IT1223341B - Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri - Google Patents
Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeriInfo
- Publication number
- IT1223341B IT1223341B IT22493/87A IT2249387A IT1223341B IT 1223341 B IT1223341 B IT 1223341B IT 22493/87 A IT22493/87 A IT 22493/87A IT 2249387 A IT2249387 A IT 2249387A IT 1223341 B IT1223341 B IT 1223341B
- Authority
- IT
- Italy
- Prior art keywords
- pergluoro
- polymer
- excimer laser
- laser rays
- based films
- Prior art date
Links
- 239000004721 Polyphenylene oxide Substances 0.000 title 1
- 229920000570 polyether Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Paints Or Removers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT22493/87A IT1223341B (it) | 1987-11-03 | 1987-11-03 | Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri |
JP63278491A JPH0271A (ja) | 1987-11-03 | 1988-11-02 | エキサイマーレーザー光線によるペルフルオロアルキルポリエーテル構造を有する重合体をベースとするフィルムのホトアブレーション法 |
EP19880118262 EP0315152A3 (en) | 1987-11-03 | 1988-11-02 | Photoablation process for films based on polymers having a perfluoroalkylpolyether structure by means of excimer laser rays |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT22493/87A IT1223341B (it) | 1987-11-03 | 1987-11-03 | Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8722493A0 IT8722493A0 (it) | 1987-11-03 |
IT1223341B true IT1223341B (it) | 1990-09-19 |
Family
ID=11197010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT22493/87A IT1223341B (it) | 1987-11-03 | 1987-11-03 | Procedimento di fotoablazione di film a base di polimeri a struttura pergluoroalchilpolieterea, mediante raggi laser ad eccimeri |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0315152A3 (it) |
JP (1) | JPH0271A (it) |
IT (1) | IT1223341B (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2725933B2 (ja) * | 1992-01-31 | 1998-03-11 | 三洋電機株式会社 | オートフォーカス装置 |
US5798202A (en) * | 1992-05-11 | 1998-08-25 | E. I. Dupont De Nemours And Company | Laser engravable single-layer flexographic printing element |
US5804353A (en) * | 1992-05-11 | 1998-09-08 | E. I. Dupont De Nemours And Company | Lasers engravable multilayer flexographic printing element |
US5259311A (en) * | 1992-07-15 | 1993-11-09 | Mark/Trece Inc. | Laser engraving of photopolymer printing plates |
JP3478012B2 (ja) * | 1995-09-29 | 2003-12-10 | ソニー株式会社 | 薄膜半導体装置の製造方法 |
FR2779090B1 (fr) | 1998-05-27 | 2000-07-13 | Sagadev | Procede de fabrication d'un cliche d'impression flexographique |
KR100854207B1 (ko) * | 2007-04-04 | 2008-08-26 | 성공제 | 아그마틴의 망막 신경절 세포 보호 용도 |
KR100902478B1 (ko) * | 2007-06-13 | 2009-06-11 | 성균관대학교산학협력단 | 에이전트 플랫폼. |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1552904A (it) * | 1967-09-15 | 1969-01-10 | ||
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
US4752668A (en) * | 1986-04-28 | 1988-06-21 | Rosenfield Michael G | System for laser removal of excess material from a semiconductor wafer |
-
1987
- 1987-11-03 IT IT22493/87A patent/IT1223341B/it active
-
1988
- 1988-11-02 JP JP63278491A patent/JPH0271A/ja active Pending
- 1988-11-02 EP EP19880118262 patent/EP0315152A3/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
IT8722493A0 (it) | 1987-11-03 |
EP0315152A2 (en) | 1989-05-10 |
JPH0271A (ja) | 1990-01-05 |
EP0315152A3 (en) | 1990-09-05 |
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