JPH11174432A - Liquid crystal display device and production therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the structure of an inexpensive liquid crystal display device capable of enhancing display quality and the efficiency of light and to provide its manufacturing method. SOLUTION: Since this liquid crystal display device and its manufacturing method use a photosensitive resin in which a coloring material is preliminarily dispersed in a base material to be used for forming of color filters and which has both heat resistance and chemical resistance, it is made possible to form the film thickness of the color filters 12 to 12c of red, green and blue corresponding to the pixels of the liquid crystal display device in roughly the same thickness. Moreover, since light shielding bodies 11 are insulative and the color filters 12a to 12c themselves have both heat resistance and chemical resistance, it is made possible to form a transparent electrode 15 on the color filters 12a to 12c without interposing a protective film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a structure of a liquid crystal display device and a manufacturing method for forming the structure of the liquid crystal display device.

[0002]

2. Description of the Related Art A conventional liquid crystal display device using a super twisted nematic mode (hereinafter referred to as an STN mode) performs color display by combining a color filter formed inside a display cell with an optical compensator. Making it possible.

The above prior art is disclosed in, for example,
There is one described in JP-A-77020. FIGS. 14 and 15 show the structure of the liquid crystal display element described in this publication. FIG. 14 is a perspective view showing a liquid crystal display device according to the related art, and FIG. 15 is a sectional view showing a section taken along line KK of FIG.

[0004] As shown in FIGS. 14 and 15, the liquid crystal display device of the prior art has two glass substrates as optical compensators for optically correcting coloring caused by birefringence of the liquid crystal layer of the display cell 29. A compensation cell 30 in which a liquid crystal 28b is enclosed is provided.

A pair of polarizing plates 31a and 31b are provided so as to sandwich the display cell 29 and the compensation cell 30.

[0006] Further, a backlight 32 composed of a fluorescent tube and a diffusion plate is provided as a light source.

As shown in FIG. 15, a display cell includes a light shield 21 having an opening on an upper glass substrate 20, and a red color filter 22a provided on the opening of the light shield 21 so as to cover the opening. The color filter includes a green color filter 22b and a blue color filter 22c.
The overcoat layer 23 is formed for the purpose of protecting the surfaces of the green and blue color filters.

On the overcoat layer 23, a liquid crystal 28
A transparent electrode 24 is formed to apply a voltage to a.

On the lower glass substrate 25, transparent electrodes 26 are formed in directions orthogonal to each other so as to form an intersection (pixel) with the transparent electrode 24.

On the transparent electrode 24 and the transparent electrode 26, an alignment film 2 which has been treated to regularly align liquid crystal molecules.
7 are formed.

Between two glass substrates, a spacer 29 for maintaining a gap between the substrates and a liquid crystal 28a for controlling the amount of transmitted light are sealed.

As described above, in the conventional STN mode liquid crystal display device shown in FIG. 14 and FIG. 15, the linear knitted light passing through the incident side polarizing plate 31a passes through the display cell 29 and the birefringence of the liquid crystal 28a. Due to the effect, it changes to different elliptically polarized light depending on the wavelength of light. Here, if the elliptically polarized light passes directly through the polarizing plate 31b on the emission side, a difference in the amount of transmitted light occurs depending on the wavelength of light, and the display color is colored.

For this reason, in order to remove the coloring caused by the birefringence of the display cell 29, a structure is provided in which a compensation cell 30 in which a liquid crystal 28b is sealed as an optically anisotropic material is provided between a pair of polarizing plates. .

By adopting such a structure, the display colors in the state where no voltage is applied to the liquid crystal 28a and the state where the selection voltage is applied are set to hues close to black and white, respectively.

Further, a structure is provided in which each pixel of the liquid crystal display device is provided with a color filter that separates light emitted from the backlight 32 into three primary colors of red, green and blue. By controlling the voltage applied to the liquid crystal 28a of each pixel, the amount of transmitted light is controlled to enable color display.

