JP2000107671A - Method for making chemical coating film thickness uniform, device for enbodying this method and chemical coating applicator including this device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To uniform the nonuniform thickness of a chemical film by the pressure of an air current by spraying this air current to the nonuniform surface of the coating film of the chemical applied on the smooth surface of a substrate. SOLUTION: This device 1 for uniforming the thickness of a chemical coating film has a substrate holder 2 which holds a substrate W previously coated with the chemical at a prescribed film thickness on the smooth surface and an air current generator which uniforms the film thickness of the coating film R of the chemical in an undried state by spraying the air current under prescribed pressure to the surface of the substrate W while the coating film R on the substrate is stilled undried. The device described above comprises a drive assembly 4 which relatively moves the substrate holder 2 and the air current generator in order to uniform spray the air current to the surface of a chemical coating film R in the undried state from its one end toward the other end.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a film of a chemical such as a photoresist or a fluorescent chemical applied on a smooth surface of a substrate, particularly a large-area substrate such as a flat panel display, with a highly uniform thickness. The present invention relates to a method for uniforming a coating thickness of a chemical solution, a device for implementing the method, and a chemical solution coating device including the device.

[0002]

2. Description of the Related Art At present, the screen size of a television receiver has been increased to 42 inches or 50 inches. As a television image display capable of realizing such a large screen, LCD (Liquid Crystal Display), P
ALC (Plasma Addressed Liquid Crystal Display),
PDP (Plasma Display Panel), FED (FieldEmisso)
n Display). When manufacturing a large screen constituting a large television image display such as these, for a transparent electrode on a smooth finished surface of a substrate such as glass, for color filters, various photoresists such as for sandblasting, It is necessary to apply a chemical solution such as a glass paste or a conductive paste in a uniform film thickness.
For example, if the coating film thickness of the color resist is not a predetermined film thickness but is non-uniform, the resulting color unevenness appears, and the large-sized television image display is rejected as a defective product.

[0003] As a conventional method of applying a chemical solution, there are a spin coating method, an extrusion coating method, a wire bar coating method, and the like.
There is an application method using a squeegee.

First, in the above-mentioned spin coating method, a substrate on which a chemical is to be uniformly applied is rotated at a high speed while maintaining a horizontal state, and the chemical is dropped on the surface of the rotating substrate. This is a coating method for uniformly applying a chemical solution dropped by the centrifugal force of the substrate to the surface of the substrate.

Next, the extrusion coating method is performed by an extrusion coating device 8 as shown in the principle diagram in FIG. That is, the extrusion coating device 8 has an orifice 80 at the center.
The ejection head 801 on which the ejection head 2 is formed and the ejection head 8
A pump (not shown) for pushing out the chemical solution R in the orifice 802 from the tip of the orifice 802, and the like.
The width of the ejection head 801 is a length corresponding to the width of the substrate W on which the chemical liquid R is to be applied. In this method, the substrate W to be coated with the chemical R is supplied below the tip of the orifice 802, and a certain amount of the chemical R is extruded by a pump and applied to the surface of the substrate W.

Next, the wire bar coating method will be described.
This method is performed by a wire bar coating device 9 as shown in the principle diagram in FIG. That is, the wire bar coating device 9
Is a pan 901 filled with the chemical solution R and a rotating shaft 902.
And a wire bar 904 composed of a thin wire 903 spirally wound around the outer peripheral surface of the wire bar 904.
The substrate is rotated while being immersed in the wire bar 904. The substrate W is pressed against the upper surface of the wire bar 904 by a pressing roller 905 rotating in the direction of arrow R while passing the substrate W in contact therewith. This is a coating method for coating on the surface of the substrate.

The application method using the squeegee is a coating method in which a chemical is dropped on the surface of the substrate and the chemical is applied over the entire surface of the substrate with the squeegee.

[0008]

According to the spin coating method, a thin film having a relatively uniform film thickness can be formed when a substrate is relatively small and a disk is used as in a semiconductor wafer. Even with a substrate having such a shape, when the substrate is rotated at a high speed, a part of the chemical solution scatters from the peripheral portion of the substrate, or the chemical solution becomes fine droplets and floats in the substrate rotating portion of the spin coating device, and Re-adhere to the top or formed coating film. Such a re-adhesion of the chemical solution increases the thickness of the coating film, and also causes unevenness of the coating by causing the droplets to adhere to the curing film while moving.

This type of coating unevenness is disclosed in, for example,
139364 "Resist coating apparatus", JP-A-2-60
121 "Semiconductor substrate coating apparatus"
As described in 19213 “Resist Coating Apparatus”, the upper part of a rotating head that rotates at high speed while fixing a substrate is
Closely cover with a covering member (plate or cylinder) having an opposing surface larger than the substrate area on the rotating head, and rotate or fix in synchronization with the rotation of the rotating head, and between the substrate and the covering member. Some measures are taken to stabilize the airflow of the liquid and prevent the scattered chemical solution or the chemical liquid droplets from re-adhering to the coating film.

