ITTO991086A0 - Resistore verticale integrato ad alta tensione e relativo processo di fabbricazione. - Google Patents

Resistore verticale integrato ad alta tensione e relativo processo di fabbricazione.

Info

Publication number
ITTO991086A0
ITTO991086A0 IT99TO001086A ITTO991086A ITTO991086A0 IT TO991086 A0 ITTO991086 A0 IT TO991086A0 IT 99TO001086 A IT99TO001086 A IT 99TO001086A IT TO991086 A ITTO991086 A IT TO991086A IT TO991086 A0 ITTO991086 A0 IT TO991086A0
Authority
IT
Italy
Prior art keywords
high voltage
manufacturing process
voltage integrated
integrated vertical
vertical resistor
Prior art date
Application number
IT99TO001086A
Other languages
English (en)
Inventor
Davide Patti
Original Assignee
St Microelectronics Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by St Microelectronics Srl filed Critical St Microelectronics Srl
Priority to IT1999TO001086A priority Critical patent/IT1311309B1/it
Publication of ITTO991086A0 publication Critical patent/ITTO991086A0/it
Priority to US09/733,781 priority patent/US20010013634A1/en
Publication of ITTO991086A1 publication Critical patent/ITTO991086A1/it
Application granted granted Critical
Publication of IT1311309B1 publication Critical patent/IT1311309B1/it
Priority to US10/756,203 priority patent/US7053463B2/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/20Resistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0641Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region without components of the field effect type
    • H01L27/0647Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. vertical bipolar transistor and bipolar lateral transistor and resistor
    • H01L27/0652Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
    • H01L27/0658Vertical bipolar transistor in combination with resistors or capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/8605Resistors with PN junctions

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
IT1999TO001086A 1999-12-10 1999-12-10 Resistore verticale integrato ad alta tensione e relativo processo difabbricazione. IT1311309B1 (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT1999TO001086A IT1311309B1 (it) 1999-12-10 1999-12-10 Resistore verticale integrato ad alta tensione e relativo processo difabbricazione.
US09/733,781 US20010013634A1 (en) 1999-12-10 2000-12-07 High-voltage integrated vertical resistor and manufacturing process thereof
US10/756,203 US7053463B2 (en) 1999-12-10 2004-01-12 High-voltage integrated vertical resistor and manufacturing process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT1999TO001086A IT1311309B1 (it) 1999-12-10 1999-12-10 Resistore verticale integrato ad alta tensione e relativo processo difabbricazione.

Publications (3)

Publication Number Publication Date
ITTO991086A0 true ITTO991086A0 (it) 1999-12-10
ITTO991086A1 ITTO991086A1 (it) 2001-06-10
IT1311309B1 IT1311309B1 (it) 2002-03-12

Family

ID=11418286

Family Applications (1)

Application Number Title Priority Date Filing Date
IT1999TO001086A IT1311309B1 (it) 1999-12-10 1999-12-10 Resistore verticale integrato ad alta tensione e relativo processo difabbricazione.

Country Status (2)

Country Link
US (2) US20010013634A1 (it)
IT (1) IT1311309B1 (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4807768B2 (ja) * 2004-06-23 2011-11-02 ルネサスエレクトロニクス株式会社 パワートランジスタ装置及びそれを用いたパワー制御システム
US9214457B2 (en) * 2011-09-20 2015-12-15 Alpha & Omega Semiconductor Incorporated Method of integrating high voltage devices
US8669611B2 (en) 2012-07-11 2014-03-11 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for power MOS transistor
US9130060B2 (en) 2012-07-11 2015-09-08 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated circuit having a vertical power MOS transistor
EP3324442A1 (en) 2016-11-21 2018-05-23 Nexperia B.V. Vertical bipolar transistor with integrated collector resistor
US11189701B1 (en) 2020-12-11 2021-11-30 International Business Machines Corporation Bipolar junction transistor with vertically integrated resistor

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3982263A (en) * 1974-05-02 1976-09-21 National Semiconductor Corporation Integrated circuit device comprising vertical channel FET resistor
JPS61232657A (ja) 1985-04-09 1986-10-16 Fujitsu Ltd 静電破壊防止素子
US4933739A (en) * 1988-04-26 1990-06-12 Eliyahou Harari Trench resistor structures for compact semiconductor memory and logic devices
US4896243A (en) * 1988-12-20 1990-01-23 Texas Instruments Incorporated Efficient ESD input protection scheme
JPH0513714A (ja) * 1990-01-25 1993-01-22 Texas Instr Inc <Ti> 溝型トランジスタ使用の双安定論理デバイス
JPH04112565A (ja) * 1990-08-31 1992-04-14 Nec Corp 半導体抵抗素子及びその製造方法
US5229310A (en) * 1991-05-03 1993-07-20 Motorola, Inc. Method for making a self-aligned vertical thin-film transistor in a semiconductor device
IT1252102B (it) * 1991-11-26 1995-06-02 Cons Ric Microelettronica Dispositivo monolitico a semiconduttore a struttura verticale con transistore di potenza a base profonda e emettitore a dita avente resistenze di ballast
JPH06342878A (ja) 1993-04-06 1994-12-13 Fuji Electric Co Ltd 半導体装置
US5373183A (en) * 1993-04-28 1994-12-13 Harris Corporation Integrated circuit with improved reverse bias breakdown
JP3334290B2 (ja) * 1993-11-12 2002-10-15 株式会社デンソー 半導体装置
EP0810503B1 (en) * 1996-05-14 2001-12-19 Co.Ri.M.Me. Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno An integrated circuit with a device having a predetermined reverse conduction threshold and a thermal compensation device with Vbe multipliers
JPH09331072A (ja) * 1996-06-12 1997-12-22 Toshiba Corp 半導体装置及びその製造方法
US6030898A (en) * 1997-12-19 2000-02-29 Advanced Micro Devices, Inc. Advanced etching method for VLSI fabrication
US6373100B1 (en) * 1998-03-04 2002-04-16 Semiconductor Components Industries Llc Semiconductor device and method for fabricating the same
IT1311280B1 (it) * 1999-12-24 2002-03-12 St Microelectronics Srl Struttura di resistore integrato verticale di ingombro ridotto peralta tensione e relativo processo di fabbricazione.

Also Published As

Publication number Publication date
ITTO991086A1 (it) 2001-06-10
US20040183158A1 (en) 2004-09-23
US7053463B2 (en) 2006-05-30
US20010013634A1 (en) 2001-08-16
IT1311309B1 (it) 2002-03-12

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