JP2000106409A - Electronic component container - Google Patents

Electronic component container

Info

Publication number
JP2000106409A
JP2000106409A JP10274800A JP27480098A JP2000106409A JP 2000106409 A JP2000106409 A JP 2000106409A JP 10274800 A JP10274800 A JP 10274800A JP 27480098 A JP27480098 A JP 27480098A JP 2000106409 A JP2000106409 A JP 2000106409A
Authority
JP
Japan
Prior art keywords
electronic component
weight
insulating
sealing material
insulating base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10274800A
Other languages
Japanese (ja)
Inventor
Yoshiaki Ito
吉明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP10274800A priority Critical patent/JP2000106409A/en
Publication of JP2000106409A publication Critical patent/JP2000106409A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15312Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a pin array, e.g. PGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Abstract

PROBLEM TO BE SOLVED: To provide an electronic component container capable of normally and stably actuating an electronic component for a long term by effectively avoiding the action of electromagnetic waves on an electronic component contained in a container also airtightly sealing the electronic component in the container without deteriorating the characteristics of the electronic component at all. SOLUTION: In an electronic component container composed of an insulating base substance 1 having a mounting part 1a mounting an electronic component 3 and an insulating cover body 2 so that the electronic component 3 may be airtightly contained in the container by junctioning the insulating base substance 1 with the insulating cover body 2 through the intermediary of a sealing material 8, the sealing material 8 made of a glassy ingredient containing inorganic filler and a metallic filler in larger particle diameter than that of the inorganic filler also to be coated on the whole surface on the insulating base substance 1 side of the insulating cover body 2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体素子や圧電振
動子等の電子部品を気密に封止して収容するための電子
部品収納用容器に関し、特に封止材にガラスを用いて封
止を行う電子部品収納用容器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component storage container for hermetically sealing and storing electronic components such as a semiconductor element and a piezoelectric vibrator. The present invention relates to a container for storing electronic components.

【0002】[0002]

【従来の技術】従来、半導体集積回路素子をはじめとす
る半導体素子あるいは水晶振動子、弾性表面波素子とい
った圧電振動子等の電子部品を収容するための電子部品
収納用容器は、例えば、酸化アルミニウム質焼結体等の
電気絶縁材料から成り、その上面或いは下面の略中央部
に電子部品を収容するための凹部を有し、該凹部から下
面にかけてタングステンやモリブデン等の高融点金属粉
末から成る複数個のメタライズ配線層が被着形成されて
いる絶縁基体と、電子部品を外部電気回路に電気的に接
続するために前記メタライズ配線層に銀ロウ等のロウ材
を介して取着されている外部リード端子と、酸化アルミ
ニウム質焼結体等の電気絶縁材料から成る絶縁蓋体とか
ら構成されている。
2. Description of the Related Art Conventionally, electronic component storage containers for storing electronic components such as semiconductor devices including semiconductor integrated circuit devices or piezoelectric vibrators such as crystal vibrators and surface acoustic wave devices have been made of, for example, aluminum oxide. Having a concave portion for accommodating an electronic component at a substantially central portion of an upper surface or a lower surface thereof, and a plurality of high melting point metal powders such as tungsten and molybdenum from the concave portion to the lower surface. An insulating base on which a number of metallized wiring layers are formed and an external substrate attached to the metallized wiring layer via a brazing material such as silver brazing in order to electrically connect electronic components to an external electric circuit. It comprises a lead terminal and an insulating lid made of an electrically insulating material such as an aluminum oxide sintered body.

【0003】そして、電子部品が、例えば、半導体素子
の場合には、絶縁基体の凹部の底面に半導体素子をガラ
ス、樹脂、ロウ材等から成る接着材を介して接着固定す
るとともに半導体素子の各電極とメタライズ配線層とを
ボンディングワイヤ等の電気的接続手段を介して電気的
に接続し、しかる後、絶縁基体の上面に絶縁蓋体を低融
点ガラスから成る封止材を介して接合させ、絶縁基体と
絶縁蓋体とから成る容器内部に半導体素子を気密に収容
することによって最終製品としての半導体装置と成る。
In the case where the electronic component is, for example, a semiconductor element, the semiconductor element is bonded and fixed to the bottom surface of the concave portion of the insulating base via an adhesive made of glass, resin, brazing material or the like. The electrode and the metallized wiring layer are electrically connected via an electrical connection means such as a bonding wire, and thereafter, the insulating lid is joined to the upper surface of the insulating base via a sealing material made of low-melting glass, A semiconductor device as a final product is obtained by hermetically housing a semiconductor element inside a container including an insulating base and an insulating lid.

【0004】また電子部品が、例えば、圧電振動子の場
合には、絶縁基体の凹部の底面に形成された段差部に圧
電振動子の一端を導電性エポキシ樹脂等から成る接着材
を介して接着固定するとともに圧電振動子の各電極をメ
タライズ配線層に電気的に接続し、しかる後、絶縁基体
の上面に絶縁蓋体を低融点ガラスから成る封止材を介し
て接合させ、絶縁基体と絶縁蓋体とから成る容器内部に
圧電振動子を気密に収容することによって最終製品とし
ての電子部品装置となる。
When the electronic component is, for example, a piezoelectric vibrator, one end of the piezoelectric vibrator is bonded to a step formed on the bottom surface of the concave portion of the insulating base via an adhesive made of a conductive epoxy resin or the like. At the same time, the electrodes of the piezoelectric vibrator are electrically connected to the metallized wiring layer, and then the insulating lid is joined to the upper surface of the insulating base via a sealing material made of low-melting glass, thereby insulating the insulating base from the insulating base. An electronic component device as a final product is obtained by hermetically housing the piezoelectric vibrator in a container including a lid.

【0005】なお、前記絶縁基体と絶縁蓋体とを接合さ
せる封止材としては、−般に酸化鉛56乃至66重量
%、酸化ホウ素4乃至14重量%、酸化珪素1乃至6重
量%、酸化ビスマス0.5乃至5重量%、酸化亜鉛0.
5乃至3重量%を含むガラス成分に、フィラーとしての
コージェライト系化合物を9乃至19重量%、チタン酸
鉛系化合物を10乃至20重量%添加したガラスが使用
されている。
As a sealing material for joining the insulating base and the insulating lid, generally, 56 to 66% by weight of lead oxide, 4 to 14% by weight of boron oxide, 1 to 6% by weight of silicon oxide, Bismuth 0.5-5% by weight, zinc oxide 0.
Glasses containing 5 to 3% by weight of a glass component and 9 to 19% by weight of a cordierite-based compound as a filler and 10 to 20% by weight of a lead titanate-based compound are used.