However, even if the coating unevenness as described above can be eliminated, the thickness of the coating film in the spin coating method is as follows:
Since the centrifugal force is used as described above, the substrate is thin at the center of rotation of the substrate and thick at the outer periphery, and is still slightly different. Similarly, when the substrate is a quadrilateral and its size is, for example, about 550 mm × 650 mm or more, coating unevenness occurs at a corner portion of the substrate. This is because the spin coating method uses the centrifugal force as described above, so that more chemical solution is spattered at corners where the distance from the center of rotation is large. Also,
The spin coating method has a drawback that a large amount of a chemical solution is required, and a large amount of the chemical solution must be discarded.

In the extrusion coating method, the width of the discharge head 801 is set to a length corresponding to the width of the substrate W to which the chemical R is to be applied. However, when the size of the substrate W is increased, the width of the discharge head 801 is reduced. Also need to be longer. Otherwise, it must be applied several times in the width direction of the substrate W. This divisional coating needs to be repeated at the divisional portions, and uneven coating occurs at the portions where the coatings overlap. Therefore, in order to remove the coating unevenness, it is necessary to increase the width of the ejection head 801 as described above. However, when the width of the ejection head 801 is increased, the chemical R is discharged from the ejection head 801 by a pump. It becomes difficult to uniformly supply the ink to the entire orifice 802, and new coating unevenness occurs. In addition, variations in the width T of the orifice 802 in the width direction of the ejection head 801 and pulsation of the pump also cause uneven application.

Further, in the wire bar coating method, since the chemical solution R pumped between the wires 903 is applied to the surface of the substrate W, coating unevenness (wire streaks) occurs according to the wire pitch. This streak-like coating unevenness is slightly improved by the surface tension of the chemical solution R only by being left naturally, but still remains, and when the size of the substrate W is large, the substrate W and the wire bar 904 are always kept uniform. It is difficult to make the contact with the coating, so that uneven coating occurs.

The coating method using the squeegee uses a chemical solution R attached to the squeegee when the size of the substrate W is large.
There is a problem in using this method because the influence of As described above, each application method has its own problems.

The present invention is intended to solve these problems, and any of the above-mentioned coating methods for applying a chemical solution to a large-sized substrate does not cause airflow on the surface of the applied thin film. To obtain a chemical solution coating film thickness uniforming method capable of making the thickness of the thin film uniform by spraying, a device for embodying the method, and a chemical solution coating device equipped with the device. It is.

[0015]

In order to solve the above-mentioned problem, a method for making a chemical solution coating film thickness uniform according to the first aspect of the present invention provides a method for coating a chemical solution film applied on a smooth surface of a substrate. An airflow is blown onto a uniform surface, and the uneven thickness of the chemical liquid film is made uniform by the pressure of the airflow.

In addition, according to a second aspect of the present invention, there is provided an apparatus for uniformizing a thickness of a chemical solution applied, comprising: a substrate holding means for holding a substrate having a predetermined surface coated with a chemical solution on a smooth surface; An airflow generating means for blowing an airflow under a predetermined pressure to a surface of the chemical liquid coating film on the substrate while the chemical liquid coating film on the substrate is in an undried state, thereby making the thickness of the undried chemical liquid coating film uniform And, the surface of the chemical coating film in the undried state,
In order to uniformly blow the airflow from one end to the other end, the airflow generator is characterized by comprising a driving means for relatively moving the substrate holding means and the airflow generation means.

Further, the apparatus for uniformizing the thickness of a chemical solution applied according to a third aspect of the present invention includes a substrate holding means for holding a substrate having a smooth surface coated with a chemical solution in a predetermined thickness in advance. A gas generating means for blowing an air stream under a predetermined pressure against the surface of the chemical liquid coating film on the substrate while the chemical liquid coating film is in an undried state, to thereby make the coating film thickness of the undried chemical liquid uniform; A driving means for relatively moving the substrate holding means and the airflow generating means so as to uniformly spray the airflow over one end of the surface of the chemical liquid coating film in an undried state from the one end thereof; And, before the airflow generated by the airflow generating means sprays the surface of the chemical coating film, a film thickness measuring means for measuring the film thickness of the chemical coating film,
An interval control unit that moves the airflow generating unit up and down with respect to the surface of the chemical coating film on the substrate to adjust an interval between the airflow generating unit and the surface of the chemical coating film; According to the measurement data of the degree of non-uniformity of the film thickness measured by the measuring means, controlling the blowing pressure of the airflow of the airflow generating means, acting on the interval control means to control the interval, or to the drive means And a main control means for controlling a relative moving speed between the substrate holding means and the airflow generating means.

