JP2999117B2 - Liquid crystal device and method of manufacturing the same - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal device used for various displays or optical information processing, and a method of manufacturing the same.

[0002]

2. Description of the Related Art Conventionally, liquid crystal devices have been used in various fields for display and optical information processing. This liquid crystal device has a configuration in which a liquid crystal layer is sandwiched between a pair of substrates on which electrodes are formed, and a minimum display unit called a pixel is regularly arranged. By applying a voltage to each of the pixels independently to change the optical characteristics of the liquid crystal constituting each pixel, images and characters are displayed. Among such liquid crystal devices, in an active matrix type color liquid crystal device used as a high-quality display device in particular, a plurality of pixel electrodes and a thin film transistor as a switching element connected to each pixel electrode are provided on one substrate. And a non-linear element array such as a diode. In addition, on the other substrate, a light-shielding film is formed by photolithography of a metal thin film on portions other than the pixels in order to prevent leakage of light from portions other than the pixels and to prevent changes in characteristics due to light irradiation of the nonlinear element. Is formed thereon, and a color filter containing dyes or pigments of red, blue, and green, which are the three primary colors of light in the additive color mixture system, is patterned thereon, and a counter electrode made of a transparent conductive film is formed thereon. are doing. A liquid crystal device has been manufactured by bonding these two substrates together.

[0003] As the color filter, 400 to
Of the 700 nm visible light, one that transmits at least 50%, preferably 80% or more of light in a specific wavelength region and absorbs light in other wavelength regions is required. As a method for forming this color filter, an electrodeposition method or a printing method may be used in addition to the method using photolithography, but the electrodeposition method or the printing method is advantageous in terms of price, but from the viewpoint of patterning accuracy and color purity. Since it is difficult to obtain a high-quality liquid crystal device, a method using photolithography is preferably used. The method for manufacturing these color filters is described in detail in, for example, a liquid crystal device handbook (edited by the 142nd Committee of the Japan Society for the Promotion of Science).

The light-shielding film is required to have a transmittance of at most 20%, preferably 10% or less in the entire wavelength region of visible light, and a metal film is generally used. However, when a metal film is used, the reflectance of light is large, and the display quality of the liquid crystal device is significantly reduced due to external light.
In some cases, a metal oxide film, a resin film in which a pigment or a dye is dispersed, or the like is used instead of the metal film.

[0005]

When one substrate on which the pixel electrode and the non-linear element are formed and the other substrate on which the light-shielding film and the color filter are formed are bonded together, a high-precision position is required. Matching technology is required. For this reason,
In a cost-effective method of simultaneously manufacturing a large number of display devices from a large substrate, considering the expansion and contraction of the substrate, the displacement of the pattern, and the accuracy of the bonding device, etc.
It is necessary to keep a margin of about ± 10 μm in a 0 cm square substrate. In this case, the aperture of the light-shielding film needs to be reduced by 10 μm in each of the upper, lower, left, and right sides with respect to the pixel electrode, and the aperture ratio of the display device has been significantly reduced.

In order to prevent this, there has been proposed a method of forming a light-shielding film on a substrate on which a non-linear element is formed. Also in this case, since the color filters are formed on the opposing substrates, it is necessary to perform alignment when the two substrates are bonded to each other. do it.
The aperture ratio of the display device is determined by the alignment accuracy of the light-shielding film and each pattern of the non-linear element forming side substrate and the patterning accuracy of the light-shielding film. Therefore, a significant improvement in the aperture ratio can be expected.

Since it is difficult to use a metal film having high conductivity as such a light-shielding film, a film in which a dye or a pigment is dispersed in a polymer resin binder is generally used. However, a light-shielding film made of a resin has a problem that a pinhole is relatively easily generated at the time of coating and patterning, and light is transmitted through a portion where the pinhole is generated. Further, in order to obtain sufficient color purity, the thickness of the color filter is required to be about 2 μm. However, there is a problem that the step in the display section on the substrate becomes large and the orientation of the liquid crystal is easily disturbed. Furthermore, since the light-shielding film is formed on the substrate on which the non-linear element is formed, there is a problem that a characteristic change occurs when the non-linear element is irradiated with light.

In order to solve such a problem, a method of forming a light-shielding film on the side of the counter substrate on which the color filter is formed may be considered. According to this method, it is possible to prevent a change in characteristics due to irradiation of the nonlinear element with light. However, in such a case, patterning must be performed four times for the three color filters, and the production process is complicated and the cost is high.