【0006】[0006]

【発明が解決しようとする課選】しかしながら、この従
来の電子部品収納用容器においては、絶縁基体や絶縁蓋
体を形成する酸化アルミニウム質焼結体等のセラミック
ス及び絶縁基体と蓋体とを接合させ電子部品を内部に気
密に封止するガラスがいずれも電磁波を透過し易く、そ
のため外部電気回路基板等に他の電子部品とともに実装
した場合、隣接する電子部品間に電磁波の相互干渉が起
こり電子部品に誤動作を起こさせるという問題を有して
いた。特に最近では外部電気回路基板に電子部品が極め
て高密度に実装され、隣接する電子部品間の距離が極め
て狭いものとなってきており、この電磁波の相互干渉に
よる問題は極めて大きなものとなってきた。
However, in this conventional electronic component storage container, a ceramic such as an aluminum oxide sintered body forming an insulating base and an insulating lid, and the insulating base and the lid are joined together. Any glass that hermetically seals electronic components inside is easily transmitted by electromagnetic waves, so when mounted together with other electronic components on an external electric circuit board or the like, mutual interference of electromagnetic waves occurs between adjacent electronic components and the There has been a problem that a component may malfunction. In particular, recently, electronic components have been mounted on an external electric circuit board at a very high density, and the distance between adjacent electronic components has become extremely small. The problem due to the mutual interference of electromagnetic waves has become extremely large. .

【0007】またこの従来の電子部品収納用容器におい
ては、絶縁基体に絶縁蓋体を接合させる封止材である低
融点ガラスの軟化溶融温度が約400℃程度であるこ
と、近時の電子部品は高密度化、高集積化に伴って耐熱
性が低下してきたこと等から、絶縁基体と絶縁蓋体とを
封止材を介して接合し、絶縁基体と絶縁蓋体とからなる
絶縁容器の内部に電子部品を気密に収容した場合、封止
材を溶融させる熱が内部に収容する電子部品に作用して
電子部品の特性に劣化を招来させ、電子部品を正常に作
動させることができないという問題点も有していた。
In this conventional electronic component storage container, the softening and melting temperature of the low-melting glass, which is a sealing material for bonding the insulating cover to the insulating base, is about 400 ° C .; Since the heat resistance has been reduced due to the high density and high integration, the insulating base and the insulating lid are joined via a sealing material, and the insulating container composed of the insulating base and the insulating lid is When the electronic components are housed in an airtight manner, the heat of melting the sealing material acts on the electronic components housed therein, causing deterioration of the characteristics of the electronic components, and the electronic components cannot be operated normally. There were also problems.

【0008】更に、電子部品を絶縁基体の凹部の底面あ
るいは段差部ヘポリイミド導電性樹脂等から成る樹脂製
の接着材を介して接着固定した場合、電子部品を接着固
定する接着材の耐熱性が低いため、接着材に封止材を溶
融させる熱が作用すると電子部品の接着固定が破れ、そ
の結果、電子部品を常に、安定に作動させることができ
なくなるという問題点も有していた。
Further, when the electronic component is bonded and fixed to the bottom surface of the concave portion or the step portion of the insulating base via a resin adhesive made of a polyimide conductive resin or the like, the heat resistance of the adhesive for bonding and fixing the electronic component is reduced. Due to the low temperature, there is also a problem that when heat for melting the sealing material acts on the adhesive, the adhesive fixing of the electronic component is broken, and as a result, the electronic component cannot always be operated stably.

【0009】本発明は、上記問題点に鑑み案出されたも
ので、その目的は容器内部に収容する電子部品に電磁波
が作用するのを有効に防止するとともに容器内部に電子
部品をその特性に劣化を招来することなく気密に封止
し、電子部品を長期間にわたり正常、かつ安定に作動さ
せることができる電子部品収納用容器を提供することに
ある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to effectively prevent electromagnetic waves from acting on electronic components housed inside a container, and to provide electronic components inside the container with its characteristics. An object of the present invention is to provide an electronic component storage container that can be hermetically sealed without causing deterioration and can operate electronic components normally and stably for a long period of time.

【0010】[0010]

【課題を解決するための手段】本発明は、電子部品が載
置される載置部を有する絶縁基体と絶縁蓋体から成り、
絶縁基体と絶縁蓋体とを封止材を介し接合することによ
って内部に電子部品を気密に収容するように成した電子
部品収納用容器であって、前記封止材はガラス成分に無
機物フィラーと、該無機物フィラーより粒径が大きい金
属フィラーを含有させてなり、かつ絶縁蓋体の絶縁基体
側の全面に被着されていることを特徴とするものであ
る。
SUMMARY OF THE INVENTION The present invention comprises an insulating base having an installation portion on which an electronic component is mounted, and an insulating lid.
An electronic component storage container formed by joining an insulating base and an insulating lid via a sealing material to hermetically accommodate electronic components therein, wherein the sealing material includes a glass component and an inorganic filler. And a metal filler having a particle size larger than that of the inorganic filler, and is covered on the entire surface of the insulating cover on the insulating substrate side.

【0011】また本発明は、前記金属フィラーの平均粒
径が無機物フィラーの平均粒径よりも2乃至10倍大き
いことを特徴とするものである。
The present invention is also characterized in that the average particle size of the metal filler is 2 to 10 times larger than the average particle size of the inorganic filler.

【0012】また本発明は、前記封止材のガラス成分が
酸化鉛50乃至65重量%、酸化ホウ素2乃至10重量
%、フッ化鉛10乃至30重量%、酸化亜鉛1乃至6重
量%、酸化ビスマス10乃至20重量%を含むガラスか
ら成ることを特徴とするものである。
In the present invention, the glass component of the sealing material may be 50 to 65% by weight of lead oxide, 2 to 10% by weight of boron oxide, 10 to 30% by weight of lead fluoride, 1 to 6% by weight of zinc oxide, It is characterized by being made of glass containing 10 to 20% by weight of bismuth.

【0013】また本発明は、前記封止材の金属フィラー
が鉄ーニッケル合金及び/又は鉄ーニッケルーコバルト
合金から成り、無機物フィラーがチタン酸鉛系化合物か
ら成り、かつ金属フィラーの含有量が5乃至10重量
%、無機物フィラーの含有量が26乃至45重量%であ
ることを特徴とするものである。
[0013] Further, in the present invention, the metal filler of the encapsulant is made of an iron-nickel alloy and / or an iron-nickel-cobalt alloy, the inorganic filler is made of a lead titanate compound, and the content of the metal filler is 5%. To 10% by weight, and the content of the inorganic filler is 26 to 45% by weight.

【0014】本発明の電子部品収納用容器によれば、絶
縁基体と絶縁蓋体とを接合させ、絶縁基体と絶縁蓋体と
から成る容器内部に電子部品を気密に封止する封止材を
ガラス成分に無機物フィラーと、該無機物フィラーより
粒径が大きい金属フィラーを含有させた導電性のものと
するとともに該封止材を絶縁基体と絶縁蓋体の接合領域
のみならず絶縁蓋体の絶縁基体側の全面に被着させたこ
とから絶縁基体と絶縁蓋体とを封止材を介して接合し、
内部に電子部品を気密に収容封止した際、内部に収容さ
れる電子部品は前記導電性の封止材でシールドされるこ
ととなり、その結果、外部ノイズが絶縁蓋体を介して入
り込むのを有効に防止することができ、容器内部の電子
部品を長期間にわたり正常、かつ安定に作動させること
ができる。
According to the electronic component storage container of the present invention, the sealing member for joining the insulating base and the insulating lid and hermetically sealing the electronic component inside the container including the insulating base and the insulating lid is provided. The glass component contains an inorganic filler and a metal filler having a larger particle diameter than the inorganic filler. The sealing material is not only the insulating region of the insulating cover but also the insulating region of the insulating cover. Since it was attached to the entire surface on the base side, the insulating base and the insulating lid were joined via a sealing material,
When the electronic components are housed and sealed in an airtight manner, the electronic components housed inside are shielded by the conductive sealing material. As a result, external noise is prevented from entering through the insulating lid. The electronic components inside the container can be operated normally and stably for a long period of time.

