JP2000010267A - Resin composition and its use - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make a phosphor fixable in a good state without irregular luminance or defects by incorporating a phosphor, a base polymer, an ethylenic unsatd. compd. and hydroxy fatty acid. SOLUTION: This compsn. is made to contain a phosphor, a base polymer, an ethylenically unsatd. compd. and hydroxy fatty acid. As for the phosphor, one prepared from rare earth oxyhalide or the like as a mother material which is activated with an activating agent is preferably used. As for the phosphor excited by UV rays, Y2O3: Eu is used and as for the other phosphors, Y2O3S: Eu is used. As for the base polymer, an acrylic resin, polyester resin, polyurethane resin or the like can be used. As for the ethylenically unsatd. compd., ethyleneglycol di(meth)acrylate or the like is used. As for the hydroxy fatty acid, for example, 2-oxy-2-methylpentanoic acid and 2-oxy-5-methylhexanoic acid can be used.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition useful for fixing a phosphor in a partition (cell) at the time of manufacturing a phosphor display device such as a plasma display panel (PDP) and the use of the resin composition. And a method for fixing the phosphor.

[0002]

2. Description of the Related Art Recently, various flat panel display panels have been actively developed. Among them, PDPs have attracted attention. From now on, display screens of laptop personal computers will be used to display various electronic bulletin boards and so-called "wall-mounted". Its use is expanding to TV. A phosphor for display is sealed (fixed) in the cell of the display panel of the PDP, and the phosphor emits color by ultraviolet rays generated by the sealing gas in the cell due to an applied voltage. As a method for fixing the phosphor, a liquid photoresist in which phosphors of each color are dispersed has been used, but recently, two layers of a resin composition layer containing the phosphor and another layer have been used. A method has been proposed. For example, a method has been proposed in which a phosphor-containing photosensitive resin layer and a photosensitive thermoplastic resin layer are provided in a partition to form a phosphor pattern (JP-A-9-199027 and JP-A-9-199030). The present applicant has also proposed a pattern forming method using a laminate of an acrylic resin layer and a phosphor-containing photosensitive resin composition layer (Japanese Unexamined Patent Application Publication No.
-69339). On the other hand, there is also a method of forming a phosphor pattern by providing a phosphor-containing photosensitive resin composition layer containing a specific crystalline vinyl polymerizable polymer binder in a partition (JP-A-9-244230). Proposed.

[0003]

However, Japanese Patent Application Laid-Open Nos. Hei 9-199027 and Hei 9-19903 describe the above.
In the technology disclosed in Japanese Patent Publication No. 0, there is a possibility that the ability to follow the embedding of the resin layer into the partition walls may be insufficient, and since the phosphor-containing layer also contains a photosensitive resin, the phosphor accompanying the curing shrinkage during firing may be used. There is a concern about the occurrence of pattern unevenness.
In the technology disclosed in Japanese Patent No. 9339, although unevenness of the phosphor pattern due to curing shrinkage at the time of firing can be suppressed, the composition layer is inferior in embedding in the partition walls, and furthermore, Japanese Patent Application Laid-Open No. 9-244230. For the technology disclosed in Japanese Patent Publication No.
Actually, there remains a problem that unevenness occurs in the phosphor pattern after firing.

[0004]

In view of the above circumstances, the present inventors have conducted intensive studies and have found that the phosphor (a), the base polymer (b), the ethylenically unsaturated compound (c) and the hydroxy fatty acid The resin composition comprising (d) has excellent storage stability, and further has a layer (I) of the resin composition and a layer containing no phosphor when the phosphor is fixed in the partition (cell) of the plasma display panel. After providing (II) in the partition (cell) and baking it, it was found that a good fixation of the phosphor without luminance unevenness or loss could be performed, and the present invention was completed.