The present invention solves the above-mentioned conventional problems. The aperture ratio of a display device can be improved, the contrast is reduced by a pinhole in a light-shielding film, and the alignment of liquid crystal is disturbed by a step in a display portion on a substrate. It is an object of the present invention to provide a liquid crystal device and a method for manufacturing the liquid crystal device, which can prevent characteristics change due to irradiation of light to a nonlinear element, can further improve throughput, and can be manufactured at low cost.

[0010]

[Means for Solving the Problems] The liquid crystal device of the present invention
The liquid crystal layer is sandwiched between a pair of substrates with each pole formed
In a liquid crystal device in which a plurality of pixels are formed,
Both of which correspond to some of the pixels on one substrate
As shown in FIG.
One or more color filters that transmit 0% or more are island-shaped
On the substrate other than the island-shaped color filter forming portion
Part of the visible light, different from the specific wavelength region
Color filter that transmits 50% or more of light in a specific wavelength range
To surround the island-shaped color filter.
Formed to surround the island-shaped color filter
Specific color filter that transmits more than 50%
In the wavelength region, the island-shaped color filter transmits 50% or more.
Low visibility compared to the wavelength range
Thus, the above object is achieved.

[0011] In the liquid crystal device of the present invention, each electrode is formed.
The liquid crystal layer is sandwiched between the pair of substrates, and a plurality of pixels
In the formed liquid crystal device, on at least one substrate
In order to correspond to a part of the plurality of pixels,
Transmits at least 50% of light in a specific wavelength region among light rays
At least one type of color filter is provided in the form of an island,
Visible light is applied to the part on the substrate other than the color filter formation part.
Of the specific wavelength region different from the specific wavelength region,
A color filter that transmits 50% or more of light
Provided to surround the color filter,
Color filters formed at least in island shape
Luter has a light transmittance of 20 in the wavelength region of 430 nm or less.
% Or less, thereby achieving the above object.

[0012] In the method of manufacturing a liquid crystal device according to the present invention, the electrodes are
A liquid crystal layer is sandwiched between a pair of substrates formed respectively, and
Pixels are formed on at least one substrate.
Visible light rays to correspond to some of the pixels
That is, a color filter that transmits 50% or more of light in a specific wavelength region.
One or more types of filters are formed in an island shape, and the island-shaped color
-Apply visible light rays to the
That is, light of a specific wavelength range different from the specific wavelength range is
The color filter that transmits 50% or more is the island color
Manufacture of liquid crystal devices formed around filters
An island-shaped collar on at least one substrate
Forming a filter, and the island-shaped color filter
The island-shaped color filter is formed on the substrate on which
Apply color filter material to surround
Light from the surface of the substrate opposite to the color filter formation surface.
Patterning of color filters by irradiating
Performing the step of achieving the above object.
It is.

[0013]

[0014]

[0015]

[0016]

[0017]

[0018]

[0019]

[0020]

[0021]

[0022]

[0023]

[0024]

[0025]

In the liquid crystal device according to the present invention, at least one substrate is provided with a color that transmits 50% or more of light of a specific wavelength region in visible light so as to correspond to a part of a plurality of pixels. One or more types of filters are provided in an island shape. On a portion of the substrate other than the island-shaped color filter forming portion, light of a specific wavelength region different from the specific wavelength region of the
A color filter that transmits 0% or more is provided so as to surround the island-shaped color filter. For example, 3
When forming a color filter of a color, two colors are formed with a normal island pattern, and the remaining one color is formed so as to surround these island patterns. Even if the thickness of the
The step in the display portion on the substrate can be significantly reduced, and alignment disorder of the liquid crystal hardly occurs.

The color filters may be three color filters each transmitting 50% or more of red, blue and green, and may be colorless and transparent to make four colors. Colors such as cyan, magenta, and yellow may be used. Some of these colors can be formed in an island pattern, and one can be used as a color filter surrounding the island pattern. Colorless and transparent are considered to be one color, and a color filter of two or more colors can be formed. The above color filters are 50% each
There may be three or more types having different specific wavelength regions to be transmitted.

A color filter is formed on one substrate, and a light-shielding film having a light transmittance of 20% or less in a wavelength region of 400 nm or more and 700 nm or less is formed on a portion other than the pixels on the other substrate. Is also good. In this case, light leakage from a portion other than the pixel can be prevented.

