JP2000056478A - サイドウォール除去液 - Google Patents

サイドウォール除去液

Info

Publication number
JP2000056478A
JP2000056478A JP22086498A JP22086498A JP2000056478A JP 2000056478 A JP2000056478 A JP 2000056478A JP 22086498 A JP22086498 A JP 22086498A JP 22086498 A JP22086498 A JP 22086498A JP 2000056478 A JP2000056478 A JP 2000056478A
Authority
JP
Japan
Prior art keywords
acid
side wall
sidewall
wiring material
oxidizing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22086498A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000056478A5 (enExample
Inventor
Fujimaro Ogata
不二麿 緒方
Tsutomu Sugiyama
勉 杉山
Kuniaki Miyahara
邦明 宮原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP22086498A priority Critical patent/JP2000056478A/ja
Publication of JP2000056478A publication Critical patent/JP2000056478A/ja
Publication of JP2000056478A5 publication Critical patent/JP2000056478A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22086498A 1998-08-04 1998-08-04 サイドウォール除去液 Pending JP2000056478A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22086498A JP2000056478A (ja) 1998-08-04 1998-08-04 サイドウォール除去液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22086498A JP2000056478A (ja) 1998-08-04 1998-08-04 サイドウォール除去液

Publications (2)

Publication Number Publication Date
JP2000056478A true JP2000056478A (ja) 2000-02-25
JP2000056478A5 JP2000056478A5 (enExample) 2005-10-27

Family

ID=16757750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22086498A Pending JP2000056478A (ja) 1998-08-04 1998-08-04 サイドウォール除去液

Country Status (1)

Country Link
JP (1) JP2000056478A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6173720B1 (en) * 1998-12-02 2001-01-16 International Business Machines Corporation Process for treating a semiconductor substrate
JP2005529487A (ja) * 2002-06-07 2005-09-29 マリンクロッド・ベイカー・インコーポレイテッド 酸化剤および有機溶媒を含有するマイクロエレクトロニクス洗浄組成物
JP2006066533A (ja) * 2004-08-25 2006-03-09 Kanto Chem Co Inc フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法
WO2008114616A1 (ja) 2007-03-16 2008-09-25 Mitsubishi Gas Chemical Company, Inc. 洗浄用組成物、半導体素子の製造方法
US7521406B2 (en) 2004-02-11 2009-04-21 Mallinckrodt Baker, Inc Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
JP2011520142A (ja) * 2008-05-01 2011-07-14 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 高密度注入レジストの除去のための低ｐＨ混合物

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6173720B1 (en) * 1998-12-02 2001-01-16 International Business Machines Corporation Process for treating a semiconductor substrate
JP2005529487A (ja) * 2002-06-07 2005-09-29 マリンクロッド・ベイカー・インコーポレイテッド 酸化剤および有機溶媒を含有するマイクロエレクトロニクス洗浄組成物
KR100958069B1 (ko) * 2002-06-07 2010-05-17 말린크로트 베이커, 인코포레이티드 산화제 및 유기 용매를 포함하는 마이크로일렉트로닉 세정조성물
US7521406B2 (en) 2004-02-11 2009-04-21 Mallinckrodt Baker, Inc Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
KR101316993B1 (ko) * 2004-02-11 2013-10-11 아반토르 퍼포먼스 머티리얼스, 인크. 할로겐 산소산, 염 및 그 유도체를 포함하는 마이크로일렉트로닉 세정 조성물
JP2006066533A (ja) * 2004-08-25 2006-03-09 Kanto Chem Co Inc フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法
WO2008114616A1 (ja) 2007-03-16 2008-09-25 Mitsubishi Gas Chemical Company, Inc. 洗浄用組成物、半導体素子の製造方法
US7977292B2 (en) 2007-03-16 2011-07-12 Mitsubishi Gas Chemical Company, Inc. Cleaning composition and process for producing semiconductor device
JP2011520142A (ja) * 2008-05-01 2011-07-14 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 高密度注入レジストの除去のための低ｐＨ混合物

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