【0015】また本発明の電子部品収納用容器によれ
ば、絶縁基体と絶縁蓋体とを接合させる封止材として、
酸化鉛50乃至65重量%、酸化ホウ素2乃至10重量
%、フッ化鉛10乃至30重量%、酸化亜鉛1乃至6重
量%、酸化ビスマス10乃至20重量%を含むガラス成
分に、無機物フィラーとしてチタン酸鉛系化合物を26
乃至45重量%、金属フィラーとして鉄ーニッケル合金
及び/又は鉄ーニッケルーコバルト合金を5乃至10重
量%添加したものを使用すると封止材の軟化溶融温度が
350℃以下となり、絶縁基体と絶縁蓋体とを封止材を
介して接合させ、絶縁基体と絶縁蓋体とから成る容器内
部に電子部品を気密に収容する際、封止材を溶融させる
熱が内部に収容する電子部品に作用しても電子部品の特
性に劣化を招来することはなく、その結果、電子部品を
長期間にわたり正常、かつ安定に作動させることが可能
となる。
Further, according to the electronic component storage container of the present invention, as a sealing material for joining the insulating base and the insulating lid,
A glass component containing 50 to 65% by weight of lead oxide, 2 to 10% by weight of boron oxide, 10 to 30% by weight of lead fluoride, 1 to 6% by weight of zinc oxide and 10 to 20% by weight of bismuth oxide, and titanium as an inorganic filler. 26 lead acid compounds
When a metal filler containing 5 to 10% by weight of an iron-nickel alloy and / or an iron-nickel-cobalt alloy is used as a metal filler, the softening and melting temperature of the sealing material becomes 350 ° C. or lower, and the insulating base and the insulating lid When the electronic component is air-tightly housed in a container formed of an insulating base and an insulating lid, the heat for melting the sealing material acts on the electronic component housed therein. However, the characteristics of the electronic component do not deteriorate, and as a result, the electronic component can be operated normally and stably for a long period of time.

【0016】また同時に封止材の軟化溶融温度が350
℃以下であり、低温であることから絶縁基体と絶縁蓋体
とを封止材を介して接合させ、絶縁基体と絶縁蓋体とか
ら成る容器の内部に電子部品を気密に収容する際、封止
材を溶融させる熱によって電子部品を絶縁基体の凹部の
底面あるいは段差部へ接着固定するポリイミド導電性樹
脂等から成る樹脂製の接着材が劣化することもなく、こ
れによって電子部品を絶縁基体の凹部の底面あるいは段
差部へ接着材を介して極めて強固に接着固定することが
可能となり、電子部品を常に、安定に作動させることが
できる。
At the same time, the softening and melting temperature of the sealing material is 350
° C or lower, and since the temperature is low, the insulating base and the insulating lid are joined via a sealing material, and when the electronic component is air-tightly housed in a container including the insulating base and the insulating lid, the sealing is performed. The resin component made of a polyimide conductive resin or the like that adheres and fixes the electronic component to the bottom surface or the step portion of the concave portion of the insulating base is not degraded by the heat of melting the stopper, and thereby the electronic component is attached to the insulating base. It is possible to extremely firmly adhere and fix the bottom surface or the step portion of the concave portion via the adhesive, and the electronic component can always be operated stably.

【0017】[0017]

【発明の実施の形態】次に、本発明を添付図面に基づき
詳細に説明する。図1は本発明の電子部品収納用容器の
実施の形態の一例を示す断面図であり、同図においては
電子部品が半導体素子であり、電子部品収納用容器が半
導体素子収納用パッケージである場合の例を示してい
る。
Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view illustrating an example of an embodiment of an electronic component storage container according to the present invention, in which the electronic component is a semiconductor element and the electronic component storage container is a semiconductor element storage package. Is shown.

【0018】図1において、1は絶縁基体、2は絶縁蓋
体である。この絶縁基体1と絶縁蓋体2とで半導体素子
3を収容するための容器4が構成される。
In FIG. 1, reference numeral 1 denotes an insulating base, and 2 denotes an insulating lid. The insulating base 1 and the insulating lid 2 constitute a container 4 for housing the semiconductor element 3.

【0019】前記絶縁基体1は酸化アルミニウム質焼結
体等の電気絶縁材料から成り、その上面の略中央部に半
導体素子3を載置収容するための空所を形成する凹部1
aが設けて有り、該凹部1a底面には半導体素子3がエ
ポキシ樹脂等の接着材を介して取着される。
The insulating substrate 1 is made of an electrically insulating material such as an aluminum oxide sintered body, and has a recess 1 for forming a cavity for placing and housing the semiconductor element 3 at a substantially central portion of the upper surface thereof.
The semiconductor element 3 is attached to the bottom of the recess 1a via an adhesive such as epoxy resin.

【0020】前記絶縁基体1は、酸化アルミニウム質焼
結体から成る場合、酸化アルミニウム、酸化珪素、酸化
マグネシウム、酸化カルシウム等の原料粉末に適当な有
機バインダー、溶剤、可塑剤、分散剤等を添加混合して
泥漿物を作り、該泥漿物を従来周知のドクターブレード
法やカレンダーロール法等のシート成形法を採用しシー
ト状に成形してセラミツクグリーンシート(セラミック
生シート)を得、しかる後、それらセラミックグリーン
シートに適当な打ち抜き加工を施すとともにこれを複数
枚積層し、約1600℃の高温で焼成することによって
製作される。
When the insulating substrate 1 is made of an aluminum oxide sintered body, an appropriate organic binder, a solvent, a plasticizer, a dispersant and the like are added to raw material powders of aluminum oxide, silicon oxide, magnesium oxide, calcium oxide and the like. The slurry is mixed to form a slurry, and the slurry is formed into a sheet by using a sheet forming method such as a doctor blade method or a calender roll method, which is conventionally known, to obtain a ceramic green sheet (ceramic green sheet). The ceramic green sheet is manufactured by performing an appropriate punching process, laminating a plurality of the sheets, and firing at a high temperature of about 1600 ° C.

