IT8722493A0 - Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri. - Google Patents

Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri.

Info

Publication number
IT8722493A0
IT8722493A0 IT8722493A IT2249387A IT8722493A0 IT 8722493 A0 IT8722493 A0 IT 8722493A0 IT 8722493 A IT8722493 A IT 8722493A IT 2249387 A IT2249387 A IT 2249387A IT 8722493 A0 IT8722493 A0 IT 8722493A0
Authority
IT
Italy
Prior art keywords
pergluoroalkylpolyether
polymers
laser beam
excimer laser
film based
Prior art date
Application number
IT8722493A
Other languages
English (en)
Other versions
IT1223341B (it
Inventor
Ernesto Occhiello
Alberto Re
Vincenzo Malatesta
Fabio Garbassi
Original Assignee
Ausimont Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ausimont Spa filed Critical Ausimont Spa
Priority to IT22493/87A priority Critical patent/IT1223341B/it
Publication of IT8722493A0 publication Critical patent/IT8722493A0/it
Priority to EP19880118262 priority patent/EP0315152A3/en
Priority to JP63278491A priority patent/JPH0271A/ja
Application granted granted Critical
Publication of IT1223341B publication Critical patent/IT1223341B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
IT22493/87A 1987-11-03 1987-11-03 Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri IT1223341B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT22493/87A IT1223341B (it) 1987-11-03 1987-11-03 Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri
EP19880118262 EP0315152A3 (en) 1987-11-03 1988-11-02 Photoablation process for films based on polymers having a perfluoroalkylpolyether structure by means of excimer laser rays
JP63278491A JPH0271A (ja) 1987-11-03 1988-11-02 エキサイマーレーザー光線によるペルフルオロアルキルポリエーテル構造を有する重合体をベースとするフィルムのホトアブレーション法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT22493/87A IT1223341B (it) 1987-11-03 1987-11-03 Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri

Publications (2)

Publication Number Publication Date
IT8722493A0 true IT8722493A0 (it) 1987-11-03
IT1223341B IT1223341B (it) 1990-09-19

Family

ID=11197010

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22493/87A IT1223341B (it) 1987-11-03 1987-11-03 Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri

Country Status (3)

Country Link
EP (1) EP0315152A3 (it)
JP (1) JPH0271A (it)
IT (1) IT1223341B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725933B2 (ja) * 1992-01-31 1998-03-11 三洋電機株式会社 オートフォーカス装置
US5798202A (en) * 1992-05-11 1998-08-25 E. I. Dupont De Nemours And Company Laser engravable single-layer flexographic printing element
US5804353A (en) * 1992-05-11 1998-09-08 E. I. Dupont De Nemours And Company Lasers engravable multilayer flexographic printing element
US5259311A (en) * 1992-07-15 1993-11-09 Mark/Trece Inc. Laser engraving of photopolymer printing plates
JP3478012B2 (ja) * 1995-09-29 2003-12-10 ソニー株式会社 薄膜半導体装置の製造方法
FR2779090B1 (fr) * 1998-05-27 2000-07-13 Sagadev Procede de fabrication d'un cliche d'impression flexographique
KR100854207B1 (ko) * 2007-04-04 2008-08-26 성공제 아그마틴의 망막 신경절 세포 보호 용도
KR100902478B1 (ko) * 2007-06-13 2009-06-11 성균관대학교산학협력단 에이전트 플랫폼.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1552904A (it) * 1967-09-15 1969-01-10
US4414059A (en) * 1982-12-09 1983-11-08 International Business Machines Corporation Far UV patterning of resist materials
US4752668A (en) * 1986-04-28 1988-06-21 Rosenfield Michael G System for laser removal of excess material from a semiconductor wafer

Also Published As

Publication number Publication date
EP0315152A3 (en) 1990-09-05
IT1223341B (it) 1990-09-19
EP0315152A2 (en) 1989-05-10
JPH0271A (ja) 1990-01-05

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