JPH11120914A - Manufacture of back plate of plasma display panel, and dry film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To simplify the process and to form an uniform phosphor layer closely fitted to a cell surface by separating a press-in layer from a cell after pressing a dry film, and performing a patterning while leaving a thin phosphor layer in the cell, followed by baking. SOLUTION: A phosphor-containing dry film 10 formed of a photosensitive press-in layer 12 substantially containing no phosphor and a phosphor-containing photosensitive layer 12 is pressed into between a number of barrier ribs 2 formed on a substrate 1. It is then exposed with a proper light 5 through a photomask 4 to cure the exposed part, and this is treated with a developer, whereby the dry film 10 is left only within a prescribed cell 3. The press-in layer 12 is developed and removed by the treatment with a developer which dissolves only the press-in layer 12 but does not dissolve or strip the phosphor- containing photosensitive layer 13, and then baked at a proper temperature. The phosphor layer finally formed within the cell 3 is sufficiently closely fitted to the surface of the cell 3 so as not to cause a stripping of phosphor.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a fluorescent display such as a plasma display panel (PDP) and a dry film.

[0002]

2. Description of the Related Art In general, a PDP has a structure in which a pair of electrodes arranged regularly on two opposing glass substrates are provided, and a gas mainly composed of Ne or the like is sealed between them. Then, a voltage is applied between these electrodes, and a discharge is generated in minute cells around the electrodes, so that each cell emits light to perform display. In order to display information, regularly arranged cells are selectively caused to emit light. This PDP has a direct current type (DC type) in which electrodes are exposed to the discharge space and an alternating current type (A) in which electrodes are covered with an insulating layer.
C type), and both types are further classified into a refresh driving method and a memory driving method according to differences in display functions and driving methods.

FIG. 5 shows an example of the configuration of an AC type PDP. In this figure, the front plate 51 and the back plate 52 are shown separated from each other. As shown, the front plate 51 and the back plate 52 made of glass are arranged in parallel with each other and face each other. On the front side of the face plate 52, a barrier rib 53 standing upright is fixed, and the front face plate 51 and the rear face plate 52 are held at a constant interval by the barrier rib 53. On the back side of the front plate 51, a composite electrode composed of a sustain electrode 54, which is a transparent electrode, and a bus electrode 55, which is a metal electrode, is formed in parallel with each other, and a dielectric layer 56 is formed to cover this. , And a protective layer 57 (M
gO layer).

On the front side of the back plate 52, address electrodes 58 are formed between the barrier ribs 53 so as to be orthogonal to the composite electrodes and parallel to each other. A phosphor 59 is provided to cover. In this AC type PDP, a front panel 51 and a rear panel 52 are formed by applying a predetermined voltage from an AC power source between composite electrodes on the front panel 51 to form an electric field.
Discharge is performed in each cell as a display element partitioned by the barrier ribs 53 and the display elements. Then, the fluorescent material 59 is caused to emit light by the ultraviolet light generated by the discharge, and the light transmitted through the front plate 51 is visually recognized by the observer. As a method of applying the phosphor, a method of using a photoresist film made of a photosensitive resin composition containing the phosphor has been proposed (for example, JP-A-6-2739).
No. 25, JP-A-8-95239, JP-A-8-95239
95250).

[0005]

According to the above-mentioned proposed method, a dry film made of a photosensitive composition is pressed into a cell formed on a back plate of a PDP, baked after exposure and development, and baked. This method burns off organic matter in the film and forms a phosphor layer on the cell surface.However, since it is necessary to secure a sufficient discharge space in the fired cell, the photosensitive resin composition contains It is essential to increase the content of the organic substance, that is, to reduce the content of the phosphor. Under such circumstances, there is a problem that not only a large amount of heat energy is required for firing, but also a large amount of decomposition gas is generated during firing, so that the management of the firing furnace is complicated.

As a more serious problem, since the dry film impressed into the cell contains a large amount of organic substances, the dry film shrinks with the elapse of the firing time, and the fluorescent light to be finally formed is reduced. There is a problem that the body layer rises from the cell surface and the phosphor layer does not adhere to the cell surface. In order to solve such a problem, when the content of the phosphor in the dry film is increased, that is, when the content of the organic substance is reduced, the amount of the phosphor after firing increases, and a sufficient cell space is obtained. Can not secure.
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve the above-mentioned problems of the prior art, to provide a PDP back plate which is simple in process and can form a uniform phosphor layer in close contact with a cell surface.

