IT942744B - Procedimento per stabilire contat ti chmici su circuiti a strato sottile - Google Patents

Procedimento per stabilire contat ti chmici su circuiti a strato sottile

Info

Publication number
IT942744B
IT942744B IT70487/71A IT7048771A IT942744B IT 942744 B IT942744 B IT 942744B IT 70487/71 A IT70487/71 A IT 70487/71A IT 7048771 A IT7048771 A IT 7048771A IT 942744 B IT942744 B IT 942744B
Authority
IT
Italy
Prior art keywords
procedure
thin layer
layer circuits
chemical contacts
establishing chemical
Prior art date
Application number
IT70487/71A
Other languages
English (en)
Italian (it)
Original Assignee
Lignes Telegrafiques Et Teleph
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lignes Telegrafiques Et Teleph filed Critical Lignes Telegrafiques Et Teleph
Application granted granted Critical
Publication of IT942744B publication Critical patent/IT942744B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/18—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material comprising a plurality of layers stacked between terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
IT70487/71A 1970-11-05 1971-10-23 Procedimento per stabilire contat ti chmici su circuiti a strato sottile IT942744B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7039766A FR2112667A5 (US07655688-20100202-C00086.png) 1970-11-05 1970-11-05

Publications (1)

Publication Number Publication Date
IT942744B true IT942744B (it) 1973-04-02

Family

ID=9063772

Family Applications (1)

Application Number Title Priority Date Filing Date
IT70487/71A IT942744B (it) 1970-11-05 1971-10-23 Procedimento per stabilire contat ti chmici su circuiti a strato sottile

Country Status (5)

Country Link
US (1) US3793175A (US07655688-20100202-C00086.png)
BE (1) BE774345A (US07655688-20100202-C00086.png)
FR (1) FR2112667A5 (US07655688-20100202-C00086.png)
GB (1) GB1368139A (US07655688-20100202-C00086.png)
IT (1) IT942744B (US07655688-20100202-C00086.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2290762A1 (fr) * 1974-11-06 1976-06-04 Lignes Telegraph Telephon Procede de realisation de contacts ohmiques pour circuits en couche mince
US4226932A (en) * 1979-07-05 1980-10-07 Gte Automatic Electric Laboratories Incorporated Titanium nitride as one layer of a multi-layered coating intended to be etched
US4336117A (en) * 1979-12-07 1982-06-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Refractory coatings and method of producing the same
US4591418A (en) * 1984-10-26 1986-05-27 The Parker Pen Company Microlaminated coating
US4774151A (en) * 1986-05-23 1988-09-27 International Business Machines Corporation Low contact electrical resistant composition, substrates coated therewith, and process for preparing such
JP2919306B2 (ja) * 1995-05-31 1999-07-12 日本電気株式会社 低抵抗タンタル薄膜の製造方法及び低抵抗タンタル配線並びに電極
KR100578976B1 (ko) * 2004-10-15 2006-05-12 삼성에스디아이 주식회사 접착력이 우수한 다층 박막 및 이의 제조방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL124711C (US07655688-20100202-C00086.png) * 1961-10-03
US3444015A (en) * 1965-03-04 1969-05-13 Sperry Rand Corp Method of etching tantalum
US3382053A (en) * 1965-04-05 1968-05-07 Western Electric Co Tantalum films of unique structure
US3726733A (en) * 1970-02-10 1973-04-10 Fujitsu Ltd Method of manufacturing thin-film integrated circuits
US3718565A (en) * 1970-11-27 1973-02-27 Bell Telephone Labor Inc Technique for the fabrication of discrete rc structure

Also Published As

Publication number Publication date
GB1368139A (en) 1974-09-25
US3793175A (en) 1974-02-19
DE2155056A1 (de) 1972-05-10
FR2112667A5 (US07655688-20100202-C00086.png) 1972-06-23
DE2155056B2 (de) 1977-03-31
BE774345A (fr) 1972-02-14

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