Further, the apparatus for uniformizing the thickness of a chemical solution applied according to a fourth aspect of the present invention is a substrate holding means for holding a substrate having a smooth surface coated with a predetermined thickness of a chemical solution in advance. An airflow generating means for spraying an airflow under a predetermined pressure on the surface of the chemical liquid coating film on the substrate while the chemical liquid coating film is in an undried state, thereby making a coating film thickness of the undried chemical liquid uniform; A driving means for relatively moving the substrate holding means and the airflow generating means so as to uniformly spray the airflow over one end of the surface of the chemical liquid coating film in an undried state from the one end thereof; And a solution viscosity measuring means for measuring and measuring the viscosity of the solution, and for adjusting an interval between the gas flow generating means and the surface of the solution coating film, the gas flow generating means is provided on the surface of the solution coating film on the substrate. Interval to move up and down with respect to Controlling means, in accordance with the measurement data of the chemical viscosity measured by the chemical viscosity measuring means, controls the blowing pressure of the airflow of the airflow generating means, controls the interval by acting on the interval control means, or the It is characterized by comprising a main control means acting on a driving means and controlling a relative moving speed between the substrate holding means and the airflow generating means.

Further, the apparatus for uniformizing the thickness of a chemical solution applied according to claim 5 of the present invention is further characterized by claims 2 to 4.
Wherein the airflow generating means is constituted by a rotating body. Further, in the apparatus for uniformizing the thickness of the applied chemical solution according to claim 6 of the present invention, the rotating body according to claim 5 is a cylindrical body or a cylindrical body. Furthermore, in the apparatus for uniformizing the thickness of a chemical solution applied according to claim 7 of the present invention, the rotating body according to claim 6 has a plurality of annular grooves formed on an outer peripheral surface thereof. It is characterized by the following. Further still, claim 8 of the present invention
In the apparatus for uniformizing the thickness of a chemical solution applied according to the above aspect, the rotating body according to the sixth aspect has a plurality of concave grooves formed in the rotation axis direction over the entire outer peripheral surface thereof. And According to a ninth aspect of the present invention, there is provided a chemical solution applying apparatus including the chemical solution applying film thickness uniforming device according to the second aspect. And yet again
According to a tenth aspect of the present invention, there is provided a chemical solution applying apparatus.
A uniforming device for uniforming the thickness of the applied chemical solution described in (1). Furthermore, a chemical solution applying device according to claim 11 of the present invention is characterized by including the chemical solution coating film thickness uniforming device according to claim 4.

Therefore, according to the method for uniformizing the thickness of a chemical solution applied according to the first aspect of the present invention, the thickness of the chemical solution is made uniform over the entire surface of the chemical solution coating film without contacting the coating film surface. be able to. Further, according to the apparatus for uniformizing the thickness of a chemical solution applied according to claim 2 of the present invention, the surface of the chemical solution applied to the surface of the substrate is moved while relatively moving the substrate and the airflow generating device. The film thickness can be made uniform uniformly without contacting the coating film surface over the entire surface. Further, according to the chemical solution coating film thickness uniforming apparatus according to claim 3 of the present invention, an air current is blown onto the coating film surface in a non-contact manner, and the nonuniformity of the film thickness measured by the film thickness measuring means is measured. The thickness of the coating film can be made finer and uniform according to the measurement data. Furthermore, according to the chemical solution coating film thickness uniforming apparatus according to claim 4 of the present invention, an air current is blown to the coating film surface in a non-contact manner, and according to the measurement data of the chemical solution viscosity measured by the chemical solution viscosity measuring means. Thus, the thickness of the coating film on the substrate can be made finer and uniform. Further, according to the chemical liquid coating film thickness uniforming apparatus according to claim 5 of the present invention, the gas flow generating means is constituted by a rotating body, so that uniform gas rectification can be generated. The thickness of the coating film on the substrate can be made finer and uniform. Further, according to the apparatus for uniformizing the thickness of a chemical solution applied according to claim 6 of the present invention, the airflow generating means is constituted by a columnar or cylindrical rotating body, so that it extends from one end to the other end of the substrate. A uniform gas rectification can be sequentially generated, and the thickness of the coating film on the substrate can be made finer and uniform. Further, according to the apparatus for uniformizing the thickness of a chemical solution applied according to claim 7 of the present invention, a plurality of annular grooves are formed on the outer peripheral surface of a cylindrical or cylindrical rotating body by using an airflow generating means. By doing so, the rectification of the gas having a strong or weak pressure can be generated, and the coating film on the substrate can be made finer and more uniform in accordance with the unevenness of the film thickness. Furthermore, according to the apparatus for uniformizing the thickness of a chemical solution applied according to claim 8 of the present invention, the rotation axis direction is formed over the entire outer peripheral surface of a cylindrical or cylindrical rotating body as an airflow generating means. By forming a plurality of concave grooves, a uniform airflow with a larger air volume can be generated, and the thickness of the coating film on the substrate can be made finer and uniform. According to a ninth aspect of the present invention, a chemical solution is applied to a substrate by providing the chemical solution coating film thickness uniforming device according to the second aspect. Since the airflow can be blown to the coating film surface in the undried state immediately after the formation of the film, the film thickness can be more quickly made uniform. And yet again
According to the chemical liquid applying apparatus according to claim 10 of the present invention, the chemical liquid is applied to the substrate by providing the chemical liquid applying film thickness uniforming apparatus according to claim 3, thereby forming a coating film. The measurement data obtained by measuring the film thickness of the coating film in the immediately after undried state can control the pressure of the airflow blown to the coating film surface, so that the film can be more quickly and finely formed. The thickness can be made uniform. Furthermore, according to the chemical solution coating device of the present invention, the chemical solution is coated on the substrate by providing the chemical solution coating film thickness uniforming device according to the fourth aspect. Since the pressure of the airflow blown in a non-contact manner to the coating film surface in the undried state immediately after the formation can be controlled according to the measurement data of the chemical viscosity measured by the chemical viscosity measuring means, more quickly, and The film thickness can be finely made uniform.