[0007]

The above object is achieved by the present invention described below. That is, the present invention comprises, between a plurality of barrier ribs formed on a substrate, a base material sheet and a photosensitive indentation layer and a phosphor-containing photosensitive layer that do not substantially contain a phosphor sequentially laminated on the sheet. Press-fitting both layers of the dry film, exposing both press-fitted layers through a photomask having a desired pattern, developing and removing both layers in non-exposed areas, photosensitive indentation layer in exposed areas And a method of manufacturing a back plate of a plasma display panel, which comprises a step of baking a phosphor-containing photosensitive layer in an exposed area, and a dry film used in the method.

According to the present invention, since the dry film used in the present invention has the above-described structure, the press-in layer is separated from the inside of the cell after the press-fitting of the dry film, and the thin phosphor layer is left in the cell and patterned. So that
Subsequent firing reduces the amount of organic matter to be burned. Therefore, the time and heat energy used for burning off organic substances are small, and the amount of gas generated by baking is small, so that the baking furnace can be easily managed. In addition, a sufficient discharge space is formed in the cell, and the phosphor layer finally formed in the cell is sufficiently adhered to the surface of the cell. Does not occur.

[0009]

Next, the present invention will be described in more detail with reference to preferred embodiments. The features of the present invention reside in the method of forming the phosphor layer on the back plate of the PDP shown in FIG. 5 and the configuration of the dry film used for forming the phosphor layer.
The substrate 1 and the ribs 2 constituting the back plate in the present invention are formed from a conventionally known material by a conventionally known method, and there is no special point in their shapes.

First, a dry film according to the present invention will be described. FIG. 1 is a schematic structural view of a dry film 10 of the present invention, in which 11 is a base film, 12 is a photosensitive indentation layer, and 13 is a phosphor-containing photosensitive layer. The dry film 10 is formed by laminating a soft photosensitive indentation layer 12 substantially free of a phosphor and a soft photosensitive layer 13 composed of at least a phosphor and a photosensitive resin on a base film 11. In the present invention, the total thickness a of the indentation layer and the phosphor-containing layer is formed to be slightly larger than the height h (cell depth) of the filled barrier rib 2 (FIG. 2).

The indentation layer is formed from a photosensitive resin. As the photosensitive resin, any conventionally known photosensitive resin can be used, and a preferred example of the photosensitive resin is a base polymer (a), an ethylenically unsaturated compound (b), and a photopolymerization initiator (c). ), The base polymer (a)
For example, an acrylic resin, a polyester resin, a polyurethane resin, or the like is used. Among these, an acrylic copolymer containing (meth) acrylic acid ester as a main component and optionally copolymerizing an ethylenically unsaturated carboxylic acid or another copolymerizable monomer is important. An acetoacetyl group-containing acrylic copolymer can also be used.

Here, the (meth) acrylic acid ester includes methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate,
-Ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, glycidyl (meth) acrylate, and the like. .

As the ethylenically unsaturated carboxylic acid, monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid and the like are preferably used, and in addition, dicarboxylic acids such as maleic acid, fumaric acid and itaconic acid, or anhydrides thereof. Products and half esters can also be used. Of these, acrylic acid and methacrylic acid are particularly preferred. When the resulting photosensitive resin composition is of a dilute alkali developing type, it is necessary to copolymerize the ethylenically unsaturated carboxylic acid in an amount of about 15 to 30% by weight (about 100 to 200 mgKOH / g in acid value). Other copolymerizable monomers include acrylamide, methacrylamide, acrylonitrile, methacrylonitrile, styrene, α-methylstyrene, vinyl acetate, alkyl vinyl ether and the like.

As the ethylenically unsaturated compound (b),
Ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, butylene glycol di (meth) acrylate, neopentyl Glycol di (meta)
Acrylate, 1,6-hexane glycol di (meth)
Acrylate, trimethylolpropane tri (meth) acrylate, glycerin di (meth) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, 2,2-bis (4 -(Meth) acryloxydiethoxyphenyl) propane, 2,2-bis- (4- (meth) acryloxypolyethoxyphenyl) propane, 2-hydroxy-3-
(Meth) acryloyloxypropyl (meth) acrylate, ethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, phthalic acid diglycidyl ester di (meth) acrylate, glycerin polyglycidyl ether poly (meth) ) Polyfunctional monomers such as acrylates. An appropriate amount of a monofunctional monomer can be used together with these polyfunctional monomers.