A red color filter 22 shown in FIG.
a, the green color filter 22b, and the blue color filter 22c are formed by dyeing a mordant layer of gelatin or the like for each color using a dye.

For example, a gelatin solution in which ammonium dichromate is added as a photosensitive agent for each of the red, green and blue color filters is applied to a glass substrate on which a light-shielding body is formed by a metal film such as chromium. Then, a color filter pattern is formed so as to cover the opening of the light-shielding body, and then dyed with a red dye, and a fixing process is performed for the purpose of preventing mixing with the color of the color filter to be formed next.

The same process is repeated, and red, green and blue color filters are formed by using red, green and blue dyes at the time of dyeing, respectively.

According to this method, in order to adjust the color density of the red, green and blue color filters so as to have predetermined spectral characteristics, the dyeability of the dye to gelatin differs for each color. The swelling amount of the film is not constant, and it is difficult to make the film thickness of the red, green, and blue color filters uniform.

For this reason, a step of 300 nm to 500 nm is generated for each of the red, green, and blue color filters.

Such a level difference of the color filter causes unevenness in the thickness of the liquid crystal layer between adjacent pixels of the liquid crystal display device. The transmittance was also non-uniform, which was a cause of lowering the display contrast.

For this reason, the purpose of uniformizing the thickness of the liquid crystal layer for each color of the color filter and the purpose of preventing dyes and the like contained in the color filter from contaminating the liquid crystal layer are to cure the liquid crystal layer with heat. The overcoat layer 23 is formed of a conductive resin.

Here, the overcoat layer 23 is used for the purpose of flattening the surface steps of the color filters in order to make the thickness of the display cell 29 uniform in the STN mode liquid crystal display device. Besides, the surface of the color filter is protected, and the transparent electrode 24 can be formed on the color filter via the overcoat layer 23.

For example, when indium tin oxide (hereinafter referred to as ITO) is formed directly on a color filter by using a vapor deposition means or a sputtering means, the ITO
Cracks were generated on the surface of the color filter due to heat and physical impact during film formation, and it was difficult to form a transparent electrode.

Therefore, the overcoat layer 2 is also used for protecting the surface of the color filter from heat and physical damage generated when forming a transparent conductive film such as ITO.
3 is needed.

[0026]

However, in order to form the overcoat layer and flatten the step of 300 nm to 500 nm generated on the surface of the color filter, the overcoat layer is formed with a thickness of 2 μm to 3 μm. There is a need. For this reason, there is a problem that the transmittance of the display cell in the visible light region is reduced.

FIG. 16 shows the transmittance of the overcoat layer in the visible light region when the overcoat layer 23 is formed to a thickness of 3.0 μm using an overcoat material made of a general thermosetting resin. 6 is a transmittance curve showing the following.

As shown in the graph of FIG. 16, the overcoat layer reduces the transmittance of light by approximately 10% to 20% over the visible light region.

[Object of the Invention] An object of the present invention is to solve the above-mentioned problems, improve the display quality and light use efficiency, and provide an inexpensive liquid crystal display device structure and a manufacturing method thereof. .

[0030]

In order to achieve the above object, a liquid crystal display device and a method of manufacturing the same according to the present invention employ the following means.

The liquid crystal display device of the present invention is a liquid crystal display device comprising a transparent electrode provided on a lower glass substrate, a light shield having an opening in the upper glass substrate, and a color filter provided in the opening. On the substrate, a light-shielding body made of an insulating material and red made of a photosensitive resin in which red, green, and blue coloring materials are dispersed in advance so as to cover openings of the light-shielding body,
It is characterized by having green and blue color filters and a transparent electrode made of a transparent conductive film on the color filters.

The liquid crystal display device of the present invention comprises a plurality of transparent electrodes provided on a lower glass substrate, a light shield provided with an opening in the upper glass substrate, a color filter provided in the opening of the light shield, and a plurality of color filters provided on the color filter. A liquid crystal display device having a transparent electrode, wherein the color filters have substantially the same thickness of red, green, and blue color filters corresponding to each pixel of the liquid crystal display device.