[0021]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to the drawings, an apparatus for uniformizing the thickness of a chemical solution applied according to an embodiment of the present invention will now be described with reference to a photo-coating method applied to a smooth surface of a large-area substrate such as a flat panel display. An example in which a coating film having uneven coating of a chemical such as a resist is finished to a highly uniform film thickness will be described.

FIG. 1 is a front view of an apparatus for uniforming the thickness of a chemical solution applied according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line AA of the apparatus for uniforming the thickness of a chemical applied film shown in FIG. 3 is FIG.
FIG. 4 is a system block diagram of a control unit of the chemical solution coating film thickness uniforming device shown in FIG. 4. FIG. 4 is a diagram showing a first embodiment which is a main component of the chemical solution coating film thickness uniforming device shown in FIGS. FIG. 5 is a side view of the airflow generating means according to the second embodiment, which is a main component of the apparatus for uniformizing the thickness of the applied chemical solution shown in FIGS. 1 and 2, and FIG. 3A and 3B show the air flow generating means of the third embodiment, which is a main component of the chemical liquid coating film thickness uniforming apparatus shown in FIGS. 1 and 2; FIG. 3 is a cross-sectional view taken along line AA of FIG.

First, the configuration will be described. In FIGS. 1 and 2, reference numeral 1 indicates an apparatus for uniforming a thickness of a chemical solution applied according to an embodiment of the present invention. The chemical liquid coating film thickness uniforming device 1 has a structure mounted on a chemical liquid coating device 8. However, FIGS. 1 and 2 mainly show the apparatus 1 for uniforming the thickness of the applied chemical solution. The chemical liquid coating film thickness uniforming device 1 includes a substrate holding device 2, an airflow generating device 3,
It comprises a driving device 4, a film thickness measuring device 5, an interval control device 6, and a main control device 7.

The substrate holding device 2 holds a substrate W having a smooth surface coated with a chemical solution in a predetermined film thickness in a horizontal state, and holds the substrate W in a predetermined direction, for example, in the X-axis direction in the holding state. A base 201 fixed on a gantry 101 via an air spring 102.
Is formed on the basis of. On the upper surface of this base 201,
A pair of parallel X-axis linear rails 202 and 203 having a length substantially equal to the entire length of the base 201 are fixed at a predetermined interval, and a guide 204 that can slide on these X-axis linear rails 202 and 203 is provided. The substrate table 206 is mounted so as to be able to move in the X-axis direction via the 205. An X-axis ball screw nut (not shown) is incorporated in the substrate table 206, and the X-axis ball screw 207 is connected to the X-axis ball screw nut in a screwed state. The rotation is performed by rotating the shaft ball screw 207. X axis ball screw 20
Numeral 7 is disposed in the X-axis direction in a horizontal state, and both ends thereof are rotatably supported by bearings of bearing cases 208 and 209 fixed vertically on the base 201.

An X-axis drive motor 401, which is a component of the drive unit 4, has an L-shaped angle 4 at the other end of the base 201.
The rotating shaft is connected to one end of the X-axis ball screw 207 via a coupling 402. The rotational driving force of the reversible rotation of the X-axis drive motor 401 is transmitted to the X-axis ball screw 207 via the coupling 402, and the substrate table 206 is reversibly reversed in the X-axis direction indicated by the arrow X at a predetermined speed and position. Move,
It is configured to be able to stop.

Next, while the chemical liquid coating film R applied to the surface of the substrate W, which will be described later, is in an undried state, the airflow generating device 3 blows an airflow under a predetermined pressure on the surface. This is a device which has a function of making the coating film thickness of the undried chemical liquid uniform, and its main component is a columnar or cylindrical rotating body 301, which rotates to generate the airflow. The air flow generating device 3 is provided with the interval control device 6.
Supported by The distance control device 6 moves the rotating body 301 on the surface of the chemical coating film R on the substrate W to adjust the distance between the rotating body 301 of the airflow generating device 3 and the surface of the chemical coating film R on the substrate W. On the other hand, it is a device for moving in the Z-axis direction (up-down direction) indicated by arrow Z. Hereinafter, both configurations will be described together.

