IT973212B - Bagno galvanico acido di rame - Google Patents

Bagno galvanico acido di rame

Info

Publication number
IT973212B
IT973212B IT33935/72A IT3393572A IT973212B IT 973212 B IT973212 B IT 973212B IT 33935/72 A IT33935/72 A IT 33935/72A IT 3393572 A IT3393572 A IT 3393572A IT 973212 B IT973212 B IT 973212B
Authority
IT
Italy
Prior art keywords
galvanic bath
copper acid
acid galvanic
copper
bath
Prior art date
Application number
IT33935/72A
Other languages
English (en)
Original Assignee
Schering Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schering Ag filed Critical Schering Ag
Application granted granted Critical
Publication of IT973212B publication Critical patent/IT973212B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
IT33935/72A 1972-01-26 1972-12-29 Bagno galvanico acido di rame IT973212B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2204326A DE2204326C3 (de) 1972-01-26 1972-01-26 Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und duktilen Kupferüberzügen

Publications (1)

Publication Number Publication Date
IT973212B true IT973212B (it) 1974-06-10

Family

ID=5834477

Family Applications (1)

Application Number Title Priority Date Filing Date
IT33935/72A IT973212B (it) 1972-01-26 1972-12-29 Bagno galvanico acido di rame

Country Status (7)

Country Link
US (1) US3778357A (it)
JP (1) JPS5625517B2 (it)
DE (1) DE2204326C3 (it)
FR (1) FR2169222B1 (it)
GB (1) GB1423530A (it)
IE (1) IE37141B1 (it)
IT (1) IT973212B (it)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4076600A (en) * 1976-12-20 1978-02-28 R. O. Hull & Company, Inc. Leveling agent for acid zinc electroplating baths and method
JPH0762021B2 (ja) * 1986-11-05 1995-07-05 第一工業製薬株式会社 第４ホスホニウム化合物の製造方法
JPH0720978B2 (ja) * 1987-06-24 1995-03-08 株式会社クラレ ホスホニウム塩ならびにその製造方法
US5849171A (en) * 1990-10-13 1998-12-15 Atotech Deutschland Gmbh Acid bath for copper plating and process with the use of this combination
DE4211140A1 (de) * 1992-04-03 1993-10-07 Basf Ag Phosphoniumsalze und ihre Verwendung als Glanzmittel für wäßrig-saure galvanische Nickelbäder
US6444110B2 (en) * 1999-05-17 2002-09-03 Shipley Company, L.L.C. Electrolytic copper plating method
US20060183328A1 (en) * 1999-05-17 2006-08-17 Barstad Leon R Electrolytic copper plating solutions
US20040045832A1 (en) * 1999-10-14 2004-03-11 Nicholas Martyak Electrolytic copper plating solutions
DE10261852B3 (de) 2002-12-20 2004-06-03 Atotech Deutschland Gmbh Gemisch oligomerer Phenaziniumverbindungen und dessen Herstellungsverfahren, saures Bad zur elektrolytischen Abscheidung eines Kupferniederschlages, enthaltend die oligomeren Phenaziniumverbindungen, sowie Verfahren zum elektrolytischen Abscheiden eines Kupferniederschlages mit einem das Gemisch enthaltenden Bad
US9399618B2 (en) * 2003-05-12 2016-07-26 Arkema Inc. High purity electrolytic sulfonic acid solutions
US9243339B2 (en) 2012-05-25 2016-01-26 Trevor Pearson Additives for producing copper electrodeposits having low oxygen content
US9809891B2 (en) 2014-06-30 2017-11-07 Rohm And Haas Electronic Materials Llc Plating method
JP6631348B2 (ja) 2015-03-26 2020-01-15 三菱マテリアル株式会社 ホスホニウム塩を用いためっき液
WO2016152983A1 (ja) * 2015-03-26 2016-09-29 三菱マテリアル株式会社 ホスホニウム塩を用いためっき液
US10988852B2 (en) 2015-10-27 2021-04-27 Rohm And Haas Electronic Materials Llc Method of electroplating copper into a via on a substrate from an acid copper electroplating bath

Also Published As

Publication number Publication date
DE2204326A1 (de) 1973-08-02
US3778357A (en) 1973-12-11
IE37141L (en) 1973-07-26
JPS5625517B2 (it) 1981-06-12
GB1423530A (en) 1976-02-04
FR2169222A1 (it) 1973-09-07
DE2204326B2 (de) 1980-08-21
FR2169222B1 (it) 1976-05-14
IE37141B1 (en) 1977-05-11
JPS4886741A (it) 1973-11-15
DE2204326C3 (de) 1981-07-09

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