Examples of monofunctional monomers include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-phenoxy-2-hydroxypropyl (meth) acrylate 2- (meth) acryloyloxy-2-hydroxypropyl phthalate, 3-chloro-2-hydroxypropyl (meth) acrylate,
Examples include glycerin mono (meth) acrylate, 2- (meth) acryloyloxyethyl acid phosphate, phthalic acid derivative half (meth) acrylate, and N-methylol (meth) acrylamide.

The ratio of the ethylenically unsaturated compound (b) to 100 parts by weight of the base polymer (a) is from 10 to 20.
It is desirable to select from 0 parts by weight, especially from 40 to 100 parts by weight. If the amount of the ethylenically unsaturated compound (b) is too small, poor curing of the photosensitive composition, a decrease in the flexibility of the film, and a delay in the development speed of the film are caused. If the amount is too large, it is not preferable because the adhesiveness of the composition is increased, cold flow is caused, and the peeling speed of the cured resist is decreased.

Further, as the photopolymerization initiator (c), benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin phenyl ether,
Benzyl diphenyl disulfide, benzyl dimethyl ketal, dibenzyl, diacetyl, anthraquinone, naphthoquinone, 3,3'-dimethyl-4-methoxybenzophenone, benzophenone, p, p'-bis (dimethylamino) benzophenone, p, p'-bis (diethylamino) ) Benzophenone, p, p'-diethylaminobenzophenone, pivaloin ethyl ether, 1,1-dichloroacetophenone, pt-butyldichloroacetophenone, hexaarylimidazole dimer, 2,2 '
-Bis (o-chlorophenyl) 4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole, 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-
Diethylthioxanthone, 2,2′-diethoxyacetophenone, 2,2′-dimethoxy-2-phenylacetophenone, 2,2′-dichloro-4-phenoxyacetophenone, phenylglyoxylate, α-hydroxyisobutylphenone, dibezosparone, -(4-isopropylphenyl) -2-hydroxy-2-methyl-1
-Propanone, 2-methyl- [4- (methylthio) phenyl] -2-morpholino-1-propanone, tribromophenylsulfone, tribromomethylphenylsulfone and the like. At this time, the total blending ratio of the photopolymerization initiator (c) is preferably about 1 to 20 parts by weight based on 100 parts by weight of the total amount of the base polymer (a) and the ethylenically unsaturated compound (b). It is.

If necessary, an organic solvent or the like is added to the above-mentioned photosensitive resin to form a photosensitive resin composition. The composition has a desired solid content thickness, for example, a solid content thickness of about 20 to 20 in the present invention.
A photosensitive indentation layer is formed by coating and forming a film on the substrate film surface with a coating amount of 150 μm. In the photosensitive resin composition, various additives such as a dye (coloring and coloring), an adhesion-imparting agent, an antioxidant, and the like, as long as a layer formed by the composition does not become opaque.
Additives such as a thermal polymerization inhibitor, a solvent, a surface tension modifier, a stabilizer, a chain transfer agent, and an antifoaming agent can be appropriately added.

A photosensitive layer containing a phosphor is formed on the surface of the photosensitive indentation layer. The phosphor-containing photosensitive layer contains a photosensitive resin and a phosphor as essential components. The photosensitive resin used is the same as the photosensitive resin forming the indentation layer. However, as will be described later, the developability of the formed phosphor-containing photosensitive layer with respect to the developer after exposure is limited to the photosensitive indentation. It is necessary to change the components of the photosensitive resin such that the developability of the layer after exposure is different, that is, the developability of the photosensitive indentation layer is large. This will be described later.

The phosphor used in the present invention is not particularly limited, but it is preferable that the host is a rare earth oxyhalide or the like and the host is activated with an activator. Y ₂ O ₃ : Eu, YVO ₄ :
Eu, (Y, Gd) BO ₃ : Eu (more than red), Zn ₂ G
eO ₂ : Mn, BaAl ₁₂ O ₁₉ : Mn, Zn ₂ SiO ₄ :
Mn, LaPO ₄ : Tb (green above), Sr ₅ (PO ₄ ) ₃
Cl: Eu, BaMgAl ₁₄ O ₂₃ : Eu ²⁺ , BaMgA
l ₁₆ O ₂₇ : Eu (more than blue) and the like, and other phosphors include Y ₂ O ₃ S: Eu, γ-Zn ₃ (P
O ₄ ) ₂ : Mn, (Zn, Cd) S: Ag + In ₂ O ₃ (red or more), ZnS: Cu, Al, ZnS: Au, Cu,
Al, (Zn, Cd) S: Cu, Al, Zn ₂ SiO ₄ :
_{Mn, As, Y 3 Al 5} O 12: Ce, Gd 2 O 2 S: Tb,
Y ₃ Al ₅ O ₁₂ : Tb, ZnO: Zn (green), Zn
S: Ag + red pigment, Y ₂ SiO ₃ : Ce (above, blue) and the like can be used, and of course, two or more kinds of these phosphors can be used in combination.