First, as for the distance control device 6, a pair of Z-axis rail mounting plates 602 and 603 are vertically fixed to both side ends substantially at the center of the base 201, respectively. Z-axis rails 604 are fixed to the plates 602 and 603, respectively. On these Z-axis rails 604, a Z table 607 is provided.
05 and 606 so as to be slidable in the Z-axis direction. One end of the Z table 607 has a Z
An axis ball screw nut (not shown) is incorporated, and a Z-axis ball screw 608 is screwed and connected to the Z-axis ball screw nut. The Z table 607 is moved by rotating the Z-axis ball screw 608. Will be Z
The axis ball screw 608 is disposed in the Z-axis direction in a state perpendicular to the surface of the base 201.
8 is a bearing case 609 vertically mounted on the Z-axis rail mounting plate 602 (one is not visible)
Are rotatably supported by the bearings.

A rotating shaft of a Z-axis drive motor 601 is connected to one end of the Z-axis ball screw 608 via a coupling 610. The Z-axis drive motor 601 is supported and fixed by the L-shaped angle 611, and the rotational driving force of the Z-axis drive motor 601 for reversible rotation is transmitted to the Z-axis ball screw 608 via the coupling 610. The table 607 is configured to be able to reversibly move and stop in a predetermined speed, position, and Z-axis direction indicated by the arrow Z.

Next, regarding the airflow generating device 3, the airflow generating device 3 is connected to the Z table 60 of the interval control device 6.
7 is built. That is, in the Z table 607,
At a predetermined interval, a pair of bearing cases 302, 3
Numeral 03 is fixed vertically, and the rotating body 301 is supported by the bearings of the bearing cases 302 and 303. The outer peripheral surface of the rotating body 301 is the substrate table 2
It is pivotally supported so as to be held parallel to 06 (FIG. 2). The coupling 30 is connected to one end of the rotating body 301.
4, the rotating shaft of the rotating body drive motor 305 is connected. The rotating body drive motor 305 is a Z table 60
7 is supported and fixed by an L-shaped angle 306 fixed to the rotating body 7. The rotational driving force of the reversible rotation of the rotating body drive motor 305 is transmitted through the coupling 304 to the rotating body 30.
1 so that the rotating body 301 can rotate at a predetermined speed in a direction indicated by an arrow R (FIG. 1).
The rotating body 301 has, for example, as shown in FIGS. 2 and 4, a uniform outer peripheral surface 3011 longer than the width of the substrate W to which the chemical is applied, and a rotating shaft 3012 at the center thereof. .

The rotating body 301 is a rotating body driving motor 30
5 rotates at a predetermined speed and direction. Rotating body 301
Is rotated, a gas flow (air flow) is generated on the outer peripheral surface 3011 of the rotating body 301. Outer peripheral surface 3 as shown in FIG.
When the rotating body 301 with a smooth 011 rotates in one direction at a constant speed, the airflow generated on the entire outer peripheral surface 3011 is uniform in any part and becomes a uniform flow (rectification). When such rectification acts on the entire coating film surface in the undried state of the substrate W moving in the X-axis direction, the film thickness on the entire coating film surface can be made uniform and smooth without contact.

The flow rate, direction, pressure, etc. of the airflow generated by the rotation of the rotating body 301 are determined by the number of rotations, the outer diameter,
It depends on the shape of the outer peripheral surface 3011, the distance and position from the outer peripheral surface 3011 to the coating film surface, and the moving speed of the substrate W. These also differ depending on the nonuniformity and viscosity of the chemical solution.
Therefore, by selecting the above-mentioned optimal conditions in consideration of the non-uniformity and viscosity of the chemical solution, the thickness of the coating film can be controlled in a non-contact manner by using the airflow.

With the configuration described above, the Z-axis ball screw 608 can be reversibly rotated by controlling the number of rotations and the direction of rotation of the Z-axis drive motor 601, whereby the Z table 607 moves up and down, and the rotating body 301 and the substrate W Of the chemical liquid coating film R can be adjusted.

The film thickness measuring device 5 includes the air flow generating device 3
The air flow generated by the rotating body 301 of the chemical liquid coating film R
Is a device for measuring the film thickness of the chemical liquid coating film R before spraying the surface of the mounting plate 502 on the base 201.
, The laser sensor 501 is fixed. One or a plurality of laser sensors 501 are provided in the width direction (Y direction) of the substrate W as needed. The thickness of the chemical coating film R on the entire surface of the substrate W is measured by sequentially measuring the thickness of the chemical coating film R while the substrate W is moved in the X-axis direction by the X-axis drive motor 401. Examples of the laser sensor 501 include a visible light laser type displacement sensor LB-1000 series manufactured by Keyence Corporation.

