JP3500777B2 - Substrate coating method, substrate coating apparatus, method of manufacturing liquid crystal display, and method of manufacturing surface illumination device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for applying a solution to a substrate to form a thin film, and more particularly to a method for coating the substrate with the solution and an apparatus for coating the solution with the substrate. Further, the present invention relates to a method of manufacturing a liquid crystal display body, in which the surface and members of a substrate used for the liquid crystal display body are coated with a thin film material solution. Furthermore, the present invention relates to a method for manufacturing a surface lighting device to which these coating methods are applied.

[0002]

2. Description of the Related Art Conventionally, as a method for applying a solution to a substrate to form a thin film, a dipping / pulling method, a spinner method, and a spray method are known.

Further, coating of a material solution for a liquid crystal display thin film used for a functional film of a liquid crystal display has been performed by a method such as spin coating, roll coating and printing.

Regarding spin coating, Japanese Examined Patent Publication No. 61-6
As described in Japanese Patent No. 1069, a rotary head that rotates a member to be coated rotates integrally with the rotary head, and the peripheral edge of the member to be contacted is substantially flush with the surface of the member to be coated. In some cases, by providing the auxiliary member, the coating liquid is evenly applied to the corners of a member to be coated having a corner other than the circular shape.

Regarding the roll coat, Japanese Patent Publication No. 6
As described in JP-A 1-267004, there has been a method in which a transparent coating material such as glass as a medium for forming a color filter is coated with a photosensitive coating material containing a coloring agent on the entire surface by a spinner or a roll coater.

Further, regarding printing, Japanese Patent Publication No. 61-1
As described in Japanese Patent No. 46540, there is one in which the relative position between the screen printing pattern mask and the thick film pattern forming surface during the squeegee moving operation is shifted in the squeegee moving operation direction for printing.

[0007] Regarding the coating, Showa 63
In "Latest Coating Technology Advances," issued April 30, 2014, the coating method is described on pages 259 to 398, and the special coating is described on pages 515 to 545.

Regarding the coating of static electricity, fog, and liquid crystal, as described in Japanese Patent Publication No. 122873/1990, a method of applying an aerosol generated by an aerosol generator to the surface of an object to be coated is applied. , The solvent vapor is present in the gas, and the coating object placed in the vapor is cooled below the saturation point of the solvent vapor, whereby the solvent vapor contained in the aerosol is coated. Condensation on the surface, on the surface of these dew drops, or on the same coating surface formed by their aggregation, to attach the dispersoid of the aerosol that has been introduced above (hereinafter referred to as particles),
After that, a method of evaporating the liquid film-like solvent and applying only the remaining aerosol particles has been proposed.

[0009]

However, the above-mentioned conventional techniques have the following problems.

Usually, the liquid crystal display substrate or the liquid crystal display member is an insulator using a square plate material. Lapping and molding are performed as the processing method, but the thickness accuracy is about ± 0.1 mm. Further, the accuracy of flatness and flatness is usually 0.1 μm to 0.5 μm, and it takes a cost to obtain a higher accuracy. However,
The gap accuracy of the liquid crystal layer of the cell of the liquid crystal display is ± 0.01
Since the layers are laminated in the range of μm and ± 0.5 μm, the precision cannot be obtained by such a processing method, and the display quality as the liquid crystal display cannot be maintained. Therefore, with the conventional processing method, it is difficult to stably perform uniform thin film coating or thin film printing on the surface of the liquid crystal display substrate (or liquid crystal display member). Further, there is a problem that impurities are mixed into the thin film material solution for liquid crystal display or the coating material to deteriorate the quality of the film, so that the display quality of the liquid crystal display and the yield at the time of manufacturing cannot be improved.

Therefore, the present invention is intended to solve such a problem, and its object is to apply a thin film material solution for a liquid crystal display or a paint to the surface of a liquid crystal display substrate or a liquid crystal display member. A method for obtaining high-quality coating thin film by forming a mist, charging the static electricity generated by the static electricity generator to a fine mist, and applying this to the surface of the liquid crystal display substrate or liquid crystal display member There is a place to do it.

[0012]

The present invention is to achieve the above-mentioned object, and the contents thereof will be described below.

The method for coating a substrate according to the present invention is the method for coating a substrate in which a thin film material solution is applied to the substrate, wherein the substrate is placed on a grounded table, and the thin film material solution is granulated. The method comprises the steps of charging a thin film material solution, and applying the charged thin film material solution to the substrate, wherein the applying step comprises a tip of a nozzle for charging the thin film material solution. A distance between the surface of the substrate and the surface of the substrate is set to 1 mm to 10 mm, a charged mask is placed close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask. Characterize.

According to such a substrate coating method,
The charged thin film material solution is in the form of fine particles.
Since it flies while being appropriately dispersed (without being partially concentrated) on the surface of the substrate, it becomes possible to form a uniform thin film on the surface of the substrate or on the member for liquid crystal display. For example, when a coating thin film is formed uniformly on the entire surface of a substrate, it is very effective because a high quality thin film can be easily formed. Further, this substrate coating method can be used, for example, in a manufacturing process for forming an electrode film of a crystal resonator. This is intended for applications other than thin film formation of substrates. That is, a high quality thin film can be formed by applying the granular crystal oscillator electrode forming resist solution to the surface and side surfaces of the crystal substrate.

[0015]

According to such a substrate coating method,
Since a thin film pattern having an arbitrary shape can be formed by using a mask, it becomes possible to eliminate the photo-etching step, which is an indispensable method for forming a selective pattern as a post-step of overall coating. For example, it is effective when regularly forming a pattern.

Further, in the above-mentioned substrate coating method, the granular thin film material solution may be conveyed by using a gas, and the gas may be caused to flow intermittently.

According to such a substrate coating method,
Fine grooves can be formed on the surface of the substrate. Also,
This substrate coating method can be used, for example, in a liquid crystal display manufacturing method. In this case, the pressure of the gas carrying the granular thin film material solution is intermittently changed, and the charged granular thin film material solution is regularly applied to the surface of the substrate to perform the liquid crystal alignment treatment. be able to. This can eliminate the conventional rubbing cleaning in the liquid crystal display manufacturing process. As described above, by eliminating the step of rubbing cleaning, it is possible to improve the alignment quality and the display quality of the liquid crystal display.

