IT8119216A0 - VERTICAL MOSFET TRANSISTOR, EQUIPPED WITH A SHIELDING ELECTRODE. - Google Patents

VERTICAL MOSFET TRANSISTOR, EQUIPPED WITH A SHIELDING ELECTRODE.

Info

Publication number
IT8119216A0
IT8119216A0 IT8119216A IT1921681A IT8119216A0 IT 8119216 A0 IT8119216 A0 IT 8119216A0 IT 8119216 A IT8119216 A IT 8119216A IT 1921681 A IT1921681 A IT 1921681A IT 8119216 A0 IT8119216 A0 IT 8119216A0
Authority
IT
Italy
Prior art keywords
shielding electrode
mosfet transistor
vertical mosfet
vertical
transistor
Prior art date
Application number
IT8119216A
Other languages
Italian (it)
Other versions
IT1135091B (en
Inventor
Alvin Malcolm Goodman
Ramon Ubaldo Martinelli
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of IT8119216A0 publication Critical patent/IT8119216A0/en
Application granted granted Critical
Publication of IT1135091B publication Critical patent/IT1135091B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802Vertical DMOS transistors, i.e. VDMOS transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/402Field plates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
IT19216/81A 1980-02-22 1981-01-20 VERTICAL MOSFET TRANSISTOR, EQUIPPED WITH A SHIELDING ELECTRODE IT1135091B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12371580A 1980-02-22 1980-02-22

Publications (2)

Publication Number Publication Date
IT8119216A0 true IT8119216A0 (en) 1981-01-20
IT1135091B IT1135091B (en) 1986-08-20

Family

ID=22410424

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19216/81A IT1135091B (en) 1980-02-22 1981-01-20 VERTICAL MOSFET TRANSISTOR, EQUIPPED WITH A SHIELDING ELECTRODE

Country Status (8)

Country Link
JP (1) JPS56131961A (en)
DE (1) DE3105693A1 (en)
FR (1) FR2476914B1 (en)
GB (1) GB2070331B (en)
IT (1) IT1135091B (en)
PL (1) PL136606B1 (en)
SE (1) SE456291B (en)
YU (1) YU41520B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141964A (en) * 1981-02-26 1982-09-02 Nippon Telegr & Teleph Corp <Ntt> Insulated gate type field effect transistor
DE3210353A1 (en) * 1982-03-20 1983-09-22 Robert Bosch Gmbh, 7000 Stuttgart MONOLITHICALLY INTEGRATED DARLINGTON CIRCUIT
EP0205639A1 (en) * 1985-06-25 1986-12-30 Eaton Corporation Bidirectional power fet with substrate referenced shield
US4577208A (en) * 1982-09-23 1986-03-18 Eaton Corporation Bidirectional power FET with integral avalanche protection
EP0207178A1 (en) * 1985-06-25 1987-01-07 Eaton Corporation Bidirectional power fet with field shaping
DE3465225D1 (en) * 1983-02-17 1987-09-10 Nissan Motor A vertical-type mosfet and method of fabricating the same
EP0205640A1 (en) * 1985-06-25 1986-12-30 Eaton Corporation Lateral bidirectional shielded notch fet
SG165138A1 (en) * 2000-07-12 2010-10-28 Inst Of Microelectronics A semiconductor device
JP5362955B2 (en) * 2003-01-21 2013-12-11 ノース−ウエスト ユニヴァーシティ High-speed switching insulated gate power semiconductor device
US7276747B2 (en) * 2005-04-25 2007-10-02 Semiconductor Components Industries, L.L.C. Semiconductor device having screening electrode and method
CN102569386B (en) * 2010-12-17 2015-02-04 上海华虹宏力半导体制造有限公司 VDMOS (vertical double-diffused metal oxide semiconductor) device with shield grid and preparation method of VDMOS device
CN102569385B (en) * 2010-12-17 2015-04-08 上海华虹宏力半导体制造有限公司 VDMOS (vertical double-diffused metal oxide semiconductor) structure provided with shielding grid and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1132810A (en) * 1966-03-30 1968-11-06 Matsushita Electronics Corp Field-effect transistor having insulated gates
GB1316555A (en) * 1969-08-12 1973-05-09
US3845495A (en) * 1971-09-23 1974-10-29 Signetics Corp High voltage, high frequency double diffused metal oxide semiconductor device
GB1423449A (en) * 1973-07-27 1976-02-04 Standard Telephones Cables Ltd Semiconductor device
JPS52106688A (en) * 1976-03-05 1977-09-07 Nec Corp Field-effect transistor

Also Published As

Publication number Publication date
JPH0213830B2 (en) 1990-04-05
FR2476914A1 (en) 1981-08-28
SE456291B (en) 1988-09-19
YU41520B (en) 1987-08-31
PL229786A1 (en) 1981-09-18
SE8100148L (en) 1981-08-23
GB2070331B (en) 1984-05-23
FR2476914B1 (en) 1985-10-18
PL136606B1 (en) 1986-03-31
YU42481A (en) 1983-06-30
DE3105693C2 (en) 1992-12-10
DE3105693A1 (en) 1981-11-26
GB2070331A (en) 1981-09-03
IT1135091B (en) 1986-08-20
JPS56131961A (en) 1981-10-15

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Legal Events

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19960129