As described above, the chemical liquid coating film thickness uniforming device 1 has a structure mounted on the chemical liquid coating device 8. The chemical liquid applicator 8 is shown by the extrusion applicator shown in FIG. Therefore, FIG.
, The discharge head mounting plate 8
The ejection head 801 and the pump 803 are fixed to the ejection head mounting plate 804. A slit-shaped orifice 802, which is long in the width direction of the substrate W, is formed at the tip of the discharge head 801 to discharge a chemical solution. The discharge head 801 and the pump 803 are connected via a tube 805, and the pump 803 is connected via a tube 806 to a chemical solution tank (not shown).

In the middle of the tube 806, a chemical viscosity meter 807 is mounted. Chemical viscosity meter 807
May be installed in the chemical tank. This liquid viscosity meter 8
As 07, for example, a torsional vibration viscometer OVC-1 manufactured by Malcolm Co., Ltd. can be used. Further, a viscosity of the chemical is controlled by attaching a constant temperature controller (not shown) to the chemical tank. The viscosity may be different depending on the lot of the chemical solution, and the discharge pressure of the pump 803 is controlled in accordance with the difference in the viscosity to make the amount of application to the substrate W uniform. When the substrate W moves in the X-axis direction, a chemical solution is discharged through the discharge head 801 to apply the liquid to the surface of the substrate W.

The main controller 7 is constituted by a microcomputer. As shown in FIG. 3, the main controller 7 controls the air flow based on the measurement data from the film thickness measuring device 5 and the liquid viscosity measuring device 807. The rotating body drive motor 305 of the generator 3, the X-axis drive motor 401 of the drive 4, and the Z-axis drive motor 601 of the interval controller 6 are controlled.

Next, the operation of the chemical liquid coating film thickness uniforming apparatus 1 of the present invention configured as described above will be described. First, the substrate table 206 is positioned, for example, on the (+) side in the X-axis direction. On the substrate table 206, a large uncoated substrate W is fixed by using, for example, an attractive force.
As the X-axis drive motor 401 rotates, the substrate table 206 moves at a constant speed from the position on the (+) side in the X-axis direction to the (-) side. When passing through the ejection head 801 for the first time, a chemical solution is applied on the substrate W, and a coating film R of the chemical solution is formed. At this time, the thickness of the coating film R is not uniform.

Next, the X-axis drive motor 401 is reversed,
The substrate table 206 is returned to the first (+) side position in the X-axis direction, and the X-axis drive motor 401 is again rotated in reverse to move the substrate table 206 from the (+) side position in the X-axis direction to the (-) side. Move at a constant speed. In this case, the rotating body drive motor 305 of the airflow generating device 3 is operated, and the rotating body 301 is rotated.
At the same time that the airflow (rectification) generated by this rotation is blown onto the surface of the coating film R in an undried state, and at the same time, the film of the coating film R immediately before the airflow is blown by the laser sensor 501 of the film thickness measuring device 5. Measure the thickness. The measurement data is fed back to the rotating body drive motor 305 under the control of the main controller 7, the number of rotations is controlled, and the blowing pressure of the airflow generated by the controlled rotation of the rotating body 301 is controlled. By controlling this airflow,
The thickness of the coating film R is made uniform to a predetermined thickness.

In order to improve the uniformity of the thickness of the coating film R, the distance between the rotating body 301 and the coating film R can be controlled according to the thickness measurement data. In this case, the measurement data is fed back to the Z-axis drive motor 601 of the interval control device 6 under the control of the main control device 7,
The distance is finely adjusted by changing the rotation direction of the shaft drive motor 601. The adjustment of the distance changes the blowing pressure of the airflow due to the rotation of the rotating body 301 that hits the surface of the coating film R, and thus a coating film R having a uniform film thickness can be obtained.

Further, in the same manner as described above, both during the application of the chemical solution and during the blowing of the airflow, the distance between the rotating body 301 and the coating film R and the rotation speed of the rotating body 301 according to the measurement data of the chemical viscosity measuring device 807. , The thickness of the coating film R can be made uniform. Furthermore, the X-axis drive motor 401 of the drive unit 4 is controlled based on the measurement data of the film thickness or the measurement data of the viscosity of the chemical solution, and the feed speed of the substrate W in the X-axis direction is controlled, thereby forming the coating film R. The film thickness and its uniformity can be controlled.

In the above embodiment, the extruder 8
Although the apparatus which combines the apparatus 1 with the chemical liquid coating film thickness uniforming apparatus 1 has been described, the apparatus may be combined with the above-described wire bar coating apparatus 9, roll coating apparatus, spin coating apparatus, coating apparatus using surface tension, and the like. Good. For example, when the chemical solution coating film thickness uniforming device 1 of the present invention is incorporated in the wire bar coating device 9, the coating film R of the chemical solution applied by the wire bar coating device 9 may have uneven coating in accordance with the wire pitch. Already pointed out. This streak-like coating unevenness is slightly improved by the surface tension of the chemical solution R only by leaving it to stand naturally. For example, as shown in FIG.
It is effective to use. That is, the rotating body 301A has an annular concave groove 3013 having a width t and an outer diameter D2 at a pitch P corresponding to the stripe of the coating unevenness on the outer peripheral surface 3011 having the outer diameter D1.
Are formed in a plurality. When the rotating body 301A is disposed on the coating film R such that the outer peripheral surface of each outer diameter D1 faces the streak of the coating unevenness, and is rotated, the portion having the larger outer diameter D1 has a smaller outer diameter D2. Since an airflow having a pressure higher than the pressure of the airflow generated in the portion can be blown to the streaks of the uneven coating, the film thickness can be more effectively made uniform.