The method of manufacturing a liquid crystal display of the present invention is the method of manufacturing a liquid crystal display in which a thin film material solution is applied to a substrate, the step of disposing the substrate on a grounded table, and the thin film material solution. The method comprises the step of charging the thin film material solution in a granular form, and the step of applying the charged thin film material solution to the substrate, wherein the applying step is for charging the thin film material solution. The distance between the tip of the nozzle and the surface of the substrate is set to 1 mm to 10 mm, a charged mask is placed close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask. Characterized by wearing.

According to such a method of manufacturing a liquid crystal display, the charged fog is in the form of fine particles and is appropriately dispersed on the surface of the substrate (without partial concentration).
Since it flies, it becomes possible to form a uniform thin film on the surface of the substrate or on the member for liquid crystal display. For example, when a coating thin film is formed uniformly on the entire surface of a substrate, it is very effective because a high quality thin film can be easily formed.

[0021]

According to such a method for manufacturing a liquid crystal display, a thin film pattern having an arbitrary shape can be formed by using a mask. Therefore, the photo-etching step, which is an essential selective pattern forming method as a post-step of the entire surface coating, is eliminated. Will be able to. Therefore, a substrate with a thin film or a member with a coating film can be manufactured by a simple process design, and the yield of the liquid crystal display and the cost reduction can be achieved. For example, it is effective when regularly forming a pattern. In addition, in the method of manufacturing a liquid crystal display, for example, a gap forming material can be used as a granular thin film material solution. In this case, the gap forming material is applied at a predetermined position on the surface of the substrate using a mask so that the gap forming material is applied at a constant interval or on a portion other than the pixel of the substrate. This stabilizes the gap material and improves the display quality of the liquid crystal display. Furthermore, the coating method in which the gap forming material is not present in the display pixel makes it possible to provide a display with good contrast.

The method of manufacturing a liquid crystal display according to the present invention is the method of manufacturing a liquid crystal display in which a thin film material solution and a gap forming material are applied to a substrate, the step of disposing the substrate on a grounded table, and A step of granulating the thin film material solution and the gap forming material respectively and charging the thin film material solution and the gap forming material; and applying the charged thin film material solution and the charged gap forming material to the substrate. And a process,
In the step of applying, the distance between the tip of a nozzle for charging the thin film material solution and the gap forming material and the surface of the substrate is set to 1 mm to 10 mm, and the charged mask is applied to the surface of the substrate. And the granular thin film material solution and / or the granular gap forming material are applied to the substrate through the mask.

According to such a liquid crystal display manufacturing method, a thin film is formed on the surface of the substrate, and the gap forming material is evenly dispersed and fixed at the same time. For example, if an alignment film material solution is used as a thin film material solution, all the steps of conventional alignment film coating, baking, rubbing, cleaning, and gap material spraying in the conventional liquid crystal display manufacturing process can be realized in only one step. , Greatly improves the manufacturability of liquid crystal displays. Moreover, since the gap material does not move to the completed liquid crystal display due to external vibration, the display quality of the liquid crystal display is improved.

A method of manufacturing a liquid crystal display body according to the present invention is the method of manufacturing a liquid crystal display body in which a liquid crystal and a gap forming material are applied to a substrate, the step of disposing the substrate on a grounded table, the liquid crystal and The step of coating the liquid crystal and the gap forming material with the liquid crystal and the gap forming material, and applying the charged liquid crystal and the charged gap forming material to the substrate. In the attaching step, the distance between the tip of the nozzle for charging the liquid crystal and the gap forming material and the surface of the substrate is set to 1 mm to 10 mm, and the charged mask is brought close to the surface of the substrate. And the granular gap forming material is applied to the substrate through the mask.

According to such a method for manufacturing a liquid crystal display, the work of injecting a liquid crystal group into an empty cell formed by bonding glass of liquid crystal display in a vacuum device as in the prior art is abolished. . That is, after the coating film having an appropriate film thickness is formed, the liquid crystal display substrates are bonded together in a vacuum device, so that a liquid crystal display with uniform gaps can be easily manufactured.

The method of manufacturing a liquid crystal display of the present invention is the method of manufacturing a liquid crystal display in which a thin film material solution and a conductive material are applied to a substrate, the step of disposing the substrate on a grounded table, and the thin film. A step of charging the thin film material solution and the conductive material by granulating the material solution and the conductive material, respectively, and a step of applying the charged thin film material solution and the charged conductive material to the substrate. In the step of applying, the distance between the tip of a nozzle for charging the thin film material solution and the conductive material and the surface of the substrate is set to 1 mm to 10 mm, and the charged mask is applied to the substrate. Is placed close to the surface of the substrate and the granular thin film material solution is applied to the substrate through the mask.

According to such a method of manufacturing a liquid crystal display body, a substrate with a conductive thin film having a low resistance value can be realized by the conductive film thus formed.

The method of manufacturing a liquid crystal display body of the present invention is the method of manufacturing a liquid crystal display body in which a thin film material solution is applied to a substrate on which a pattern is formed, the step of disposing the substrate on a grounded table, The method comprises the steps of granulating the thin film material solution and charging the thin film material solution; and applying the charged thin film material solution to the substrate and the pattern, the applying step comprising: The distance between the tip of the nozzle for charging the thin film material solution and the surface of the substrate is set to 1 mm to 10 mm, the charged mask is placed close to the surface of the substrate, and the granular thin film material solution is formed. Is applied to the substrate through the mask.

According to such a method for manufacturing a liquid crystal display, the thin film material solution is made into particles, and the charged granular thin film material solution is applied to the step pattern formed on the surface of the substrate to form the flattening film. To form. Accordingly, even if the surface of the substrate and the surface of the member have some irregularities, a thin film of high quality can be uniformly formed.

A substrate coating apparatus of the present invention is a substrate coating apparatus for forming a thin film by applying a thin film material solution onto a substrate, and an atomization generator for granulating the thin film material solution and the thin film material solution. Generates static electricity to be charged, and a static electricity generation nozzle for applying a charged thin film material solution to the substrate, a charge amount sensor for detecting the charge amount of the thin film, and based on the data of the charge amount sensor, A static electricity amount control device for setting a charge amount to the thin film material solution, wherein the static electricity generating nozzle has a distance between the tip of the static electricity generating nozzle and the surface of the substrate of 1 mm.
It is characterized in that a charged mask having a thickness of about 10 mm is placed close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask.