【0021】また前記絶縁基体1は凹部1aから下面に
かけて複数個のメタライズ配線層5が被着形成されてお
り、該メタライズ配線層5の凹部1a側の端部には半導
体素子3の各電極がボンディングワイヤ6を介して電気
的に接続され、また絶縁基体1の下面に導出された部位
には外部電気回路と接続される外部リード端子7が銀ロ
ウ等のロウ材を介して取着されている。
A plurality of metallized wiring layers 5 are formed on the insulating substrate 1 from the concave portion 1a to the lower surface, and each electrode of the semiconductor element 3 is provided at an end of the metallized wiring layer 5 on the concave portion 1a side. An external lead terminal 7 electrically connected via a bonding wire 6 and connected to an external electric circuit at a portion led out to the lower surface of the insulating base 1 is attached via a brazing material such as silver brazing. I have.

【0022】前記メタライズ配線層5は半導体素子3の
各電極を外部電気回路に電気的に接続する際の導電路と
して作用し、タングステン、モリブデン、マンガン等の
高融点金属粉末により形成されている。
The metallized wiring layer 5 functions as a conductive path when each electrode of the semiconductor element 3 is electrically connected to an external electric circuit, and is formed of a refractory metal powder such as tungsten, molybdenum, and manganese.

【0023】なお、前記メタライズ配線層5はタングス
テン、モリブデン、マンガン等の高融点金属粉末に適当
な有機溶剤、溶媒、可塑剤等を添加混合して得た金属ペ
ーストを従来周知のスクリーン印刷法等の厚膜手法を採
用して絶縁基体1となるセラミックグリーンシートに予
め印刷塗布しておき、これをセラミックグリーンシート
と同時に焼成することによって絶縁基体1の凹部1aか
ら下面にかけて所定パターンに被着形成される。
The metallized wiring layer 5 is formed by mixing a metal paste obtained by adding a suitable organic solvent, solvent, plasticizer, etc. to a high melting point metal powder such as tungsten, molybdenum, manganese or the like by a conventionally known screen printing method or the like. Is applied in advance to a ceramic green sheet serving as the insulating base 1 by employing the thick film method described above, and is baked simultaneously with the ceramic green sheet to form a predetermined pattern from the concave portion 1a to the lower surface of the insulating base 1. Is done.

【0024】また、前記メタライズ配線層5はその表面
にニッケル、金等の艮導電性で耐蝕性及びロウ材との濡
れ性が良好な金属をめっき法により1〜20μmの厚み
に被着させておくと、メタライズ配線層5の酸化腐蝕を
有効に防止することができるとともにメタライズ配線層
5とボンディングワイヤ6との接続及びメタライズ配線
層5と外部リード端子7とのロウ付けを極めて強固とな
すことができる。従って、前記メタライズ配線層5の酸
化腐蝕を防止し、メタライズ配線層5とボンディングワ
イヤ6との接続及びメタライズ配線層5と外部リード端
子7とのロウ付けを強固となすには、メタライズ配線層
5の表面にニッケル、金等をめっき法により1〜20μ
mの厚みに被着させておくことが好ましい。
The metallized wiring layer 5 is formed by depositing a metal having good conductivity, corrosion resistance and good wettability with a brazing material such as nickel and gold on the surface thereof in a thickness of 1 to 20 μm by plating. In other words, it is possible to effectively prevent oxidation corrosion of the metallized wiring layer 5 and to make the connection between the metallized wiring layer 5 and the bonding wire 6 and the brazing between the metallized wiring layer 5 and the external lead terminals 7 extremely strong. Can be. Therefore, in order to prevent the metallized wiring layer 5 from being oxidized and corroded, and to make the connection between the metallized wiring layer 5 and the bonding wires 6 and the brazing between the metallized wiring layer 5 and the external lead terminals 7 firm, Nickel, gold, etc. on the surface of the plating by 1-20μ
m.

【0025】更に前記メタライズ配線層5にロウ付けさ
れる外部リード端子7は容器4の内部に収容する半導体
素子3を外部電気回路に接続する作用をなし、外部リー
ド端子7を外部電気回路に接続することによって内部に
収容される半導体素子3はボンディングワイヤ6、メタ
ライズ配線層5及び外部リード端子7を介して外部電気
回路に電気的に接続されることとなる。
Further, the external lead terminals 7 brazed to the metallized wiring layer 5 serve to connect the semiconductor element 3 housed in the container 4 to an external electric circuit, and connect the external lead terminals 7 to the external electric circuit. As a result, the semiconductor element 3 housed inside is electrically connected to an external electric circuit via the bonding wire 6, the metallized wiring layer 5, and the external lead terminal 7.

【0026】前記外部リード端子7は鉄ーニッケルーコ
バルト合金や鉄ーニッケル合金等の金属材料から成り、
鉄ーニッケルーコバルト合金等のインゴット(塊)に圧
延加工法や打ち抜き加工法等、従来周知の金属加工法を
施すことによって所定の形状に形成される。
The external lead terminal 7 is made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy.
It is formed in a predetermined shape by subjecting an ingot such as an iron-nickel-cobalt alloy to a conventionally known metal working method such as a rolling method or a punching method.

【0027】前記外部リード端子7はまたその表面にニ
ッケル、金等の良導電性で、かつ耐蝕性に優れた金属を
めっき法により1〜20μmの厚みに被着させておく
と、外部リード端子7の酸化腐蝕を有効に防止すること
ができるとともに外部リード端子7と外部電気回路との
電気的接続を良好となすことができる。そのため、前記
外部リード端子7はその表面にニッケル、金等をめっき
法により1〜20μmの厚みに被着させておくことが好
ましい。
When the external lead terminal 7 is coated with a metal having good conductivity and excellent corrosion resistance, such as nickel or gold, to a thickness of 1 to 20 μm by plating, the external lead terminal 7 may be provided. 7 can be effectively prevented, and the electrical connection between the external lead terminal 7 and the external electric circuit can be made good. Therefore, it is preferable that nickel, gold, or the like be applied to the surface of the external lead terminal 7 by plating to a thickness of 1 to 20 μm.

【0028】更に前記外部リード端子7が取着された絶
縁基体1はその上面に酸化アルミニウム質焼結体等の電
気絶縁材料から成る絶縁蓋体2が封止材8を介して接合
され、これによって絶縁基体1と絶縁蓋体2とから成る
容器4内部に半導体素子3が気密に封止される。
Further, the insulating base 1 to which the external lead terminals 7 are attached is joined to the upper surface of an insulating lid 2 made of an electrically insulating material such as an aluminum oxide sintered body via a sealing material 8. As a result, the semiconductor element 3 is hermetically sealed inside the container 4 including the insulating base 1 and the insulating lid 2.

【0029】前記絶縁蓋体2は酸化アルミニウム質焼結
体から成る場合、例えば、酸化アルミニウム、酸化珪
素、酸化マグネシウム、酸化カルシウム等の原料粉末に
適当な有機バインダー、溶剤、可塑剤、分散剤等を添加
混合して得た原料粉末を所定のプレス金型内に充填する
とともに一定圧力で押圧して成形し、しかる後、前記成
形品を約1500℃の温度で焼成することによって製作
される。
When the insulating lid 2 is made of an aluminum oxide sintered body, for example, an organic binder, a solvent, a plasticizer, a dispersant, etc. suitable for a raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc. The raw material powder obtained by adding and mixing is pressed into a predetermined press mold and pressed at a constant pressure to form the molded product. Thereafter, the molded product is sintered at a temperature of about 1500 ° C.