[0005]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The resin composition of the present invention comprises a phosphor (a), a base polymer (b), an ethylenically unsaturated compound (c), and a hydroxy fatty acid (d). Such a phosphor (a) is particularly limited. However, it is preferable to use a rare earth oxyhalide or the like as a base material and to activate the base material with an activator. For example, as an ultraviolet excitation type phosphor, Y ₂ O ₃ : E
u, YVO ₄ : Eu, (red or more), BaAl ₁₂ O ₁₉ :
Mn, Zn ₂ SiO ₄ : Mn, LaPO ₄ : Tb (green above), BaMgAl ₁₄ O ₂₃ : Eu, BaMgAl ₁₆ O
₂₇ : Eu, (above blue) and the like, and other phosphors include Y ₂ O ₃ S: Eu, γ-Zn ₃ (PO ₄ ) ₂ : M
n, (ZnCd) S: Ag + In ₂ O ₃ (red or more), Z
nS: Cu, Al, ZnS: Au, Cu, Al, (Zn
Cd) S: Cu, Al, Zn ₂ SiO ₄ : Mn, As, Y
₃ Al ₅ O ₁₂ : Ce, Gd ₂ O ₂ S: Tb, Y ₃ Al ₅ O ₁₂ :
Tb, ZnO: Zn (more green), ZnS: Ag + red pigment, Y ₂ SiO ₃ : Ce (more blue), etc. can also be used.

As the base polymer (b), acrylic resin, polyester resin, polyurethane resin and the like are used. Among them, (meth) acrylate is a main component, and if necessary, ethylenic resin is used. Acrylic copolymers obtained by copolymerizing saturated carboxylic acids and other copolymerizable monomers are important. An acetoacetyl group-containing acrylic copolymer can also be used. Where (meta)
As acrylic acid esters, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth)
Acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, hydroxyethyl (meth) acrylate, hydroxy Propyl (meth) acrylate,
Glycidyl (meth) acrylate is exemplified.

As the ethylenically unsaturated carboxylic acid, monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid and the like are preferably used. In addition, dicarboxylic acids such as maleic acid, fumaric acid and itaconic acid, and anhydrides thereof are also used. Products and half esters can also be used. Of these, acrylic acid and methacrylic acid are particularly preferred.

When the resin composition of the present invention is a photosensitive resin composition as described below, it is preferable to use a dilute alkali developing type, and when the diluting alkali developing type is used, the above ethylenic non-developable type is used. It is necessary to copolymerize the saturated carboxylic acid at about 15 to 30% by weight (about 100 to 200 mg KOH / g in acid value). Other copolymerizable monomers include:
Examples thereof include acrylamide, methacrylamide, acrylonitrile, methacrylonitrile, styrene, α-methylstyrene, vinyl acetate, and alkyl vinyl ether.

Further, as the ethylenically unsaturated compound (c), ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol Di (meth) acrylate, butylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexane glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerin di (meth) acrylate , Pentaerythritol di (meth) acrylate,
Pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, 2,
2-bis (4- (meth) acryloxydiethoxyphenyl) propane, 2,2-bis- (4- (meth) acryloxypolyethoxyphenyl) propane, 2-hydroxy-3- (meth) acryloyloxypropyl ( (Meth) acrylate, ethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, phthalic acid diglycidyl ester di (meth) acrylate, glycerin triacrylate, glycerin polyglycidyl ether poly (meth) acrylate And other polyfunctional monomers.

An appropriate amount of a monofunctional monomer can be used in combination with these polyfunctional monomers. Examples of the monofunctional monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, -Hydroxybutyl (meth) acrylate, 2-
Phenoxy-2-hydroxypropyl (meth) acrylate, 2- (meth) acryloyloxy-2-hydroxypropyl phthalate, 3-chloro-2-hydroxypropyl (meth) acrylate, glycerin mono (meth)
Acrylate, 2- (meth) acryloyloxyethyl acid phosphate, half (meth) acrylate of a phthalic acid derivative, N-methylol (meth) acrylamide and the like can be mentioned.