The method of manufacturing a liquid crystal display device according to the present invention comprises the steps of forming a light-shielding body with a heat-resistant and chemical-resistant photosensitive resin in which an insulating black colorant is dispersed on an upper glass substrate. The red, green, and blue color filters are made of a photosensitive resin that has both heat resistance and chemical resistance, in which red, green, and blue coloring materials are dispersed so as to cover the openings of the light shield. A step of forming substantially the same, a step of heat-treating the color filter, a step of forming a transparent conductive film on the color filter, a step of patterning the transparent conductive film to form a transparent electrode, Forming an alignment film on the lower glass substrate, forming a transparent electrode on the lower glass substrate, forming an alignment film on the transparent electrode, and performing a liquid crystal alignment process on the upper glass substrate or the lower glass substrate. Set the electrode spacing on the glass substrate A step of dispersing a spacer to be held, sealing the upper glass substrate and the lower glass substrate with the transparent electrode surfaces facing each other with a sealing material, and enclosing liquid crystal between the glass substrates in the sealing region. It is characterized by.

[Function] According to the present invention, in a liquid crystal display device in which a color filter is combined with a liquid crystal display cell to enable color display, the surface can be formed flat when the color filter is formed.

Further, since the photosensitive resin in which the coloring material used for the light shield and the color filter is dispersed has both heat resistance and chemical resistance, the transparent resin made of a transparent conductive film is directly formed on the light shield and the respective color filters. It has become possible to form electrodes.

By using the liquid crystal display device obtained as described above, the thickness of the liquid crystal layer corresponding to each color element of the color filter can be made uniform without interposing an overcoat layer on the color filter. It has become possible.

By using such a structure of the liquid crystal display device, it is possible to eliminate the absorption of light by the overcoat layer without deteriorating the display quality, and obtain the effect of improving the light use efficiency of the backlight. Was done.

Further, since a step of forming an overcoat layer is not required, the cost required for this step can be omitted.

[0039]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments for carrying out a liquid crystal display device and a method of manufacturing the same according to the present invention will be described below with reference to the drawings.

[Description of Structure: FIG. 1 and FIG. 2] First, referring to FIG. 1 and FIG.
The structure of the N-mode liquid crystal display device will be described, and then the manufacturing method that enables the structure of the liquid crystal display device of the present invention will be described.

FIG. 1 is a perspective view showing a liquid crystal display device of the present invention, and FIG. 2 is a sectional view showing a section taken along line AA of FIG.

1 and 2, a pair of polarizing plates 8
a and a polarizing plate 8b, a display cell 5 enabling color display, and two sheets held at a constant gap by a spacer 19b to optically correct coloring caused by birefringence of the display cell 5 Liquid crystal 18 in the gap between the glass substrates
and a backlight 6.

Upper glass substrate 1 constituting display cell 5
The light-shielding member 0 is provided with a light-shielding body 11 made of an insulator to prevent light from leaking from the transparent electrodes of the liquid crystal display device.

Further, in order to enable color display, a red color filter 12a, a green color filter 12b, and a blue color filter 12c are provided in the opening of the light shield 11, corresponding to the pixels of the liquid crystal display device. ing.

On the red color filter 12a, the green color filter 12b, the blue color filter 12c and the light shield 11, a transparent conductive film made of indium tin oxide (hereinafter referred to as ITO) for applying a voltage to the liquid crystal. Are provided, and an alignment film 16b on which alignment processing of liquid crystal is performed is formed on the transparent electrode 13.