【0030】また前記絶縁基体1と絶縁蓋体2とを接合
させる封止材8は導電性を帯びたガラスから成り、例え
ば、酸化鉛50乃至65重量%、酸化ホウ素2乃至10
重量%、フッ化鉛10乃至30重量%、酸化亜鉛1乃至
6重量%、酸化ビスマス10乃至20重量%を含むガラ
ス成分にチタン酸鉛系化合物を無機物フィラーとして2
6乃至45重量%、鉄ーニッケル合金及び/又は鉄ーニ
ッケルーコバルト合金を金属フィラーとして5乃至10
重量%含有させたものが好適に使用され、封止の作業性
を向上させるために絶縁蓋体2の絶縁基体1側に予め被
着されている。
The sealing material 8 for joining the insulating base 1 and the insulating lid 2 is made of conductive glass, for example, 50 to 65% by weight of lead oxide and 2 to 10% of boron oxide.
% Of lead fluoride, 10 to 30% by weight of lead fluoride, 1 to 6% by weight of zinc oxide, and 10 to 20% by weight of bismuth oxide.
6 to 45% by weight of iron-nickel alloy and / or iron-nickel-cobalt alloy as metal filler
% Is preferably used, and is previously attached to the insulating base 1 side of the insulating cover 2 in order to improve the sealing workability.

【0031】前記封止材8の絶縁蓋体2への被着は、チ
タン酸鉛系化合物の無機物フィラーと鉄ーニッケル合金
及び/又は鉄ーニッケルーコバルト合金の金属フィラー
を含有するガラスに適当な有機溶剤、溶媒を添加混合す
ることによって得たガラスペーストを絶縁蓋体2の絶縁
基体1側表面に従来周知のスクリーン印刷法等により所
定厚みに印刷塗布することによって行われる。
The sealing material 8 is applied to the insulating cover 2 by applying a glass containing an inorganic filler of a lead titanate compound and a metal filler of an iron-nickel alloy and / or an iron-nickel-cobalt alloy. An organic solvent and a glass paste obtained by adding and mixing a solvent are printed and applied to a predetermined thickness on the surface of the insulating cover 2 on the insulating substrate 1 side by a conventionally known screen printing method or the like.

【0032】更に前記導電性を帯びている封止材8は絶
縁蓋体2と絶縁基体1との接合領域のみならず絶縁蓋体
2の絶縁基体1側全面に被着されている。そのため半導
体素子3を収容する絶縁基体1の凹部1aは前記導電性
を帯びている封止材8によってシールドされることとな
り、その結果、外部ノイズが絶縁蓋体2を介して入り込
むのが有効に防止され、容器4内部の半導体素子3を長
期間にわたり正常、かつ安定に作動させることができ
る。
Further, the conductive sealing material 8 is applied not only to the joining region between the insulating cover 2 and the insulating base 1 but also to the entire surface of the insulating cover 2 on the insulating base 1 side. Therefore, the concave portion 1a of the insulating base 1 for housing the semiconductor element 3 is shielded by the conductive sealing material 8, so that external noise can effectively enter through the insulating lid 2. Thus, the semiconductor element 3 inside the container 4 can be operated normally and stably for a long period of time.

【0033】また同時に内部に収容した半導体素子3等
から発生するノイズも絶縁蓋体2を介して外部に漏れる
ことが有効に防止され、半導体素子3の発生するノイズ
が他の装置に入り込んで誤動作等の悪影響を与えること
も極小となる。
At the same time, noise generated from the semiconductor element 3 and the like housed therein is effectively prevented from leaking to the outside via the insulating cover 2, and the noise generated by the semiconductor element 3 enters another device and malfunctions. The adverse effects such as are also minimized.

【0034】なお、前記導電性を帯びている封止材8は
ガラス成分として酸化鉛50乃至65重量%、酸化ホウ
素2乃至10重量%、フッ化鉛10乃至30重量%、酸
化亜鉛1乃至6重量%、酸化ビスマス10乃至20重量
%を含むガラスを使用する場合、かかるガラスの軟化溶
融温度が350℃以下と低いことからこの封止材8を用
いて絶縁基体1と絶縁蓋体2とを接合させ、容器4を気
密に封止する際、封止材8を溶融させる熱が内部に収容
する半導体素子3に作用してもその温度が低いため半導
体素子3の特性に劣化を招来することはなく、半導体素
子3を長斯間にわたり正常、かつ安定に作動させること
が可能となる。また同時に半導体素子3が絶縁基体1の
凹部1aに樹脂製の接着材を介して接着固定されている
場合、該樹脂製接着材は封止材8の軟化溶融温度が35
0℃以下と低いことから封止材8を軟化溶融させる熱に
よって特性が大きく劣化することはなく、これによって
半導体素子3を絶縁基体1の凹部1aに極めて強固に接
着固定しておくことが可能となり、半導体素子3を常
に、安定に作動させることができる。
The conductive sealing material 8 is composed of 50 to 65% by weight of lead oxide, 2 to 10% by weight of boron oxide, 10 to 30% by weight of lead fluoride, and 1 to 6% of zinc oxide as glass components. When the glass containing 10 to 20% by weight of bismuth oxide is used, since the softening and melting temperature of the glass is as low as 350 ° C. or less, the insulating base 1 and the insulating lid 2 are formed using the sealing material 8. When joining and sealing the container 4 in an airtight manner, even if heat for melting the sealing material 8 acts on the semiconductor element 3 housed therein, the temperature is low, so that the characteristics of the semiconductor element 3 are deteriorated. However, the semiconductor element 3 can be operated normally and stably over a long period of time. At the same time, when the semiconductor element 3 is bonded and fixed to the concave portion 1a of the insulating base 1 via a resin adhesive, the resin adhesive has a softening / melting temperature of the sealing material 8 of 35.
Since the temperature is as low as 0 ° C. or less, the characteristics are not significantly deteriorated by the heat of softening and melting the sealing material 8, whereby the semiconductor element 3 can be extremely firmly adhered and fixed to the concave portion 1 a of the insulating base 1. Thus, the semiconductor element 3 can always be operated stably.

【0035】更に、前記封止材8はそれを酸化鉛50乃
至65重量%、酸化ホウ素2乃至10重量%、フッ化鉛
10乃至30重量%、酸化亜鉛1乃至6重量%、酸化ビ
スマス10乃至20重量%を含むガラスで形成した場
合、酸化鉛の量が50重量%未満であるとガラスの軟化
溶融温度が高くなって、容器4を気密封止する際の熱に
よって半導体素子3の特性に劣化を招来してしまい、ま
た65重量%を超えるとガラスの耐薬品性が低下し、容
器4の気密封止の信頼性が大きく低下してしまう。従っ
て、前記酸化鉛の量は50乃至65重量%の範囲として
おくことが好ましい。
Further, the encapsulant 8 comprises 50 to 65% by weight of lead oxide, 2 to 10% by weight of boron oxide, 10 to 30% by weight of lead fluoride, 1 to 6% by weight of zinc oxide, and 10 to 10% by weight of bismuth oxide. When formed of glass containing 20% by weight, if the amount of lead oxide is less than 50% by weight, the softening / melting temperature of the glass becomes high, and the heat generated when the container 4 is hermetically sealed may affect the characteristics of the semiconductor element 3. If the content exceeds 65% by weight, the chemical resistance of the glass decreases, and the reliability of hermetic sealing of the container 4 is greatly reduced. Therefore, it is preferable that the amount of the lead oxide be in the range of 50 to 65% by weight.