Further, as the hydroxy fatty acid (d),
2-oxy-2-methylpentanoic acid, 2-oxy-5
Methylhexanoic acid, 3-oxy-2-methylpentanoic acid, 8-oxytetradecanoic acid, 11-oxytetradecanoic acid, 10-oxyhexadecanoic acid, 11-oxyhexadecanoic acid, 14-oxyhexadecanoic acid, 12-oxidedecanoic acid, 16-oxyhexadecanoic acid, 12-
Oxyoctadecanoic acid, 9-oxyoctadecanoic acid, 2
Examples thereof include 2-oxidecosanoic acid, and preferably, 12-oxyoctadecanoic acid, 8-oxytetradecanoic acid, and 10-oxyhexadecanoic acid are used.

[0012] The resin composition of the present invention comprises the above (a) to
(D), the content of which is not particularly limited, but the content of the phosphor (a) is 100% of the total amount of the base polymer (b) and the ethylenically unsaturated compound (c).
The content is preferably from 1 to 1500 parts by weight, more preferably from 10 to 800 parts by weight, and if the content is less than 1 part by weight, the fixed phosphor pattern becomes insufficient in luminance, and conversely exceeds 1500 parts by weight. The flexibility when formed into a film is undesirably reduced, and the ratio of the ethylenically unsaturated compound (c) to 100 parts by weight of the base polymer (b) is 75 to 500 parts by weight, particularly 150 to 4 parts by weight.
It is preferable to select from the range of 50 parts by weight. If the amount of the ethylenically unsaturated compound (c) is too small, the flexibility of the layer (I) of the resin composition to be described later is lowered, and the sensitivity as described later is reduced. When a photosensitive resin composition is used, poor curing and a delay in development speed are caused, and an excessive amount of the ethylenically unsaturated compound (c) causes a cold flow, and when a photosensitive resin composition as described below is used, Is not preferred because it causes a decrease in the peeling speed of the cured resist. Further, the content of the hydroxy fatty acid (d) is preferably 0.1 to 10 parts by weight, more preferably 1 to 7 parts by weight, based on 100 parts by weight of the total amount of the base polymer (b) and the ethylenically unsaturated compound (c). If the content is less than 0.1 part by weight, sufficient storage stability cannot be obtained, and if it exceeds 10 parts by weight, the dissolving operation of the fatty acid becomes complicated, which is not preferable.

In the present invention, the resin composition is preferably a photosensitive resin composition. In this case, benzoin, benzoin methyl ether, benzoin ethyl ether may be further used as the photopolymerization initiator (e). ,
Benzoin isopropyl ether, benzoin n-butyl ether, benzoin phenyl ether, benzyl diphenyl disulfide, benzyl dimethyl ketal, dibenzyl, diacetyl, anthraquinone, naphthoquinone, 3,3′-dimethyl-4-methoxybenzophenone, benzophenone, 4,4′-bis ( Dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, pivaloin ethyl ether, 1,
1-dichloroacetophenone, pt-butyldichloroacetophenone, hexaarylimidazole dimer (eg, 2,2′-bis (o-chlorophenyl) 4
5,4 ′, 5′-tetraphenyl-1,2-biimidazole, etc.), 2,4-diethylthioxanthone, 9-phenylacridine and the like. The base polymer (b) and the ethylenically unsaturated compound ( c) total amount of 10
It is preferable to add 0.1 to 20 parts by weight to 0 part by weight.

Further, in the present invention, it is preferable to add an inhibitor (f) to the resin composition in order to adjust sensitivity and to further improve the unevenness in the generation of the phosphor pattern. Examples thereof include hydroquinones such as hydroquinone, hydroquinone monomethyl ether, hydroquinone monoethyl ether, hydroquinone monobenzyl ether, hydroquinone monopropyl ether, and parabenzoquinone; thiurams such as tetrabutylthiuram disulfide and tetraethylthiuram disulfide; and 2,2′-methylenebis. (4-ethyl-6-ter
t-butylphenol), 2,2′-methylenebis (4
Methylenebisphenols such as -methyl-6-tert-butylphenol), 2- (2'-hydroxy-
3 ', 5'-di-tert-butylphenol) -5
Triazoles such as chloro-benzotriazole, t-
Butyl catechol and the like, and the total amount of the base polymer (b) and the ethylenically unsaturated compound (c) is 1
It is preferable to add 0.01 to 3 parts by weight to 00 parts by weight.