A non-linear element for switching a plurality of pixels may be formed on at least one of the substrates. In this case, it is possible to adopt a configuration in which a non-linear element is formed on one substrate and a color filter is formed on the other substrate. Further, when a light-shielding film having a light transmittance of 20% or less in a wavelength region of 400 nm or more and 700 nm or less is formed in a portion other than the pixels on the substrate on which the nonlinear element is formed, light is shielded when the two substrates are aligned. Since there is no problem even if the opening of the film is enlarged, a significant improvement in the aperture ratio can be expected.

When a material having high conductivity is used for the light shielding film,
It is preferable that the conductivity of the light-shielding film is 10 ⁻³ Ωcm or less, because there is a possibility that a leak occurs between the pixel electrodes. As such a light-shielding film, a material in which a dye or a pigment is dispersed in a resin binder can be used.

The specific wavelength region in which the color filter formed so as to surround the island-shaped color filter transmits 50% or more has lower luminosity than the wavelength region in which the island-shaped color filter transmits 50% or more. It is desirable that For example, when three color filters of red, green, and blue are used, it is preferable that the color filter formed so as to surround the island-shaped color filter be a blue color filter. In this case, light leakage hardly occurs even if a pinhole occurs in the light shielding film,
A decrease in display contrast can be prevented. In this case, there is no need to form a light-shielding film on the side of the counter substrate on which the color filter is formed, so that the manufacturing process can be simplified and the cost can be reduced.

When a dye or a pigment is dispersed in a negative photoresist as a color filter,
The reliability can be improved.

When at least a color filter formed in an island shape having a sufficient light-shielding property with respect to a wavelength sensitive to a photoresist is used among the color filters, the back surface of the substrate (color By irradiating light from the surface opposite to the surface on which the filter is formed), a color filter surrounding the island pattern can be formed by self-alignment. As such a color filter, those having a light transmittance of 20% or less in a wavelength region of 430 nm or less can be used, and examples thereof include those containing an ultraviolet absorber. In addition, if the material of the color filter formed so as to surround the island-shaped pattern contains an ultraviolet absorber, it is possible to prevent a change in characteristics due to irradiation of the nonlinear element with light without forming a light shielding film. Can be.

[0033]

Embodiments of the present invention will be described below with reference to the drawings. In the following embodiments, an active matrix type liquid crystal device in which an amorphous silicon thin film transistor is formed as a switching element will be described. However, the present invention is not limited to this, and transistors using polysilicon, single crystal silicon, or other materials are used. The present invention can be applied to an active matrix type liquid crystal device having a nonlinear element such as a diode or a diode, and further to a simple matrix type liquid crystal device having no nonlinear element. Further, although three colors of red, green and blue are formed as the color filters, four colors may be added by adding colorless and transparent to the color filters, and other colors such as cyan, magenta and yellow may be used. Only some of these colors may be used, and colorless and transparent may be considered as one color, and two or more color filters may be formed.

Embodiment 1 FIG. 1 is a sectional view showing a liquid crystal device according to Embodiment 1 of the present invention. In FIG. 1, a liquid crystal 8 is sandwiched between a pair of substrates 4 and 5, and a TFT 6 and a pixel electrode 7 are provided on the substrate 5. On the substrate 4, red, green, and blue lights are provided at 50% or more, preferably 80%, so as to correspond to a part of the plurality of pixels.
%, A color filter (red) 9, a color filter (green) 10, and a color filter (blue) 11 are formed, and a counter electrode 12 made of a transparent conductive film is formed thereon. Alignment films 13 and 14 for controlling the alignment state of the liquid crystal 8 are formed on both substrates 4 and 5, and the gap between the substrates is made constant by spacers 15. The color filters 9, 10, and 11 are arranged as shown in FIG. 2 when viewed from the liquid crystal 8 side.

The production of this liquid crystal device can be performed as follows.

First, the color filter forming substrate will be described. An overcoat film (not shown) made of tantalum oxide, silicon oxide, silicon nitride, or the like is formed on a substrate 4 made of glass, resin, quartz, or the like, if necessary, and color filters 9, 10, 1
Form one.

As a material for forming the color filters 9, 10, and 11, a material obtained by adding a pigment or a dye to a resin can be used, but from the viewpoint of heat resistance, a material obtained by adding a pigment is used. Is preferred. Further, in order to simplify the manufacturing process, it is preferable to use a photosensitive resin. Since the color filter is formed inside the cell, the negative resin material shows better reliability than the positive resin at present.