The method for forming the phosphor-containing photosensitive layer is not particularly limited, and may be a known method, for example, by adding a predetermined amount of a phosphor and other necessary components to the above photosensitive resin, Mixing and stirring to uniformly disperse the phosphor to form a photosensitive resin composition, which has a desired solid content thickness, for example,
In the present invention, a phosphor-containing photosensitive layer is formed by coating and forming a film on the surface of the photosensitive indentation layer at a coating amount of a solid content of about 5 to 100 μm. In this case, the content of the phosphor is preferably 1 to 50 parts by weight, more preferably 1 to 50 parts by weight based on 100 parts by weight of the total amount of the base polymer and the ethylenically unsaturated compound in the photosensitive resin composition.
0 to 30 parts by weight. If the content of the phosphor exceeds 50 parts by weight, it becomes difficult to form a dry film, and
If the amount is less than the weight part, the luminance tends to decrease when the phosphor layer is formed, which is not preferable.

The photosensitive resin composition of the present invention may further include a dye (colored or colored), an adhesion promoter, an antioxidant, a thermal polymerization inhibitor, a solvent, a surface tension modifier, a stabilizer, a chain, Additives such as a transfer agent and an antifoaming agent can be appropriately added. In particular, by incorporating a silane-based, aluminum-based or titanate-based coupling agent, the final P
The adhesion of the phosphor layer formed in the cells of the DP back plate to the cell surface can be improved. In addition, these coupling agents may be applied in advance to the cell surface of the back plate of the PDP.

Since the phosphor-containing photosensitive layer 13 of the dry film according to the present invention does not need to have a thickness for completely filling the cell space 3 as described above, only the phosphor-containing photosensitive layer is required. The content of the phosphor in the phosphor can be higher than that of the conventional dry film. For example, the preferable phosphor content is about 60 to 90% by weight in the phosphor-containing photosensitive layer. It is the ratio of the share. Further, the dry film of the present invention is preferably three kinds of films including phosphors which emit light in three colors of red, green and blue.

The dry film of the present invention is formed as described above. In a preferred embodiment, a release layer 16 is provided between the base film 11 and the push layer 12, and the push layer 12 and the phosphor are formed. Separation of the containing layer 13 can be facilitated. Further, an adhesive layer 14 can be provided on the surface of the phosphor-containing layer 13 in order to facilitate press-fitting (transfer) of the press-in layer 12 and the phosphor-containing layer 13 into the PDP rear substrate. Further, in order to improve the preservability of the dry film 10, a film similar to the base film 11 can be attached to the surface of the phosphor-containing layer 13 or the pressure-sensitive adhesive layer 14 to form the protective layer 15. In use, the protective layer 15 is peeled off, and the indentation layer 12 and the phosphor-containing layer 13 are transferred to the surface of the PDP rear substrate.

Layer 1 in the dry film of the present invention
Both the layer 2 and the layer 13 are photosensitive, but have different developability to a developing solution after exposure. That is, when the photosensitive indentation layer and the phosphor-containing layer have been transferred to the back substrate (press-fitted between the ribs), the layer 12 is located above the layer 13, and the layers 12 and 13 are in the development process. Are peeled off at the same time (FIGS. 2C and 3C), or only the layer 12 is peeled off by development and the layer 13 needs to remain in the cell (FIG. 4B). For this purpose, for example, a photosensitive resin is selected so that the layer 13 crosslinks more densely than the layer 12 even with the same exposure, or the acid of the layer 12 is used when the developing solution is an alkaline aqueous system. It is necessary to select a photosensitive resin such that the value is significantly higher than the acid value of the layer 13. As described above, the photosensitive composition to be used is different between the layer 12 and the layer 13, and the developing solution is selectively used. 2C and 3C
In the case shown in FIG. 4, the portion to be developed and removed is an unexposed area, so a relatively weak developer is used. In the case of FIG. 4B, a developer capable of developing and removing only the exposed indentation layer is used. use.

