IT1210812B - Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio - Google Patents

Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio

Info

Publication number
IT1210812B
IT1210812B IT8767519A IT6751987A IT1210812B IT 1210812 B IT1210812 B IT 1210812B IT 8767519 A IT8767519 A IT 8767519A IT 6751987 A IT6751987 A IT 6751987A IT 1210812 B IT1210812 B IT 1210812B
Authority
IT
Italy
Prior art keywords
cadmium
procedure
manufacture
mercury telluride
monocrystalline layers
Prior art date
Application number
IT8767519A
Other languages
English (en)
Other versions
IT8767519A0 (it
Inventor
Sergio Bernardi
Original Assignee
Selenia Ind Elettroniche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Selenia Ind Elettroniche filed Critical Selenia Ind Elettroniche
Priority to IT8767519A priority Critical patent/IT1210812B/it
Publication of IT8767519A0 publication Critical patent/IT8767519A0/it
Priority to EP88109560A priority patent/EP0295659B1/en
Priority to DE198888109560T priority patent/DE295659T1/de
Priority to US07/207,259 priority patent/US4872943A/en
Priority to DE8888109560T priority patent/DE3860551D1/de
Application granted granted Critical
Publication of IT1210812B publication Critical patent/IT1210812B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H01L21/02628—Liquid deposition using solutions
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
    • C30B19/04—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux the solvent being a component of the crystal composition
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/024—Group 12/16 materials
    • H01L21/02411—Tellurides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02551—Group 12/16 materials
    • H01L21/02562—Tellurides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H01L21/02625—Liquid deposition using melted materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/906—Special atmosphere other than vacuum or inert
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/101—Liquid Phase Epitaxy, LPE

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IT8767519A 1987-06-16 1987-06-16 Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio IT1210812B (it)

Priority Applications (5)

Application Number Priority Date Filing Date Title
IT8767519A IT1210812B (it) 1987-06-16 1987-06-16 Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio
EP88109560A EP0295659B1 (en) 1987-06-16 1988-06-15 Process for making single-crystal mercury cadmium telluride layers
DE198888109560T DE295659T1 (de) 1987-06-16 1988-06-15 Verfahren zum erzeugen von monokristallinen quecksilber-cadmium-tellurid-schichten.
US07/207,259 US4872943A (en) 1987-06-16 1988-06-15 Process for making monocrystalline HGCDTE layers
DE8888109560T DE3860551D1 (de) 1987-06-16 1988-06-15 Verfahren zum erzeugen von monokristallinen quecksilber-cadmium-tellurid-schichten.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8767519A IT1210812B (it) 1987-06-16 1987-06-16 Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio

Publications (2)

Publication Number Publication Date
IT8767519A0 IT8767519A0 (it) 1987-06-16
IT1210812B true IT1210812B (it) 1989-09-29

Family

ID=11303113

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8767519A IT1210812B (it) 1987-06-16 1987-06-16 Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio

Country Status (4)

Country Link
US (1) US4872943A (it)
EP (1) EP0295659B1 (it)
DE (2) DE3860551D1 (it)
IT (1) IT1210812B (it)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH042689A (ja) * 1990-04-19 1992-01-07 Mitsubishi Electric Corp ヘテロエピタキシャル液相成長方法
US5264190A (en) * 1990-04-19 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Liquid phase epitaxial film growth apparatus
CA2649322C (en) 2008-09-30 2011-02-01 5N Plus Inc. Cadmium telluride production process
CN114551642B (zh) * 2022-02-10 2023-09-12 中国科学院上海技术物理研究所 一种弱p型碲镉汞材料的退火方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3725135A (en) * 1968-10-09 1973-04-03 Honeywell Inc PROCESS FOR PREPARING EPITAXIAL LAYERS OF Hg{11 {118 {11 Cd{11 Te
US3902924A (en) * 1973-08-30 1975-09-02 Honeywell Inc Growth of mercury cadmium telluride by liquid phase epitaxy and the product thereof
US4344476A (en) * 1979-08-30 1982-08-17 Santa Barbara Research Center Supercool method for producing single crystal mercury cadmium telluride
US4315477A (en) * 1980-03-24 1982-02-16 Rockwell International Corporation Semi-open liquid phase epitaxial growth system
US4317689A (en) * 1980-07-18 1982-03-02 Honeywell Inc. Mercury containment for liquid phase growth of mercury cadmium telluride from tellurium-rich solution
JPS57211725A (en) * 1981-06-23 1982-12-25 Fujitsu Ltd Liquid epitaxial growth method
US4642142A (en) * 1982-05-19 1987-02-10 Massachusetts Institute Of Technology Process for making mercury cadmium telluride
GB2132228B (en) * 1982-12-22 1985-09-04 Philips Electronic Associated Producing a controlled unsaturated vapour pressure of a volatile liquid in a heat treatment chamber

Also Published As

Publication number Publication date
IT8767519A0 (it) 1987-06-16
EP0295659A1 (en) 1988-12-21
EP0295659B1 (en) 1990-09-05
DE295659T1 (de) 1989-10-05
DE3860551D1 (de) 1990-10-11
US4872943A (en) 1989-10-10

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940628