Commercially available products such as color mosaic (product name: manufactured by Fuji Hunt Electronics Technology Co., Ltd.) can be used as such a color filter material. The formation of a color filter using a color mosaic can be performed as follows. First, a color mosaic is applied on a substrate by a spin coater, a bar coater, a roll coater or the like, and calcined at a temperature of about 80 ° C. for about 5 minutes, and then an oxygen barrier film made of polyvinyl alcohol or the like is applied and dried. This is exposed to ultraviolet light using a photomask of a predetermined pattern, and developed with a developing solution such as sodium hydrogen carbonate. After rinsing this with pure water, it is baked at a temperature of about 200 ° C. for about 30 minutes.

As other color filter materials,
A dry film type resist in which a film obtained by adding a pigment to a negative type resist, an oxygen barrier film, and a protective film are formed in a multilayer film may be used.

In addition to the above-described method using a photoresist, a color filter can be formed by other methods such as an electrodeposition method and a printing method, or a method combining these methods.
Any method may be used as long as sufficient patterning accuracy can be obtained.

In this embodiment, a glass substrate (trade name: # 70)
59: Corning Japan Co., Ltd.) 4, the color filter 9 of color mosaic CR (red) was formed in an island pattern, and the color filter 10 of color mosaic CG (green) was formed in an island pattern. . Thereafter, a color filter 11 of color mosaic CB (blue) was formed so as to surround these island-like patterns to obtain a color filter layer as shown in FIG. Here, a stripe pattern is formed, but a delta arrangement may be used. In addition, the shape of the color filter can be various shapes such as a circle, an ellipse, and a hexagon.

On top of that, ITO (Indium Tin)
Oxide) and the like were formed to form one substrate. Here, if necessary in terms of flatness on the color filter and adhesion to the counter electrode 12, a protective film (not shown) made of acrylic or polyimide is provided between the color filter and the counter electrode 12.
May be formed.

Next, the substrate on the pixel electrode 7 and TFT 6 formation side will be described. Tantalum or the like was deposited on a glass substrate (# 7059: manufactured by Corning Japan KK) 5 by sputtering, and this was patterned by photolithography to form a gate electrode. Further, silicon nitride was deposited by a CVD method to form a gate insulating film. Subsequently, the amorphous silicon film and n ⁺ −
An amorphous silicon film was formed by a CVD method, and was patterned by photolithography to form a semiconductor layer. Thereafter, titanium was deposited by sputtering, and this was patterned by photolithography to form a source electrode and a drain electrode. Thus, the TFT 6 for switching the pixel electrode 7 is formed.

Next, a pixel electrode 7 was formed by depositing ITO by sputtering and patterning it by photolithography. A protective film (not shown) made of silicon nitride, silicon oxide, or the like may be formed thereon as needed.

Here, general examples of materials, manufacturing methods, and the like have been described, but the present invention is not limited to these. For example, materials such as molybdenum, aluminum, chromium, copper, and ITO can be used for the electrodes such as the gate electrode, the source electrode, and the drain electrode in addition to the above-described materials. May be used. For the gate insulating film, a material such as silicon oxide or tantalum pentoxide can be used.
A method such as application of a solution, baking, or anodic oxidation may be used. The pixel electrode 7 and the counter electrode 12 may be formed using a material such as tin oxide.

Liquid crystal alignment films 13 and 14 made of polyimide were formed on the two substrates formed as described above, and were subjected to an alignment treatment in a predetermined direction by a rubbing method, and the surfaces were treated with pure water. Further, spacers were sprayed on the substrates, and the periphery of the screen was sealed, and the two substrates were bonded. Thereafter, the liquid crystal 8 was injected into the gap between the substrates, the injection port was sealed, and baked to obtain a liquid crystal cell. By combining this liquid crystal cell with a polarizing plate, a liquid crystal driving driver, a driving circuit and a power supply, a twisted nematic liquid crystal device was obtained. Here, as the liquid crystal display mode, other display modes such as a super-twisted nematic type, a field-effect birefringence type, a guest-host type, a polymer dispersion type, and a copper-like scattering type may be used in addition to the twisted nematic type. In that case, a liquid crystal alignment film, alignment treatment, a polarizing plate, and the like may not be required.