The relationship between the photosensitive resin and the developer is summarized as follows. 1. When the photosensitive resin is of the alkali developing type: FIG.
The photosensitive resin of the pressed layer of the unexposed portion in B is α, the photosensitive resin of the phosphor-containing layer is β, the photosensitive resin of the pressed layer in the exposed region is α ′, and the photosensitive resin of the phosphor-containing layer is Is β ′, both α and β have developability with respect to the alkaline developer A, but α ′ and β ′ in the exposed area do not have developability (see FIG. 2C). Next, reference is made to FIGS. 4A and 4B. Assuming that the developing solution used in this step is B, the developing solution B needs to be more alkaline than the developing solution A, has a developing property for α ′, but has a developing property for β ′. Does not have developability. 4A and 4B are performed by using such a developer B. The above relationship is expressed, for example, as follows. α, β <A <α ′ <B <β ′ (The inequality symbol <indicates “developing to the left and non-developing to the right”) It can be easily realized by appropriately adjusting the acid value of the photosensitive resin of the phosphor-containing layer.

2. When the photosensitive resin is of an organic solvent developing type: developing solutions A and B and photosensitive resins α, α ′, β,
The relationship with β ′ is the same as in the above-mentioned alkali development type. That is, two kinds of organic solvents having a relationship that the developability of the developer B is greater than the developability of the developer A are used as the developer,
As the photosensitive resin, for example, two kinds of photosensitive resins in which the crosslinking density of the photosensitive resin α ′ of the phosphor-containing layer is larger than the crosslinking density of the photosensitive resin β ′ of the indentation layer may be used. .

FIG. 2A shows a state in which the phosphor-containing dry film 10 of the present invention as shown in FIG. 1 is press-fitted between a number of barrier ribs 2 formed on the substrate 1. The dry film 10 is pressed into the cell 3 by applying pressure (and heat) using a pair of rubber rolls or the like. In the above description, the thickness b of the phosphor-containing layer of the dry film 10 is preferably about 2/3 to 1/3 of the height h of the rib.

FIG. 2 shows a state in which the dry film 10 is pressed into the cell 3 by the above method and a state in which pattern exposure is performed.
B. After the dry film is pressed into the cell in this manner, as shown in FIG. 2B, the exposed portion is cured by exposing it to light 5 having an appropriate wavelength through a photomask 4, and the exposed portion is hardened into a developing solution. Figure 2
As shown in C, the dry film can be left only in a predetermined cell. At this time, a developing solution that can remove both the layer 12 and the layer 13 of the unexposed dry film 10 is used. It is assumed that the dry film shown in FIG. 2C includes a phosphor R that emits red light. Next, by repeating the operations of FIGS. 2A to 2C using the green light-emitting phosphor-containing dry film, predetermined cells are filled with green phosphor dry film G (FIG. 3A).

The filled dry film is exposed (FIG. 3B) and developed in the same manner as in the case of the red dry film, as shown in FIGS. 3B and 3C, so that the green phosphor-containing photosensitive layer G has a predetermined shape. The cells are filled (FIG. 3C). By performing the same operation on the blue dry film B, the blue phosphor-containing photosensitive layer B is filled in a predetermined cell (FIG. 3D). Next, the cells filled with the blue phosphor-containing photosensitive layer B are exposed (however, in this case, the entire surface may be exposed, the pattern may be exposed, or the heat curing treatment may be performed) (not shown). Next, as shown in FIG. 4A, the upper portion of the cell is polished to obtain the height of the push layer 12 and the barrier rib 2.
The height of the

Next, the indentation layer is developed and removed by dissolving only the indentation layer and treating the phosphor-containing photosensitive layer with a developer that does not dissolve and peel off (FIG. 4B). After removing the indentation layer, pre-baking is performed as necessary to improve the adhesion between the phosphor layer and the cell surface. Then FIG.
By baking the material shown in B at an appropriate temperature, the organic matter in the phosphor-containing photosensitive layer is burned off, and three color RGB phosphor layers are formed on the inner surface of the cell.

When the indentation layer and the phosphor-containing layer of the dry film used in the present invention are of a rare alkali developing type, the development after exposure is carried out by using 1 to 2% by weight of an alkali such as caustic soda, sodium carbonate and potassium carbonate. It is carried out using a dilute aqueous solution of a certain degree. After the development process, the cell forming substrate is
Baking is performed at 50 ° C. to fix the phosphor layer inside the cell.
To form a full-color PDP, red, blue,
The above-described transfer step, exposure step, and baking step are repeatedly performed using the dry film of the present invention containing each green phosphor.

