JP2000077345A5 - - Google Patents
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- Publication number
- JP2000077345A5 JP2000077345A5 JP1998248635A JP24863598A JP2000077345A5 JP 2000077345 A5 JP2000077345 A5 JP 2000077345A5 JP 1998248635 A JP1998248635 A JP 1998248635A JP 24863598 A JP24863598 A JP 24863598A JP 2000077345 A5 JP2000077345 A5 JP 2000077345A5
- Authority
- JP
- Japan
- Prior art keywords
- control signal
- power
- heater
- supplied
- signal generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10248635A JP2000077345A (ja) | 1998-09-02 | 1998-09-02 | 電気炉制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10248635A JP2000077345A (ja) | 1998-09-02 | 1998-09-02 | 電気炉制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000077345A JP2000077345A (ja) | 2000-03-14 |
| JP2000077345A5 true JP2000077345A5 (cg-RX-API-DMAC10.html) | 2006-01-26 |
Family
ID=17181053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10248635A Withdrawn JP2000077345A (ja) | 1998-09-02 | 1998-09-02 | 電気炉制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000077345A (cg-RX-API-DMAC10.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3403160B2 (ja) | 2000-09-27 | 2003-05-06 | 東京エレクトロン株式会社 | 熱処理装置、熱処理装置用制御装置 |
| JP5374109B2 (ja) * | 2008-10-17 | 2013-12-25 | 株式会社アルバック | 加熱真空処理方法 |
| JP5102861B2 (ja) * | 2010-05-28 | 2012-12-19 | 東京エレクトロン株式会社 | 基板処理システム用加熱装置の昇温制御方法、プログラム、コンピュータ記録媒体及び基板処理システム |
| KR20200078116A (ko) * | 2018-12-21 | 2020-07-01 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
-
1998
- 1998-09-02 JP JP10248635A patent/JP2000077345A/ja not_active Withdrawn
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