The resin composition of the present invention further comprises a dye (colored or colored), an adhesion promoter, a plasticizer, an antioxidant, a solvent, a surface tension modifier, a stabilizer, a chain transfer agent,
Additives such as defoamers and flame retardants can also be added as appropriate. Thus, the resin composition of the present invention is obtained. Such a resin composition is useful for fixing a phosphor in a PDP or the like, and a method for fixing the phosphor using such a resin composition will be described in detail. In the present invention, when the phosphor is fixed in the partition (cell) of the plasma display panel, the layer (I) of the resin composition and the layer (II) not containing the phosphor are mixed in the partition (cell). After baking, it is possible to perform good fixing of the phosphor by baking.
The thickness of the layer (I) of this time (h _a) is not be indiscriminately also varies depending on the structure of the content and PDP phosphor, usually thinner is favored over the partition wall side height (h _0), Further, the values of _ha (μm) and h ₀ (μm) are calculated as _ha / h ₀ = 1 /
Is preferably 20 to 15/20, in particular h _a / h ₀
= Preferably 1/20 to 10/20, according h _a / h ₀ is the phosphor insufficient thickness after firing is less than 1/20, the space at the time of cell discharge exceeds 15/20 reversed Is undesirably reduced. It is very preferable that the layer (I) is previously formed into a film or a sheet in terms of uniform dispersibility, followability, workability, and the like of the phosphor.

The layer (II) containing no phosphor is preferably a layer of a photosensitive resin composition, and more specifically, a layer comprising a base polymer, an ethylenic compound, a photopolymerization initiator, and further a hydroxy fatty acid. As the photosensitive resin composition, the base polymer (b), the ethylenically unsaturated compound (c) and the photopolymerization initiator (e), and further, the hydroxy fatty acid (d) can be used in the same manner. Can,
The thickness (h _b ) of the layer (II) containing no phosphor is as follows:
Can not be said categorically also varies depending on the structure of the PDP, usually similar to the above h _a, thinner is more preferable than the partition wall side height (h _0), even according h _b a (μm) h ₀ (μm)
Preferably but is _{h b / h 0 = 1 /} 20~15 / 20, preferably in particular _{h b / h 0 = 1 /} 20~10 / 20, according h _b / h ₀ 1/20 If it is less than 15, it becomes difficult to sufficiently push the resin composition layer (I) into the partition walls (cells). On the other hand, if it exceeds 15/20, the patterning property is undesirably deteriorated. In addition, it is preferable that the layer (II) is formed into a film or a sheet in advance in terms of followability, workability, and the like.

Further, in the layer (II) containing no phosphor, a dye (coloring or coloring), an adhesion-imparting agent, a plasticizer,
Additives such as an antioxidant, a thermal polymerization inhibitor, a solvent, a surface tension modifier, a stabilizer, a chain transfer agent, an antifoaming agent, and a flame retardant can also be appropriately added. It is preferable that the resin composition layer (I) and the phosphor-free layer (II) are previously formed into a film as described above. Specifically, each composition is made of a polyester film, a polypropylene film,
After coating on a base film surface such as a polystyrene film, it is preferable to coat a protective film such as a polyethylene film or a polyvinyl alcohol film on the coated surface to form a laminate, which is then used for fixing the phosphor. Next, a method for fixing the phosphor will be specifically described.

(Formation of Layer (I) of Resin Composition) Base film (polyester film, polyvinyl alcohol film, nylon film, cellulose film, etc.) of a laminate having the above-mentioned resin composition layer (I) as an intermediate layer. The adhesive force between the protective film and the resin composition layer (I) and the adhesive force between the protective film and the resin composition layer (I) are compared. On the side of (I), the resin composition layer (I) is pushed into the partition (cell) by using a hot laminator or the like on the PDP substrate on which the partition (cell) has been formed in advance. (I)
To form (Formation of Phosphor-Free Layer (II)) The film left on the surface of the resin composition layer (I) is peeled off, and a laminate having the phosphor-free layer (II) as an intermediate layer is formed on the film. Similarly to the layer (I) of the resin composition, the layer (II) containing no phosphor is formed by using a hot laminator or the like to push the layer into the cell. Here, two layers of the resin composition layer (I) / the phosphor-free layer (II) are laminated and filled in the partition walls (cells) of the PDP substrate. the ratio h _a / h _b between the thickness of the thick layer not containing (h _a) and phosphor (II) of the layer of composition (I) (h _b)
Is preferably 10/90 to 75/25.