According to such a substrate coating apparatus,
The charged thin film material solution is in the form of fine particles.
Since it flies while being appropriately dispersed (without being partially concentrated) on the surface of the substrate, it becomes possible to form a uniform thin film on the surface of the substrate or on the member for liquid crystal display. Also,
The control means controls the film thickness, film quality and shading of the coating by forming a thin film for liquid crystal display on the surface of the substrate while controlling the electrostatic charge amount. As a result, it becomes possible to perform manufacturing control for forming various functional films.

The atomization generator may include a plurality of nozzles for conveying the granular thin film material solution.

According to such a substrate coating apparatus,
By having a plurality of nozzles, it is possible to simultaneously apply the granular thin film material solution to different surfaces of the substrate. Thereby, a thin film can be formed at high speed.

The method of manufacturing a surface lighting device according to the present invention is the method of manufacturing a surface lighting device in which a reflective film solvent is applied to form a reflective film on a light guide plate, wherein the light guide plate is arranged on a grounded table. A step, a step of charging the reflective film solvent by granulating the reflective film solvent, and a step of applying the charged reflective film solvent to the light guide plate, the applying step, The distance between the tip of the nozzle for charging the reflective film solvent and the surface of the light guide plate is 1 mm to
It is characterized in that the mask is set to 10 mm, a charged mask is disposed in proximity to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask.

According to such a method of manufacturing a surface lighting device, such a thin film forming technique is applied to a surface lighting device having a light guide plate. Then, by controlling the amount of charge with respect to the granular reflective film solvent, a concentrated reflective film is formed on the surface of the light guide plate. This has made it possible to realize bright and uniform illumination in surface illumination. In addition, the substrate coating method, the substrate coating apparatus, the liquid crystal display manufacturing method, and the surface lighting apparatus manufacturing method of the present invention do not require mechanical precision because they are non-contact coating methods, and thus inexpensive coating. The device can be realized. Furthermore, the solvent used in the photo-etching process becomes unnecessary, which is effective as a measure for preventing environmental damage.

[0037]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.

(Embodiment 1) FIG. 1 is a sectional view showing the overall construction of an embodiment of a substrate coating apparatus according to the present invention. Here, a case of forming a thin film for a liquid crystal display on a substrate will be described as an example. In the figure, a solvent tank 4 filled with a liquid crystal display thin film material solution 3 is set in the atomization generator main body 2. The atomization generator main body 2 has an ultrasonic transducer 1 built therein. The ultrasonic transducer 1 is a thin film material solution for liquid crystal display 3
Vibrates from the time when is filled on the upper surface of the ultrasonic transducer 1,
As a result, the fog 5 of the liquid crystal material thin film material solution 3 is generated. The blower nozzle 7 installed by penetrating the atomization generator main body 2 so as to communicate with the inside of the mist guide nozzle 6.
In addition, dry air or a gas such as nitrogen gas is blown from the outer peripheral side (direction of arrow A) of the atomization generator main body 2 to cause the mist 5 of the thin film material solution for liquid crystal display 3 to flow along the pipe of the mist guide nozzle 6. To transport. A static electricity generating nozzle 20 is installed near the tip of the fog guiding nozzle 6. When a control signal is sent from the static electricity amount control device 21 to the static electricity generation nozzle 20, static electricity is generated and the fog 5 of the thin film material solution for liquid crystal display 3 is charged. At this time, since the liquid crystal display substrate table 14 to which the liquid crystal display substrate 12 is fixed is grounded, the fog 5 flies toward the liquid crystal display substrate 12 and the liquid crystal display substrate 12 Is applied and coated on the upper surface of. The coated film is heat-treated by the heater 15 at the time of coating. The above is the basic configuration of the substrate coating method and apparatus of the present invention.

FIG. 2 is a perspective view showing an example of an actual method for coating the substrate described in FIG. In this example, a method of forming a thin film by scanning in the XY directions on the surface of the liquid crystal display substrate 12 will be described.

First, the fog guiding nozzle 6 and the static electricity generating nozzle 20 are constructed so as to be able to move at a constant speed in a direction parallel to the atomization generating device body 2 (direction of arrow Y). On the other hand, the liquid crystal display substrate table 14 is configured to be movable at a constant speed in a direction (arrow X direction) perpendicular to the atomization generator main body 2. Then, the coating film 23 is formed by moving the liquid crystal display thin film material solution in the XY directions as appropriate to form mist particles and charging the static electricity generating nozzles 20 to fly the mist. Here, by setting the gap between the tip of the static electricity generating nozzle 20 and the surface of the liquid crystal display substrate 12 to an appropriate distance, the surface of the liquid crystal display substrate 12 has a uniform film quality / coating film thickness ± 1. % High quality film can be formed. The tip of the static electricity generating nozzle 20 and the liquid crystal display substrate 1
The gap between the second surface and the second surface is preferably set at an interval of about 1 mm to 10 mm. Also, the atomization generator main body 2
It is desirable that the size of the fog generated by is in the range of 500Å to 1000Å.

Next, a method of forming a pattern by causing a hollow pattern mask to be charged with static electricity and causing fog to fly to the surface of the liquid crystal display substrate will be described.

Referring again to FIG. 1, when the coating film 11 is formed, the mask 9 with the hollow pattern is set on the liquid crystal display substrate table 14 using the mask holding jig 10. Then, the voltage varying device 22 charges the mask 9 with the hollow pattern. When the entire surface of the liquid crystal display substrate 12 is coated or a plurality of coating films 11 are formed, the atomization generator body 2 is moved in a direction parallel to the static electricity generation nozzle 20 (direction of arrow Y). The atomization generator Y-axis moving motor 8 is moved at a constant speed by the atomization generator slide shaft 19. Further, a liquid crystal display substrate table 14 having a grounded liquid crystal display substrate table 14 is installed in the table body 16.
The table sliding shaft 17 and the liquid crystal display substrate receiving portion 13 are connected by the direction moving motor 18 and moved at a constant speed in the arrow X direction. With this configuration of the present device, the photoetching step in the step of manufacturing the liquid crystal display body can be omitted.

FIG. 3 and FIG. 4 are perspective views of a method of forming a mosaic pattern and a stripe pattern shown as an example of forming a thin film on a substrate using hollow pattern masks having various shapes.

