IT1208659B - PERFECTED METHOD OF ELECTROPLATING OF NON-METALLIC SURFACES - Google Patents

PERFECTED METHOD OF ELECTROPLATING OF NON-METALLIC SURFACES

Info

Publication number
IT1208659B
IT1208659B IT8348608A IT4860883A IT1208659B IT 1208659 B IT1208659 B IT 1208659B IT 8348608 A IT8348608 A IT 8348608A IT 4860883 A IT4860883 A IT 4860883A IT 1208659 B IT1208659 B IT 1208659B
Authority
IT
Italy
Prior art keywords
electroplating
metallic surfaces
perfected method
perfected
metallic
Prior art date
Application number
IT8348608A
Other languages
Italian (it)
Other versions
IT8348608A0 (en
Inventor
Denis M Morissey
Peter E Ezeblisky Rudol Takach
Original Assignee
Kollmorgen Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kollmorgen Tech Corp filed Critical Kollmorgen Tech Corp
Publication of IT8348608A0 publication Critical patent/IT8348608A0/en
Application granted granted Critical
Publication of IT1208659B publication Critical patent/IT1208659B/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
    • H05K3/424—Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
    • C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886—Multistep pretreatment
    • C23C18/1889—Multistep pretreatment with use of metal first
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/285—Sensitising or activating with tin based compound or composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/17—Post-manufacturing processes
    • H05K2203/173—Adding connections between adjacent pads or conductors, e.g. for modifying or repairing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
IT8348608A 1982-07-01 1983-07-01 PERFECTED METHOD OF ELECTROPLATING OF NON-METALLIC SURFACES IT1208659B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39444282A 1982-07-01 1982-07-01
US50116783A 1983-06-10 1983-06-10

Publications (2)

Publication Number Publication Date
IT8348608A0 IT8348608A0 (en) 1983-07-01
IT1208659B true IT1208659B (en) 1989-07-10

Family

ID=27014738

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8348608A IT1208659B (en) 1982-07-01 1983-07-01 PERFECTED METHOD OF ELECTROPLATING OF NON-METALLIC SURFACES

Country Status (15)

Country Link
KR (1) KR890002623B1 (en)
AT (1) AT383149B (en)
AU (1) AU564034B2 (en)
CA (1) CA1226846A (en)
CH (1) CH655518B (en)
DE (1) DE3323476A1 (en)
DK (1) DK303083A (en)
ES (1) ES523785A0 (en)
FR (1) FR2529582B1 (en)
GB (1) GB2123036B (en)
IL (1) IL69122A (en)
IN (1) IN160555B (en)
IT (1) IT1208659B (en)
NL (1) NL8302344A (en)
SE (1) SE462434B (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3339946A1 (en) * 1983-11-04 1985-05-23 Klaus 6500 Mainz Eisenmenger Process for metallising printed circuit board hole walls
DE3412447A1 (en) * 1984-03-31 1985-11-28 Schering AG, 1000 Berlin und 4709 Bergkamen METHOD FOR PRODUCING PRINTED CIRCUITS
US4891069A (en) * 1986-06-06 1990-01-02 Techno Instruments Investments 1983 Ltd. Composition for the electrolytic coating of circuit boards without an electroless metal coating
US4749449A (en) * 1987-06-05 1988-06-07 E. I. Du Pont De Nemours And Company Metallization utilizing a catalyst which is removed or deactivated from undesired surface areas
US5007990A (en) * 1987-07-10 1991-04-16 Shipley Company Inc. Electroplating process
DE3741459C1 (en) * 1987-12-08 1989-04-13 Blasberg Oberflaechentech Process for the production of plated-through printed circuit boards
US4810333A (en) * 1987-12-14 1989-03-07 Shipley Company Inc. Electroplating process
US4895739A (en) * 1988-02-08 1990-01-23 Shipley Company Inc. Pretreatment for electroplating process
US4873136A (en) * 1988-06-16 1989-10-10 General Electric Company Method for preparing polymer surfaces for subsequent plating thereon, and improved metal-plated plastic articles made therefrom
US5004525A (en) * 1988-08-23 1991-04-02 Shipley Company Inc. Copper electroplating composition
US5068013A (en) * 1988-08-23 1991-11-26 Shipley Company Inc. Electroplating composition and process
US4969979A (en) * 1989-05-08 1990-11-13 International Business Machines Corporation Direct electroplating of through holes
AU644602B2 (en) * 1989-08-31 1993-12-16 Blasberg-Oberflachentechnik Gmbh Plated-through printed circuit board with resist and process for producing it
DE3928832C2 (en) * 1989-08-31 1995-04-20 Blasberg Oberflaechentech Process for the production of plated-through printed circuit boards and semi-finished printed circuit boards
US5071517A (en) * 1989-11-21 1991-12-10 Solution Technology Systems Method for directly electroplating a dielectric substrate and plated substrate so produced
US5342501A (en) * 1989-11-21 1994-08-30 Eric F. Harnden Method for electroplating metal onto a non-conductive substrate treated with basic accelerating solutions for metal plating
US4959121A (en) * 1990-01-05 1990-09-25 General Electric Company Method for treating a polyimide surface for subsequent plating thereon
US5207888A (en) * 1991-06-24 1993-05-04 Shipley Company Inc. Electroplating process and composition
US5376248A (en) * 1991-10-15 1994-12-27 Enthone-Omi, Inc. Direct metallization process
DE4138214A1 (en) * 1991-11-21 1993-05-27 Daimler Benz Ag Metallisation of aluminium nitride ceramic - involves ceramic treatment to remove glass surface film
US5262042A (en) * 1991-12-12 1993-11-16 Eric F. Harnden Simplified method for direct electroplating of dielectric substrates
DE4206680C1 (en) * 1992-02-28 1994-01-27 Schering Ag Process for the metallization of non-conductive surfaces and the use of hydroxymethanesulfinic acid in the process
US5262041A (en) * 1992-12-11 1993-11-16 Shipley Company Inc. Additive plating process
US5415762A (en) * 1993-08-18 1995-05-16 Shipley Company Inc. Electroplating process and composition
DE4412463C3 (en) * 1994-04-08 2000-02-10 Atotech Deutschland Gmbh Process for the preparation of a palladium colloid solution and its use
US5626736A (en) 1996-01-19 1997-05-06 Shipley Company, L.L.C. Electroplating process
DE19643823C2 (en) * 1996-10-30 2002-10-17 Lpw Chemie Gmbh Process for the direct functional metallization of the surface of a plastic object
FR2946433B1 (en) 2009-06-05 2013-07-12 Ecole Polytechnique Dgar USE OF AN AMORPHOUS SILICON LAYER AND ANALYSIS METHOD
KR101460749B1 (en) * 2013-06-12 2014-11-13 (주)제이스 Lamination technical development of metal printed circuit board having high heat-radiation property

