JP1642983S - - Google Patents
Info
- Publication number
- JP1642983S JP1642983S JPD2018-16237F JP2018016237F JP1642983S JP 1642983 S JP1642983 S JP 1642983S JP 2018016237 F JP2018016237 F JP 2018016237F JP 1642983 S JP1642983 S JP 1642983S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-16237F JP1642983S (enrdf_load_stackoverflow) | 2018-07-25 | 2018-07-25 | |
| TW107307217F TWD208174S (zh) | 2018-07-25 | 2018-12-11 | 半導體製造用晶圓支持器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-16237F JP1642983S (enrdf_load_stackoverflow) | 2018-07-25 | 2018-07-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1642983S true JP1642983S (enrdf_load_stackoverflow) | 2019-10-07 |
Family
ID=68095610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2018-16237F Active JP1642983S (enrdf_load_stackoverflow) | 2018-07-25 | 2018-07-25 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1642983S (enrdf_load_stackoverflow) |
| TW (1) | TWD208174S (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20250034975A (ko) | 2022-07-08 | 2025-03-11 | 토소우 에스엠디, 인크 | 물리적 기상 증착 스퍼터 애플리케이션을 위한 동적 진공 밀봉 시스템 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD709536S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD699199S1 (en) | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode plate for a plasma processing apparatus |
| USD709538S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709539S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709537S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD699200S1 (en) | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
| USD724553S1 (en) | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| JP1546800S (enrdf_load_stackoverflow) | 2015-06-12 | 2016-03-28 | ||
| USD810705S1 (en) | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
| USD802634S1 (en) | 2015-10-23 | 2017-11-14 | Flow International Corporation | Contour follower for a fluid jet cutting machine |
| USD797691S1 (en) | 2016-04-14 | 2017-09-19 | Applied Materials, Inc. | Composite edge ring |
| USD815385S1 (en) | 2016-10-13 | 2018-04-10 | Entegris, Inc. | Wafer support ring |
| USD830981S1 (en) | 2017-04-07 | 2018-10-16 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate processing apparatus |
-
2018
- 2018-07-25 JP JPD2018-16237F patent/JP1642983S/ja active Active
- 2018-12-11 TW TW107307217F patent/TWD208174S/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWD208174S (zh) | 2020-11-11 |