JP1683121S - Nozzle for liquid ejection - Google Patents
Nozzle for liquid ejectionInfo
- Publication number
- JP1683121S JP1683121S JP2020011295F JP2020011295F JP1683121S JP 1683121 S JP1683121 S JP 1683121S JP 2020011295 F JP2020011295 F JP 2020011295F JP 2020011295 F JP2020011295 F JP 2020011295F JP 1683121 S JP1683121 S JP 1683121S
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- liquid ejection
- article
- substrate processing
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000007788 liquid Substances 0.000 title abstract 4
- 239000000758 substrate Substances 0.000 abstract 6
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Abstract
本物品は、半導体デバイス等の製造プロセスにおいて、半導体ウェハ等の基板に対し、処理液を供給することによってエッチング等の所定の基板処理を施す基板処理装置に使用する液体吐出用ノズルである。本物品は基板処理装置に取り付けて使用され、基板の周縁部(べベル部)に対して本物品の先端から処理液を吐出させて前記基板処理を行う。This article is a liquid ejection nozzle used in a substrate processing apparatus for performing predetermined substrate processing such as etching by supplying a processing liquid to a substrate such as a semiconductor wafer in the manufacturing process of semiconductor devices and the like. The article is used by being attached to a substrate processing apparatus, and the substrate processing is performed by ejecting the processing liquid from the tip of the article onto the peripheral edge portion (bevel portion) of the substrate.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020011295F JP1683121S (en) | 2020-06-08 | 2020-06-08 | Nozzle for liquid ejection |
US29/744,996 USD930796S1 (en) | 2020-06-08 | 2020-08-03 | Liquid discharge nozzle for semiconductor substrate processing apparatus |
TW108306619D01F TWD215672S (en) | 2020-06-08 | 2020-08-04 | Nozzle for liquid ejection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020011295F JP1683121S (en) | 2020-06-08 | 2020-06-08 | Nozzle for liquid ejection |
Publications (1)
Publication Number | Publication Date |
---|---|
JP1683121S true JP1683121S (en) | 2021-04-12 |
Family
ID=75378233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020011295F Active JP1683121S (en) | 2020-06-08 | 2020-06-08 | Nozzle for liquid ejection |
Country Status (3)
Country | Link |
---|---|
US (1) | USD930796S1 (en) |
JP (1) | JP1683121S (en) |
TW (1) | TWD215672S (en) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD341418S (en) * | 1991-02-22 | 1993-11-16 | Tokyo Electron Limited | Supply nozzle for applying liquid resist to a semiconductor wafer |
USD469790S1 (en) | 2001-05-18 | 2003-02-04 | Oy Trial Ab | Nozzle |
JP5638768B2 (en) | 2009-04-24 | 2014-12-10 | 武蔵エンジニアリング株式会社 | Nozzle rotation mechanism and coating apparatus having the same |
USD637267S1 (en) * | 2010-01-27 | 2011-05-03 | Sintokogio, Ltd. | Nozzle for an air blast process |
USD636845S1 (en) * | 2010-01-27 | 2011-04-26 | Sintokogio, Ltd. | Nozzle for an air blast process |
USD774908S1 (en) | 2014-04-10 | 2016-12-27 | 3M Innovative Properties Company | Nozzle for syringe |
USD771248S1 (en) | 2014-10-01 | 2016-11-08 | Adhezion Biomedical, Llc | Dispensing applicator having a curved elongated nozzle |
USD783784S1 (en) | 2015-01-30 | 2017-04-11 | Criser, S.A. De C.V. | Nozzle for a drain hose |
USD824966S1 (en) * | 2016-10-14 | 2018-08-07 | Oerlikon Metco (Us) Inc. | Powder injector |
USD823906S1 (en) * | 2017-04-13 | 2018-07-24 | Oerlikon Metco (Us) Inc. | Powder injector |
USD906485S1 (en) * | 2017-09-27 | 2020-12-29 | Natural Gas Solutions North America, Llc | Shaft seal |
USD910145S1 (en) * | 2018-08-01 | 2021-02-09 | Lutz Pumpen Gmbh | Dispenser nozzle |
USD903836S1 (en) * | 2019-05-29 | 2020-12-01 | Carefusion 303, Inc. | Y-spigot body |
-
2020
- 2020-06-08 JP JP2020011295F patent/JP1683121S/en active Active
- 2020-08-03 US US29/744,996 patent/USD930796S1/en active Active
- 2020-08-04 TW TW108306619D01F patent/TWD215672S/en unknown
Also Published As
Publication number | Publication date |
---|---|
TWD215672S (en) | 2021-12-01 |
USD930796S1 (en) | 2021-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI520248B (en) | A bending correcting device for a semiconductor element substrate and a bending correction method | |
JP2016039186A (en) | Processing method for wafer | |
JP2018166142A5 (en) | ||
TWD183010S (en) | Wafer boats for substrate processing equipment | |
CN104183524A (en) | Wafer edge etching device | |
JP2012190868A (en) | Two-fluid nozzle, substrate liquid processing device, substrate liquid processing method, and computer readable recording medium, in which substrate liquid processing program is recorded | |
KR102251256B1 (en) | Liquid processing apparatus and liquid processing method | |
JP6449097B2 (en) | Substrate processing method, substrate processing apparatus, and computer-readable storage medium storing substrate processing program | |
TW201628075A (en) | Holding device | |
JP2010539696A5 (en) | ||
TW201612967A (en) | Polishing method and polishing apparatus | |
CN105023841B (en) | A kind of crystal column surface tears gold and removes gluing method | |
JP1683121S (en) | Nozzle for liquid ejection | |
JP2008288541A (en) | Single wafer processing cleaning apparatus | |
CN203774251U (en) | Device for cleaning back side of wafer | |
TW201606914A (en) | Apparatus and method treating substrate for separation process | |
TWD213830S (en) | Nozzles for liquid ejection | |
TW201810402A (en) | Etching method, etching apparatus and method for dividing a semiconductor wafer | |
JP2016025267A (en) | Processing method of wafer | |
TWD215922S (en) | Gas inlet attachment for wafer processing apparatus | |
MY188084A (en) | Wafer-like substrate processing method, apparatus and use thereof | |
JP1767300S (en) | Threaded Nozzle Insert | |
JP2015146352A (en) | Cleaning device and cleaning method | |
JP2013222849A (en) | Processing distortion removal method of wafer | |
TWI724215B (en) | Method for cleaning wafer edge |