(Exposure) Exposure is performed by bringing a pattern mask into close contact with the layer (II) containing no phosphor. At this time, if necessary, or if the layer (II) containing no phosphor does not have adhesiveness, the film on the surface of the layer (II) not containing the phosphor is peeled off, and the pattern mask is replaced with the phosphor. Exposure can also be carried out by directly contacting the layer (II) not containing.
Exposure is usually performed by ultraviolet irradiation, and the light source at that time is a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a carbon arc lamp,
Xenon lamps, metal halide lamps, chemical lamps and the like are used. After irradiation with ultraviolet rays, heating can be performed as necessary to complete the curing.

(Development) After exposure, the film on the layer (II) containing no phosphor is peeled off and then developed. Since the layer (II) containing no phosphor is a diluted alkali-developable photosensitive resin composition, development after exposure is performed using a dilute aqueous solution of about 1 to 2% by weight of an alkali such as sodium carbonate or potassium carbonate. Do it. At this time, it is also possible to use a developer such as an organic alkali.

(Firing) The partition (cell) forming substrate after the above treatment is baked at 450 to 550 ° C. to fix the phosphor inside the partition (cell). Thus, the phosphor can be fixed in the partition (cell) by the method of the present invention. However, in order to form a full-color PDP, the layer (I) of each of the red, blue, and green resin compositions is used. The above (formation of the resin composition layer (I)) to (development) is repeated using the layer (II) containing no phosphor and the phosphor of the above three colors is filled in a cell, (Firing).

[0022]

The present invention will be specifically described below with reference to examples. In the examples, "parts" means on a weight basis unless otherwise specified. Example 1 The following phosphor (a) 65 parts, base polymer (b) 50
Parts, 75 parts of the ethylenically unsaturated compound (c) and 5 parts of the hydroxy fatty acid (d) were mixed to prepare a resin composition. Phosphor (a) (Y, Gd) BO ₃ : Eu [K-Keisei Optonics “K
X-504A "] (R: red, emission wavelength; 590, 61
0, 620 nm, particle size: 2-4 μm, specific gravity: 5.1) Base polymer (b) The copolymerization ratio of methyl methacrylate / n-butyl methacrylate / methacrylic acid is 30/49/21 on a weight basis.
(Glass transition temperature 69 ° C., acid value 137 m
gKOH / g, weight average molecular weight 60,000) ethylenically unsaturated compound (c) tetraethylene glycol dimethacrylate hydroxy fatty acid (d) 12-oxyoctadecanoic acid

Next, 100 parts of the obtained resin composition is dissolved and dispersed in 100 parts of a solvent (methyl ethyl ketone) to obtain a dope. The dope is coated on a polyester film having a thickness of 20 μm, and the dope is added at room temperature. After leaving for 30 minutes for 30 minutes, each was dried in an oven at 60 ° C., 90 ° C., and 110 ° C. for 3 minutes to prepare a resin composition layer (I) having _a thickness (ha) of 50 μm. Layer (I) of the obtained resin composition
Was used to fix the phosphor as described below and evaluated.