[0033]

Next, the present invention will be described more specifically with reference to examples and comparative examples. In the examples, “%” or “parts” is based on weight unless otherwise specified. Example 1 (When the photosensitive resin is of an alkali developing type) In this example, water + alcohol (a 10% aqueous solution of ethanol) was used as the developing solution A, and an alkaline aqueous solution (3% sodium carbonate carbonate) was used as the developing solution B. Aqueous solution). As the resin α, a mixture of an alkali-soluble polymer (phenol novolak-based or cresol novolak-based resin) and monomethacrylate and dimethacrylate or a mixture of monoacrylate and diacrylate was used. As the resin β, a mixture of an alkali-soluble polymer (phenol novolak-based or cresol novolak-based resin) and triacrylate or trimethacrylate was used.

Preparation of Phosphor-Containing Composition (Resin β ) 10% base polymer (trade name “Regitop PSF-2803” manufactured by Gunei Chemical Co., Ltd.), tetramethylol methane triacrylate (Shin-Nakamura Chemical Co., Ltd.) Product name "NK Ester A-TMM-3") 10%, the following phosphor 52%, radical generator (Ciba Geigy Co., Ltd. product name "Irgcure 907") 3%, and diluent solvent (3-methoxy-3-methyl) (-1-butanol) 20% to prepare three-color phosphor-containing compositions. (Phosphor) Blue light-emitting phosphor: BaMgAl ₁₀ O ₁₇ : Eu
(Product name: KX-501A, manufactured by Kasei Optonics Co., Ltd.) Red light emitting phosphor: Y ₂ O ₃ : Eu (Product name: LP-RE)
I, manufactured by Kasei Optonics Co., Ltd.) Green-emitting phosphor: Zn ₂ SiO ₄ : Mn (trade name: P1-
G1S, manufactured by Kasei Optonics)

Preparation of composition for indentation layer (Resin α ) 15% base polymer (trade name “Regitop PSF-2803” manufactured by Gunei Chemical Co., Ltd.), β-methacryloyloxyethyl hydrogen phthalate (Shin-Nakamura Chemical Co., Ltd.) Co., Ltd. product name "NK Ester CB-1") 40%,
5% of a radical generator (trade name “Irgcure 907” manufactured by Ciba Geigy) and a diluting solvent (3-methoxy-3-)
(Methyl-1-butanol) 40% was mixed to prepare a composition for an indentation layer.

Preparation of Dry Film First, the composition for the indentation layer was coated on a polyester film having a thickness of 20 μm using a blade coater, left at room temperature for 1 minute and 30 seconds, and then dried in an oven at 90 ° C. for 30 minutes.
After drying for a minute, the thickness of the indentation layer was adjusted to 100 μm.
Next, using a blade coater, the phosphor-containing composition was applied on the above-mentioned push layer, left at room temperature for 1 minute and 30 seconds, and then dried in an oven at 90 ° C. for 30 minutes to form a phosphor-containing layer. Was a dry film of the present invention having a two-layer structure with a film thickness of 20 μm (provided that no protective film was provided). Lamination on glass substrate This dry film was heated in an oven at 60 ° C. on a glass substrate [conductive circuit and barrier rib (150 μm height).
m, a width of 50 μm, and a pitch of 200 μm) on the phosphor screen forming substrate].
° C, roll pressure 3 kg / cm ² , lamination speed 1.5
m / min. Were laminated.

Exposure and development phosphor screen pattern shape (line width aperture 110 μm, pitch 20
0 μm), a pattern mask is superimposed on the surface of the laminate film so as to form an exposed portion, and the exposure is performed with a 3 kW ultra-high pressure mercury lamp using an exposure machine MAP-200 manufactured by Dainippon Screen.
An exposure of 00 mJ / cm ² was performed. After taking a hold time of 15 minutes after the exposure, the polyester film was peeled off, and a 20% ethanol 10% aqueous solution was used at 20 ° C.
Development was performed for 1.5 times the minimum development time. Then 16
Post-baking (water-drying) was performed at 0 ° C. for 30 minutes. The above steps were performed for each of the dry films of the present invention including the phosphors of three colors. After removing the indented layer, development was performed using developer B (3% aqueous sodium carbonate solution) for 1.5 times the minimum development time. Then 120
Post-baking (water-drying) was performed at 30 ° C. for 30 minutes. Firing Next, the glass substrate filled with each of the above three color phosphor compositions is raised in a firing furnace from room temperature to 550 ° C. in one hour, and the resin component in the phosphor composition film is burned off to obtain a fluorescent material. A body layer was formed to obtain a back plate of the PDP. This phosphor layer was sufficiently adhered to the substrate, there was no lifting of the phosphor layer, and a sufficient discharge space was secured.

