IT1197069B - Trappola a fluido refrigerante per evaporatori sotto vuoto per la deposizione di sottili pellicole metalliche - Google Patents

Trappola a fluido refrigerante per evaporatori sotto vuoto per la deposizione di sottili pellicole metalliche

Info

Publication number
IT1197069B
IT1197069B IT21421/86A IT2142186A IT1197069B IT 1197069 B IT1197069 B IT 1197069B IT 21421/86 A IT21421/86 A IT 21421/86A IT 2142186 A IT2142186 A IT 2142186A IT 1197069 B IT1197069 B IT 1197069B
Authority
IT
Italy
Prior art keywords
deposition
thin metal
metal films
refrigerant fluid
fluid trap
Prior art date
Application number
IT21421/86A
Other languages
English (en)
Other versions
IT8621421A1 (it
IT8621421A0 (it
Inventor
Orazio Viscuso
Original Assignee
Sgs Microelettronica Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=11181524&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IT1197069(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sgs Microelettronica Spa filed Critical Sgs Microelettronica Spa
Priority to IT21421/86A priority Critical patent/IT1197069B/it
Publication of IT8621421A0 publication Critical patent/IT8621421A0/it
Priority to EP87201234A priority patent/EP0255965B2/en
Priority to DE8787201234T priority patent/DE3762889D1/de
Priority to US07/071,909 priority patent/US4785638A/en
Publication of IT8621421A1 publication Critical patent/IT8621421A1/it
Application granted granted Critical
Publication of IT1197069B publication Critical patent/IT1197069B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D8/00Cold traps; Cold baffles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S417/00Pumps
    • Y10S417/901Cryogenic pumps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
IT21421/86A 1986-08-06 1986-08-06 Trappola a fluido refrigerante per evaporatori sotto vuoto per la deposizione di sottili pellicole metalliche IT1197069B (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IT21421/86A IT1197069B (it) 1986-08-06 1986-08-06 Trappola a fluido refrigerante per evaporatori sotto vuoto per la deposizione di sottili pellicole metalliche
EP87201234A EP0255965B2 (en) 1986-08-06 1987-06-26 Refrigerant fluid trap for vacuum evaporators for the deposit of thin metal films
DE8787201234T DE3762889D1 (de) 1986-08-06 1987-06-26 Fluessig gekuehlter auffang fuer vacuumaufdampfanlage zum herstellen von duennen metallschichten.
US07/071,909 US4785638A (en) 1986-08-06 1987-07-10 Refrigerant fluid trap for vacuum evaporators for the deposit of thin metal films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT21421/86A IT1197069B (it) 1986-08-06 1986-08-06 Trappola a fluido refrigerante per evaporatori sotto vuoto per la deposizione di sottili pellicole metalliche

Publications (3)

Publication Number Publication Date
IT8621421A0 IT8621421A0 (it) 1986-08-06
IT8621421A1 IT8621421A1 (it) 1988-02-06
IT1197069B true IT1197069B (it) 1988-11-25

Family

ID=11181524

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21421/86A IT1197069B (it) 1986-08-06 1986-08-06 Trappola a fluido refrigerante per evaporatori sotto vuoto per la deposizione di sottili pellicole metalliche

Country Status (4)

Country Link
US (1) US4785638A (it)
EP (1) EP0255965B2 (it)
DE (1) DE3762889D1 (it)
IT (1) IT1197069B (it)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2234988B (en) * 1989-08-16 1993-12-08 Qpl Limited Improvements in vacuum deposition machines
US6241793B1 (en) * 1999-08-02 2001-06-05 Taiwan Semiconductor Manufacturing Company, Ltd Cold trap equipped with curvilinear cooling plate
GB0319171D0 (en) * 2003-08-15 2003-09-17 Boc Group Plc Purifier/getter for vacuum and uhp gas applications

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL251342A (it) * 1960-05-07
US3144200A (en) * 1962-10-17 1964-08-11 Clyde E Taylor Process and device for cryogenic adsorption pumping
FR1369360A (fr) * 1963-03-30 1964-08-14 Perfectionnements aux creusets pour la métallisation à l'aluminium de rubans en matière diélectrique
US3252291A (en) * 1963-04-04 1966-05-24 Bendix Balzers Vacuum Inc Cryo-pumps
FR1381199A (fr) * 1964-02-07 1964-12-04 Grove Valve & Regulator Co Perfectionnements apportés aux organes pour le transfert de chaleur et aux procédés pour leur fabrication
GB1076428A (en) * 1964-05-25 1967-07-19 Edwards High Vacuum Int Ltd Improvements in or relating to cold traps in vacuum systems
US3472039A (en) * 1968-02-19 1969-10-14 Varian Associates Hemispheric cryogenic vacuum trap and vacuum system using same
FR2114039A5 (it) * 1970-11-13 1972-06-30 Air Liquide
US4488506A (en) * 1981-06-18 1984-12-18 Itt Industries, Inc. Metallization plant
JPS60161702A (ja) * 1984-01-27 1985-08-23 Seiko Instr & Electronics Ltd 真空用冷却トラツプ
US4599869A (en) * 1984-03-12 1986-07-15 Ozin Geoffrey A Cryogenic deposition of catalysts

Also Published As

Publication number Publication date
IT8621421A1 (it) 1988-02-06
IT8621421A0 (it) 1986-08-06
EP0255965A2 (en) 1988-02-17
EP0255965A3 (en) 1988-08-10
EP0255965B2 (en) 1994-10-05
DE3762889D1 (de) 1990-06-28
EP0255965B1 (en) 1990-05-23
US4785638A (en) 1988-11-22

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970829