Here, in the conventional liquid crystal display device, a transparent electrode is provided on a color filter via an insulating overcoat layer. Uses a metal film. However,
As shown in FIG. 2, in the liquid crystal display device of the present invention, since the transparent electrode 13 is provided directly on the light blocking member 11, the red color filter 12a, the green color filter 12b, and the blue color filter 12c without the interposition of the overcoat layer, When a light shield made of a film is provided, electrodes adjacent to the transparent electrode 13 are short-circuited. For this reason,
A light shield 11 which is an insulator is provided for the purpose of preventing a short circuit between the transparent electrodes.

The lower glass substrate 14 facing the upper glass substrate 10 has a plurality of transparent electrodes 15 also formed of ITO.
It has.

The transparent electrode 13 formed on the upper glass substrate 10 and the transparent electrode 1 formed on the lower glass substrate 14
An alignment film 16a for aligning the liquid crystal is formed on 5, and the alignment film 16a is also subjected to an alignment process so as to uniformly align the liquid crystal.

The upper glass substrate 10 and the lower glass substrate 14
The surfaces on which the transparent electrodes are formed face each other, and the periphery is sealed with a sealing material 17 so that the liquid crystal does not leak.

A spacer 19a for maintaining a gap between the substrates and a liquid crystal 18a for controlling the amount of transmitted light are sealed between the two glass substrates.

A driving IC 9a and a driving IC 9b for applying a voltage for driving the liquid crystal are connected to the transparent electrodes 13 and 15, respectively.

Here, the red color filter 12a, the green color filter 12b, and the blue color filter 12
c is red and red respectively so as to obtain a predetermined spectral characteristic when the thickness of each color filter is substantially the same.
A red color filter 12a and a green color filter 12a are formed using a photosensitive resin having both heat resistance and chemical resistance in which green and blue coloring materials are dispersed in an optimal amount in advance.
b, the blue color filters 12c are provided to have substantially the same thickness.

For example, when the red, green, and blue color filters are formed, predetermined spectral characteristics can be obtained, and the red, green, and blue color filters are formed so that the thicknesses of the respective color filters become substantially the same. A red color filter 12a, a green color filter 12b, and a blue color filter 12c are provided using a color filter base material in which the amount of the coloring material added and the mixing ratio of the photosensitive resin are adjusted.

A specific method of forming a color filter will be described in detail in the description of the manufacturing method.

By providing the same thickness of each color filter corresponding to the pixel of the liquid crystal display device in this way, the thickness of the liquid crystal layer of the display cell 5 is made almost uniform, and The amount of light transmission of the liquid crystal layer of the pixel corresponding to the green and blue color elements when the voltage is applied and when the voltage is not applied is the same for each color.

[Description of Manufacturing Method: FIGS. 3 to 13] Next, a manufacturing method for forming the structure of the liquid crystal display device according to the embodiment of the present invention will be specifically described with reference to FIGS. Will be described.

FIG. 3 is a plan view showing the upper glass substrate 10 on which the insulating light-shielding body 11 is formed, and FIG.
It is sectional drawing which shows the cross section in a line.

Black color resist CF manufactured by Tokyo Ohka Kogyo
PR-BK745S (trade name) is applied to the upper glass substrate 10 using a spin coater so as to have a thickness of 1.2 μm.

The upper glass substrate 10 is baked for 3 minutes on a hot plate heated to a temperature of 100 ° C. to improve the adhesion to the upper glass substrate.

Next, the upper glass substrate is cooled to room temperature,
Using an exposure apparatus using a high-pressure mercury lamp having an output of 3.5 kW as a light source, the light-shielding body pattern formed on the photomask is positioned at a predetermined position on the upper glass substrate 10,
Exposure processing is performed so that the exposure amount of light of 365 nm at the wavelength of light emitted from the light source of the exposure apparatus becomes 800 mJ / cm ² .

The upper glass substrate 10 is developed with an alkali developing solution, and the portion exposed to light becomes insoluble in the developing solution, and an insulating light-shielding body 11 is formed on the upper glass substrate 10.

