BE829001A - Procede pour ajuster un masque photosensible, notamment pour la realisation de structures tres fines - Google Patents

Procede pour ajuster un masque photosensible, notamment pour la realisation de structures tres fines

Info

Publication number
BE829001A
BE829001A BE156288A BE156288A BE829001A BE 829001 A BE829001 A BE 829001A BE 156288 A BE156288 A BE 156288A BE 156288 A BE156288 A BE 156288A BE 829001 A BE829001 A BE 829001A
Authority
BE
Belgium
Prior art keywords
realization
adjusting
thin structures
photosensitive mask
photosensitive
Prior art date
Application number
BE156288A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742422982 external-priority patent/DE2422982C2/de
Application filed filed Critical
Publication of BE829001A publication Critical patent/BE829001A/xx

Links

Classifications

    • H10P95/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BE156288A 1974-05-13 1975-05-13 Procede pour ajuster un masque photosensible, notamment pour la realisation de structures tres fines BE829001A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742422982 DE2422982C2 (de) 1974-05-13 Verfahren zum Ausrichten einer Fotomaske, insbesondere zum Erzeugen von Feinststrukturen

Publications (1)

Publication Number Publication Date
BE829001A true BE829001A (fr) 1975-09-01

Family

ID=5915331

Family Applications (1)

Application Number Title Priority Date Filing Date
BE156288A BE829001A (fr) 1974-05-13 1975-05-13 Procede pour ajuster un masque photosensible, notamment pour la realisation de structures tres fines

Country Status (6)

Country Link
JP (1) JPS50156879A (OSRAM)
BE (1) BE829001A (OSRAM)
FR (1) FR2271667B1 (OSRAM)
GB (1) GB1501158A (OSRAM)
IT (1) IT1038007B (OSRAM)
NL (1) NL7505324A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112021A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
NL7505324A (nl) 1975-11-17
JPS50156879A (OSRAM) 1975-12-18
IT1038007B (it) 1979-11-20
GB1501158A (en) 1978-02-15
DE2422982B1 (de) 1975-08-14
FR2271667A1 (OSRAM) 1975-12-12
FR2271667B1 (OSRAM) 1977-04-15

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