ES2186530B1 - Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos. - Google Patents
Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos.Info
- Publication number
- ES2186530B1 ES2186530B1 ES200100911A ES200100911A ES2186530B1 ES 2186530 B1 ES2186530 B1 ES 2186530B1 ES 200100911 A ES200100911 A ES 200100911A ES 200100911 A ES200100911 A ES 200100911A ES 2186530 B1 ES2186530 B1 ES 2186530B1
- Authority
- ES
- Spain
- Prior art keywords
- procedure
- preparation
- thin layers
- deposition
- inorganic oxides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title abstract 5
- 229910052809 inorganic oxide Inorganic materials 0.000 title abstract 4
- 238000002360 preparation method Methods 0.000 title abstract 3
- 230000008021 deposition Effects 0.000 abstract 3
- 239000010410 layer Substances 0.000 abstract 3
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 239000012530 fluid Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000012528 membrane Substances 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 239000012044 organic layer Substances 0.000 abstract 1
- 238000000746 purification Methods 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/024—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Abstract
Procedimiento para la preparación de capas finas porosas de óxidos inorgánicos. El objeto de la presente invención es un procedimiento para la preparación de capas finas de óxidos inorgánicos sobre substratos mediante la deposición desde fase vapor asistida por plasma que se diferencia de los procedimientos habituales porque se intercalan entre las sucesivas etapas de deposición del óxido inorgánico etapas de deposición de capas orgánicas, de forma que durante la etapa de deposición de la capa inorgánica se produzca la eliminación por combustión de la parte orgánica previamente depositada. El procedimiento es de interés en el desarrollo de membranas selectivas para separación y purificación de fluidos así como para la fabricación y modificación de sensores de gases y de humedad y de componentes electrónicos.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES200100911A ES2186530B1 (es) | 2001-04-19 | 2001-04-19 | Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos. |
PCT/ES2002/000193 WO2002086190A1 (es) | 2001-04-19 | 2002-04-18 | Procedimiento para la preparación de capas finas porosas de óxidos inorgánicos |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES200100911A ES2186530B1 (es) | 2001-04-19 | 2001-04-19 | Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos. |
Publications (2)
Publication Number | Publication Date |
---|---|
ES2186530A1 ES2186530A1 (es) | 2003-05-01 |
ES2186530B1 true ES2186530B1 (es) | 2005-05-01 |
Family
ID=8497485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES200100911A Expired - Fee Related ES2186530B1 (es) | 2001-04-19 | 2001-04-19 | Procedimiento para la preparacion de capas finas porosas de oxidos inorganicos. |
Country Status (2)
Country | Link |
---|---|
ES (1) | ES2186530B1 (es) |
WO (1) | WO2002086190A1 (es) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1261227B (it) * | 1993-04-06 | 1996-05-09 | Cetev Cent Tecnolog Vuoto | Impianto di deposizione di film sottili, preferibilmente riferito a tecniche pecvd e "sputtering", e relativi processi. |
WO1999057330A1 (en) * | 1998-05-01 | 1999-11-11 | Desu Seshu B | Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition |
US6015595A (en) * | 1998-05-28 | 2000-01-18 | Felts; John T. | Multiple source deposition plasma apparatus |
US6054188A (en) * | 1999-08-02 | 2000-04-25 | Becton Dickinson And Company | Non-ideal barrier coating architecture and process for applying the same to plastic substrates |
US6541367B1 (en) * | 2000-01-18 | 2003-04-01 | Applied Materials, Inc. | Very low dielectric constant plasma-enhanced CVD films |
-
2001
- 2001-04-19 ES ES200100911A patent/ES2186530B1/es not_active Expired - Fee Related
-
2002
- 2002-04-18 WO PCT/ES2002/000193 patent/WO2002086190A1/es not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2002086190A1 (es) | 2002-10-31 |
ES2186530A1 (es) | 2003-05-01 |
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Legal Events
Date | Code | Title | Description |
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EC2A | Search report published |
Date of ref document: 20030501 Kind code of ref document: A1 |
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FD2A | Announcement of lapse in spain |
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