The upper glass substrate 10 on which the light shield 11 is formed
Is calcined in a temperature range of 220 ° C. to 240 ° C. for 2 hours,
Along with heat-curing the black color resist constituting the light-shielding body 11, unreacted substances not involved in photo-curing and heat-curing with the substance contained in the black color resist are gasified,
Remove. The thickness of the light-shielding body 11 after firing is 1.0 μm.
m.

FIG. 5 is a plan view showing the upper glass substrate 10 in which the red color filter 12a is formed in the opening of the light shielding body 11, and FIG. 6 is a cross-sectional view taken along the line CC of FIG.

Red color resist V25 manufactured by Nippon Steel Chemical
9R (trade name) is applied to the light-shielding body 11 forming surface of the upper glass substrate 10 by spin coating so as to have a film thickness of 1.15 μm.

The upper glass substrate 10 is baked on a hot plate heated to a temperature of 100 ° C. for 3 minutes to improve the adhesion to the upper glass substrate.

Next, the upper glass substrate 10 is cooled to room temperature, and the color filter pattern formed on the photomask is transferred to the upper glass substrate 10 using an exposure apparatus using a high-pressure mercury lamp of 3.5 kW as a light source. The light-shielding body 11 is positioned at the position where the red color filter 12a is to be formed.

Next, the exposure amount of 365 nm light at the wavelength of light emitted from the light source of the exposure apparatus is 400 mJ / cm ^2.
Exposure processing is performed so that

The upper glass substrate 10 is developed with an alkali developing solution, the portion exposed to light is insoluble in the developing solution, and a red color filter 12a is formed at the opening of the light shield 11 on the upper glass substrate 10.

The upper glass substrate 10 on which the red color filter 12a is formed is baked for 2 hours in a temperature range of 220 ° C. to 240 ° C., and the red color resist constituting the red color filter 12a is thermally cured, and Unreacted substances not involved in photo-curing and heat-curing contained in the gas are gasified and removed. The thickness of the fired red color filter 12a was 1.0 μm.

FIG. 7 is a plan view showing the upper glass substrate 10 in which the green color filter 12b is formed in the opening of the light shield 11, and FIG. 8 is a cross-sectional view showing a cross section taken along line DD of FIG.

Similarly, a green color resist V259G (trade name) manufactured by Nippon Steel Chemical Co., Ltd.
1.15 μm using spin coating on the formation surface
It is applied so as to have a film thickness.

The upper glass substrate 10 is baked on a hot plate heated to a temperature of 100 ° C. for 3 minutes to improve the adhesion to the upper glass substrate.

Next, the upper glass substrate 10 is cooled to room temperature, and the color filter pattern formed on the photomask is applied to the upper glass substrate 10 using an exposure apparatus using a high-pressure mercury lamp of 3.5 kW output as a light source. The opening of the light shield 11 is positioned at a position where the green color filter 12b is formed.

Next, the exposure amount of light of 365 nm at the wavelength of light emitted from the light source of the exposure apparatus is 400 mJ / cm ^2.
Exposure processing is performed so that

The upper glass substrate 10 is developed with an alkali developing solution, the portion exposed to light is insoluble in the developing solution, and a green color filter 12b is formed at the opening of the light shielding body 11 on the upper glass substrate 10.

The upper glass substrate 10 on which the green color filter 12b is formed is baked for 2 hours in a temperature range of 220 ° C. to 240 ° C., and the green color resist constituting the green color filter 12b is thermally cured, and Unreacted substances not involved in photo-curing and heat-curing contained in the gas are gasified and removed. The thickness of the green color filter after firing was 0.98 μm.

FIG. 9 is a plan view showing the upper glass substrate 10 in which a blue color filter 12c is formed in the opening of the light shielding body 11, and FIG. 10 is a cross-sectional view showing a cross section taken along the line EE of FIG.

Similarly, a blue color resist V259B (trade name) manufactured by Nippon Steel Chemical Co., Ltd.
1.15 μm using spin coating on the formation surface
It is applied so as to have a film thickness.