A mask 25 with a hollow mosaic pattern or a mask 27 with a hollow stripe pattern, which is charged by the voltage varying device 22, is provided to keep the gap with the surface of the substrate 12 for liquid crystal display at an appropriate distance. This distance is
It may be in the range of 0.1 mm to 1 mm, especially 0.1
mm is preferred. When the static electricity generation nozzle 20 is moved at a constant speed while blowing the mist of the liquid crystal display thin film material solution, and the liquid crystal display substrate table 14 is moved in the direction of the arrow X, the mosaic pattern film 24 and the stripe pattern film 2 are moved.
6 can be formed. Regarding the size of the pattern, a mosaic pattern thin film or a stripe pattern thin film having a minimum dot of 80 μm and a film thickness of about 200 Å can be formed.

Next, a method for forming a uniform mist of the thin film material solution for a liquid crystal display on the surface of the substrate for a liquid crystal display or forming a uniform pattern on the entire surface will be described. This method is a method of forming a thin film without moving the above-mentioned atomization generator main body 2.

FIG. 5 is a perspective view for explaining a method of uniformly forming a thin film of a thin film material solution for a liquid crystal display.

In the figure, a wide-angle static electricity generating nozzle 28 having a dispersion nozzle 29 for uniformly dispersing the mist over the entire surface of the fog guide nozzle 6 is provided. Wide-angle static electricity generation nozzle 2
8 is fixed from -30 kv to -70 kv
Charge static electricity in the range. N2 for the dispersion nozzle 29
Blow from 0.01 liters / minute to 1.5 liters / minute of gas. The liquid crystal display substrate table 14 on which the liquid crystal display substrate 12 is set is moved in the direction of the arrow X and stopped on the lower surface of the wide-angle static electricity generation nozzle 28. The mist 5 of the thin film material solution is coated. Liquid crystal display substrate table 14
When coating is performed by arbitrarily setting the stop time, the coating thin film can be formed on the entire surface of the liquid crystal display substrate 12. The film thickness distribution can be coated with an accuracy of ± 1%. In this example, when the thin film was formed with the liquid crystal display substrate 12 stopped for 2 minutes, a uniform thin film could be formed in the film thickness range of 0.5 μm to 0.6 μm.

6 and 7 are perspective views showing a method of forming a thin film having a uniform pattern on the entire surface of the liquid crystal display substrate. FIG. 6 is a perspective view of a method for forming a mosaic pattern, and FIG. 7 is a perspective view of a method for forming a stripe pattern. This is a method in which the surface of the liquid crystal display substrate 12 is entirely coated with a mosaic pattern film 24 'and a stripe pattern film 26'. A mask 25 ′ with a hollow mosaic pattern or a mask 27 ′ with a hollow stripe pattern is provided and held below the wide-angle static electricity generating nozzle 28. The gap is, for example,
A hollow mask is 0.1 m on the liquid crystal display substrate 12.
Installed in the range of m to 1 mm, the liquid crystal display substrate table 14 is moved in the direction of the arrow X, and the liquid crystal display is placed on the surface of the liquid crystal display substrate 12 while being stopped below the wide-angle static electricity generating nozzle 28. Coating a mist of thin film material solution. The mosaic pattern film 24 ′ or the stripe pattern film 26 ′ can be formed on the entire surface of the liquid crystal display substrate 12 by coating the liquid crystal display substrate table 14 with an arbitrary stop time. The film thickness distribution can be coated with an accuracy of ± 1% as described above. The mosaic pattern accuracy and stripe pattern accuracy are ± 5.
It is possible to secure a thickness of not more than μm, and a mosaic pattern group and a stripe pattern group can have a shape without bleeding. Thus, a thin film having excellent film quality characteristics could be formed.

Example 2 In this example, an alignment treatment method capable of forming fine grooves on the surface of a liquid crystal display substrate and a coating method for uniformly dispersing and fixing a gap forming material for a liquid crystal display are shown in FIG. , FIG. 9 will be described. Since the basic structure of the substrate coating method and apparatus of this embodiment is the same as that shown in FIG. 1, only the different portions are shown, and the other common portions are not shown or described. To do. Further, since the basic configurations of Examples 3 to 6 and other examples described below are the same as those shown in FIG. 1, illustration and description of common parts are omitted as in the case of Example 2. .

FIG. 8 is a perspective view showing an embodiment of a method of aligning the surface of a liquid crystal display substrate. In the figure, a gas such as door rye air or nitrogen is intermittently caused to flow from a blowing nozzle to a mist 30 of an alignment film material solution for a liquid crystal display generated by an ultrasonic vibrator,
A mist 30 of the alignment film material solution for a liquid crystal display is intermittently conveyed through the mist guide nozzle, and is charged by the static electricity generating nozzle 20 provided at the outlet of the mist guide nozzle. Then, the fine mist 30 of the charged alignment film material solution for a liquid crystal display body flies and is applied to the surface of the substrate 12 for a liquid crystal display body to form fine grooves 31. At this time, the shape and groove width of the fine groove 31 can be changed by changing the timer setting value for intermittently flowing the gas. As a result, the alignment strength of the liquid crystal can be controlled.

In this embodiment, the timer set value for intermittently flowing the gas is 0.01 m / sec to 0.05 m / sec.
When the groove width was varied within about sec, a groove 31 having a groove width of 100Å to 500Å was formed. Further, when the timer set value was varied from about 0.1 m / sec to about 1 m / sec, a groove 31 having a groove width of 1000Å to 5000Å could be formed. With this structure, the rubbing cleaning in the conventional liquid crystal display manufacturing process can be eliminated, so that the alignment quality and the display quality of the liquid crystal display are improved.

FIG. 9 is a cross-sectional view showing a method of orienting and uniformly coating the surface of the liquid crystal display substrate with the liquid crystal display gap forming material. In the figure, the liquid crystal display gap material 32 is mixed in the liquid crystal alignment film material solution. Then, the static electricity generating nozzle 20 charges the mist of the alignment film material solution 30 for the liquid crystal display body and the mist of the gap forming material 32 for the liquid crystal display body to uniformly disperse the gap forming material 32 for the liquid crystal display body. It can be applied to the surface of the liquid crystal display substrate 12 at the same time as the mist of the liquid crystal alignment film material solution 30. By forming a thin film by this method, it is possible to form the alignment treatment, spread the gap for the liquid crystal display and fix the gap material for the liquid crystal display at the same time.

