JP1760960S - - Google Patents

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Publication number
JP1760960S
JP1760960S JP2023012019F JP2023012019F JP1760960S JP 1760960 S JP1760960 S JP 1760960S JP 2023012019 F JP2023012019 F JP 2023012019F JP 2023012019 F JP2023012019 F JP 2023012019F JP 1760960 S JP1760960 S JP 1760960S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023012019F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2023012019F priority Critical patent/JP1760960S/ja
Priority to TW112306478F priority patent/TWD240926S/zh
Priority to US29/920,441 priority patent/USD1112115S1/en
Application granted granted Critical
Publication of JP1760960S publication Critical patent/JP1760960S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2023012019F 2023-06-12 2023-06-12 Active JP1760960S (ref)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2023012019F JP1760960S (ref) 2023-06-12 2023-06-12
TW112306478F TWD240926S (zh) 2023-06-12 2023-12-11 基板處理裝置用隔熱板
US29/920,441 USD1112115S1 (en) 2023-06-12 2023-12-11 Insulation plate for a semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2023012019F JP1760960S (ref) 2023-06-12 2023-06-12

Publications (1)

Publication Number Publication Date
JP1760960S true JP1760960S (ref) 2024-01-10

Family

ID=89452058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023012019F Active JP1760960S (ref) 2023-06-12 2023-06-12

Country Status (3)

Country Link
US (1) USD1112115S1 (ref)
JP (1) JP1760960S (ref)
TW (1) TWD240926S (ref)

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0785919B2 (ja) * 1990-11-30 1995-09-20 ソマール株式会社 断熱板
JP3494554B2 (ja) * 1997-06-26 2004-02-09 東芝セラミックス株式会社 半導体用治具およびその製造方法
US7325692B2 (en) * 2002-11-26 2008-02-05 Disco Corporation Cassette having separation plates for storing a plurality of semiconductor wafers
US7329947B2 (en) * 2003-11-07 2008-02-12 Sumitomo Mitsubishi Silicon Corporation Heat treatment jig for semiconductor substrate
USD600220S1 (en) * 2008-03-28 2009-09-15 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
JP4748193B2 (ja) * 2008-09-01 2011-08-17 ソニー株式会社 非水電解質二次電池の絶縁板、非水電解質二次電池および非水電解質二次電池の絶縁板の製造方法
USD616392S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD615937S1 (en) * 2009-03-06 2010-05-18 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD616393S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD654884S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD654883S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
JP6318301B2 (ja) * 2015-02-25 2018-04-25 株式会社日立国際電気 基板処理装置、ヒータおよび半導体装置の製造方法
USD804437S1 (en) * 2016-09-30 2017-12-05 Norton (Waterford) Limited Circuit board
US10453713B2 (en) * 2016-11-29 2019-10-22 Taiwan Semiconductor Manufacturing Co., Ltd. Method for controlling temperature of furnace in semiconductor fabrication process
JP6770461B2 (ja) * 2017-02-21 2020-10-14 クアーズテック株式会社 縦型ウエハボート
USD852763S1 (en) * 2017-08-31 2019-07-02 ebm-papst Lanshut GmbH Circuit board
JP1624353S (ref) 2018-07-19 2019-02-12
USD979506S1 (en) * 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
JP1700781S (ja) * 2021-03-22 2021-11-29 基板処理装置用断熱板
JP1706320S (ref) * 2021-06-28 2022-01-31
USD1054388S1 (en) * 2021-10-15 2024-12-17 Shin-Etsu Chemical Co., Ltd. Carrier substrate for handling
JP1733769S (ref) * 2022-08-10 2023-01-06

Also Published As

Publication number Publication date
TWD240926S (zh) 2025-10-11
USD1112115S1 (en) 2026-02-10

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