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2733198A (en) * 1956-01-31 Acid copper plating bath
US3095608A (en) * 1959-12-09 1963-07-02 Cabot Corp Process and apparatus for extruding and curing polymeric compositions
US3099608A (en) * 1959-12-30 1963-07-30 Ibm Method of electroplating on a dielectric base
US3414493A (en) * 1965-10-19 1968-12-03 Lea Ronal Inc Electrodeposition of copper
DE1665314C2 (en) * 1966-02-22 1978-05-24 Kollmorgen Tech Corp Base material for the production of printed circuits
US3682671A (en) * 1970-02-05 1972-08-08 Kollmorgen Corp Novel precious metal sensitizing solutions
FR2102630A5 (en) * 1970-08-12 1972-04-07 Commissariat Energie Atomique Insulant-metal-bond formation process - esp for metal coating of quartz tubes
FR2122456B1 (en) * 1971-01-20 1976-07-23 Hoechst Ag
US3984290A (en) * 1973-10-01 1976-10-05 Georgy Avenirovich Kitaev Method of forming intralayer junctions in a multilayer structure
US4336114A (en) * 1981-03-26 1982-06-22 Hooker Chemicals & Plastics Corp. Electrodeposition of bright copper

Also Published As

Publication number Publication date
GB2123036A (en) 1984-01-25
DE3323476A1 (en) 1984-01-05
DK303083D0 (en) 1983-06-30
DK303083A (en) 1984-01-02
GB8317516D0 (en) 1983-08-03
GB2123036B (en) 1986-07-09
FR2529582B1 (en) 1989-05-19
IT8348608A0 (en) 1983-07-01
IL69122A0 (en) 1983-10-31
AU1648183A (en) 1984-01-05
AU564034B2 (en) 1987-07-30
KR890002623B1 (en) 1989-07-20
SE462434B (en) 1990-06-25
NL8302344A (en) 1984-02-01
KR840005498A (en) 1984-11-14
ES8404769A1 (en) 1984-05-16
CH655518B (en) 1986-04-30
FR2529582A1 (en) 1984-01-06
ES523785A0 (en) 1984-05-16
AT383149B (en) 1987-05-25
SE8303716D0 (en) 1983-06-29
IL69122A (en) 1987-01-30
SE8303716L (en) 1984-01-02
IN160555B (en) 1987-07-18
CA1226846A (en) 1987-09-15
DE3323476C2 (en) 1988-10-20
ATA240783A (en) 1986-10-15

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19930728