IT1127490B - Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio - Google Patents

Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio

Info

Publication number
IT1127490B
IT1127490B IT48862/80A IT4886280A IT1127490B IT 1127490 B IT1127490 B IT 1127490B IT 48862/80 A IT48862/80 A IT 48862/80A IT 4886280 A IT4886280 A IT 4886280A IT 1127490 B IT1127490 B IT 1127490B
Authority
IT
Italy
Prior art keywords
galvanostegy
interspace
procedure
amplitude control
amplitude
Prior art date
Application number
IT48862/80A
Other languages
English (en)
Other versions
IT8048862A0 (it
Inventor
Inoue Kiyoshi
Original Assignee
Inoue Japax Res
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Res filed Critical Inoue Japax Res
Publication of IT8048862A0 publication Critical patent/IT8048862A0/it
Application granted granted Critical
Publication of IT1127490B publication Critical patent/IT1127490B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
IT48862/80A 1979-06-01 1980-06-02 Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio IT1127490B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54067483A JPS6056238B2 (ja) 1979-06-01 1979-06-01 電気メツキ方法

Publications (2)

Publication Number Publication Date
IT8048862A0 IT8048862A0 (it) 1980-06-02
IT1127490B true IT1127490B (it) 1986-05-21

Family

ID=13346261

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48862/80A IT1127490B (it) 1979-06-01 1980-06-02 Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio

Country Status (6)

