IT1038007B - Procedimento per formare strutture a piu strati in componenti a semiconduttori - Google Patents

Procedimento per formare strutture a piu strati in componenti a semiconduttori

Info

Publication number
IT1038007B
IT1038007B IT23195/75A IT2319575A IT1038007B IT 1038007 B IT1038007 B IT 1038007B IT 23195/75 A IT23195/75 A IT 23195/75A IT 2319575 A IT2319575 A IT 2319575A IT 1038007 B IT1038007 B IT 1038007B
Authority
IT
Italy
Prior art keywords
procedure
semiconductor components
layer structures
forming multi
forming
Prior art date
Application number
IT23195/75A
Other languages
English (en)
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742422982 external-priority patent/DE2422982C2/de
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1038007B publication Critical patent/IT1038007B/it

Links

Classifications

    • H10P95/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT23195/75A 1974-05-13 1975-05-12 Procedimento per formare strutture a piu strati in componenti a semiconduttori IT1038007B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742422982 DE2422982C2 (de) 1974-05-13 Verfahren zum Ausrichten einer Fotomaske, insbesondere zum Erzeugen von Feinststrukturen

Publications (1)

Publication Number Publication Date
IT1038007B true IT1038007B (it) 1979-11-20

Family

ID=5915331

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23195/75A IT1038007B (it) 1974-05-13 1975-05-12 Procedimento per formare strutture a piu strati in componenti a semiconduttori

Country Status (6)

Country Link
JP (1) JPS50156879A (OSRAM)
BE (1) BE829001A (OSRAM)
FR (1) FR2271667B1 (OSRAM)
GB (1) GB1501158A (OSRAM)
IT (1) IT1038007B (OSRAM)
NL (1) NL7505324A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112021A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
NL7505324A (nl) 1975-11-17
JPS50156879A (OSRAM) 1975-12-18
GB1501158A (en) 1978-02-15
DE2422982B1 (de) 1975-08-14
FR2271667A1 (OSRAM) 1975-12-12
BE829001A (fr) 1975-09-01
FR2271667B1 (OSRAM) 1977-04-15

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