Example 2 (When the photosensitive resin is of an organic solvent developing type) In this example, a weak solvent (isopropyl alcohol) is used as the developing solution A, and a strong solvent (metrethyl ethyl ketone) is used as the developing solution B. Using. As the resin α, a mixture of monomethacrylate and dimethacrylate or a mixture of monoacrylate and diacrylate was used, and as the resin β, triacrylate or trimethacrylate was used.

[0039]Preparation of phosphor-containing composition (resin β) Tetramethylol methane triacrylate (Shin Nakamura Chemical
"NK Ester A-TMM-3" (trade name) manufactured by Kogyo Co., Ltd.
L ") 10%, tetramethylol methane triacrylate
(New Nakamura Chemical Co., Ltd. product name "NK Ester A
-TMM-3 ") 10%, the following phosphor 52%, radio
Agent (Circa Geigy product name "IRG Cure 9"
07 ”) 3% and diluent solvent (3-methoxy-3-methyl)
-1-butanol) contains 20% of three color phosphors
Each composition was prepared. (Phosphor) Blue light-emitting phosphor: BaMgAl_TenO₁₇: Eu
(Product name: KX-501A, manufactured by Kasei Optonics Co.) Red light emitting phosphor: Y_TwoO_Three: Eu (Product name: LP-RE)
I, manufactured by Kasei Optonics Co.) Green light-emitting phosphor: Zn_TwoSiO_Four: Mn (Product name: P1-
G1S, manufactured by Kasei Optonics)Preparation of composition for indentation layer (resin α) Base polymer (methyl methacrylate / n-butylmeth
Tacrylate / 2-ethylhexyl acrylate / meta
When the copolymerization ratio of the acrylic acid is 55/8/15 /
22) 15%, β-methacryloyloxy
Siethyl hydrogen phthalate (Shin Nakamura Chemical Co., Ltd.)
Co., Ltd. product name "NK Ester CB-1") 40%,
Radical generator (trade name “Irguki
907 ") and a diluting solvent (3-methoxy-3-)
Methyl-1-butanol) 40%
A composition for use was prepared.Preparation of dry film First, the composition for the indentation layer was prepared using a blade coater.
And coat it on a 20μm thick polyester film.
After leaving at room temperature for 1 minute and 30 seconds, 30
After drying for a minute, the thickness of the indentation layer was adjusted to 100 μm.
Next, using a blade coater the phosphor-containing composition
And apply on the above-mentioned indentation layer, at room temperature for 1 minute 30 seconds
After standing, dry in a 90 ° C oven for 30 minutes.
The present invention has a two-layer structure in which the thickness of the light-containing layer is 20 μm.
Dry film (however, no protective film is provided
Absent. ).

Lamination on glass substrate The dried film was heated in an oven to 60 ° C. on a glass substrate [conductive circuit and barrier ribs (150 μm in height).
m, a width of 50 μm, and a pitch of 200 μm) on the phosphor screen forming substrate].
° C, roll pressure 3 kg / cm ² , lamination speed 1.5
m / min. Were laminated. Exposure, developed phosphor screen pattern shape (line width aperture 110 μm, pitch 20
0 μm), a pattern mask is superimposed on the surface of the laminate film so as to form an exposed portion, and the exposure is performed with a 3 kW ultra-high pressure mercury lamp using an exposure machine MAP-200 manufactured by Dainippon Screen.
An exposure of 00 mJ / cm ² was performed. After a hold time of 15 minutes after the exposure, the polyester film was peeled off and developed at 20 ° C. using developer A (isopropyl alcohol) for 1.5 times the minimum development time. Next, post-baking (water-drying) was performed at 160 ° C. for 30 minutes. The above steps were performed for each of the dry films including the phosphors of three colors.

After the removal of the indented layer , development was carried out using developer B (methyl ethyl ketone) for 1.5 times the minimum development time. Then 120 ° C
For 30 minutes. Firing Next, the glass substrate filled with each of the phosphor compositions of the three colors is raised from room temperature to 550 ° C. in a firing furnace in one hour, and the resin component in the phosphor composition film is burned off to emit fluorescent light. A body layer was formed to obtain a back plate of the PDP. This phosphor layer was sufficiently adhered to the substrate, there was no lifting of the phosphor layer, and a sufficient discharge space was secured.