Country Link
US (1) US4269672A (it)
JP (1) JPS6056238B2 (it)
DE (1) DE3020824C2 (it)
FR (1) FR2457912B1 (it)
GB (1) GB2052562B (it)
IT (1) IT1127490B (it)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL64705A0 (en) * 1981-01-13 1982-03-31 Metafuse Ltd Process and apparatus for treating electrically conductive matrices and products produced by the process
US4364802A (en) * 1981-03-05 1982-12-21 Inoue-Japax Research Incorporated Scanning electrode vibration electrodeposition method
DE3109755C2 (de) * 1981-03-13 1986-08-07 Inoue-Japax Research Inc., Yokohama, Kanagawa Verfahren und Vorrichtung zur galvanischen Abscheidung
IT1149042B (it) * 1981-08-07 1986-12-03 Inoue Japax Res Metodo e dispositivo per la deposizione elettrolitica di un metallo su un substrato
GB2104918B (en) * 1981-08-19 1984-12-19 Inoue Japax Res Electrodepositing a metal on a conductive surface
JPS5931882A (ja) * 1982-08-12 1984-02-21 Sonitsukusu:Kk 浴中表面処理方法及びその装置
US20100038121A1 (en) * 1999-08-27 2010-02-18 Lex Kosowsky Metal Deposition
US20100044079A1 (en) * 1999-08-27 2010-02-25 Lex Kosowsky Metal Deposition
AU6531600A (en) * 1999-08-27 2001-03-26 Lex Kosowsky Current carrying structure using voltage switchable dielectric material
US20100038119A1 (en) * 1999-08-27 2010-02-18 Lex Kosowsky Metal Deposition
US20100044080A1 (en) * 1999-08-27 2010-02-25 Lex Kosowsky Metal Deposition
US6746589B2 (en) * 2000-09-20 2004-06-08 Ebara Corporation Plating method and plating apparatus
US7626179B2 (en) * 2005-09-30 2009-12-01 Virgin Island Microsystems, Inc. Electron beam induced resonance
US7586097B2 (en) 2006-01-05 2009-09-08 Virgin Islands Microsystems, Inc. Switching micro-resonant structures using at least one director
US7791290B2 (en) 2005-09-30 2010-09-07 Virgin Islands Microsystems, Inc. Ultra-small resonating charged particle beam modulator
CN101496167A (zh) 2005-11-22 2009-07-29 肖克科技有限公司 用于过电压保护的包括电压可变换材料的半导体器件
US20070200646A1 (en) * 2006-02-28 2007-08-30 Virgin Island Microsystems, Inc. Method for coupling out of a magnetic device
DE102006010808B4 (de) * 2006-03-07 2009-08-13 BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG Vorrichtung, System, Verfahren, Computerprogramm und Datenträger zur elektrophoretischen Abscheidung mit einer beweglichen Elektrode
US7876793B2 (en) * 2006-04-26 2011-01-25 Virgin Islands Microsystems, Inc. Micro free electron laser (FEL)
US8188431B2 (en) 2006-05-05 2012-05-29 Jonathan Gorrell Integration of vacuum microelectronic device with integrated circuit
US20070258720A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Inter-chip optical communication
US7732786B2 (en) 2006-05-05 2010-06-08 Virgin Islands Microsystems, Inc. Coupling energy in a plasmon wave to an electron beam
US7728702B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Shielding of integrated circuit package with high-permeability magnetic material
US20070257273A1 (en) * 2006-05-05 2007-11-08 Virgin Island Microsystems, Inc. Novel optical cover for optical chip
US7986113B2 (en) 2006-05-05 2011-07-26 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
US7728397B2 (en) * 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Coupled nano-resonating energy emitting structures
CN101536190A (zh) 2006-09-24 2009-09-16 肖克科技有限公司 具有分级电压响应的电压可切换介电材料的配方及其制造方法
US7990336B2 (en) 2007-06-19 2011-08-02 Virgin Islands Microsystems, Inc. Microwave coupled excitation of solid state resonant arrays
ES2342518B1 (es) * 2007-10-27 2011-01-17 Universidad De Las Palmas De Gran Canaria Sistema robotico de orientacion y soporte catodico en maquina de electroconformado.
US8272123B2 (en) 2009-01-27 2012-09-25 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US9226391B2 (en) 2009-01-27 2015-12-29 Littelfuse, Inc. Substrates having voltage switchable dielectric materials
US8399773B2 (en) 2009-01-27 2013-03-19 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
KR101679099B1 (ko) 2009-03-26 2016-11-23 쇼킹 테크놀로지스 인코포레이티드 전압 스위칭형 유전 물질을 갖는 소자
US20110198544A1 (en) * 2010-02-18 2011-08-18 Lex Kosowsky EMI Voltage Switchable Dielectric Materials Having Nanophase Materials
US9320135B2 (en) * 2010-02-26 2016-04-19 Littelfuse, Inc. Electric discharge protection for surface mounted and embedded components
US9224728B2 (en) 2010-02-26 2015-12-29 Littelfuse, Inc. Embedded protection against spurious electrical events
US9082622B2 (en) 2010-02-26 2015-07-14 Littelfuse, Inc. Circuit elements comprising ferroic materials
CA2905536C (en) 2013-03-15 2023-03-07 Modumetal, Inc. Electrodeposited compositions and nanolaminated alloys for articles prepared by additive manufacturing processes
WO2016044720A1 (en) 2014-09-18 2016-03-24 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
CA2905575C (en) 2013-03-15 2022-07-12 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
BR112017005534A2 (pt) 2014-09-18 2017-12-05 Modumetal Inc métodos de preparação de artigos por processos de eletrodeposição e fabricação aditiva
EP3509812B1 (en) 2016-09-09 2025-04-09 Modumetal, Inc. Manufacturing of molds by deposition of material layers on a workpiece, molds and articles obtained by said process
CN109963966B (zh) 2016-09-14 2022-10-11 莫杜美拓有限公司 用于可靠、高通量、复杂电场生成的系统以及由其生产涂层的方法
CN110114210B (zh) 2016-11-02 2022-03-04 莫杜美拓有限公司 拓扑优化的高界面填充结构
US11286575B2 (en) * 2017-04-21 2022-03-29 Modumetal, Inc. Tubular articles with electrodeposited coatings, and systems and methods for producing the same
WO2019210264A1 (en) 2018-04-27 2019-10-31 Modumetal, Inc. Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB259900A (en) * 1925-10-17 1927-02-03 Siemens Ag Improved method of and means for producing galvanic chromium coatings on hollow bodies, especially on narrow tubes
US1733404A (en) * 1926-03-15 1929-10-29 Frank A Fahrenwald Process and apparatus for electroplating tubes
US2206908A (en) * 1938-11-05 1940-07-09 Raymond L Lunt Method for electroplating molds for rubber articles
US3810829A (en) * 1972-06-28 1974-05-14 Nasa Scanning nozzle plating system

Also Published As

Publication number Publication date
FR2457912B1 (fr) 1985-08-23
JPS6056238B2 (ja) 1985-12-09
GB2052562B (en) 1983-01-06
GB2052562A (en) 1981-01-28
IT8048862A0 (it) 1980-06-02
FR2457912A1 (fr) 1980-12-26
US4269672A (en) 1981-05-26
DE3020824A1 (de) 1980-12-11
DE3020824C2 (de) 1984-11-29
JPS55161092A (en) 1980-12-15

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Legal Events

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19960625