First, a phosphor-free layer (II) having a thickness (h _b ) of 70 μm according to the above was prepared by using 100 parts of the following base polymer, 100 parts of an ethylenically unsaturated compound and 10 parts of a photopolymerization initiator. (However, no protective film was provided). Base polymer methyl methacrylate / n-butyl methacrylate / 2
-A copolymer having a copolymerization ratio of ethylhexyl acrylate / methyl methacrylic acid of 50/15/10/25 by weight (glass transition temperature: 75 ° C., acid value: 163 mg KO)
H / g, weight average molecular weight 60,000) The mixing ratio of the ethylenically unsaturated compound tetraethylene glycol dimethacrylate / EO-modified trimethylolpropane triacrylate [“THE-330” manufactured by Nippon Kayaku Co., Ltd.] is 80 /% by weight.
20 is a mixture photopolymerization initiator benzyl dimethyl ketal

Next, using a laminate of the layer (I) of the resin composition obtained above (provided that no protective film is provided) and the layer (II) containing no phosphor, a phosphor is prepared in the following manner. Was fixed. (The layer (I) of the resin composition and the layer (I
Formation of I)) Partition walls preheated to 60 ° C. in an oven (height (h ₀ ): 100 μm, width: 80 μm, slit: 150 μm
PDP substrate (20 stripe pattern)
(0 mm × 200 mm × 3.1 mm), the layer (I) (laminated film) of the above resin composition was laminated at a laminating roll temperature of 100 ° C., a roll pressure of 3 kg / cm ² , and a laminating speed of 1.0 m / sec. Thereafter, the polyester film is peeled off, and the phosphor-free layer (II) (laminate film) is similarly laminated on the polyester film to form a resin composition layer (I) and a phosphor-free layer (II). did. _{(H a / h b = 50} /70) ( exposure, development) Then, on the polyester film layer (II) surface containing no phosphor, the inside of the partition walls (cell) (except barrier ribs) is exposed Thus, the entire surface was provided with a pattern, and exposed with an exposure machine HMW-532D manufactured by Oak Manufacturing Co., Ltd. at 80 mj using a 3 kw ultra-high pressure mercury lamp. After taking a hold time of 15 minutes after exposure, 1% Na ₂ CO ₃
Development was carried out in an aqueous solution at 30 ° C. for 1.5 times the minimum development time.

The phosphor (a) in the layer (I) of the resin composition is Zn ₂ SiO ₄ : Mn (“PI-GIS” manufactured by Kasei Optonics Co., Ltd.) (G: green, emission wavelength: 520 n).
m, particle size: 2-6 μm, specific gravity: 4.2) and BaMgA
l ₁₀ O _17: Eu [Chemical Optonics Inc. "KX-510
A "] (B; blue, emission wavelength; 450 nm, particle size;
The same procedure was performed using the layer (I) of the resin composition changed to 6 μm, specific gravity: 3.8).
A layer (I) of the resin composition containing each of the phosphors G and B and a layer (II) containing no phosphor were formed in a stripe shape.

(Firing) Next, put in a firing furnace at about 550 ° C.
Then, the resin components in the resin composition layer (I) and the phosphor-free layer (II) were burned off, and the respective phosphors were fixed in the partition walls (cells). The obtained RGB phosphor pattern was irradiated with a UV lamp (main emission wavelength: 254 nm) and visually observed, but no line defect or unevenness of each phosphor pattern was observed, and a good phosphor pattern was obtained. Was. In addition, the phosphor was similarly fixed using the layer (I) of the resin composition after the storage stability promotion test described below.
A good phosphor pattern was obtained. In addition, a polyethylene film was laminated as a protective film to the obtained resin composition layer (I), and while slitting to a width of 300 mm, 50 m was wound around a branch pipe having an outer diameter of 84.2 mm to form a roll. A storage stability promotion test was carried out by leaving it horizontally in a dryer at 3 ° C. for 3 days, but no exudation (edge fusion) of the resin composition from the side end of the roll was observed.

Example 2 A phosphor pattern was obtained in the same manner as in Example 1 except that the hydroxy fatty acid (d) in the resin composition was changed to 7 parts of 8-oxytetradecanoic acid. Was as good as in Example 1, and the storage stability was good with no bleeding (edge fusion) of the resin composition from the side end of the roll.