【0036】また酸化ホウ素の量は2重量%未満である
とガラスの軟化溶融温度が高くなって、容器4を気密封
止する際の熱によって半導体素子3の特性に劣化を招釆
してしまい、また10重量%を超えるとガラスの耐薬品
性が低下し、容器4の気密封止の信頼性が大きく低下し
てしまう。従って、前記酸化ホウ素の量は2乃至10重
量%の範囲としておくことが好ましい。
If the amount of boron oxide is less than 2% by weight, the softening and melting temperature of the glass increases, and the heat generated when the container 4 is hermetically sealed causes deterioration of the characteristics of the semiconductor element 3. If the content exceeds 10% by weight, the chemical resistance of the glass is reduced, and the reliability of hermetic sealing of the container 4 is greatly reduced. Therefore, it is preferable that the amount of the boron oxide be in the range of 2 to 10% by weight.

【0037】またフッ化鉛の量は10重量%未満である
とガラスの軟化溶融温度が高くなって、容器4を気密封
止する際の熱によって半導体素子3の特性に劣化を招来
してしまい、また30重量%を超えるとガラスの耐薬品
性が低下し、容器4の気密封止の信頼性が大きく低下し
てしまう。従って、前記フッ化鉛の量は10乃至30重
量%の範囲としておくことが好ましい。
If the amount of lead fluoride is less than 10% by weight, the softening and melting temperature of the glass increases, and the heat generated when the container 4 is hermetically sealed causes deterioration of the characteristics of the semiconductor element 3. If it exceeds 30% by weight, the chemical resistance of the glass is reduced, and the reliability of hermetic sealing of the container 4 is greatly reduced. Therefore, it is preferable that the amount of the lead fluoride be in the range of 10 to 30% by weight.

【0038】また酸化亜鉛の量は1重量%未満であると
ガラスの耐薬品性が低下し、容器4の気密封止の信頼性
が大きく低下してしまい、また6重量%を超えるとガラ
スの結晶化が進んで流動性が大きく低下し、容器4の気
密封止が困難となってしまう。従って、前記酸化亜鉛の
量は1乃至6重量%の範囲としておくことが好ましい。
If the amount of zinc oxide is less than 1% by weight, the chemical resistance of the glass is reduced, and the reliability of hermetic sealing of the container 4 is greatly reduced. As the crystallization proceeds, the fluidity is greatly reduced, and it becomes difficult to hermetically seal the container 4. Therefore, it is preferable that the amount of the zinc oxide be in the range of 1 to 6% by weight.

【0039】また酸化ビスマスの量は10重量%未満で
あるとガラスの軟化溶融温度が高くなって、容器4を気
密封止する際の熱によって半導体素子3の特性に劣化を
招来してしまい、また20重量%を超えるとガラスの結
晶化が進んで流動性が大きく低下し、容器4の気密封止
が困難となってしまう。従って、前記酸化ビスマスの量
は10乃至20重量%の範囲としておくことが好まし
い。
If the amount of bismuth oxide is less than 10% by weight, the softening and melting temperature of the glass becomes high, and the heat at the time of hermetically sealing the container 4 causes the characteristics of the semiconductor element 3 to be deteriorated. On the other hand, if it exceeds 20% by weight, the crystallization of the glass proceeds and the fluidity is greatly reduced, making it difficult to hermetically seal the container 4. Therefore, the amount of bismuth oxide is preferably set in the range of 10 to 20% by weight.

【0040】また前記封止材8に含有される無機物フィ
ラーは封止材8の熱膨張係数を調整し、絶縁基体1と絶
縁蓋体2とに封止材8を強固に接合させ、容器4の気密
封止の信頼性を大きく向上させるとともに封止材8の機
械的強度を向上させる作用をなし、チタン酸鉛系化合物
が好適に使用され、その含有量は26重量%未満である
と封止材8の熱膨張係数が絶縁基体1及び絶縁蓋体2の
熱膨張係数に対し大きく相違して封止材8を絶縁基体1
及び絶縁蓋体2に強固に接合させることができなくな
り、また45重量%を超えると封止材8の流動性が大き
く低下し、容器4の気密封止が困難となってしまう。従
って、前記チタン酸鉛系化合物を無機物フィラーとして
封止材8に含有させた場合、その量は26乃至45重量
%の範囲としておくことが好ましい。
The inorganic filler contained in the sealing material 8 adjusts the coefficient of thermal expansion of the sealing material 8 so that the sealing material 8 is firmly joined to the insulating base 1 and the insulating lid 2. Has a function of greatly improving the reliability of hermetic sealing and improving the mechanical strength of the sealing material 8, and a lead titanate-based compound is suitably used. If its content is less than 26% by weight, the sealing is performed. Since the thermal expansion coefficient of the stopper 8 is significantly different from the thermal expansion coefficients of the insulating base 1 and the insulating lid 2, the sealing material 8 is
In addition, it cannot be firmly joined to the insulating lid 2, and if it exceeds 45% by weight, the fluidity of the sealing material 8 is greatly reduced, and the hermetic sealing of the container 4 becomes difficult. Therefore, when the lead titanate-based compound is contained in the sealing material 8 as an inorganic filler, the amount is preferably in the range of 26 to 45% by weight.

【0041】また前記封止材8に含有される金属フィラ
ーは封止材8に導電性を付与する作用をなし、鉄ーニッ
ケル合金及び/又は鉄ーニッケルーコバルト合金が好適
に使用され、その量が5重量%未満であると封止材8の
導電性が低下し、絶縁蓋体2の絶縁基体1側の全面を導
電性の膜で完全に被覆することが困難となり、また20
重量%を超えると封止材8の流動性が低下し、容器4の
気密封止が困難となってしまう。従って、前記鉄ーニッ
ケル合金及び/又は鉄ーニッケルーコバルト合金を金属
フィラーとして封止材8に含有させた場合、その量は5
乃至20重量%の範囲としておくことが好ましい。
The metal filler contained in the sealing material 8 has an effect of imparting conductivity to the sealing material 8, and an iron-nickel alloy and / or an iron-nickel-cobalt alloy is preferably used. Is less than 5% by weight, the conductivity of the sealing material 8 decreases, making it difficult to completely cover the entire surface of the insulating cover 2 on the insulating base 1 side with a conductive film.
If the content is more than 10% by weight, the fluidity of the sealing material 8 decreases, and it becomes difficult to hermetically seal the container 4. Therefore, when the iron-nickel alloy and / or the iron-nickel-cobalt alloy is contained in the sealing material 8 as a metal filler, the amount is 5%.
It is preferable to set it in the range of 20 to 20% by weight.

