DE60030411D1 - Optisches System zur Homogenisierung von Lichtstrahlen, mit variablem Ausgangs-Querschnitt - Google Patents

Optisches System zur Homogenisierung von Lichtstrahlen, mit variablem Ausgangs-Querschnitt

Info

Publication number
DE60030411D1
DE60030411D1 DE60030411T DE60030411T DE60030411D1 DE 60030411 D1 DE60030411 D1 DE 60030411D1 DE 60030411 T DE60030411 T DE 60030411T DE 60030411 T DE60030411 T DE 60030411T DE 60030411 D1 DE60030411 D1 DE 60030411D1
Authority
DE
Germany
Prior art keywords
component
optical system
homogenization
section
light rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60030411T
Other languages
English (en)
Other versions
DE60030411T2 (de
Inventor
Daniele Murra
Sarah Bollanti
Lazzaro Paolo Di
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agenzia Nazionale per le Nuove Tecnologie lEnergia e lo Sviluppo Economico Sostenibile ENEA
Original Assignee
Agenzia Nazionale per le Nuove Tecnologie lEnergia e lo Sviluppo Economico Sostenibile ENEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agenzia Nazionale per le Nuove Tecnologie lEnergia e lo Sviluppo Economico Sostenibile ENEA filed Critical Agenzia Nazionale per le Nuove Tecnologie lEnergia e lo Sviluppo Economico Sostenibile ENEA
Publication of DE60030411D1 publication Critical patent/DE60030411D1/de
Application granted granted Critical
Publication of DE60030411T2 publication Critical patent/DE60030411T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Lenses (AREA)
  • Laser Surgery Devices (AREA)
  • Lasers (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
DE60030411T 2000-04-28 2000-12-06 Optisches System zur Homogenisierung von Lichtstrahlen mit variablem Ausgangs-Querschnitt Expired - Lifetime DE60030411T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT2000RM000229A IT1316395B1 (it) 2000-04-28 2000-04-28 Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile.
ITRM000229 2000-04-28

Publications (2)

Publication Number Publication Date
DE60030411D1 true DE60030411D1 (de) 2006-10-12
DE60030411T2 DE60030411T2 (de) 2007-04-12

Family

ID=11454694

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60030411T Expired - Lifetime DE60030411T2 (de) 2000-04-28 2000-12-06 Optisches System zur Homogenisierung von Lichtstrahlen mit variablem Ausgangs-Querschnitt

Country Status (5)

Country Link
US (1) US6639728B2 (de)
EP (1) EP1150156B1 (de)
AT (1) ATE338289T1 (de)
DE (1) DE60030411T2 (de)
IT (1) IT1316395B1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372630B2 (en) * 2001-08-17 2008-05-13 Semiconductor Energy Laboratory Co., Ltd. Laser, irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device
JP3977038B2 (ja) * 2001-08-27 2007-09-19 株式会社半導体エネルギー研究所 レーザ照射装置およびレーザ照射方法
US7210820B2 (en) * 2003-05-07 2007-05-01 Resonetics, Inc. Methods and apparatuses for homogenizing light
KR100990251B1 (ko) * 2003-12-23 2010-10-26 엘지디스플레이 주식회사 레이저 빔 프로파일 변형 필터를 포함하는 레이저 광학계
GB0428185D0 (en) 2004-12-23 2005-01-26 Micromass Ltd Mass spectrometer
CA2590009C (en) * 2004-12-23 2013-11-26 Micromass Uk Limited Mass spectrometer
US20080013182A1 (en) * 2006-07-17 2008-01-17 Joerg Ferber Two-stage laser-beam homogenizer
US8802580B2 (en) * 2008-11-14 2014-08-12 The Trustees Of Columbia University In The City Of New York Systems and methods for the crystallization of thin films
US9036262B2 (en) * 2011-07-13 2015-05-19 Bae Systems Information And Electronic Systems Integration Inc. Beam shaping and control apparatus
EP2752689A1 (de) * 2013-01-02 2014-07-09 Jena-Optronik GmbH Kalibriereinrichtung zur Kalibration eines extraterrestrischen optischen Instruments und Kalibrierverfahren mit dieser

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733944A (en) * 1986-01-24 1988-03-29 Xmr, Inc. Optical beam integration system
US6560018B1 (en) * 1994-10-27 2003-05-06 Massachusetts Institute Of Technology Illumination system for transmissive light valve displays
FR2737786B1 (fr) * 1995-08-11 1997-09-12 Soc D Production Et De Rech Ap Dispositif optique pour homogeneiser un faisceau laser
DE19632460C1 (de) * 1996-08-12 1997-10-30 Microlas Lasersystem Gmbh Optische Vorrichtung zum Homogenisieren von Laserstrahlung und Erzeugen von mehreren Beleuchtungsfeldern
JPH10314970A (ja) * 1997-05-14 1998-12-02 Tsunezo Sei レーザービーム照射の均一性を向上する方法
US5844727A (en) * 1997-09-02 1998-12-01 Cymer, Inc. Illumination design for scanning microlithography systems
JP4663047B2 (ja) * 1998-07-13 2011-03-30 株式会社半導体エネルギー研究所 レーザー照射装置及び半導体装置の作製方法
JP3919419B2 (ja) * 2000-03-30 2007-05-23 キヤノン株式会社 照明装置及びそれを有する露光装置
US6577429B1 (en) * 2002-01-15 2003-06-10 Eastman Kodak Company Laser projection display system

Also Published As

Publication number Publication date
US6639728B2 (en) 2003-10-28
ATE338289T1 (de) 2006-09-15
EP1150156B1 (de) 2006-08-30
DE60030411T2 (de) 2007-04-12
IT1316395B1 (it) 2003-04-10
ITRM20000229A1 (it) 2001-10-28
US20010043399A1 (en) 2001-11-22
ITRM20000229A0 (it) 2000-04-28
EP1150156A2 (de) 2001-10-31
EP1150156A3 (de) 2004-09-15

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