IT1002811B - Procedimento per produrre superfici polite di semiconduttori - Google Patents

Procedimento per produrre superfici polite di semiconduttori

Info

Publication number
IT1002811B
IT1002811B IT4805674A IT4805674A IT1002811B IT 1002811 B IT1002811 B IT 1002811B IT 4805674 A IT4805674 A IT 4805674A IT 4805674 A IT4805674 A IT 4805674A IT 1002811 B IT1002811 B IT 1002811B
Authority
IT
Italy
Prior art keywords
polite
semiconductors
procedure
producing
producing polite
Prior art date
Application number
IT4805674A
Other languages
English (en)
Original Assignee
Wacker Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Gmbh filed Critical Wacker Gmbh
Application granted granted Critical
Publication of IT1002811B publication Critical patent/IT1002811B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625With simultaneous mechanical treatment, e.g. mechanico-chemical polishing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • ing And Chemical Polishing (AREA)
  • Surface Treatment Of Glass (AREA)
IT4805674A 1973-02-02 1974-01-31 Procedimento per produrre superfici polite di semiconduttori IT1002811B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732305188 DE2305188A1 (de) 1973-02-02 1973-02-02 Verfahren zur herstellung von polierten halbleiteroberflaechen

Publications (1)

Publication Number Publication Date
IT1002811B true IT1002811B (it) 1976-05-20

Family

ID=5870787

Family Applications (1)

Application Number Title Priority Date Filing Date
IT4805674A IT1002811B (it) 1973-02-02 1974-01-31 Procedimento per produrre superfici polite di semiconduttori

Country Status (6)

Country Link
JP (1) JPS49111580A (it)
DE (1) DE2305188A1 (it)
FR (1) FR2216077B1 (it)
GB (1) GB1449702A (it)
IT (1) IT1002811B (it)
NL (1) NL7401454A (it)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2538855A1 (de) * 1975-09-01 1977-03-10 Wacker Chemitronic Verfahren zur herstellung von schleierfreien halbleiteroberflaechen, insbesondere schleierfreien oberflaechen von (111)-orientiertem galliumarsenid
JPS5531582A (en) * 1978-08-15 1980-03-05 Ibm Free polishing device
DE3517665A1 (de) * 1985-05-15 1986-11-20 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zum polieren von siliciumscheiben
JPS6287242A (ja) * 1985-05-29 1987-04-21 Nippon Shokubai Kagaku Kogyo Co Ltd 安定な金属酸化物系ゾル組成物
DE3545383A1 (de) * 1985-12-20 1987-07-02 Wacker Chemitronic Verfahren zum eindiffundieren von wasserstoff in halbleiter-, insbesondere siliciumscheiben
JPS62162462A (ja) * 1986-01-10 1987-07-18 Rohm Co Ltd ウエハ表面仕上方法
JP2651144B2 (ja) * 1987-01-26 1997-09-10 キヤノン株式会社 結晶基材の製造方法
JPH01153262A (ja) * 1987-12-10 1989-06-15 Mitsubishi Metal Corp 鏡面研磨方法
US5226930A (en) * 1988-06-03 1993-07-13 Monsanto Japan, Ltd. Method for preventing agglomeration of colloidal silica and silicon wafer polishing composition using the same
JPH0236067A (ja) * 1988-07-25 1990-02-06 Toshiba Corp 研磨方法及びその装置
JPH02146732A (ja) * 1988-07-28 1990-06-05 Fujitsu Ltd 研摩液及び研摩方法
NL8802028A (nl) * 1988-08-16 1990-03-16 Philips Nv Werkwijze voor het vervaardigen van een inrichting.
US5084071A (en) * 1989-03-07 1992-01-28 International Business Machines Corporation Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
US6533832B2 (en) 1998-06-26 2003-03-18 Cabot Microelectronics Corporation Chemical mechanical polishing slurry and method for using same
CN102822308B (zh) 2010-03-29 2014-12-03 旭硝子株式会社 研磨剂、研磨方法及半导体集成电路装置的制造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3385682A (en) * 1965-04-29 1968-05-28 Sprague Electric Co Method and reagent for surface polishing

Also Published As

Publication number Publication date
JPS49111580A (it) 1974-10-24
NL7401454A (it) 1974-08-06
FR2216077B1 (it) 1976-04-30
GB1449702A (en) 1976-09-15
FR2216077A1 (it) 1974-08-30
DE2305188A1 (de) 1974-08-08

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