【0042】更に前記導電性を帯びている封止材8に金
属フィラーとして鉄ーニッケル合金及び/又は鉄ーニッ
ケルーコバルト合金を含有させた場合、金属フィラーの
粒径が30μm未満となると封止材8の導電性が低下し
て外部ノイズが絶縁蓋体2を介して容器4内部に入り込
むのを有効に防止するのが困難となり、また70μmを
超えると封止材8の流動性が低下し、容器4の気密封止
が困難となる傾向にある。従って、前記鉄ーニッケル合
金及び/又は鉄ーニッケルーコバルト合金を金属フィラ
ーとして封止材8に含有させた場合、その粒径は30乃
至70μmの範囲としておくこが好ましい。
Further, when the conductive sealing material 8 contains an iron-nickel alloy and / or an iron-nickel-cobalt alloy as a metal filler, if the particle size of the metal filler is less than 30 μm, the sealing material is 8, it becomes difficult to effectively prevent external noise from entering the inside of the container 4 through the insulating lid 2, and if it exceeds 70 μm, the fluidity of the sealing material 8 decreases, It tends to be difficult to hermetically seal the container 4. Therefore, when the iron-nickel alloy and / or the iron-nickel-cobalt alloy is contained in the sealing material 8 as a metal filler, it is preferable that the particle size is in the range of 30 to 70 μm.

【0043】前記封止材8はまたガラス成分に含有され
る金属フィラーの平均粒径が無機物フィラーの平均粒径
よりも大きくなっており、これによって絶縁蓋体2の絶
縁基体1側の全面に被着させる際、封止材8の金属フィ
ラー同士が互いに確実に接触して絶縁蓋体2の絶縁基体
1側の全面を導電性の膜で完全に被覆することができ
る。
In the sealing material 8, the average particle diameter of the metal filler contained in the glass component is larger than the average particle diameter of the inorganic filler. At the time of application, the metal fillers of the sealing material 8 are reliably brought into contact with each other, so that the entire surface of the insulating lid 2 on the insulating base 1 side can be completely covered with the conductive film.

【0044】なお、前記金属フィラーの平均粒径は無機
物フィラーの平均粒径に対し2倍未満の大きさであると
絶縁蓋体2の絶縁基体1側の全面を導電性の膜で完全に
被覆することが困難となり、また10倍を超えると封止
材8の流動性が低下し、容器4の気密封止の信頼性が劣
化してしまう危険性がある。従って、前記封止材8の金
属フィラーの平均粒径は無機物フィラーの平均粒径に対
し2乃至10倍の範囲としておくことが好ましい。
If the average particle size of the metal filler is less than twice the average particle size of the inorganic filler, the entire surface of the insulating cover 2 on the insulating substrate 1 side is completely covered with the conductive film. If the ratio exceeds 10 times, the fluidity of the sealing material 8 decreases, and the reliability of the hermetic sealing of the container 4 may be degraded. Therefore, it is preferable that the average particle diameter of the metal filler of the sealing material 8 is in a range of 2 to 10 times the average particle diameter of the inorganic filler.

【0045】かくして上述の半導体素子収納用パッケー
ジによれば絶縁基体1の凹部1aに半導体素子3をガラ
ス、樹脂、ロウ材等から成る接着材を介して接着固定す
るとともに半導体素子3の各電極をメタライズ配線層5
にボンディングワイヤ6を介して電気的に接続し、しか
る後、絶縁基体1の上面に凹部1aを覆うように絶縁蓋
体2を封止材8を介して接合させ、絶縁基体1と絶縁蓋
体2とから成る容器4の内部に半導体素子3を気密に収
容することによって最終製品としての半導体装置が完成
する。
Thus, according to the above-mentioned package for accommodating a semiconductor element, the semiconductor element 3 is bonded and fixed to the concave portion 1a of the insulating base 1 via an adhesive made of glass, resin, brazing material or the like, and each electrode of the semiconductor element 3 is connected. Metallized wiring layer 5
Is electrically connected to the insulating base 1 via a bonding material 6 so as to cover the concave portion 1 a on the upper surface of the insulating base 1. The semiconductor device 3 as a final product is completed by hermetically housing the semiconductor element 3 in the container 4 formed of the semiconductor device 3.

【0046】また本発明は上述の実施の形態に限定され
るものではなく、本発明の要旨を逸脱しない範囲であれ
ば種々の変更は可能であり、例えば、前述の例では電子
部品として半導体素子を収容する電子部品収納用容器を
例示したが、電子部品が水晶振動子や弾性表面波素子等
であり、これを収容するための電子部品収納用容器にも
適用し得る。
The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. Although the electronic component storage container for storing the electronic component is exemplified, the electronic component is a crystal oscillator, a surface acoustic wave element, or the like, and the present invention can be applied to an electronic component storage container for storing the electronic component.

【0047】更に前述の例ではメタライズ配線層5に外
部リード端子7をロウ付けした電子部品収納用容器を例
示したが、必ずしもこれに限定されるものではなく、メ
タライズ配線層を絶縁基体の下面に導出させ、これをそ
のまま外部電気回路に接続させる端子としたものであっ
てもよい。
Further, in the above-described example, the electronic component storage container in which the external lead terminals 7 are brazed to the metallized wiring layer 5 has been exemplified. However, the present invention is not limited to this, and the metallized wiring layer is formed on the lower surface of the insulating base. It may be a terminal that is derived and used as it is as a terminal that is directly connected to an external electric circuit.

【0048】[0048]

【発明の効果】本発明の電子部品収納用容器によれば、
絶縁基体と絶縁蓋体とを接合させ、絶縁基体と絶縁蓋体
とから成る容器内部に電子部品を気密に封止する封止材
をガラス成分に無機物フィラーと、該無機物フィラーよ
り粒径が大きい金属フィラーを含有させた導電性のもの
とするとともに該封止材を絶縁基体と絶縁蓋体の接合領
域のみならず絶縁蓋体の絶縁基体側の全面に被着させた
ことから絶縁基体と絶縁蓋体とを封止材を介して接合
し、内部に電子部品を気密に収容封止した際、内部に収
容される電子部品は前記導電性の封止材でシールドされ
ることとなり、その結果、外部ノイズが絶縁蓋体を介し
て入り込むのを有効に防止することができ、容器内部の
電子部品を長期間にわたり正常、かつ安定に作動させる
ことができる。
According to the electronic component storage container of the present invention,
The insulating base and the insulating lid are joined together, and a sealing material for hermetically sealing the electronic component inside the container composed of the insulating base and the insulating lid is made of an inorganic filler as a glass component and has a larger particle size than the inorganic filler. Since the sealing material is applied not only to the joint region between the insulating base and the insulating cover, but also to the entire surface of the insulating cover on the insulating base side, the insulating material is insulated from the insulating base. When the electronic component is hermetically sealed inside by joining the lid and the sealing member via a sealing material, the electronic component housed inside is shielded by the conductive sealing material. As a result, In addition, external noise can be effectively prevented from entering through the insulating lid, and the electronic components inside the container can be operated normally and stably for a long period of time.