When the apparatus 1 for uniformizing the thickness of the applied chemical solution according to the embodiment of the present invention is incorporated in a spin coating apparatus, the rotating body 301 constituting the airflow generating apparatus 3 is constituted by a disk.
The substrate W, on which the coating film R is formed on the surface of the substrate W by dropping a chemical solution in advance, is held in a horizontal state, and the disc is slightly spaced in a plane parallel to the application surface of the substrate W. Is opened and rotated to generate an airflow, and the airflow is applied to the coating film R.
And the pressure is used to make the thickness of the coating film R uniform.

Alternatively, while rotating the application surface of the substrate W on which the coating film R is formed in advance, the substrate W is rotated at a slight interval in a rotation surface parallel to the rotation surface of the substrate W. By rotating the airflow generating disk at a higher rotation speed than the speed to generate an airflow, the airflow can be blown onto the coating film R, and the thickness of the coating film R can be made uniform by the pressure. Furthermore,
By rotating the airflow generating disk in a direction opposite to the rotation direction of the substrate W to increase the blowing pressure of the airflow,
The pressure of the airflow blown to the surface of the substrate W can be increased.

In addition, the chemical liquid coating film thickness uniforming apparatus 1 of the present invention can be incorporated in another type of chemical liquid coating apparatus to make the coating film R of the substrate W uniform. In addition, it is possible to provide a uniform thickness of the coating film R on the surface of the substrate W by using the chemical liquid coating film thickness uniforming device 1 alone without incorporating it in the chemical liquid coating device.

FIG. 6 shows a rotating body 301B according to a third embodiment, which replaces the first rotating body 301. The rotating body 301B has a structure in which a plurality of grooves 3014 having a width t and a pitch angle α ° parallel to the direction of the rotating shaft 3012 are formed on an outer peripheral surface 3011 thereof. With such a structure, an airflow having a higher pressure than the first rotating body 301 is easily generated due to the presence of the plurality of concave grooves 3014. By devising the structure of the rotating body 301 in this way, the pressure of the airflow blown to the surface of the coating film R can be changed.

In the apparatus 1 for uniformizing the thickness of the applied chemical solution according to the above-described embodiment, the substrate W is moved in the X-axis direction by the driving device 4. It should be noted that it is also possible to adopt a configuration in which the airflow generating device 3 and the film thickness measuring device 5 are moved in the X-axis direction.

Further, in the above-described embodiment, a flat panel of a television receiver is taken as an example of the substrate W, and a method and an apparatus for making the thickness of a coating film applied on the surface uniform have been described. It is to be noted that the present invention can be applied to a case where the film thickness of, for example, a photoresist applied to the surface of the semiconductor wafer or other material is uniform as W.

[0048]

As is apparent from the above description, according to the chemical liquid coating film uniforming apparatus of the present invention, the coating film adhered to the surface of the substrate in a non-contact manner by the pressure of the gas flow (rectification). Can be made uniform and non-contact uniform.
Unlike the case of contact, dust is not generated, and flattening can be performed under stable conditions. In addition, the combination of the distance between the surface of the coating film and the rotating body of the airflow generating device, the number of rotations, the structure of the rotating body, the relative speed of the substrate or the airflow generating device, and the like, determine the conditions for flattening the thickness of the coating film. Optimization can be achieved.

[Brief description of the drawings]

FIG. 1 is a front view of a chemical solution coating film thickness uniforming apparatus according to an embodiment of the present invention.

FIG. 2 shows an apparatus A for uniforming the thickness of a chemical solution applied film shown in FIG.
It is sectional drawing in the -A line.

FIG. 3 is a system block diagram of a control unit of the chemical solution coating film thickness uniforming apparatus shown in FIG.

FIG. 4 is a side view of an airflow generating means of the first embodiment, which is a main component of the chemical liquid coating film thickness uniforming device shown in FIGS. 1 and 2;

FIG. 5 is a side view of an airflow generation unit according to a second embodiment, which is a main component of the chemical liquid coating film thickness uniforming device shown in FIGS. 1 and 2;

FIG. 6 shows an airflow generating means according to a third embodiment, which is a main component of the chemical solution coating film thickness uniforming apparatus shown in FIGS. 1 and 2; FIG. B is the same figure as A
3 is a cross-sectional view taken along line AA of FIG.

FIG. 7 is a principle view of a general extrusion coating apparatus.

FIG. 8 is a principle diagram of a general wire bar coating apparatus.