In the obtained liquid crystal device, when forming the three color filters 9, 10, and 11, two colors are formed in an island pattern, and the remaining one color is formed so as to surround these island patterns. As a result, even if the thickness of the color filter layer was set to about 2 μm in order to obtain sufficient color purity, the step in the display portion on the substrate could be significantly reduced, and alignment disorder of the liquid crystal was hardly generated. For this reason, there is no need to form a light-shielding film on the color filter formation side substrate 4, and the manufacturing process can be simplified and the cost can be reduced. As the color filters 9, 10, and 11 were used, in which a dye or a pigment was dispersed in a negative photoresist, the reliability was improved.

(Embodiment 2) In this embodiment 2, a substrate 5 on which a TFT 6 and a pixel electrode 7 are formed in the same manner as in the embodiment 1
The transmittance of light in the wavelength region of 400 nm or more and 700 nm or less is 20% or less, preferably 10% or less, in a region other than the pixel electrode in the upper region where light needs to be shielded, for example, a screen region.
% Or less. At this time, in consideration of the alignment margin between the two substrates, the light-shielding film forms the pixel electrodes 2 to 3
It may be formed so as to cover about μm.

As a material of such a light shielding film, a metal,
A metal oxide, carbon, a resin in which a dye or a pigment is dispersed, or the like can be used, but the conductivity of the light-shielding film needs to be 10 ⁻³ Ωcm or less in order to avoid leakage between pixel electrodes. . Therefore, it is desirable to use a resin in which a dye or pigment is dispersed. As such a material, for example, Color Mosaic CK2000 (trade name: Fuji Hunt Electronics Technology Co., Ltd.)
Commercially available products. The formation of this light-shielding film can be performed by a method using a photoresist in the same manner as the formation of a color filter using a color mosaic, and furthermore, other methods such as an electrodeposition method and a printing method,
Alternatively, any combination of these methods may be used as long as sufficient patterning accuracy is obtained.

In this embodiment, as in the first embodiment, T
After forming the FT 6 and the pixel electrode 7, the color mosaic CK
Was used to form a light-shielding film to form one substrate. This substrate was combined with the other substrate on which a color filter was formed in the same manner as in Example 1, and a liquid crystal device was manufactured in the same manner as in Example 1. In this embodiment, the color filters 9, 10, 11 and the openings of the light-shielding film (portions indicated by dotted lines)
Are arranged in a pattern as shown in FIG.

In the second embodiment, since a light-shielding film is formed on a portion other than the pixel on the TFT forming side substrate, a portion where the light-shielding film covers the pixel electrode is required to be two to two when aligning the two substrates.
There was no problem even if the aperture of the light-shielding film was increased to about 3 μm, and the aperture ratio could be greatly improved. Since a resin in which a dye or a pigment was dispersed was used as the light-shielding film, the conductivity of the light-shielding film could be made 10 ⁻³ Ωcm or less, and leakage between pixel electrodes could be prevented.

The specific wavelength region (blue) where the color filter 11 formed so as to surround the island-shaped color filter transmits 50% or more (blue) is the wavelength region where the island-shaped color filters 9 and 10 transmit 50% or more (blue). (Red, green) as compared with (red, green), light leakage hardly occurs even if a pinhole is formed in the light shielding film, and a decrease in display contrast was prevented. Also in this case, since it is not necessary to form a light-shielding film on the color filter forming side substrate 4, the manufacturing process can be simplified and the cost can be reduced.

Example 3 In Example 3, a color filter material in which a dye or pigment was dispersed in a negative photoresist was used.
10 is the wavelength to which the photoresist is sensitive (for example, 43
A material having a sufficient light-shielding property (for example, a light transmittance of 20% or less) with respect to a wavelength region of 0 nm or less was formed.

As such an island-shaped color filter material, for example, a material mixed with an ultraviolet absorbent can be used. Island color filters 9 and 10 are formed on the substrate 4 using the color filter material mixed with the ultraviolet absorber, and the material of the color filter 11 formed so as to surround the island pattern is applied thereon. Exposure and development are performed from the back surface of the substrate (the side opposite to the color filter forming side). At this time, the upper portions of the island-shaped color filters 9 and 10 are removed because they are not exposed, and a color filter layer similar to that of the first embodiment can be formed by self-alignment.

Here, the color mosaic CR and CG
(Product name: Fuji Hunt Electronics Technology Co., Ltd.) 40% by weight of zinc oxide as an ultraviolet absorber
The mixed material was patterned into an island shape in the same manner as in Example 1, and a color mosaic CB (product name: manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was applied thereon and exposed from the back surface of the substrate. By firing, the same color filter layer as in Example 1 could be formed at high throughput and at low cost.