【0049】また本発明の電子部品収納用容器によれ
ば、絶縁基体と絶縁蓋体とを接合させる封止材として、
酸化鉛50乃至65重量%、酸化ホウ素2乃至10重量
%、フッ化鉛10乃至30重量%、酸化亜鉛1乃至6重
量%、酸化ビスマス10乃至20重量%を含むガラス成
分に、無機物フィラーとしてチタン酸鉛系化合物を26
乃至45重量%、金属フィラーとして鉄ーニッケル合金
及び/又は鉄ーニッケルーコバルト合金を5乃至10重
量%添加したものを使用すると封止材の軟化溶融温度が
350℃以下となり、絶縁基体と絶縁蓋体とを封止材を
介して接合させ、絶縁基体と絶縁蓋体とから成る容器内
部に電子部品を気密に収容する際、封止材を溶融させる
熱が内部に収容する電子部品に作用しても電子部品の特
性に劣化を招来することはなく、その結果、電子部品を
長期間にわたり正常、かつ安定に作動させることが可能
となる。
According to the electronic component storage container of the present invention, as the sealing material for joining the insulating base and the insulating lid,
A glass component containing 50 to 65% by weight of lead oxide, 2 to 10% by weight of boron oxide, 10 to 30% by weight of lead fluoride, 1 to 6% by weight of zinc oxide and 10 to 20% by weight of bismuth oxide, and titanium as an inorganic filler. 26 lead acid compounds
When a metal filler containing 5 to 10% by weight of an iron-nickel alloy and / or an iron-nickel-cobalt alloy is used as a metal filler, the softening and melting temperature of the sealing material becomes 350 ° C. or less, and the insulating base and the insulating lid When the electronic component is air-tightly housed in a container formed of an insulating base and an insulating lid, the heat for melting the sealing material acts on the electronic component housed therein. However, the characteristics of the electronic component do not deteriorate, and as a result, the electronic component can be operated normally and stably for a long period of time.

【0050】また同時に封止材の軟化溶融温度が350
℃以下であり、低温であることから絶縁基体と絶縁蓋体
とを封止材を介して接合させ、絶縁基体と絶縁蓋体とか
ら成る容器の内部に電子部品を気密に収容する際、封止
材を溶融させる熱によって電子部品を絶縁基体の凹部の
底面あるいは段差部へ接着固定するポリイミド導電性樹
脂等から成る樹脂製の接着材が劣化することもなく、こ
れによって電子部品を絶縁基体の凹部の底面あるいは段
差部へ接着材を介して極めて強固に接着固定することが
可能となり、電子部品を常に、安定に作動させることが
できる。
At the same time, the softening and melting temperature of the sealing material is 350
° C or lower, and since the temperature is low, the insulating base and the insulating lid are joined via a sealing material, and when the electronic component is air-tightly housed in a container including the insulating base and the insulating lid, the sealing is performed. The resin component made of a polyimide conductive resin or the like that adheres and fixes the electronic component to the bottom surface or the step portion of the concave portion of the insulating base is not degraded by the heat of melting the stopper, and thereby the electronic component is attached to the insulating base. It is possible to extremely firmly adhere and fix the bottom surface or the step portion of the concave portion via the adhesive, and the electronic component can always be operated stably.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の電子部品収納用容器の一実施例を示す
断面図である。
FIG. 1 is a sectional view showing an embodiment of an electronic component storage container according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・・・絶縁基体 2・・・・・・・絶縁蓋体 3・・・・・・・半導体素子(電子部品) 4・・・・・・・容器 8・・・・・・・封止材 DESCRIPTION OF SYMBOLS 1 ... Insulating base 2 ... Insulating lid 3 ... Semiconductor element (electronic component) 4 ... Container 8 ... ..Sealing materials

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】電子部品が載置される載置部を有する絶縁
基体と絶縁蓋体から成り、絶縁基体と絶縁蓋体とを封止
材を介し接合することによって内部に電子部品を気密に
収容するように成した電子部品収納用容器であって、前
記封止材はガラス成分に無機物フィラーと、該無機物フ
ィラーより粒径が大きい金属フィラーを含有させてな
り、かつ絶縁蓋体の絶縁基体側の全面に被着されている
ことを特徴とする電子部品収納用容器。
An electronic component is hermetically sealed by joining an insulating base and an insulating lid having a mounting portion on which the electronic component is mounted, and joining the insulating base and the insulating lid via a sealing material. An electronic component storage container configured to store therein, wherein the sealing material contains an inorganic filler in a glass component and a metal filler having a larger particle size than the inorganic filler, and an insulating base of an insulating lid body. An electronic component storage container, which is attached to the entire surface on the side.
【請求項2】前記金属フィラーの平均粒径が無機物フィ
ラーの平均粒径よりも2乃至10倍大きいことを特徴と
する請求項1に記載の電子部品収納用容器。
2. The electronic component container according to claim 1, wherein the average particle size of the metal filler is 2 to 10 times larger than the average particle size of the inorganic filler.
【請求項3】前記封止材のガラス成分が酸化鉛50乃至
65重量%、酸化ホウ素2乃至10重量%、フッ化鉛1
0乃至30重量%、酸化亜鉛1乃至6重量%、酸化ビス
マス10乃至20重量%を含むガラスから成ることを特
徴とする請求項1に記載の電子部品収納用容器。
3. The glass component of the sealing material is 50 to 65% by weight of lead oxide, 2 to 10% by weight of boron oxide, and 1% of lead fluoride.
The electronic component storage container according to claim 1, wherein the container is made of glass containing 0 to 30% by weight, zinc oxide 1 to 6% by weight, and bismuth oxide 10 to 20% by weight.
【請求項4】前記封止材の金属フィラーが鉄ーニッケル
合金及び/又は鉄ーニッケルーコバルト合金から成り、
無機物フィラーがチタン酸鉛系化合物から成り、かつ金
属フィラーの含有量が5乃至10重量%、無機物フィラ
ーの含有量が26乃至45重量%であることを特徴とす
る請求項1に記載の電子部品収納用容器。
4. The sealing material according to claim 1, wherein the metal filler comprises an iron-nickel alloy and / or an iron-nickel-cobalt alloy.
2. The electronic component according to claim 1, wherein the inorganic filler is made of a lead titanate-based compound, the content of the metal filler is 5 to 10% by weight, and the content of the inorganic filler is 26 to 45% by weight. Storage container.
JP10274800A 1998-09-29 1998-09-29 Electronic component container Pending JP2000106409A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10274800A JP2000106409A (en) 1998-09-29 1998-09-29 Electronic component container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10274800A JP2000106409A (en) 1998-09-29 1998-09-29 Electronic component container

Publications (1)

Publication Number Publication Date
JP2000106409A true JP2000106409A (en) 2000-04-11

Family

ID=17546750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10274800A Pending JP2000106409A (en) 1998-09-29 1998-09-29 Electronic component container

Country Status (1)

Country Link
JP (1) JP2000106409A (en)

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