The upper glass substrate 10 is baked on a hot plate heated to a temperature of 100 ° C. for 3 minutes to improve the adhesion to the upper glass substrate.

Next, the upper glass substrate 10 is cooled to room temperature, and the color filter pattern formed on the photomask is applied to the upper glass substrate 10 using an exposure apparatus using a high-pressure mercury lamp of 3.5 kW as a light source. It is positioned at the position where the blue color filter 12c is formed in the opening of the light shielding body 11.

Next, the exposure amount of the light of 365 nm at the wavelength of the light emitted from the light source of the exposure apparatus is 400 mJ / cm ^2.
Exposure processing is performed so that

The upper glass substrate 10 is developed with an alkali developing solution, and the portion exposed to light becomes insoluble in the developing solution, so that a blue color filter 12c is formed at the opening of the light shield 11 on the upper glass substrate 10.

The upper glass substrate 10 on which the blue color filter 12c is formed is baked at a temperature in the range of 220 ° C. to 240 ° C. for one hour, and the blue color resist constituting the blue color filter 12c is cured by heat. Unreacted substances not involved in photo-curing and heat-curing contained in the gas are gasified and removed. The thickness of the fired blue color filter was 1.01 μm.

FIG. 11 shows a light shield 11 and a red color filter 12 on the upper glass substrate 10 shown in FIGS.
3A is a drawing showing a step on the surface forming the green color filter 12b and the blue color filter 12c.
In FIG. 11, the vertical axis indicates the surface step, and the horizontal axis indicates the relative position of each color filter.

As shown in FIG. 11, by using the manufacturing method of the present invention, a red color filter 12a, a green color filter 12b, and a blue color filter 12c corresponding to the red, green, and blue pixels of the liquid crystal display device. Can be formed with substantially the same thickness.

9 and 10, the red color filter 12a and the green color filter 12b
The blue color filter 12c is provided for preventing light source light leakage due to misalignment with the light shielding body 11.
The end of the light shielding body 11 and the end of each color filter are formed to overlap. Therefore, as shown in FIG. 11, a projection is formed at an end of the color filter in a portion where the light shielding body and the color filter overlap. The surface steps of the projections reduce the thickness of the liquid crystal layer, which changes the transmittance characteristics when a voltage is applied to the liquid crystal in this area. However, most of the projections are covered with a light shielding body. Has little effect on display characteristics.

FIG. 12 shows a light-shielding body 11 and a red color filter 12a and a green color filter 1 formed in the opening thereof.
2b is a plan view showing an upper glass substrate in which a plurality of transparent electrodes made of ITO are formed on the blue color filter 12c, and FIG. 13 is a cross-sectional view showing a cross section taken along line FF of FIG.

The light shield 11 of the upper glass substrate 10, the red color filter 12a, and the green color filter 12b
And the surface on which the blue color filter 12c is formed, the silicon oxide (Si)
O ₂ ) film is formed with a thickness of 50 nm to 100 nm.

Next, an ITO film is formed on the silicon oxide (SiO ₂ ) film by using a sputtering method. At this time, the substrate temperature is set to 200 ° C., and the ITO film is formed so as to have a thickness of 320 nm. IT at this time
The sheet resistance of the O film was 4.5Ω □ to 6Ω □.

Next, a positive photoresist, for example, OFPR-800 (trade name) manufactured by Tokyo Ohka Co., Ltd. is applied on the ITO film by spin coating at a thickness of 1 μm, and hot photoresist heated to 90 ° C. Bake on plate for 1 minute.

Next, the upper glass substrate 10 is cooled to room temperature, and a plurality of electrode patterns formed on a photomask are transferred to the upper glass substrate using an exposure apparatus using a high-pressure mercury lamp of 3.5 kW as a light source. Align to 10 predetermined positions.

