FR2832022B1 - Procede et dispositif d'application in situ d'un champ electrique intense a puissance variable pour des traitements localises - Google Patents
Procede et dispositif d'application in situ d'un champ electrique intense a puissance variable pour des traitements localisesInfo
- Publication number
- FR2832022B1 FR2832022B1 FR0114327A FR0114327A FR2832022B1 FR 2832022 B1 FR2832022 B1 FR 2832022B1 FR 0114327 A FR0114327 A FR 0114327A FR 0114327 A FR0114327 A FR 0114327A FR 2832022 B1 FR2832022 B1 FR 2832022B1
- Authority
- FR
- France
- Prior art keywords
- electric field
- variable power
- intense electric
- situ application
- localized treatments
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32201—Generating means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0114327A FR2832022B1 (fr) | 2001-11-06 | 2001-11-06 | Procede et dispositif d'application in situ d'un champ electrique intense a puissance variable pour des traitements localises |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0114327A FR2832022B1 (fr) | 2001-11-06 | 2001-11-06 | Procede et dispositif d'application in situ d'un champ electrique intense a puissance variable pour des traitements localises |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2832022A1 FR2832022A1 (fr) | 2003-05-09 |
FR2832022B1 true FR2832022B1 (fr) | 2003-12-19 |
Family
ID=8869101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0114327A Expired - Fee Related FR2832022B1 (fr) | 2001-11-06 | 2001-11-06 | Procede et dispositif d'application in situ d'un champ electrique intense a puissance variable pour des traitements localises |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2832022B1 (fr) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1987003865A1 (fr) * | 1985-12-24 | 1987-07-02 | John Edmund Althaus | Appareil et procede de vidange de conteneurs |
US5825485A (en) * | 1995-11-03 | 1998-10-20 | Cohn; Daniel R. | Compact trace element sensor which utilizes microwave generated plasma and which is portable by an individual |
IT1298891B1 (it) * | 1998-02-06 | 2000-02-07 | Ca Te V Centro Tecnologie Del | Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili. |
FI103917B1 (fi) * | 1998-06-25 | 1999-10-15 | Elmatec Oy | Kannettava mikroaaltokuivauslaite |
RU2171554C2 (ru) * | 1999-04-07 | 2001-07-27 | Корчагин Юрий Владимирович | Способ генерации плазмы и устройство для его осуществления |
-
2001
- 2001-11-06 FR FR0114327A patent/FR2832022B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2832022A1 (fr) | 2003-05-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20080930 |