ITRM20000229A0 - Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile. - Google Patents

Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile.

Info

Publication number
ITRM20000229A0
ITRM20000229A0 IT2000RM000229A ITRM20000229A ITRM20000229A0 IT RM20000229 A0 ITRM20000229 A0 IT RM20000229A0 IT 2000RM000229 A IT2000RM000229 A IT 2000RM000229A IT RM20000229 A ITRM20000229 A IT RM20000229A IT RM20000229 A0 ITRM20000229 A0 IT RM20000229A0
Authority
IT
Italy
Prior art keywords
optical system
light beams
variable section
section output
spatial homogenization
Prior art date
Application number
IT2000RM000229A
Other languages
English (en)
Inventor
Daniele Murra
Sarah Bollanti
Lazzaro Paolo Di
Original Assignee
Enea Ente Nuove Tec
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enea Ente Nuove Tec filed Critical Enea Ente Nuove Tec
Priority to IT2000RM000229A priority Critical patent/IT1316395B1/it
Publication of ITRM20000229A0 publication Critical patent/ITRM20000229A0/it
Priority to US09/727,268 priority patent/US6639728B2/en
Priority to AT00830807T priority patent/ATE338289T1/de
Priority to EP00830807A priority patent/EP1150156B1/en
Priority to DE60030411T priority patent/DE60030411T2/de
Publication of ITRM20000229A1 publication Critical patent/ITRM20000229A1/it
Application granted granted Critical
Publication of IT1316395B1 publication Critical patent/IT1316395B1/it

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Lenses (AREA)
  • Laser Surgery Devices (AREA)
  • Lasers (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
IT2000RM000229A 2000-04-28 2000-04-28 Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile. IT1316395B1 (it)

Priority Applications (5)

Application Number Priority Date Filing Date Title
IT2000RM000229A IT1316395B1 (it) 2000-04-28 2000-04-28 Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile.
US09/727,268 US6639728B2 (en) 2000-04-28 2000-11-30 Optical system for homogenization of light beams, with variable cross-section output
AT00830807T ATE338289T1 (de) 2000-04-28 2000-12-06 Optisches system zur homogenisierung von lichtstrahlen, mit variablem ausgangs-querschnitt
EP00830807A EP1150156B1 (en) 2000-04-28 2000-12-06 Optical system for homogenization of light beams, with variable cross-section output
DE60030411T DE60030411T2 (de) 2000-04-28 2000-12-06 Optisches System zur Homogenisierung von Lichtstrahlen mit variablem Ausgangs-Querschnitt

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2000RM000229A IT1316395B1 (it) 2000-04-28 2000-04-28 Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile.

Publications (3)

Publication Number Publication Date
ITRM20000229A0 true ITRM20000229A0 (it) 2000-04-28
ITRM20000229A1 ITRM20000229A1 (it) 2001-10-28
IT1316395B1 IT1316395B1 (it) 2003-04-10

Family

ID=11454694

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000RM000229A IT1316395B1 (it) 2000-04-28 2000-04-28 Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile.

Country Status (5)

Country Link
US (1) US6639728B2 (it)
EP (1) EP1150156B1 (it)
AT (1) ATE338289T1 (it)
DE (1) DE60030411T2 (it)
IT (1) IT1316395B1 (it)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372630B2 (en) * 2001-08-17 2008-05-13 Semiconductor Energy Laboratory Co., Ltd. Laser, irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device
JP3977038B2 (ja) * 2001-08-27 2007-09-19 株式会社半導体エネルギー研究所 レーザ照射装置およびレーザ照射方法
US7210820B2 (en) * 2003-05-07 2007-05-01 Resonetics, Inc. Methods and apparatuses for homogenizing light
KR100990251B1 (ko) * 2003-12-23 2010-10-26 엘지디스플레이 주식회사 레이저 빔 프로파일 변형 필터를 포함하는 레이저 광학계
JP5031580B2 (ja) * 2004-12-23 2012-09-19 マイクロマス ユーケー リミテッド 質量分析計
GB0428185D0 (en) 2004-12-23 2005-01-26 Micromass Ltd Mass spectrometer
US20080013182A1 (en) * 2006-07-17 2008-01-17 Joerg Ferber Two-stage laser-beam homogenizer
KR20110094022A (ko) * 2008-11-14 2011-08-19 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 박막 결정화를 위한 시스템 및 방법
US9036262B2 (en) * 2011-07-13 2015-05-19 Bae Systems Information And Electronic Systems Integration Inc. Beam shaping and control apparatus
EP2752689A1 (de) * 2013-01-02 2014-07-09 Jena-Optronik GmbH Kalibriereinrichtung zur Kalibration eines extraterrestrischen optischen Instruments und Kalibrierverfahren mit dieser

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733944A (en) * 1986-01-24 1988-03-29 Xmr, Inc. Optical beam integration system
US6560018B1 (en) * 1994-10-27 2003-05-06 Massachusetts Institute Of Technology Illumination system for transmissive light valve displays
FR2737786B1 (fr) * 1995-08-11 1997-09-12 Soc D Production Et De Rech Ap Dispositif optique pour homogeneiser un faisceau laser
DE19632460C1 (de) * 1996-08-12 1997-10-30 Microlas Lasersystem Gmbh Optische Vorrichtung zum Homogenisieren von Laserstrahlung und Erzeugen von mehreren Beleuchtungsfeldern
JPH10314970A (ja) * 1997-05-14 1998-12-02 Tsunezo Sei レーザービーム照射の均一性を向上する方法
US5844727A (en) * 1997-09-02 1998-12-01 Cymer, Inc. Illumination design for scanning microlithography systems
JP4663047B2 (ja) * 1998-07-13 2011-03-30 株式会社半導体エネルギー研究所 レーザー照射装置及び半導体装置の作製方法
JP3919419B2 (ja) * 2000-03-30 2007-05-23 キヤノン株式会社 照明装置及びそれを有する露光装置
US6577429B1 (en) * 2002-01-15 2003-06-10 Eastman Kodak Company Laser projection display system

Also Published As

Publication number Publication date
US6639728B2 (en) 2003-10-28
EP1150156A3 (en) 2004-09-15
DE60030411T2 (de) 2007-04-12
ITRM20000229A1 (it) 2001-10-28
DE60030411D1 (de) 2006-10-12
US20010043399A1 (en) 2001-11-22
EP1150156A2 (en) 2001-10-31
IT1316395B1 (it) 2003-04-10
EP1150156B1 (en) 2006-08-30
ATE338289T1 (de) 2006-09-15

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