DE69115775D1 - Prozess zur Abscheidung einer anderen Dünnschicht auf einen oxydischen Supraleiter - Google Patents

Prozess zur Abscheidung einer anderen Dünnschicht auf einen oxydischen Supraleiter

Info

Publication number
DE69115775D1
DE69115775D1 DE69115775T DE69115775T DE69115775D1 DE 69115775 D1 DE69115775 D1 DE 69115775D1 DE 69115775 T DE69115775 T DE 69115775T DE 69115775 T DE69115775 T DE 69115775T DE 69115775 D1 DE69115775 D1 DE 69115775D1
Authority
DE
Germany
Prior art keywords
deposition
thin film
another thin
oxidic superconductor
oxidic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69115775T
Other languages
English (en)
Other versions
DE69115775T2 (de
Inventor
Michitomo Iiyama
Mitsuchika Saitoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69115775D1 publication Critical patent/DE69115775D1/de
Publication of DE69115775T2 publication Critical patent/DE69115775T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661Processes performed after copper oxide formation, e.g. patterning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0884Treatment of superconductor layers by irradiation, e.g. ion-beam, electron-beam, laser beam or X-rays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0912Manufacture or treatment of Josephson-effect devices
    • H10N60/0941Manufacture or treatment of Josephson-effect devices comprising high-Tc ceramic materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/725Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73Vacuum treating or coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/725Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73Vacuum treating or coating
    • Y10S505/731Sputter coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/725Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73Vacuum treating or coating
    • Y10S505/732Evaporative coating with superconducting material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
DE69115775T 1990-07-12 1991-07-12 Prozess zur Abscheidung einer anderen Dünnschicht auf einen oxydischen Supraleiter Expired - Fee Related DE69115775T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18486790 1990-07-12

Publications (2)

Publication Number Publication Date
DE69115775D1 true DE69115775D1 (de) 1996-02-08
DE69115775T2 DE69115775T2 (de) 1996-09-05

Family

ID=16160702

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69115775T Expired - Fee Related DE69115775T2 (de) 1990-07-12 1991-07-12 Prozess zur Abscheidung einer anderen Dünnschicht auf einen oxydischen Supraleiter

Country Status (4)

Country Link
US (1) US5234901A (de)
EP (1) EP0466607B1 (de)
CA (1) CA2047001C (de)
DE (1) DE69115775T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6399569B1 (en) * 1991-03-11 2002-06-04 Curis, Inc. Morphogen treatments for limiting proliferation of epithelial cells
DE19634118A1 (de) * 1996-08-23 1998-02-26 Forschungszentrum Juelich Gmbh Schichtenfolge sowie eine solche enthaltendes Bauelement
US6221812B1 (en) 1998-07-20 2001-04-24 Board Of Regents, The University Of Texas System Jc in high magnetic field of bi-layer and multi-layer structures for high temperature superconductive materials
US6974501B1 (en) * 1999-11-18 2005-12-13 American Superconductor Corporation Multi-layer articles and methods of making same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283086A (ja) * 1987-05-14 1988-11-18 Furukawa Electric Co Ltd:The 超電導薄膜の製造方法
JP2584003B2 (ja) * 1988-09-26 1997-02-19 松下電器産業株式会社 超電導素子及びその製造方法
EP0392437B1 (de) * 1989-04-11 1996-08-14 Matsushita Electric Industrial Co., Ltd. Methode zum Ausheilen eines Dünnschichtsupraleiters

Also Published As

Publication number Publication date
DE69115775T2 (de) 1996-09-05
US5234901A (en) 1993-08-10
EP0466607B1 (de) 1995-12-27
CA2047001C (en) 1996-07-23
EP0466607A2 (de) 1992-01-15
CA2047001A1 (en) 1992-01-13
EP0466607A3 (en) 1992-05-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee