IT1298891B1 - Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili. - Google Patents

Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili.

Info

Publication number
IT1298891B1
IT1298891B1 IT98RM000071A ITRM980071A IT1298891B1 IT 1298891 B1 IT1298891 B1 IT 1298891B1 IT 98RM000071 A IT98RM000071 A IT 98RM000071A IT RM980071 A ITRM980071 A IT RM980071A IT 1298891 B1 IT1298891 B1 IT 1298891B1
Authority
IT
Italy
Prior art keywords
deposition
chamber
thin films
vacuum system
system equipped
Prior art date
Application number
IT98RM000071A
Other languages
English (en)
Inventor
Carlo Misiano
Enrico Simonetti
Original Assignee
Ca Te V Centro Tecnologie Del
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ca Te V Centro Tecnologie Del filed Critical Ca Te V Centro Tecnologie Del
Priority to IT98RM000071A priority Critical patent/IT1298891B1/it
Publication of ITRM980071A1 publication Critical patent/ITRM980071A1/it
Priority to DE19904829A priority patent/DE19904829A1/de
Priority to US09/247,474 priority patent/US6136167A/en
Application granted granted Critical
Publication of IT1298891B1 publication Critical patent/IT1298891B1/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/162—Open vessel, i.e. one end sealed by object or workpiece

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT98RM000071A 1998-02-06 1998-02-06 Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili. IT1298891B1 (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT98RM000071A IT1298891B1 (it) 1998-02-06 1998-02-06 Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili.
DE19904829A DE19904829A1 (de) 1998-02-06 1999-02-05 Tragbare Vakuumanlage mit Vorkammer zum Auftragen von Feinfolien
US09/247,474 US6136167A (en) 1998-02-06 1999-02-08 Portable apparatus for thin deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT98RM000071A IT1298891B1 (it) 1998-02-06 1998-02-06 Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili.

Publications (2)

Publication Number Publication Date
ITRM980071A1 ITRM980071A1 (it) 1998-05-06
IT1298891B1 true IT1298891B1 (it) 2000-02-07

Family

ID=11405533

Family Applications (1)

Application Number Title Priority Date Filing Date
IT98RM000071A IT1298891B1 (it) 1998-02-06 1998-02-06 Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili.

Country Status (3)

Country Link
US (1) US6136167A (it)
DE (1) DE19904829A1 (it)
IT (1) IT1298891B1 (it)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2832022B1 (fr) * 2001-11-06 2003-12-19 Christian Lincot Procede et dispositif d'application in situ d'un champ electrique intense a puissance variable pour des traitements localises
FR2839459B1 (fr) * 2002-05-13 2005-02-25 Pvdco Nouveau reacteur pour le depot d'un revetement metallique sur un substrat
KR100563102B1 (ko) * 2002-09-12 2006-03-27 에이에스엠엘 네델란즈 비.브이. 표면들로부터 입자들을 제거함으로써 세정하는 방법,세정장치 및 리소그래피투영장치
DE10247888A1 (de) * 2002-10-14 2004-04-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Erzeugung von Plasmen durch Hochfrequenzentladungen
US20130115867A1 (en) * 2011-11-08 2013-05-09 General Electric Company Enclosure system and method for applying coating
DE102012209650B4 (de) * 2012-06-08 2014-10-23 Schunk Kohlenstofftechnik Gmbh Plasma-unterstütztes chemisches Gasabscheidungs-Verfahren mit erhöhter Plasmadichte
CN111837221B (zh) * 2019-02-14 2024-03-05 株式会社日立高新技术 半导体制造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57134559A (en) * 1981-02-12 1982-08-19 Toyota Central Res & Dev Lab Inc Physical vapor deposition device
DE3521053A1 (de) * 1985-06-12 1986-12-18 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum aufbringen duenner schichten auf ein substrat
KR920003789B1 (ko) * 1988-02-08 1992-05-14 니뽄 덴신 덴와 가부시끼가이샤 플라즈마 스퍼터링을 이용한 박막 형성 장치 및 이온원
DE4313353C2 (de) * 1993-04-23 1997-08-28 Leybold Ag Vakuum-Beschichtungsanlage

Also Published As

Publication number Publication date
US6136167A (en) 2000-10-24
ITRM980071A1 (it) 1998-05-06
DE19904829A1 (de) 1999-08-26

Similar Documents

Publication Publication Date Title
DE69940082D1 (de) Plasmaabscheidungsprozesse bei dielektrischen Filmen mit geringer Dielektrizitätskonstante
ID26960A (id) Film polietilen berkerapatan tinggi yang terorientasi lemah untuk pelapisan dokumen berharga banyak-lapis
ATE485246T1 (de) Dünnfilmbeschichtung mit einer transparenten grundierungsschicht
AU2351499A (en) Thin plastic film
AU7451600A (en) Optical device with multilayer thin film and aligner with the device
DE69319531T2 (de) Ultradünnes Filmlaminat
EP0716459A3 (en) Article comprising organic thin film transistors
EP0716458A3 (en) Method of making an organic thin film transistor, and article made by the method
FR2787440B1 (fr) Substrat transparent comportant un revetement antireflet
ZA200200104B (en) Film coatings and film coating compositions based on polyvinyl alcohol.
AU4168699A (en) Method of organic film deposition
DE69322404D1 (de) Topographisch genaues duennfilm-beschichtungssystem
DE69432433D1 (de) Mikrowellensputtervorrichtung zur herstellung dünner kompositfilme
MX9203168A (es) Substrato provisto de multiples capas, procedimiento para la formacion de dichas capas y composicion de revestimiento.
IT1298891B1 (it) Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili.
AU4035899A (en) Microstructured films
EP0959151A3 (en) Thin film forming apparatus
AU6223099A (en) Laminar plastics film
AU3946997A (en) Opaque polyester film as substrate with white coatings on both sides
DE59406727D1 (de) Vakuumbeschichtungsanlage
FR2704240B1 (fr) Installation de revêtement sous vide.
AU4047300A (en) Films with improved metallizable surfaces
AU3708800A (en) Elegant film coating system
AU1345901A (en) Low temperature chemical vapor deposition of thin film magnets
ITMI20000877A0 (it) Film con rivestimento barriera e metodo di preparazione.

Legal Events

Date Code Title Description
0001 Granted