IT1239491B - Misure e controllo di temperature per processi fototermici - Google Patents

Misure e controllo di temperature per processi fototermici

Info

Publication number
IT1239491B
IT1239491B IT19833A IT1983390A IT1239491B IT 1239491 B IT1239491 B IT 1239491B IT 19833 A IT19833 A IT 19833A IT 1983390 A IT1983390 A IT 1983390A IT 1239491 B IT1239491 B IT 1239491B
Authority
IT
Italy
Prior art keywords
measurements
temperature control
photothermal processes
photothermal
processes
Prior art date
Application number
IT19833A
Other languages
English (en)
Italian (it)
Other versions
IT9019833A0 (it
IT9019833A1 (it
Inventor
Carl Murray Penney
Tushar Shashikant Chande
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of IT9019833A0 publication Critical patent/IT9019833A0/it
Publication of IT9019833A1 publication Critical patent/IT9019833A1/it
Application granted granted Critical
Publication of IT1239491B publication Critical patent/IT1239491B/it

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
    • G01J5/601—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature using spectral scanning
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/44—Electric circuits
    • G01J2001/4413—Type
    • G01J2001/442—Single-photon detection or photon counting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/2813—2D-array

Landscapes

  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Radiation Pyrometers (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
IT19833A 1989-03-27 1990-03-27 Misure e controllo di temperature per processi fototermici IT1239491B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/329,054 US4959244A (en) 1989-03-27 1989-03-27 Temperature measurement and control for photohermal processes

Publications (3)

Publication Number Publication Date
IT9019833A0 IT9019833A0 (it) 1990-03-27
IT9019833A1 IT9019833A1 (it) 1991-09-27
IT1239491B true IT1239491B (it) 1993-11-03

Family

ID=23283674

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19833A IT1239491B (it) 1989-03-27 1990-03-27 Misure e controllo di temperature per processi fototermici

Country Status (6)

Country Link
US (1) US4959244A (cg-RX-API-DMAC7.html)
JP (1) JPH02267270A (cg-RX-API-DMAC7.html)
DE (1) DE4008816A1 (cg-RX-API-DMAC7.html)
FR (1) FR2644797A1 (cg-RX-API-DMAC7.html)
GB (1) GB2232792B (cg-RX-API-DMAC7.html)
IT (1) IT1239491B (cg-RX-API-DMAC7.html)

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US5200230A (en) * 1987-06-29 1993-04-06 Dunfries Investments Limited Laser coating process
US5026979A (en) * 1990-03-05 1991-06-25 General Electric Company Method and apparatus for optically monitoring laser materials processing
US5240736A (en) * 1992-10-26 1993-08-31 Ford Motor Company Method and apparatus for in-situ measuring filament temperature and the thickness of a diamond film
US5365876A (en) * 1993-02-01 1994-11-22 The United States Of America As Represented By The United States Department Of Energy Crystal face temperature determination means
JPH0929472A (ja) * 1995-07-14 1997-02-04 Hitachi Ltd 割断方法、割断装置及びチップ材料
US6400833B1 (en) 1998-06-19 2002-06-04 Oms-Optical Measuring Systems Method and apparatus for discrimination of product units from spread spectrum images of thin portions of product units
US6303411B1 (en) 1999-05-03 2001-10-16 Vortek Industries Ltd. Spatially resolved temperature measurement and irradiance control
CN100416243C (zh) 2001-12-26 2008-09-03 加拿大马特森技术有限公司 测量温度和热处理的方法及系统
US7341673B2 (en) 2003-08-12 2008-03-11 Lam Research Corporation Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
TWI320951B (en) * 2002-08-13 2010-02-21 Lam Res Corp Methods for in situ substrate temperature monitoring by electromagnetic radiation emission
WO2004057650A1 (en) 2002-12-20 2004-07-08 Mattson Technology Canada, Inc. Methods and systems for supporting a workpiece and for heat-treating the workpiece
JP5630935B2 (ja) 2003-12-19 2014-11-26 マトソン テクノロジー、インコーポレイテッド 工作物の熱誘起運動を抑制する機器及び装置
US7360945B2 (en) * 2005-03-31 2008-04-22 Intel Corporation Apparatus for determining temperature of a portable computer system
DE102005047433B4 (de) * 2005-09-30 2009-12-24 Wolfgang Erdmann Verfahren zum computergestützten Optimieren des Betriebs eines Rollenofens, Computerprogramm und computerlesbarer Datenträger
WO2008058397A1 (en) 2006-11-15 2008-05-22 Mattson Technology Canada, Inc. Systems and methods for supporting a workpiece during heat-treating
JP5718809B2 (ja) 2008-05-16 2015-05-13 マトソン テクノロジー、インコーポレイテッド 加工品の破壊を防止する方法および装置
US8309883B2 (en) * 2010-05-20 2012-11-13 Ipg Photonics Corporation Methods and systems for laser processing of materials
US9573224B2 (en) 2014-09-02 2017-02-21 Product Innovation & Engineering, LLC System and method for determining beam power level along an additive deposition path
US9757902B2 (en) 2014-09-02 2017-09-12 Product Innovation and Engineering L.L.C. Additive layering method using improved build description
US10632566B2 (en) 2014-12-02 2020-04-28 Product Innovation and Engineering L.L.C. System and method for controlling the input energy from an energy point source during metal processing
CN105506733A (zh) * 2015-12-23 2016-04-20 圆融光电科技股份有限公司 外延生长设备
US9720243B1 (en) * 2015-12-31 2017-08-01 X Development Llc Wavelength division monolithic optical device
CN106843316B (zh) * 2017-03-01 2018-11-09 华中科技大学 一种基于光热式的快速升温控制方法、装置及升温炉
US11839915B2 (en) 2021-01-20 2023-12-12 Product Innovation and Engineering LLC System and method for determining beam power level along an additive deposition path
CN114216566A (zh) * 2021-12-27 2022-03-22 中国工程物理研究院流体物理研究所 一种瞬态连续温度的单点测量方法及系统

