ITFI940054A0 - Impianto continuo di metalizzazione sotto vuoto del tipo con due rullidelimitanti una zona di trattamento (configurazione free-span)" - Google Patents

Impianto continuo di metalizzazione sotto vuoto del tipo con due rullidelimitanti una zona di trattamento (configurazione free-span)"

Info

Publication number
ITFI940054A0
ITFI940054A0 ITFI940054A ITFI940054A ITFI940054A0 IT FI940054 A0 ITFI940054 A0 IT FI940054A0 IT FI940054 A ITFI940054 A IT FI940054A IT FI940054 A ITFI940054 A IT FI940054A IT FI940054 A0 ITFI940054 A0 IT FI940054A0
Authority
IT
Italy
Prior art keywords
free
type
treatment area
continuous vacuum
span configuration
Prior art date
Application number
ITFI940054A
Other languages
English (en)
Inventor
Franco Grazzini
Original Assignee
Galileo Vacuum Tec Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Galileo Vacuum Tec Spa filed Critical Galileo Vacuum Tec Spa
Priority to ITFI940054A priority Critical patent/IT1269042B/it
Publication of ITFI940054A0 publication Critical patent/ITFI940054A0/it
Priority to EP95830101A priority patent/EP0672762A1/en
Publication of ITFI940054A1 publication Critical patent/ITFI940054A1/it
Application granted granted Critical
Publication of IT1269042B publication Critical patent/IT1269042B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Solid Materials (AREA)
ITFI940054A 1994-03-18 1994-03-18 Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span) IT1269042B (it)

Priority Applications (2)

Application Number Priority Date Filing Date Title
ITFI940054A IT1269042B (it) 1994-03-18 1994-03-18 Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)
EP95830101A EP0672762A1 (en) 1994-03-18 1995-03-17 Apparatus for continuous vacuum metallization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITFI940054A IT1269042B (it) 1994-03-18 1994-03-18 Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)

Publications (3)

Publication Number Publication Date
ITFI940054A0 true ITFI940054A0 (it) 1994-03-18
ITFI940054A1 ITFI940054A1 (it) 1995-09-18
IT1269042B IT1269042B (it) 1997-03-18

Family

ID=11350797

Family Applications (1)

Application Number Title Priority Date Filing Date
ITFI940054A IT1269042B (it) 1994-03-18 1994-03-18 Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)

Country Status (2)

Country Link
EP (1) EP0672762A1 (it)
IT (1) IT1269042B (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69629316T2 (de) * 1996-04-03 2004-05-27 "Okb" "Titan", Zao Verfahren und vorrichtung zum aufbringen von porösen schichten und kathodenfilm eines elektrolytischen kondensors
US20140030435A1 (en) * 2010-12-01 2014-01-30 Applied Materials, Inc. Evaporation unit and vacuum coating apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1359273A (fr) * 1963-03-13 1964-04-24 Dispositif mécanique pour le déroulement de rubans à métalliser simultanément sur les deux faces
JPS56112471A (en) * 1980-02-08 1981-09-04 Toshiba Corp Sputtering device
JPS56163526A (en) * 1980-05-20 1981-12-16 Fuji Photo Film Co Ltd Production of magnetic recording medium
JPS5837844A (ja) * 1981-08-31 1983-03-05 Sekisui Chem Co Ltd 磁気記録媒体の製造方法

Also Published As

Publication number Publication date
EP0672762A1 (en) 1995-09-20
ITFI940054A1 (it) 1995-09-18
IT1269042B (it) 1997-03-18

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970327