By carrying out this method, the steps of coating the alignment film, baking, rubbing, cleaning, and spraying the gap material in the conventional liquid crystal display manufacturing process can be manufactured in one process. Also,
Since the gap material does not move to the completed liquid crystal display due to external vibration, the display quality of the liquid crystal display is improved.

Example 3 In this example, a method of applying a liquid crystal group (aggregate of liquid crystals) to a fine mist by electrostatically charging it on the surface of a liquid crystal display substrate, and a method of applying the liquid crystal group A method of mixing and applying the gap material for a liquid crystal display will be briefly described with reference to FIGS. 10 and 11.

FIG. 10 is a sectional view showing a method of applying a liquid crystal group to the surface of a liquid crystal display substrate. In the figure, the surface of the liquid crystal display substrate 12 is the same as that of the second embodiment (see FIG. 8).
Alternatively, the fine grooves 31 are formed in advance by the method described in FIG. 9) or the like, and the alignment treatment is performed. Then, the liquid crystal group 33 which is atomized and conveyed by the fog guiding nozzle, and further charged by the static electricity generating nozzle 20 is applied to the surface of the liquid crystal display substrate 12 at an arbitrary film thickness. After that, the substrates for the liquid crystal display are bonded together in the vacuum device to complete the liquid crystal display.

FIG. 11 is a sectional view showing a method of mixing and applying a liquid crystal group and a gap material on the surface of a liquid crystal display substrate. In the figure, an arbitrary liquid crystal display gap forming material 32 is mixed in the liquid crystal group 33, and the liquid crystal group 33 and the liquid crystal display gap forming material 32 atomized by the ultrasonic vibrator are passed through an air flow or a gas. The mist is transported by a flow, and the mist is electrified by a static electricity generator (not shown) to fly the mist while repelling the gap members, so that the mist is applied to the surface of the liquid crystal display substrate 12. When the desired film thickness is reached, the liquid crystal display substrate substrates are bonded together in a vacuum device.

By carrying out this method, it is not necessary to inject a liquid crystal group into an empty cell in which liquid crystal display glass members are bonded together in a vacuum device, which is required in the conventional apparatus. A liquid crystal display having a uniform gap can be manufactured.

Next, a method of applying the liquid crystal display gap material forming material at a predetermined position on the surface of the liquid crystal display substrate will be described.

FIG. 12 is a cross-sectional view showing a method of applying a gap material forming material to a predetermined position on the surface of a liquid crystal display substrate. In the figure, fine grooves 31 are formed in advance on the surface of the liquid crystal display substrate 12, and an alignment treatment is performed. Here, the mask 9 with the hollow pattern is charged by using the voltage varying device 34. Then, the gap forming material 32 for a liquid crystal display is mixed in a volatile solvent or pure water and atomized and conveyed. Then, the volatile solvent or pure water is volatilized, and by being charged by the static electricity generating nozzle 20, only the liquid crystal display gap forming material 32 repels and disperses, and passes through the mask 9 with the hollow pattern and flies. Is dropped onto the surface of the liquid crystal display substrate 12 and applied.

By carrying out this method, the gap material forming material can be applied to the surface of the liquid crystal display substrate at regular intervals. Further, by disposing the hollow pattern mask in consideration of the positions of the pixels of the liquid crystal display substrate, the gap material forming material can be applied to the liquid crystal display substrate other than the pixels. By the above method,
The display quality of the liquid crystal display is improved, and the coating method in which the gap material forming material is not present in the display pixel can provide a display with good contrast.

Example 4 In this example, a method of forming a conductive film on the surface of a liquid crystal display substrate using a mixture of conductive particles in a liquid crystal display thin film material solution will be described.

FIG. 13 is a sectional view showing a method of forming a conductive thin film on the surface of a liquid crystal display substrate. In the figure,
The conductive particles 38 are mixed in a thin film material special solution for a liquid crystal display to prepare a volatilization preventing liquid. The volatilization preventive liquid can control the film quality of the special solution for thin film material for liquid crystal display. The thin film material special solution 37 for liquid crystal display body atomized by the main body of the atomization generator is charged by the static electricity generation nozzle 20 and is applied to the surface of the liquid crystal display substrate 12 together with the conductive particles 38. At least two or more electrode probes 35 are brought into contact with each electrode pattern 39 formed in advance on the surface of the liquid crystal display substrate 12, and a voltage is applied by a voltage controller 36 to adjust the amount of fog applied. Control. Simultaneously with the coating, the conductive thin film 40 is formed by baking with a heater (not shown) installed on the liquid crystal display substrate table 14.
Can be formed.

By carrying out this method, a substrate for a liquid crystal display with a conductive thin film having a low resistance value can be realized.

(Embodiment 5) In this embodiment, a method of flattening the surface of a liquid crystal display substrate on which a step pattern is previously formed will be described.

FIG. 14 is a sectional view showing a method for flattening the surface of the liquid crystal display substrate. In the figure, it is assumed that a step pattern 43 is previously formed on the surface of the liquid crystal display substrate 12 by a process such as photoetching. Here, a mixture of the liquid crystal display planarizing solution 41 and the volatilization preventing liquid is atomized by the atomization generator main body, and further charged by the static electricity generation nozzle 20. The charged fog is applied onto the step pattern 43 on the surface of the liquid crystal display substrate 12, and as a result, the step pattern 43 is formed.
A flattening film 42 can be formed on the surface of the.

By carrying out this method, a flattening film in the submicron unit can be formed, so that the gap of the liquid crystal display can be made uniform and the gradation of the liquid crystal display device can be displayed with high precision. In this example, when the step pattern 43 on the surface of the liquid crystal display substrate 12 had a step of 0.5 μm to 1.5 μm, the flattening solution for liquid crystal display 4 according to the present method was used.
1 was mixed with the volatilization preventive liquid to form a mist, which was electrostatically charged and applied on the step pattern 43.
A flattening film having a flatness in the range of 0Å to 100Å could be formed.

(Embodiment 6) In the present embodiment, it will be described that the reflection film of the light guide plate of the surface illumination for liquid crystal display device can be made dark and light by controlling the charge amount of static electricity.

FIG. 15 is a perspective view showing a method for realizing the shading of the reflection film of the light guide plate of the surface lighting device for a liquid crystal display device according to the present invention. In the figure, the solvent 44 containing particles for the reflective film is diluted with a diluent to obtain a solution having a viscosity of several tens cps, atomized by the atomization generator main body, and further charged by the static electricity generation nozzle 20. The charged mist is the light guide plate 45.
Apply on top. At this time, it is possible to realize the shading of the reflection film 46 by coating the light guide plate 45 while changing the static charge amount from −60 kv to −10 kv by the static amount control device.