Comparative Example 1 The phosphor of the composition of the phosphor-containing composition of Example 1 was changed to 17 parts, and a 160 μm-thick dry film was formed without forming a push layer. A back plate of a PDP was prepared in the same manner as in Example 1 except that the cells were filled. Since the absolute amount of the phosphor in the comparative example 1 is calculated to be the same as that in the example 1, the discharge space is the same as that in the example 1 in the final shape of the fired cell. Due to the large amount of resin inside, peeling of the phosphor layer occurred during firing.

[0043]

According to the present invention, since the dry film used in the present invention has the above-described structure, the press-in layer is separated from the cell after press-fitting the dry film,
Since the patterning is performed while leaving a thin phosphor layer in the cell, a small amount of organic substances to be burned is reduced by baking thereafter. Therefore, the time and heat energy used for burning off organic substances are small, and the amount of gas generated by baking is small, so that the baking furnace can be easily managed. or,
While a sufficient discharge space is formed in the cell, the phosphor layer finally formed in the cell is sufficiently adhered to the surface of the cell, and the floating or peeling of the phosphor as in the prior art is prevented. Does not occur.

[Brief description of the drawings]

[Fig. 1] Drift film configuration

FIG. 2 illustrates a method of the present invention.

FIG. 3 illustrates a method of the present invention.

FIG. 4 illustrates a method of the present invention.

FIG. 5 is an explanatory diagram of a configuration of a PDP.

[Explanation of symbols]

 1: Substrate 2: Barrier rib 3: Cell (space) 4: Photomask 5: Light R: Red light-emitting phosphor layer G: Green light-emitting phosphor layer 11: Base film 12: Photosensitive indenting layer 13: Phosphor-containing photosensitive Layer 14: Adhesive layer 15: Protective layer 16: Release layer 51: Front plate 52: Back plate 53: Barrier rib 54: Sustain electrode 55: Bus electrode 56: Dielectric layer 57: Protective layer 58: Address electrode 59: Fluorescence Body layer

Claims (9)

[Claims] 1. A substrate comprising a base sheet, a photosensitive indentation layer substantially free of a phosphor, and a phosphor-containing photosensitive layer, which are sequentially laminated on the sheet, between a plurality of barrier ribs formed on the substrate. The process of press-fitting both layers of dry lime film,
Exposing both the press-fit layers through a photomask having a desired pattern, developing and removing both layers in a non-exposed area, developing and removing a photosensitive indentation layer in an exposed area, and a phosphor in the exposed area A method for manufacturing a back plate of a plasma display panel, comprising a step of baking a photosensitive layer. 2. The method for manufacturing a back plate of a plasma display panel according to claim 1, wherein the press-fitting of the dry film onto the substrate surface is performed by a roll. 3. The dry film has three colors of red, green and blue.
The plasma display panel according to claim 1, wherein the three types of films include a phosphor that emits light of a color, wherein the press-fitting, exposing, and developing of the dry film according to claim 1 are performed on each of the films, and firing is performed simultaneously. Manufacturing method of back plate. 4. A back plate of a plasma display panel comprising a base sheet, a photosensitive indentation layer substantially free of a phosphor, and a phosphor-containing photosensitive layer, which are sequentially laminated on the sheet. Drift film for use in the manufacture of 5. The dry film according to claim 4, wherein the developability of the photosensitive indentation layer in the exposed area is greater than the developability of the phosphor-containing photosensitive layer in the same exposed area. 6. The photosensitive resin of an indentation layer in an unexposed portion is α
When the photosensitive resin of the phosphor-containing layer is β, the photosensitive resin of the indentation layer in the exposed area is α ′, and the photosensitive resin of the phosphor-containing layer is β ′, α, β <A <α '<
B <β ′ (the inequality symbol <represents “developing property to the left and non-developing property to the right”, wherein A represents developer A and B represents developer B). 4. The dry life film according to 4. 7. The dry film according to claim 5, wherein the total thickness of the indentation layer and the phosphor-containing layer is larger than the depth of a cell formed on the substrate. 8. The thickness of the phosphor-containing layer is in the range of １ ／ to ／ of the depth of a cell formed on the substrate.
Drift film described in. 9. The dry film has three colors of red, green and blue.
5. The dry film according to claim 4, which is a three-type film containing a phosphor that emits light of a color.