Example 3 In Example 1, 130 parts of the phosphor (a), 20 parts of the base polymer (b), 70 parts of the ethylenically unsaturated compound (c) and 70 parts of the hydroxy fatty acid (d) were mixed in the resin composition. ) The same procedure was carried out except that the amount was changed to 7 parts. In each case, the obtained phosphor pattern was as good as that of Example 1, and the storage stability was also high in the resin composition from the side end of the roll. No exudation (edge fusion) was observed.

Example 4 In Example 1, the copolymer ratio of methyl methacrylate / n-butyl methacrylate / methacrylic acid was 56/2 by weight based on the base polymer (b) in the resin composition.
The same procedure was performed except that the copolymer was changed to 1/23 (glass transition temperature: 74 ° C., acid value: 150 mg KOH / g, weight average molecular weight: 120,000). It was as good as in Example 1, and the storage stability was good with no seepage of the resin composition (edge fusion) from the side end of the roll.

Example 5 The procedure of Example 1 was repeated, except that the ethylenically unsaturated compound (c) in the resin composition was changed to EO-modified bisphenol A dimethacrylate [“BPE-500” manufactured by Shin-Nakamura Chemical Co., Ltd.]. In each case, the obtained phosphor pattern was as good as in Example 1, and the storage stability of the resin composition from the side end of the roll (edge fusion) was observed. It was good.

Example 6 In Example 1, the photopolymerization initiator (e) was added to the resin composition.
The same procedure as in Example 1 was carried out except that 3 parts of benzyldimethyl ketal was blended. The obtained phosphor pattern was as good as in Example 1, and the storage stability was also measured from the side end of the roll. No exudation (edge fusion) of the resin composition was observed and the result was good.

Example 7 In Example 1, 2,2'-methylenebis (4-ethyl-6-tert) was used as an inhibitor (f) in the resin composition.
-Butylphenol) except that 0.3 part was blended. In each case, the phosphor pattern obtained was
It was as good as in Example 1, and the storage stability was good with no seepage of the resin composition (edge fusion) from the side end of the roll.

Example 8 The same procedure as in Example 1 was carried out except that 7 parts of 10-oxyhexanedecanoic acid was added as the hydroxy fatty acid (d) to the layer (II) containing no phosphor. The obtained phosphor pattern was as good as in Example 1, and the storage stability was good with no seepage of the resin composition (edge fusion) from the side end of the roll.

Example 9 In Example 1, the photopolymerization initiator (e) was added to the resin composition.
Was carried out in the same manner except that 4 parts of 1-hydroxycyclohexylphenyl ketone (“Irgacure 184” manufactured by Ciba Geigy) and 0.2 part of methoxyhydroquinone as the inhibitor (f) were used. The obtained phosphor pattern was as good as in Example 1,
In addition, the storage stability was good because no bleeding (edge fusion) of the resin composition from the side end of the roll was observed.

Example 10 The procedure of Example 9 was repeated, except that 5 parts of 12-hydroxyoctadecanoic acid was added as the hydroxy fatty acid (d) to the layer (II) containing no phosphor. The obtained phosphor pattern was as good as in Example 1, and the storage stability was good with no seepage of the resin composition (edge fusion) from the side end of the roll.

Comparative Example 1 The procedure of Example 1 was repeated, except that the hydroxy fatty acid (d) in the resin composition was not added. However, the phosphor pattern before the storage stability test was successfully formed. However, after the storage stability test, unevenness or the like occurs in the phosphor pattern, and the storage stability also shows that the resin composition exudes from the side edge of the roll (edge fusion).
After the expiration of days, it was recognized.

[0038]

The resin composition of the present invention has excellent storage stability. In particular, exudation (edge fusion) from the side edge of the roll is observed even when the resin composition is formed into a roll and stored at room temperature for a long period of time. In addition, the resin composition is very useful for fixing a phosphor such as PDP.