[Explanation of symbols]

1. Apparatus for homogenizing film thickness of chemical solution applied according to an embodiment of the present invention, 2
... substrate holding device, 201 ... base, 206 ... substrate table, 207 ... X-axis ball screw, 3 ... airflow generator, 30
1, 301A, 301B ... rotating body, 4 ... drive device, 40
DESCRIPTION OF SYMBOLS 1 ... X-axis drive motor, 5 ... Film thickness measuring device, 501 ... Laser sensor, 6 ... Interval control device, 601 ... Z-axis drive motor, 607 ... Z table, 7 ... Main control device, 8 ... Chemical liquid coating device, 801 ... discharge head, 802 ... orifice, 8
03: Pump, 807: Chemical solution viscosity meter

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H025 AA00 AB17 EA01 EA10 4D075 AC04 AC60 AC71 AC92 AC94 AC96 BB92Z DC22 4F042 AA07 BA04 BA05 BA06 BA08 BA15 BA25 DD31 DD38 DD44 DD45 5F046 JA21 JA27

Claims (11)

[Claims] An airflow is blown onto an uneven surface of a coating film of a chemical solution applied to a smooth surface of a substrate, and the uneven thickness of the coating film is made uniform by the pressure of the airflow. To make the thickness of the applied chemical solution uniform. 2. A substrate holding means for holding a substrate having a smooth surface coated with a chemical solution with a predetermined thickness in advance, wherein the chemical solution coating film on the substrate is in an undried state.
An airflow is blown under a predetermined pressure against the surface, an airflow generating means for equalizing the thickness of the coating film of the chemical liquid in the undried state, and the surface of the chemical liquid coating film in the undried state, In order to uniformly blow the air flow from one end to the other end, a drive means for relatively moving the substrate holding means and the air flow generation means is provided, and a chemical liquid coating film thickness is provided. Homogenizer. 3. A substrate holding means for holding a substrate having a smooth surface coated with a chemical solution with a predetermined thickness in advance, wherein the chemical solution coating film on the substrate is in an undried state.
A gas generating means for blowing an air flow under a predetermined pressure against the surface to make the coating film thickness of the undried chemical solution uniform, and the surface of the undried chemical solution coating film from one end thereof A driving unit for relatively moving the substrate holding unit and the airflow generation unit to uniformly blow the airflow over the other end, and an airflow generated by the airflow generation unit is provided on a surface of the chemical liquid coating film. Before spraying, the film thickness measuring means for measuring the film thickness of the chemical liquid coating film, In order to adjust the gap between the airflow generating means and the surface of the chemical liquid coating film, the airflow generating means on the substrate An interval control means for moving the film in the vertical direction with respect to the surface of the chemical coating film, and controlling a blowing pressure of the airflow of the airflow generating means in accordance with measurement data of the degree of unevenness of the film thickness measured by the film thickness measuring means. And before Main control means for controlling the distance by acting on the distance control means or acting on the drive means to control a relative moving speed between the substrate holding means and the airflow generating means. An apparatus for uniformizing the thickness of a chemical solution applied. 4. A substrate holding means for holding a substrate having a smooth surface coated with a chemical solution with a predetermined thickness in advance, wherein the chemical solution coating film on the substrate is in an undried state.
An airflow is blown against the surface under a predetermined pressure, and an airflow generating means for equalizing the applied film thickness of the undried chemical liquid, and the surface of the undried chemical liquid coating film from one end thereof. A driving unit that relatively moves the substrate holding unit and the airflow generation unit to uniformly blow the airflow over the other end, a chemical liquid viscosity measuring unit that measures and measures the viscosity of the chemical liquid, An interval control means for vertically moving the air flow generating means with respect to the surface of the chemical liquid coating film on the substrate in order to adjust the distance between the air flow generating means and the surface of the chemical liquid coating film; and According to the measurement data of the viscosity of the liquid medicine measured by the means, controlling the blowing pressure of the airflow of the airflow generating means, acting on the interval control means to control the interval, or acting on the driving means, and An apparatus for uniformizing the thickness of a chemical liquid coating, comprising: a main control unit that controls a relative moving speed between the substrate holding unit and the airflow generating unit. 5. The apparatus according to claim 2, wherein said airflow generating means is constituted by a rotating body. 6. The apparatus according to claim 5, wherein the rotating body is a cylindrical body or a cylindrical body. 7. The apparatus according to claim 6, wherein a plurality of annular grooves are formed on the outer peripheral surface of the rotating body with a cylindrical body or a cylindrical body. 8. Over the entire outer peripheral surface of the rotating body,
7. The apparatus according to claim 6, wherein a plurality of concave grooves are formed in the rotation axis direction. 9. A chemical coating device, comprising: the chemical coating thickness uniforming device according to claim 2. 10. A chemical coating device, comprising the chemical liquid coating thickness uniforming device according to claim 3. 11. A chemical coating device, comprising the chemical liquid coating film thickness uniforming device according to claim 4.