IT946331B - Apparecchiatura per allineare una maschera rispetto ad un substrato semiconduttore - Google Patents
Apparecchiatura per allineare una maschera rispetto ad un substrato semiconduttoreInfo
- Publication number
- IT946331B IT946331B IT19072/72A IT1907272A IT946331B IT 946331 B IT946331 B IT 946331B IT 19072/72 A IT19072/72 A IT 19072/72A IT 1907272 A IT1907272 A IT 1907272A IT 946331 B IT946331 B IT 946331B
- Authority
- IT
- Italy
- Prior art keywords
- aligning
- mask
- equipment
- respect
- semiconducting substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7100212A NL7100212A (it) | 1971-01-08 | 1971-01-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT946331B true IT946331B (it) | 1973-05-21 |
Family
ID=19812206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT19072/72A IT946331B (it) | 1971-01-08 | 1972-01-05 | Apparecchiatura per allineare una maschera rispetto ad un substrato semiconduttore |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US3811779A (it) |
| JP (1) | JPS5325238B1 (it) |
| AT (1) | AT334979B (it) |
| AU (1) | AU466289B2 (it) |
| BE (1) | BE777785A (it) |
| BR (1) | BR7200054D0 (it) |
| CA (1) | CA958819A (it) |
| CH (1) | CH539839A (it) |
| DE (1) | DE2163856C3 (it) |
| ES (1) | ES398630A1 (it) |
| FR (1) | FR2121301A5 (it) |
| GB (1) | GB1384891A (it) |
| IT (1) | IT946331B (it) |
| NL (1) | NL7100212A (it) |
| SE (1) | SE374620B (it) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2622283A1 (de) * | 1976-05-19 | 1977-12-08 | Bosch Gmbh Robert | Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens |
| NL7606548A (nl) * | 1976-06-17 | 1977-12-20 | Philips Nv | Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat. |
| US4265542A (en) * | 1977-11-04 | 1981-05-05 | Computervision Corporation | Apparatus and method for fine alignment of a photomask to a semiconductor wafer |
| CH629000A5 (de) * | 1978-05-22 | 1982-03-31 | Bbc Brown Boveri & Cie | Verfahren zum optischen justieren von bauelementen. |
| JPS59224515A (ja) * | 1983-06-03 | 1984-12-17 | Mitsubishi Electric Corp | 光学式エンコ−ダ |
| DE3372673D1 (en) * | 1983-09-23 | 1987-08-27 | Ibm Deutschland | Process and device for mutually aligning objects |
| FR2553532A1 (fr) * | 1983-10-12 | 1985-04-19 | Varian Associates | Dispositif capacitif d'alignement de masque |
| US4702606A (en) * | 1984-06-01 | 1987-10-27 | Nippon Kogaku K.K. | Position detecting system |
| DE3682675D1 (de) * | 1986-04-29 | 1992-01-09 | Ibm Deutschland | Interferometrische maskensubstratausrichtung. |
| WO1991011056A1 (en) * | 1990-01-18 | 1991-07-25 | Spetsialnoe Konstruktorskoe Bjuro Radioelektronnoi Apparatury Instituta Radiofiziki I Elektroniki Akademii Nauk Armyanskoi Ssr | Method and device for adjustment of photoelectric converter of shaft rotation angle into code |
| NL9001611A (nl) * | 1990-07-16 | 1992-02-17 | Asm Lithography Bv | Apparaat voor het afbeelden van een maskerpatroon op een substraat. |
-
1971
- 1971-01-08 NL NL7100212A patent/NL7100212A/xx unknown
- 1971-12-22 DE DE2163856A patent/DE2163856C3/de not_active Expired
- 1971-12-30 AU AU37426/71A patent/AU466289B2/en not_active Expired
- 1971-12-30 US US00214122A patent/US3811779A/en not_active Expired - Lifetime
-
1972
- 1972-01-05 BR BR54/72A patent/BR7200054D0/pt unknown
- 1972-01-05 IT IT19072/72A patent/IT946331B/it active
- 1972-01-05 ES ES398630A patent/ES398630A1/es not_active Expired
- 1972-01-05 CH CH13472A patent/CH539839A/de not_active IP Right Cessation
- 1972-01-05 JP JP5572A patent/JPS5325238B1/ja active Pending
- 1972-01-05 SE SE7200103A patent/SE374620B/xx unknown
- 1972-01-05 GB GB51172A patent/GB1384891A/en not_active Expired
- 1972-01-05 CA CA131,700A patent/CA958819A/en not_active Expired
- 1972-01-06 BE BE777785A patent/BE777785A/xx unknown
- 1972-01-07 FR FR7200448A patent/FR2121301A5/fr not_active Expired
- 1972-01-07 AT AT11172*#A patent/AT334979B/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA958819A (en) | 1974-12-03 |
| NL7100212A (it) | 1972-07-11 |
| DE2163856C3 (de) | 1980-07-31 |
| ATA11172A (de) | 1976-06-15 |
| ES398630A1 (es) | 1974-10-01 |
| AT334979B (de) | 1977-02-10 |
| DE2163856B2 (de) | 1979-11-08 |
| GB1384891A (en) | 1975-02-26 |
| FR2121301A5 (it) | 1972-08-18 |
| BE777785A (fr) | 1972-07-06 |
| CH539839A (de) | 1973-07-31 |
| AU3742671A (en) | 1973-07-05 |
| SE374620B (it) | 1975-03-10 |
| JPS5325238B1 (it) | 1978-07-25 |
| US3811779A (en) | 1974-05-21 |
| AU466289B2 (en) | 1975-10-23 |
| DE2163856A1 (de) | 1972-07-20 |
| BR7200054D0 (pt) | 1973-06-12 |
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