IT8021994A0 - Composizione per pulitura, in particolare per l'eliminazione di fondente per saldatura. - Google Patents

Composizione per pulitura, in particolare per l'eliminazione di fondente per saldatura.

Info

Publication number
IT8021994A0
IT8021994A0 IT8021994A IT2199480A IT8021994A0 IT 8021994 A0 IT8021994 A0 IT 8021994A0 IT 8021994 A IT8021994 A IT 8021994A IT 2199480 A IT2199480 A IT 2199480A IT 8021994 A0 IT8021994 A0 IT 8021994A0
Authority
IT
Italy
Prior art keywords
elimination
cleaning
composition
soldering flux
soldering
Prior art date
Application number
IT8021994A
Other languages
English (en)
Other versions
IT8021994A1 (it
IT1151031B (it
Inventor
Peter Bakos
Gerald Andrei Bendz
Russell Elwood Darrow
Dennis Louis Rivenburgh
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT8021994A0 publication Critical patent/IT8021994A0/it
Publication of IT8021994A1 publication Critical patent/IT8021994A1/it
Application granted granted Critical
Publication of IT1151031B publication Critical patent/IT1151031B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
    • C09D9/005—Chemical paint or ink removers containing organic solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
IT21994/80A 1979-06-26 1980-05-13 Composizione per pulitura,in particolare per l'eliminazione di fondente per saldatura IT1151031B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/052,160 US4276186A (en) 1979-06-26 1979-06-26 Cleaning composition and use thereof

Publications (3)

Publication Number Publication Date
IT8021994A0 true IT8021994A0 (it) 1980-05-13
IT8021994A1 IT8021994A1 (it) 1981-11-13
IT1151031B IT1151031B (it) 1986-12-17

Family

ID=21975853

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21994/80A IT1151031B (it) 1979-06-26 1980-05-13 Composizione per pulitura,in particolare per l'eliminazione di fondente per saldatura

Country Status (6)

Country Link
US (1) US4276186A (it)
EP (1) EP0021149B1 (it)
JP (1) JPS5821000B2 (it)
CA (1) CA1124610A (it)
DE (1) DE3062187D1 (it)
IT (1) IT1151031B (it)

Families Citing this family (95)

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US4428871A (en) 1981-09-23 1984-01-31 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4395479A (en) * 1981-09-23 1983-07-26 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4664721A (en) * 1981-12-07 1987-05-12 Intercontinental Chemical Corporation Printing screen cleaning and reclaiming compositions
US4453984A (en) * 1982-06-30 1984-06-12 International Business Machines Corporation Method for removing electrically conductive paste from a screening mask
US4401747A (en) * 1982-09-02 1983-08-30 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4401748A (en) * 1982-09-07 1983-08-30 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4514232A (en) * 1982-12-15 1985-04-30 International Business Machines Corporation Process for stripping silicon oil base thermal grease
US4737195A (en) * 1983-11-18 1988-04-12 Amchem Products Activator-accelerator mixtures for alkaline paint stripper compositions
US4791043A (en) * 1983-12-20 1988-12-13 Hmc Patents Holding Co., Inc. Positive photoresist stripping composition
US4541489A (en) * 1984-03-19 1985-09-17 Phillips Petroleum Company Method of removing flow-restricting materials from wells
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US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
US4640719A (en) * 1985-07-01 1987-02-03 Petroleum Fermentations N.V. Method for printed circuit board and/or printed wiring board cleaning
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US4983224A (en) * 1988-10-28 1991-01-08 Rd Chemical Company Cleaning compositions and methods for removing soldering flux
US4848470A (en) * 1988-11-21 1989-07-18 Acme Resin Corporation Process for removing flow-restricting materials from wells
US4964919A (en) * 1988-12-27 1990-10-23 Nalco Chemical Company Cleaning of silicon wafers with an aqueous solution of KOH and a nitrogen-containing compound
US5310696A (en) * 1989-06-16 1994-05-10 Massachusetts Institute Of Technology Chemical method for the modification of a substrate surface to accomplish heteroepitaxial crystal growth
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JP3592285B2 (ja) 2001-06-28 2004-11-24 住友電気工業株式会社 ポリイミド層を含む積層体のエッチング方法
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JP6041624B2 (ja) * 2012-10-31 2016-12-14 株式会社ネオス シリカスケール除去剤組成物
CN104099193A (zh) * 2013-04-03 2014-10-15 东莞市剑鑫电子材料有限公司 水基型玻璃清洗剂、制备方法及其在手机镜片清洗中的应用

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Also Published As

Publication number Publication date
US4276186A (en) 1981-06-30
DE3062187D1 (en) 1983-04-07
IT8021994A1 (it) 1981-11-13
JPS565899A (en) 1981-01-21
IT1151031B (it) 1986-12-17
EP0021149A1 (de) 1981-01-07
EP0021149B1 (de) 1983-03-02
JPS5821000B2 (ja) 1983-04-26
CA1124610A (en) 1982-06-01

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