view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 12 is a cross-sectional view showing a color filter for a liquid crystal display device and a method for manufacturing the same in an example of the present invention.

FIG. 13 is a plan view showing a structure of a color filter for a liquid crystal display device in a conventional example.

FIG. 14 is a cross-sectional view showing a structure of a color filter for a liquid crystal display device in a conventional example.

FIG. 15 is a plan view showing the structure of a color filter for a liquid crystal display device in a conventional example.

FIG. 16 is a cross-sectional view showing a structure of a color filter for a liquid crystal display device in a conventional example.

FIG. 17 is a cross-sectional view showing a structure of a liquid crystal display device in a conventional example.

[Explanation of symbols]

 31 glass substrate 32 light shield 33 opening 34 spacer 35 red filter 36 green filter 37 blue filter

Claims (3)

[Claims] 1. A red, green, and blue color filter formed on a glass substrate, and a light-shielding member for shielding the boundary between the color filters, and a transparent spacer having the same thickness as the light-shielding member under the color filter. A color filter for a liquid crystal display device having. 2. A step of forming a light-shielding body having an opening with a photosensitive resin in which a black coloring material is dispersed on a glass substrate, and a spacer having the same film thickness as the light-shielding body made of a transparent photosensitive resin in the opening. And a step of forming a red, green, and blue color filter with a photosensitive resin in which pigments are dispersed on a spacer formed in the opening, and a color for a liquid crystal display device. Filter manufacturing method. 3. A step of forming a light-shielding body having an opening made of a photosensitive resin in which a black coloring material is dispersed on a glass substrate, and a spacer having the same film thickness as the light-shielding body made of a transparent photosensitive resin in the opening. And the step of forming a color filter pattern with a photosensitive dyeing resin on the spacer formed in the opening every time the red, green, and blue color filters are formed, and the color filter pattern is red. And a step of dyeing with a green or blue dye, the method for producing a color filter for a liquid crystal display device.