FIG. 16 is a cross-sectional view of a surface illumination device for a liquid crystal display device, which incorporates a grayscale light guide plate 45 realized by using the method shown in FIG. In the figure, a light beam generated by a light source 49 is directly or via a mirror 48 a light guide plate 45.
Is guided inside. The light ray that has proceeded into the light guide plate 45 is refracted inside the light guide plate 45, is reflected by the reflection film 46 that is formed in a light and shade manner, and is guided to the light collection film 47. At this time, since the reflection film 46 is formed thicker as it goes away from the light source 49, the amount of reflected light rays changes according to the distance from the light source, and many light rays are reflected by the reflection film far from the light source. become. As a result, the surface illumination can be made uniform.

FIG. 17 shows luminance measurement data of the surface illumination device for a liquid crystal display body by this gradation formation. Luminance data 5
0 has an average luminance of 500 nits or more, and the in-plane luminance distribution is ± 2% or less. By applying this method to the light guide plate, it becomes possible to perform bright and uniform surface illumination as a surface illumination device for a liquid crystal display device. In addition, members for flattening the brightness, such as a diffusion film and a light-condensing film, which have been used conventionally, are not required.

(Other Examples) In this example, after the thin film material solution (or paint) for liquid crystal display is atomized, the surface of the substrate for liquid crystal display ( Alternatively, an apparatus for forming a thin film on a liquid crystal display member) will be described.

FIG. 18 is a diagram showing an embodiment of the control system (control means) of the substrate coating apparatus according to the present invention. In the figure, the fog generated by the atomization generation unit 51 is configured to be conveyed to the static electricity generation nozzle 20, and further configured to be charged by the static electricity generation nozzle 20 and applied to the substrate 12. There is. This is a configuration common to many of the embodiments described above.

Now, the substrate coating apparatus is controlled by the personal computer 54. The static electricity amount control device 21 that determines the amount of electrification with respect to fog is connected to a personal computer 54 via a voltage variable device 52 configured by a D / A converter or the like, and can generate an arbitrary voltage within a predetermined range. . First, the voltage varying device 52 is instructed to change the voltage from the personal computer 54, a predetermined static electricity is generated, the fog is charged, and a thin film is formed on the substrate. The state of the thin film formed on the substrate is detected by the plurality of charge amount sensors 56 provided on the back surface of the substrate 12, and the I / O unit 55 is detected.
Is input to the personal computer 54 via. The personal computer 54 controls the static electricity amount control device 21 based on the input data and operates to form a desired thin film.

Such a static electricity amount control program is
The data is stored in the data storage device 53, and the procedure and method for forming various coating films can be stored. With this system configuration, it is possible to control the film thickness, film quality, and shading of the coating, and to perform manufacturing control for forming various functional films.

Next, an apparatus for uniformly coating a plurality of surfaces (both surfaces, step surfaces, edges, etc.) of the liquid crystal display substrate will be described.

FIG. 19 is a sectional view of the double-sided coating device. In the figure, the front and back surfaces of the liquid crystal display substrate 12 are coated on both sides with a fog 5 of a different liquid crystal display material solution. This can be performed by moving the two static electricity generation nozzles 20 in parallel and at right angles (in the direction of the arrow shown in FIG. 19) with respect to the liquid crystal display substrate 12 by the static electricity amount control device 21. By carrying out this method, it is possible to simultaneously form a pattern on both surfaces of the composite.

The method of coating a substrate according to the present invention comprises
In addition to the substrates for liquid crystal displays, substrates that have been processed into any shape (such as substrates with hollow shapes) and the side surfaces of the
It can also be applied to a coating method for uniformly forming an organic thin film. Here, an example applied to the electrode film forming process of the crystal unit will be described.

FIG. 20 shows a perspective view of a forming method in which a solvent is atomized and uniformly applied on the surface and side surfaces of a substrate having a hollow shape. By atomizing the organic material solution (photosensitive resist) and charging the fine mist 30 with the static electricity generating nozzle 20, it is possible to coat the surface and the side surface of the quartz substrate 57. By carrying out this method, it becomes possible to easily form a thin film not only on a conventional flat plate-shaped substrate but also on a substrate formed in an arbitrary shape.

In addition to the above, as a solution for atomizing and charging, an inorganic material solution (for example, a solution containing ceramic particles) or the like can be used to easily form a thin film on the quartz substrate 57.

Further, even in a film forming process other than the manufacturing process of forming the electrode film of the crystal unit described here,
A thin film can be formed by the substrate coating method and apparatus of the present invention.

[0081]

As described above, the present invention has the following effects.

The method of coating a substrate of the present invention is the method of coating a substrate in which a thin film material solution is applied, in which the substrate is placed on a grounded table,
A uniform thin film can be formed on the surface or member of the substrate by including the step of granulating the thin film material solution and charging the thin film material solution and the step of applying the charged thin film material solution to the substrate. . In the step of applying, a charged mask is placed on the substrate, and a granular thin film material solution is applied to the substrate through the mask, so that a thin film pattern of an arbitrary shape can be formed by using the mask. As a result, the photo-etching step, which is an indispensable selective pattern forming method, can be eliminated as a post-step of the entire surface coating. Further, in the above substrate coating method, the granular thin film material solution is conveyed by using gas, and the gas is caused to flow intermittently, whereby fine grooves can be formed on the surface of the substrate.

The method of manufacturing a liquid crystal display of the present invention is the method of manufacturing a liquid crystal display in which a thin film material solution is applied to a substrate, the step of disposing the substrate on a grounded table, and granulating the thin film material solution. By providing the step of charging the thin film material solution and the step of applying the charged thin film material solution to the substrate, it becomes possible to form a uniform thin film on the surface of the substrate or on the member for liquid crystal display. In the step of applying, a charged mask is placed on the substrate, and a granular thin film material solution is applied to the substrate through the mask, whereby a thin film pattern of an arbitrary shape can be formed by using the mask. Therefore, the photo-etching step, which is an indispensable method of forming a selective pattern, can be omitted as a post-step of the entire surface coating.