Next, exposure processing is performed so that the exposure amount of 365 nm light at the wavelength of light emitted from the light source of the exposure apparatus becomes 80 mJ / cm ² .

Thereafter, development processing was performed for 1 minute with a developing solution NMD-W (trade name) manufactured by Tokyo Ohka, and a plurality of electrodes were formed with a photoresist at predetermined positions on the ITO film formed on the upper glass substrate 10. Form a pattern.

The upper glass substrate 10 is heated in an oven heated to 120 ° C. for 30 minutes to improve the adhesion between the resist-formed electrode pattern and the ITO film.

Thereafter, using the resist pattern as an etching mask, the substrate is immersed in an ITO etching solution, for example, a mixed solution of hydrochloric acid and ferric chloride for 30 minutes to perform an etching process, thereby forming a plurality of transparent electrodes 13.

Thereafter, a resist stripper, for example, N-320 (trade name) manufactured by Nagase & Co., Ltd. is heated to a temperature of 50 ° C. and immersed for 20 minutes to strip and remove the photoresist on the transparent electrode.

FIG. 12 shows a plurality of transparent electrodes 1 made of ITO.
FIG. 13 is a perspective view showing a lower glass substrate 14 forming the substrate 5, and FIG. 13 is a sectional view showing a section taken along line EE in FIG.

On the lower glass substrate 14, an ITO film is formed similarly to the upper glass substrate 10, and a plurality of transparent electrodes 15 are formed in the same manner.

The upper glass substrate 10 thus formed
Then, a process of manufacturing a normal liquid crystal display panel, that is, a process of applying an alignment film for controlling the alignment of liquid crystal, and an alignment process by rubbing are performed on the lower glass substrate 14.

Next, in order to maintain a gap between the substrates on the alignment film surface of the upper glass substrate 10 or the lower glass substrate 14, a spacer 19 made of silica beads having a particle size of 5 μm is used.
Spray b.

Thereafter, the upper glass substrate 10 and the lower glass substrate 14 are bonded together with the sealing material 17 with the alignment film surfaces facing each other.

Thereafter, the display cell 20 can be completed through a liquid crystal injection step and an injection hole sealing step.

Thereafter, the connection wiring of the transparent electrode 13 and the transparent electrode 15 formed on each substrate of the display cell 5 and the output wiring of the scanning-side driving IC 21 and the signal-side driving IC 22 are connected by the COG method or the TAB method. And the liquid crystal display device of the present invention can be obtained.

The liquid crystal display device of the present invention uses the above-described ST.
It is not limited to only the N-mode liquid crystal display device,
Twisted structure in which a display cell with a color filter is arranged between two polarizing plates, and the amount of light transmitted is controlled using the optical rotation of the two polarizing plates and the liquid crystal to enable color display. Nematic mode (hereinafter T
Even when the liquid crystal display device is described as an N-mode), by using the display cell structure and the manufacturing method described above, the liquid crystal display device can be directly formed on the light blocking member and the color filter without providing an overcoat layer on the color filter. It is possible to provide a transparent electrode.

[0105]

As is clear from the above description, in the structure and the manufacturing method of the liquid crystal display device of the present invention, the liquid crystal display device of the STN mode which enables color display by combining a display cell with a color filter. Even so,
The surface can be formed flat when the color filter is formed, and the transparent electrode can be formed directly on the color filter.

In the display cell obtained as described above, there is no step for each color of the color filter, and the thickness of the liquid crystal layer corresponding to each color element of the color filter can be made uniform.

By using such a structure of the display cell, an overcoat layer is not required, so that there is no absorption of light by the overcoat layer, and the effect of improving the use efficiency of light source light of the liquid crystal display device can be obtained. Was.

Further, the liquid crystal display device of the present invention is not limited to the STN mode liquid crystal display device. Even if the liquid crystal display device is of the TN mode, a transparent electrode can be directly formed on a color filter. The same effect can be obtained because there is no need to form an overcoat layer.