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GB1118303A (en) * 1964-11-27 1968-06-26 British Iron Steel Research Heating control system
GB1372753A (en) * 1971-01-11 1974-11-06 Honeywell Inc Apparatus for processing a workpiece with a laser beam
US4081215A (en) * 1976-05-18 1978-03-28 General Electric Company Stable two-channel, single-filter spectrometer
JPS55500588A (cg-RX-API-DMAC7.html) * 1978-08-18 1980-09-04
DE3123427C2 (de) * 1981-06-12 1985-10-24 Siemens AG, 1000 Berlin und 8000 München Anordnung zum Messen des elektrischen Widerstandes und der Temperatur von durch Aufdampfen oder Aufstäuben auf Substraten abgeschiedenen dünnen, metallischleitenden Schichten während der Schichtherstellung
FR2545007B1 (fr) * 1983-04-29 1986-12-26 Commissariat Energie Atomique Procede et dispositif pour le revetement d'une piece par projection de plasma
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
FR2572523B1 (fr) * 1984-10-25 1987-06-12 Bertin & Cie Procede et dispositif pyrometriques pour determiner a distance, par voie optique, la temperature et/ou l'emissivite d'un corps ou milieu quelconque
US4676646A (en) * 1985-10-15 1987-06-30 Energy Conversion Devices, Inc. Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer
JPS6217179A (ja) * 1985-07-17 1987-01-26 Nec Corp 薄膜形成方法
EP0209131B1 (en) * 1985-07-17 1991-12-04 Nec Corporation Optical cvd method with a strong optical intensity used during an initial period and device therefor
JPS6217178A (ja) * 1985-07-17 1987-01-26 Nec Corp 薄膜形成装置
DD254114A3 (de) * 1985-07-30 1988-02-17 Univ Dresden Tech Pyrometrisches messverfahren
DE3634800A1 (de) * 1985-12-30 1987-07-02 Weinert E Messgeraetewerk Mehrkanalmesskopf fuer ein strahlungspyrometer
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US4699080A (en) * 1986-05-15 1987-10-13 Dynapert-Htc Corporation Temperature sensors for vapor processing systems
JPS62296512A (ja) * 1986-06-17 1987-12-23 Fujitsu Ltd 気相成長装置
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DE3733147A1 (de) * 1987-10-01 1989-04-13 Messer Griesheim Gmbh Verfahren zum laserwaermebehandeln, wie laserhaerten, laserweichgluehen, laserrekristallisieren von bauteilen in festem zustand
DE3739862A1 (de) * 1987-11-25 1989-06-08 Bosch Gmbh Robert Werkstueckbearbeitungsvorrichtung

Also Published As

Publication number Publication date
GB2232792A (en) 1990-12-19
IT9019833A0 (it) 1990-03-27
JPH02267270A (ja) 1990-11-01
FR2644797A1 (fr) 1990-09-28
GB2232792B (en) 1993-11-24
DE4008816A1 (de) 1990-10-04
DE4008816C2 (cg-RX-API-DMAC7.html) 1991-12-19
US4959244A (en) 1990-09-25
IT9019833A1 (it) 1991-09-27
GB9005861D0 (en) 1990-05-09

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