The method of manufacturing a liquid crystal display of the present invention is
In a method of manufacturing a liquid crystal display device, in which a thin film material solution and a gap forming material are applied to a substrate, a step of disposing the substrate on a grounded table, the thin film material solution and the gap forming material are each granulated, and the thin film material solution and the gap are formed. By providing the step of charging the forming material and the step of applying the charged thin film material solution and the charged gap forming material to the substrate, a thin film is formed on the surface of the substrate and the gap forming material is evenly formed. Disperse,
Also, the work of fixing can be performed at the same time.

The method of manufacturing a liquid crystal display of the present invention is
In a method of manufacturing a liquid crystal display body, in which a liquid crystal and a gap forming material are applied to a substrate, a step of disposing the substrate on a grounded table, a step of granulating the liquid crystal and the gap forming material, respectively, and charging the liquid crystal and the gap forming material. , And a step of applying the charged liquid crystal and the charged gap forming material to the substrate,
Since the work of injecting the liquid crystal group into the empty cell in which the liquid crystal display glass is bonded together in the vacuum device is eliminated, a liquid crystal display body having a uniform gap can be easily manufactured.

The method for producing a liquid crystal display of the present invention is
In a method for manufacturing a liquid crystal display device, in which a thin film material solution and a conductive material are applied to a substrate, a step of disposing the substrate on a grounded table, the thin film material solution and the conductive material are respectively granulated to form the thin film material solution and the conductive material. By comprising a step of charging and a step of applying the charged thin film material solution and the charged conductive material to the substrate,
A substrate with a conductive thin film having a low resistance value can be realized.

The method of manufacturing the liquid crystal display of the present invention is
In a method of manufacturing a liquid crystal display, in which a thin film material solution is applied to a substrate on which a pattern is formed, a step of disposing the substrate on a grounded table, a step of granulating the thin film material solution and charging the thin film material solution, and A flattening film can be formed on the surface of the substrate by including the step of applying the charged thin film material solution to the substrate and the pattern. Accordingly, even if the surface of the substrate for liquid crystal display and the member for liquid crystal display have some irregularities, a thin film of high quality can be uniformly formed.

The substrate coating apparatus of the present invention is a substrate coating apparatus in which a thin film material solution is applied to a substrate to form a thin film. A static electricity generating device, a coating device that coats the charged thin film material solution on the substrate, a charge amount sensor that detects the charge amount of the thin film, and the charge amount of the thin film material solution based on the data of the charge amount sensor. By having the static electricity amount control device to be set, it becomes possible to form a uniform thin film on the surface of the substrate or the member for liquid crystal display. Further, it is possible to control the film thickness, film quality and shading of the coating. As a result, it becomes possible to perform manufacturing control for forming various functional films. Further, since the atomization generator has a plurality of nozzles that convey the granular thin film material solution, the granular thin film material solution can be simultaneously applied to different surfaces of the substrate. Thereby, a thin film can be formed at high speed.

The method of manufacturing a surface lighting device of the present invention is a method of manufacturing a surface lighting device in which a reflective film solvent is applied to form a reflective film on a light guide plate, and the light guide plate is placed on a grounded table. By providing the step of granulating the reflective film solvent and charging the reflective film solvent and the step of applying the charged reflective film solvent to the light guide plate, bright and uniform illumination can be realized in surface illumination. It is possible to obtain a possible surface lighting device.

Further, the method for coating a substrate of the present invention,
Since the substrate coating apparatus, the liquid crystal display manufacturing method, and the surface lighting apparatus manufacturing method do not require mechanical precision because they are non-contact coating methods, an inexpensive coating apparatus can be realized. Furthermore, the solvent used in the photo-etching process becomes unnecessary, which is effective as a measure for preventing environmental damage.

[Brief description of drawings]

FIG. 1 is a sectional view of the overall configuration showing an embodiment of a substrate coating apparatus of the present invention.

FIG. 2 is a perspective view showing a typical example of performing coating by moving a substrate or a nozzle.

FIG. 3 is a perspective view showing an embodiment of a method for forming a mosaic pattern using a mask.

FIG. 4 is a perspective view showing an example of a method for forming a stripe pattern using a mask.

FIG. 5 is a perspective view showing an embodiment of a method for forming a uniform thin film on the entire surface.

FIG. 6 is a perspective view showing an example of a method of forming a mosaic pattern on the entire surface using a mask.

FIG. 7 is a perspective view showing an example of a method of forming a stripe pattern on the entire surface using a mask.

FIG. 8 is a perspective view showing an example of a coating method for aligning liquid crystals.

FIG. 9 is a cross-sectional view showing a method of aligning liquid crystal and a method of uniformly dispersing and simultaneously applying a gap forming material for a liquid crystal display.

FIG. 10 is a cross-sectional view showing an example of a method of applying a liquid crystal group.

FIG. 11 is a cross-sectional view showing an example of a method of mixing and applying a liquid crystal group and a gap material.

FIG. 12 is a cross-sectional view showing an example of a method of applying a gap material forming material to a predetermined position on a substrate.

FIG. 13 is a cross-sectional view showing an example of a method of forming a conductive thin film.

FIG. 14 is a cross-sectional view showing an example of a method of flattening the surface of a liquid crystal display substrate on which a step pattern is formed.

FIG. 15 is a perspective view showing an embodiment of a method for graying a reflector of a light guide plate in a surface lighting device for a liquid crystal display device of the present invention.

FIG. 16 is a sectional view showing an example of a surface lighting device for a liquid crystal display device of the present invention.

17 is a luminance measurement graph of the surface illumination device for a liquid crystal display device of FIG.

FIG. 18 is a diagram showing an example of a control system of the substrate coating apparatus of the present invention.

FIG. 19 is a cross-sectional view showing an example of a double-sided coating device.

FIG. 20 is a perspective view showing an example of a method of coating a quartz substrate (a substrate having a hollow shape).

[Explanation of symbols]

1 Ultrasonic Transducer 2 Atomization Generator Main Body 3 Liquid Crystal Display Thin Film Material Solution 4 Solvent Tank 5 Mist of Liquid Crystal Display Film Thin Film Material Solution 6 Fog Induction Nozzle 7 Blow Nozzle 8 Atomization Generator Y Direction Moving Motor 9 Mask with hollow pattern 10 Mask holding jig 11, 23 Coating film 12 Liquid crystal display substrate 13 Liquid crystal display substrate table receiving portion 14 Liquid crystal display substrate table 15 Heater 16 Table body 17 Table sliding shaft 18 Liquid Crystal Display Substrate Table X Direction Moving Motor 19 Atomization Generator Sliding Shaft 20 Static Electricity Generation Nozzle 21 Static Electricity Control Device 22, 34 Voltage Variable Device 24, 24 'Mosaic Pattern Film 25, 25' Hollow Mosaic Patterned mask 26, 26 'Stripe pattern film 27, 27' Mask 28 with hollow stripe pattern Angular static electricity generating nozzle 29 Dispersion nozzle 30 Fog of alignment film material solution for liquid crystal display 31 Fine grooves 32 Liquid crystal display gap forming material 33 Liquid crystal group 35 Electrode probe 36 Voltage control device 37 Liquid crystal display thin film material special solution 38 Conductive particle 39 Electrode pattern 40 Conductive thin film 41 Flattening solution for liquid crystal display 42 Flattening film 43 Step pattern 44 Solvent containing reflective film particles 45 Light guide plate 46 Reflective film 47 Condensing film 48 Mirror 49 Light source 50 Luminance data 51 Atomization generation Unit 52 Voltage variable device 53 Data saver 54 Personal computer 55 IO unit 56 Charge amount sensor 57 Crystal substrate

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ identification code FI G02F 1/1337 G02F 1/1337 (58) Fields investigated (Int.Cl. ⁷ , DB name) B05B 5/025 B05B 5/08 B05D 1/04 B05D 1/32 G02F 1/1333 G02F 1/1337

Claims (10)

(57) [Claims] 1. A method for coating a substrate, which comprises applying a thin film material solution to a substrate, arranging the substrate on a grounded table, and granulating the thin film material solution to charge the thin film material solution. And a step of applying the charged thin film material solution to the substrate, wherein the applying step includes a tip of a nozzle for charging the thin film material solution and a surface of the substrate. 1mm spacing
A coating method for a substrate, wherein a charged mask is set to be 10 mm, a charged mask is disposed close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask. 2. The method for coating a substrate according to claim 1, wherein the granular thin film material solution is conveyed by using a gas, and the gas is caused to flow intermittently. 3. A method of manufacturing a liquid crystal display device, which comprises applying a thin film material solution to a substrate, arranging the substrate on a grounded table, and granulating the thin film material solution to charge the thin film material solution. And a step of applying the charged thin film material solution to the substrate, wherein the applying step includes a tip of a nozzle for charging the thin film material solution and a surface of the substrate. 1mm distance from
A method for manufacturing a liquid crystal display device, wherein the charged mask is set to be close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask. 4. A method of manufacturing a liquid crystal display, comprising applying a thin film material solution and a gap forming material to a substrate, the step of disposing the substrate on a grounded table, and the thin film material solution and the gap forming material. And a step of charging the thin film material solution and the gap forming material into granules, and a step of applying the charged thin film material solution and the charged gap forming material to the substrate. In the attaching step, the distance between the tip of the nozzle for charging the thin film material solution and the gap forming material and the surface of the substrate is set to 1 mm to 10 mm, and the charged mask is attached to the surface of the substrate. And at least one of the granular thin film material solution and the granular gap forming material through the mask. Method of manufacturing a liquid crystal display element, characterized in that to coated on. 5. A method of manufacturing a liquid crystal display body, wherein a liquid crystal and a gap forming material are applied to a substrate, the step of disposing the substrate on a grounded table, and the liquid crystal and the gap forming material are each granulated. And a step of applying the charged liquid crystal and the charged gap forming material to the substrate, wherein the applying step includes applying the liquid crystal and the gap forming material. The gap between the tip of the nozzle for charging the gap forming material and the surface of the substrate is set to 1 mm to 10 mm, the charged mask is arranged in proximity to the surface of the substrate, and the granular gap forming material is used. Is applied to the substrate through the mask, and a method for manufacturing a liquid crystal display body. 6. A method of manufacturing a liquid crystal display body, wherein a thin film material solution and a conductive material are applied to a substrate, the step of disposing the substrate on a grounded table, and the thin film material solution and the conductive material being granular, respectively. And a step of charging the thin film material solution and the conductive material, and a step of applying the charged thin film material solution and the charged conductive material to the substrate, the step of applying The distance between the tip of the nozzle for charging the thin film material solution and the conductive material and the surface of the substrate is set to 1 mm to 10 mm, and the charged mask is arranged in proximity to the surface of the substrate, A method for manufacturing a liquid crystal display, comprising applying the granular thin film material solution to the substrate through the mask. 7. A method of manufacturing a liquid crystal display, comprising applying a thin film material solution to a patterned substrate, the step of disposing the substrate on a grounded table, and the thin film material solution being granulated. A step of charging the thin film material solution; and a step of applying the charged thin film material solution to the substrate and the pattern, wherein the applying step comprises a nozzle for charging the thin film material solution The distance between the tip of the substrate and the surface of the substrate is 1 mm
A method for manufacturing a liquid crystal display device, wherein the charged mask is set to be close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask. 8. A substrate coating apparatus for forming a thin film by coating a thin film material solution on a substrate, an atomization generator for granulating the thin film material solution, and static electricity for charging the thin film material solution, Further, a static electricity generating nozzle for coating the substrate with a charged thin film material solution, a charge amount sensor for detecting the charge amount of the thin film, and charging of the thin film material solution based on the data of the charge amount sensor. And a static electricity amount control device for setting an amount, wherein the static electricity generation nozzle has a distance between the tip of the static electricity generation nozzle and the surface of the substrate set to 1 mm to 10 mm, and the charged mask is of the substrate. A substrate coating apparatus, which is disposed close to a surface and applies the granular thin film material solution to the substrate through the mask. 9. The substrate coating apparatus according to claim 8, wherein the atomization generator includes a plurality of nozzles that convey the granular thin film material solution. 10. A method of manufacturing a surface lighting device, wherein a reflective film solvent is applied to form a reflective film on a light guide plate, the method comprising: disposing the light guide plate on a grounded table; And a step of charging the reflective film solvent, and a step of applying the charged reflective film solvent to the light guide plate, the applying step for charging the reflective film solvent The distance between the tip of the nozzle and the surface of the light guide plate is 1 mm.
A method for manufacturing a surface lighting device, wherein the surface area of the substrate is set to 10 mm, a charged mask is disposed close to the surface of the substrate, and the granular thin film material solution is applied to the substrate through the mask.