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[Procedure amendment]

[Submission date] May 31, 1999 (1999.5.3
1)

[Procedure amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0012

[Correction method] Change

[Correction contents]

[0012] The resin composition of the present invention comprises the above (a) to
(D), the content of which is not particularly limited, but the content of the phosphor (a) is 100% of the total amount of the base polymer (b) and the ethylenically unsaturated compound (c).
The content is preferably from 1 to 1500 parts by weight, more preferably from 10 to 800 parts by weight, and if the content is less than 1 part by weight, the fixed phosphor pattern becomes insufficient in luminance, and conversely exceeds 1500 parts by weight. The flexibility when formed into a film is undesirably reduced, and the ratio of the ethylenically unsaturated compound (c) to 100 parts by weight of the base polymer (b) is 75 to 500 parts by weight, particularly 150 to 4 parts by weight.
It is preferable to select from the range of 50 parts by weight. If the amount of the ethylenically unsaturated compound (c) is too small, the flexibility of the layer (I) of the resin composition to be described later is lowered, and the sensitivity as described later is reduced. in case of a sexual resin composition can lead to poor curing and the development rate delay, excessive ethylenically unsaturated compound (c), will be lead to cold flow, good better ward.
Further, the content of the hydroxy fatty acid (d) depends on the total amount of the base polymer (b) and the ethylenically unsaturated compound (c).
The content is preferably 0.1 to 10 parts by weight, more preferably 1 to 7 parts by weight, based on 0 part by weight. If the content is less than 0.1 part by weight, sufficient storage stability cannot be obtained. To 10
Exceeding the parts by weight makes the dissolving operation of the fatty acid complicated, which is not preferred.

Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat II (reference) C08L 101/00 C08L 101/00 // C08F 265/04 C08F 265/04 F term (reference) 2H025 AA00 AB17 AC01 AD01 BC14 BC34 BC43 CB13 CB14 CB20 CB22 CC15 CC20 DA13 DA20 FA07 FA17 FA39 4J002 BC071 BC091 BE041 BF021 BG011 BG041 BG051 BG061 BG071 BG101 BG131 BH021 EU BN111 BN121 CF001 CK021 DE097 E187 EE088 018111 EB018 OH EV318 EW046 FD148 FD207 FD209 GP00 GP03 4J011 QA03 QA06 QA13 QA15 QA22 QA23 SA07 SA25 SA29 SA32 SA34 SA36 SA38 SA39 SA40 SA42 SA54 SA63 SA64 SA83 4J026 AA17 AA31 AA38 AA43 AA45 AABA BAA ABA ABA ABA ABA ABA ABA A BA A DB11 DB29 DB30 DB36 GA07

Claims (10)

[Claims] 1. A phosphor (a), a base polymer (b),
A resin composition comprising an ethylenically unsaturated compound (c) and a hydroxy fatty acid (d). 2. The content of hydroxy fatty acid (d) is 1 in total of base polymer (b) and ethylenic compound (c).
The resin composition according to claim 1, wherein the amount is 0.1 to 10 parts by weight based on 00 parts by weight. 3. The method according to claim 1, wherein the content of the phosphor (a) is 1 to 1500 parts by weight based on 100 parts by weight of the total amount of the base polymer (b) and the ethylenic compound (b). Or the resin composition according to 2. 4. The resin composition according to claim 1, further comprising a photopolymerization initiator (e). 5. The resin composition according to claim 1, further comprising an inhibitor (f). 6. In fixing a phosphor in a partition (cell) of a plasma display panel, a layer (I) of the resin composition according to claim 1 and a layer (II) containing no phosphor are used. A method for fixing a phosphor, wherein the phosphor is provided in the partition (cell) and fired. 7. The photosensitive resin composition layer comprising a base polymer, an ethylenically unsaturated compound, and a photopolymerization initiator, wherein the layer (II) containing no phosphor is formed.
The method for fixing the phosphor according to the above. 8. The photosensitive resin composition layer comprising a base polymer, an ethylenically unsaturated compound, a photopolymerization initiator, and a hydroxy fatty acid, wherein the layer (II) containing no phosphor is formed. Fixing method of phosphor. 9. The phosphor according to claim 6, wherein after the layer (I) is provided in the partition (cell), a layer (II) containing no phosphor is provided. How to fix. 10. The method according to claim 6, wherein the method according to claim 6 is repeated three times to fix R (red), G (green), and B (blue) phosphors. Fixing method.