ITMI20112275A1 - Dispositivo a semiconduttore e procedimento per la sua fabbricazione - Google Patents
Dispositivo a semiconduttore e procedimento per la sua fabbricazioneInfo
- Publication number
- ITMI20112275A1 ITMI20112275A1 IT002275A ITMI20112275A ITMI20112275A1 IT MI20112275 A1 ITMI20112275 A1 IT MI20112275A1 IT 002275 A IT002275 A IT 002275A IT MI20112275 A ITMI20112275 A IT MI20112275A IT MI20112275 A1 ITMI20112275 A1 IT MI20112275A1
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/36—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66053—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide
- H01L29/66068—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
- H01L21/0455—Making n or p doped regions or layers, e.g. using diffusion
- H01L21/046—Making n or p doped regions or layers, e.g. using diffusion using ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7816—Lateral DMOS transistors, i.e. LDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7827—Vertical transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/971,188 US8815721B2 (en) | 2010-12-17 | 2010-12-17 | Semiconductor device and method of manufacturing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
ITMI20112275A1 true ITMI20112275A1 (it) | 2012-06-18 |
Family
ID=45955535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT002275A ITMI20112275A1 (it) | 2010-12-17 | 2011-12-15 | Dispositivo a semiconduttore e procedimento per la sua fabbricazione |
Country Status (4)
Country | Link |
---|---|
US (2) | US8815721B2 (it) |
JP (1) | JP2012134492A (it) |
DE (1) | DE102011056544A1 (it) |
IT (1) | ITMI20112275A1 (it) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5802231B2 (ja) | 2013-03-22 | 2015-10-28 | 株式会社東芝 | 半導体装置及びその製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06163905A (ja) * | 1992-11-27 | 1994-06-10 | Sanyo Electric Co Ltd | 絶縁ゲート半導体装置の製造方法 |
JP3206727B2 (ja) * | 1997-02-20 | 2001-09-10 | 富士電機株式会社 | 炭化けい素縦型mosfetおよびその製造方法 |
US6346726B1 (en) * | 1998-11-09 | 2002-02-12 | International Rectifier Corp. | Low voltage MOSFET power device having a minimum figure of merit |
US6956238B2 (en) * | 2000-10-03 | 2005-10-18 | Cree, Inc. | Silicon carbide power metal-oxide semiconductor field effect transistors having a shorting channel and methods of fabricating silicon carbide metal-oxide semiconductor field effect transistors having a shorting channel |
JP4876321B2 (ja) * | 2001-03-30 | 2012-02-15 | 株式会社デンソー | 炭化珪素半導体装置の製造方法 |
JP4463482B2 (ja) | 2002-07-11 | 2010-05-19 | パナソニック株式会社 | Misfet及びその製造方法 |
JP4800602B2 (ja) * | 2004-09-09 | 2011-10-26 | Okiセミコンダクタ株式会社 | 半導体装置の製造方法 |
US8377812B2 (en) | 2006-11-06 | 2013-02-19 | General Electric Company | SiC MOSFETs and self-aligned fabrication methods thereof |
US7790616B2 (en) | 2007-08-29 | 2010-09-07 | Northrop Grumman Systems Corporation | Encapsulated silicidation for improved SiC processing and device yield |
US7982224B2 (en) * | 2007-10-15 | 2011-07-19 | Panasonic Corporation | Semiconductor device with silicon carbide epitaxial layer including dopant profiles for reducing current overconcentration |
DE102008059649B4 (de) | 2008-11-28 | 2013-01-31 | Globalfoundries Dresden Module One Limited Liability Company & Co. Kg | Geringere topographieabhängige Unregelmäßigkeiten während der Strukturierung zweier unterschiedlicher verspannungsinduzierender Schichten in der Kontaktebene eines Halbleiterbauelements |
JP2012114104A (ja) * | 2009-02-24 | 2012-06-14 | Hitachi Ltd | 蓄積型絶縁ゲート型電界効果型トランジスタ |
-
2010
- 2010-12-17 US US12/971,188 patent/US8815721B2/en active Active
-
2011
- 2011-12-15 IT IT002275A patent/ITMI20112275A1/it unknown
- 2011-12-16 JP JP2011275232A patent/JP2012134492A/ja active Pending
- 2011-12-16 DE DE102011056544A patent/DE102011056544A1/de active Pending
-
2014
- 2014-08-25 US US14/467,754 patent/US20140361315A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
DE102011056544A1 (de) | 2012-06-21 |
JP2012134492A (ja) | 2012-07-12 |
US8815721B2 (en) | 2014-08-26 |
US20140361315A1 (en) | 2014-12-11 |
US20120153362A1 (en) | 2012-06-21 |
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