IT1261227B - Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. - Google Patents

Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi.

Info

Publication number
IT1261227B
IT1261227B ITRM930216A ITRM930216A IT1261227B IT 1261227 B IT1261227 B IT 1261227B IT RM930216 A ITRM930216 A IT RM930216A IT RM930216 A ITRM930216 A IT RM930216A IT 1261227 B IT1261227 B IT 1261227B
Authority
IT
Italy
Prior art keywords
pecvd
sputtering
techniques
thin film
film deposition
Prior art date
Application number
ITRM930216A
Other languages
English (en)
Inventor
Carlo Misiano
Enrico Simonetti
Original Assignee
Cetev Cent Tecnolog Vuoto
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cetev Cent Tecnolog Vuoto filed Critical Cetev Cent Tecnolog Vuoto
Priority to ITRM930216A priority Critical patent/IT1261227B/it
Publication of ITRM930216A0 publication Critical patent/ITRM930216A0/it
Publication of ITRM930216A1 publication Critical patent/ITRM930216A1/it
Priority to EP94830145A priority patent/EP0619380A1/en
Priority to US08/222,690 priority patent/US5466296A/en
Application granted granted Critical
Publication of IT1261227B publication Critical patent/IT1261227B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
ITRM930216A 1993-04-06 1993-04-06 Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. IT1261227B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
ITRM930216A IT1261227B (it) 1993-04-06 1993-04-06 Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi.
EP94830145A EP0619380A1 (en) 1993-04-06 1994-03-28 Thin film deposition apparatus and process utilizing PECVD and sputtering
US08/222,690 US5466296A (en) 1993-04-06 1994-04-04 Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITRM930216A IT1261227B (it) 1993-04-06 1993-04-06 Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi.

Publications (3)

Publication Number Publication Date
ITRM930216A0 ITRM930216A0 (it) 1993-04-06
ITRM930216A1 ITRM930216A1 (it) 1993-07-06
IT1261227B true IT1261227B (it) 1996-05-09

Family

ID=11401691

Family Applications (1)

Application Number Title Priority Date Filing Date
ITRM930216A IT1261227B (it) 1993-04-06 1993-04-06 Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi.

Country Status (3)

Country Link
US (1) US5466296A (it)
EP (1) EP0619380A1 (it)
IT (1) IT1261227B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59609370D1 (de) * 1995-03-14 2002-07-25 Empa Abscheiden von diffusionssperrschichten in einer niederdruckplasmakammer
US6060129A (en) * 1996-03-04 2000-05-09 Polar Materials, Inc. Method for bulk coating using a plasma process
US5753092A (en) * 1996-08-26 1998-05-19 Velocidata, Inc. Cylindrical carriage sputtering system
AU741219B2 (en) * 1997-05-16 2001-11-29 Hoya Kabushiki Kaisha Mechanism for imparting water repellency to both sides simultaneously
JP2000017457A (ja) * 1998-07-03 2000-01-18 Shincron:Kk 薄膜形成装置および薄膜形成方法
DE19834314A1 (de) * 1998-07-30 2000-02-03 Leybold Systems Gmbh Verfahren zum Aufbringen einer Kratzschutzschicht und eines Entspiegelungsschichtsystems und Vorrichtung zu seiner Durchführung
ES2186530B1 (es) * 2001-04-19 2005-05-01 Consejo Superior De Investigaciones Cientificas Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos.
JP6496898B2 (ja) * 2014-07-02 2019-04-10 アドバンストマテリアルテクノロジーズ株式会社 電子部品の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2848480C2 (de) * 1978-11-08 1984-11-08 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum Aufbringen von Schichten auf Träger unter Vakuum
JPS55145172A (en) * 1979-04-26 1980-11-12 Hitachi Ltd Forming apparatus for film
JPS6395983A (ja) * 1986-10-14 1988-04-26 Mitsubishi Kasei Corp 光学的記録用媒体の製造方法
EP0409451A1 (en) * 1989-07-18 1991-01-23 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
DE4030900A1 (de) * 1990-09-29 1992-04-02 Bosch Gmbh Robert Verfahren und einrichtung zum beschichten von teilen
AU2003903405A0 (en) 2003-07-02 2003-07-17 Kouts, Caroline Combination carry bag

Also Published As

Publication number Publication date
ITRM930216A1 (it) 1993-07-06
ITRM930216A0 (it) 1993-04-06
US5466296A (en) 1995-11-14
EP0619380A1 (en) 1994-10-12

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970404