Further, since the step of forming the overcoat layer is not required, the cost required for this step can be omitted.

[Brief description of the drawings]

FIG. 1 is a perspective view illustrating a structure of a liquid crystal display device according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view illustrating a structure of a liquid crystal display device according to an embodiment of the present invention.

FIG. 3 is a plan view illustrating the method for manufacturing the liquid crystal display device according to the embodiment of the present invention.

FIG. 4 is a cross-sectional view illustrating the method for manufacturing the liquid crystal display device according to the embodiment of the present invention.

FIG. 5 is a plan view illustrating the method for manufacturing the liquid crystal display device in the embodiment of the present invention.

FIG. 6 is a cross-sectional view illustrating the method for manufacturing the liquid crystal display device according to the embodiment of the present invention.

FIG. 7 is a plan view illustrating the method for manufacturing the liquid crystal display device in the embodiment of the present invention.

FIG. 8 is a cross-sectional view illustrating the method of manufacturing the liquid crystal display device according to the embodiment of the present invention.

FIG. 9 is a plan view illustrating the method for manufacturing the liquid crystal display device in the embodiment of the present invention.

FIG. 10 is a sectional view illustrating the method for manufacturing the liquid crystal display device according to the embodiment of the present invention.

FIG. 11 is a view showing a surface shape of a color filter which is a component of the liquid crystal display device according to the embodiment of the present invention.

FIG. 12 is a plan view illustrating the method for manufacturing the liquid crystal display device in the embodiment of the present invention.

FIG. 13 is a sectional view illustrating the method for manufacturing the liquid crystal display device according to the embodiment of the present invention.

FIG. 14 is a perspective view showing a structure of a liquid crystal display device according to the related art.

FIG. 15 is a cross-sectional view illustrating a structure of a liquid crystal display device according to the related art.

FIG. 16 is a diagram showing spectral characteristics of an overcoat layer which is a component of a liquid crystal display device according to a conventional technique.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Upper glass substrate 11 Shield 12a Red color filter 12b Green color filter 12c Blue color filter 13 Transparent electrode 14 Lower glass substrate 15 Transparent electrode

Claims (3)

[Claims] 1. A liquid crystal display device comprising: a transparent electrode provided on a lower glass substrate; a light shield having an opening in the upper glass substrate; and a color filter provided in the opening. A red, green, and blue color filter made of a photosensitive resin in which red, green, and blue coloring materials are dispersed in advance so as to cover the light-shielding body made of an insulator and the opening of the light-shielding body, respectively. A liquid crystal display device comprising: a transparent electrode made of a transparent conductive film. 2. A liquid crystal display device comprising: a transparent electrode provided on a lower glass substrate; a light shield having an opening in the upper glass substrate; a color filter provided in the opening of the light shield; and a transparent electrode provided on the color filter. Wherein the color filters correspond to each pixel of the liquid crystal display device, and the red, green, and blue color filters have substantially the same thickness. 3. A step of forming a light shield using a photosensitive resin in which an insulating black colorant is dispersed on an upper glass substrate, and a red, green, and blue colorant covering an opening of the light shield. Forming red, green, and blue color filters so that the film thicknesses thereof are substantially the same with photosensitive resin dispersed therein, heat treating the color filters, and forming a transparent conductive film on the color filters. Forming a transparent conductive film, forming a transparent electrode by patterning the transparent conductive film, forming an alignment film on the transparent electrode and performing a liquid crystal alignment process, forming a transparent electrode on the lower glass substrate, and forming a transparent electrode. Forming an alignment film on the electrodes and performing a liquid crystal alignment treatment; and dispersing spacers for maintaining the electrode spacing on the upper glass substrate or the lower glass substrate, thereby forming a transparent electrode surface between the upper glass substrate and the lower glass substrate. Face to face Method of manufacturing a liquid crystal display device comprising: the step of sealing by Lumpur material, characterized by a step of filling liquid crystal between glass substrates of the sealing region.