At this time, if the material of the color filter 11 formed so as to surround the island pattern contains an ultraviolet absorber, it is possible to prevent the TFT 6 from being irradiated with light without forming a light shielding film. And no characteristic change occurred.

[0057]

As described above, according to the present invention, it is possible to obtain a liquid crystal device in which the step in the display portion on the substrate is extremely reduced and the liquid crystal alignment state is excellent and the display quality is excellent. Since it is not necessary to provide a light-shielding film on the color filter formation side substrate, the manufacturing process can be simplified and the cost can be reduced.

When a light-shielding film is provided on a substrate facing the color filter-forming side substrate, light leakage hardly occurs even if a pinhole is formed in the light-shielding film, so that a reduction in display contrast can be prevented. When a nonlinear element is formed on the substrate facing the color filter formation side,
By forming a light-shielding film on the non-linear element forming side substrate, the aperture ratio can be greatly improved. If a material having low conductivity is used as the light-shielding film, leakage between pixel electrodes can be prevented.

Further, when a color filter in which a dye or a pigment is dispersed in a negative photoresist is used, the reliability can be improved. In addition, when a color filter having at least a light-shielding property with respect to a wavelength sensitive to a photoresist is used as a color filter formed in an island shape, a color filter surrounding the island pattern is formed by self-alignment. Thus, a color filter layer can be obtained at high throughput and at low cost. Furthermore, if the material of the color filter formed so as to surround the island-shaped pattern contains an ultraviolet absorber, it is possible to prevent a characteristic change due to light irradiation on the nonlinear element without forming a light shielding film. Can be.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating a main part of a liquid crystal device according to a first embodiment of the present invention.

FIG. 2 is a plan view illustrating a color filter in the liquid crystal device according to the first embodiment of the present invention.

FIG. 3 is a plan view illustrating a color filter in a liquid crystal device according to a second embodiment of the present invention.

[Explanation of symbols]

 4, 5 Substrate 6 TFT 7 Pixel electrode 8 Liquid crystal 9, 10, 11 Color filter 12 Counter electrode 13, 14 Liquid crystal alignment film 15 Spacer

Claims (3)

(57) [Claims] (1) Between a pair of substrates on which electrodes are respectively formed
Liquid crystal device in which a plurality of pixels are formed with a liquid crystal layer sandwiched between
At A part of the plurality of pixels on at least one substrate;
Corresponding to the specific wavelength range of visible light
One or more color filters that transmit 50% or more of light
Are provided in the shape of an island, and the portions other than the island-shaped color filter forming portion
In the portion on the substrate, of the visible light, the specific wavelength region is
Color that transmits 50% or more of light of different specific wavelength range
Filter so as to surround the island-shaped color filter
Provided so as to surround the island-shaped color filter.
Features that the formed color filter transmits more than 50%
In the constant wavelength region, the island-shaped color filter is 50% or less.
It has low visibility compared to the wavelength range of transmission
Liquid crystal devices. (2) Between a pair of substrates on which electrodes are respectively formed
Liquid crystal device in which a plurality of pixels are formed with a liquid crystal layer sandwiched between
At A part of the plurality of pixels on at least one substrate;
Corresponding to the specific wavelength range of visible light
One or more color filters that transmit 50% or more of light
Are provided in the shape of an island, and the portions other than the island-shaped color filter forming portion
In the portion on the substrate, of the visible light, the specific wavelength region is
Color that transmits 50% or more of light of different specific wavelength range
Filter so as to surround the island-shaped color filter
And at least an island-like color filter is provided.
The color filter formed on the
A liquid crystal device having a long-range light transmittance of 20% or less. (3) Between a pair of substrates on which electrodes are respectively formed
The liquid crystal layer is interposed to form a plurality of pixels, at least
Also correspond to a part of the plurality of pixels on one substrate.
As described above, light of a specific wavelength
More than one type of color filter that transmits at least
Substrate formed other than the island-shaped color filter forming portion
In the upper part, visible light that is different from the specific wavelength
Color filter that transmits 50% or more of light in a specific wavelength region
Luther surrounds the island-shaped color filter.
A method for manufacturing a liquid crystal device, comprising: Form an island-shaped color filter on at least one substrate
The process of On the substrate on which the island-shaped color filters are formed,
Color filter Color to surround the
Apply the filter material and use the color filter
By irradiating light from the surface opposite to the
Patterning the filter.
Production method.