IN2014DE00469A - - Google Patents

Download PDF

Info

Publication number
IN2014DE00469A
IN2014DE00469A IN469DE2014A IN2014DE00469A IN 2014DE00469 A IN2014DE00469 A IN 2014DE00469A IN 469DE2014 A IN469DE2014 A IN 469DE2014A IN 2014DE00469 A IN2014DE00469 A IN 2014DE00469A
Authority
IN
India
Prior art keywords
mol
composition
ratio
pzt precursor
pzt
Prior art date
Application number
Other languages
English (en)
Inventor
Toshihiro Doi
Hideaki Sakurai
Nobuyuki Soyama
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of IN2014DE00469A publication Critical patent/IN2014DE00469A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1245—Inorganic substrates other than metallic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Semiconductor Memories (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inorganic Insulating Materials (AREA)
IN469DE2014 2013-03-25 2014-02-18 IN2014DE00469A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013061938A JP6075145B2 (ja) 2013-03-25 2013-03-25 Ｐｚｔ系強誘電体薄膜形成用組成物の製造方法並びに該組成物を用いたｐｚｔ系強誘電体薄膜の形成方法

Publications (1)

Publication Number Publication Date
IN2014DE00469A true IN2014DE00469A (enrdf_load_stackoverflow) 2015-06-19

Family

ID=50115705

Family Applications (1)

Application Number Title Priority Date Filing Date
IN469DE2014 IN2014DE00469A (enrdf_load_stackoverflow) 2013-03-25 2014-02-18

Country Status (7)

Country Link
US (1) US20140287251A1 (enrdf_load_stackoverflow)
EP (1) EP2784137B1 (enrdf_load_stackoverflow)
JP (1) JP6075145B2 (enrdf_load_stackoverflow)
KR (1) KR102019522B1 (enrdf_load_stackoverflow)
CN (1) CN104072132B (enrdf_load_stackoverflow)
IN (1) IN2014DE00469A (enrdf_load_stackoverflow)
TW (1) TWI591205B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6237398B2 (ja) 2014-03-27 2017-11-29 三菱マテリアル株式会社 ＣｅドープのＰＺＴ系圧電体膜形成用組成物
US10411183B2 (en) 2014-03-27 2019-09-10 Mitsubishi Materials Corporation Composition for forming Mn-doped PZT-based piezoelectric film and Mn-doped PZT-based piezoelectric film
JP6550791B2 (ja) * 2015-02-26 2019-07-31 三菱マテリアル株式会社 ＰＮｂＺＴ膜形成用組成物の製造方法及びＰＮｂＺＴ圧電体膜の形成方法
SG11201801039VA (en) * 2015-08-28 2018-03-28 Japan Advanced Institute Of Science And Tech Method for forming pzt ferroelectric film
JP6950404B2 (ja) * 2017-03-15 2021-10-13 三菱マテリアル株式会社 圧電体膜形成用液組成物の製造方法及びこの液組成物を用いて圧電体膜を形成する方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990013149A1 (en) * 1989-04-27 1990-11-01 Queen's University At Kingston SOL GEL PROCESS FOR PREPARING Pb(Zr,Ti)O3 THIN FILMS
US5384294A (en) * 1993-11-30 1995-01-24 The United States Of America As Represented By The Secretary Of The Air Force Sol-gel derived lead oxide containing ceramics
JP5370332B2 (ja) * 1995-09-19 2013-12-18 セイコーエプソン株式会社 圧電体素子およびインクジェット式記録ヘッド
US6203608B1 (en) * 1998-04-15 2001-03-20 Ramtron International Corporation Ferroelectric thin films and solutions: compositions
JP4122564B2 (ja) * 1998-04-24 2008-07-23 セイコーエプソン株式会社 圧電体素子、インクジェット式記録ヘッドおよびそれらの製造方法
JP2001261338A (ja) 2000-03-15 2001-09-26 Mitsubishi Materials Corp Ｔｉを含有する金属酸化物薄膜形成用原料溶液、Ｔｉを含有する金属酸化物薄膜の形成方法及びＴｉを含有する金属酸化物薄膜
JP4419332B2 (ja) * 2001-02-06 2010-02-24 三菱マテリアル株式会社 ペロブスカイト型酸化物膜の基板表面構造とその基板およびペロブスカイト型酸化物膜
US7229662B2 (en) * 2003-12-16 2007-06-12 National University Of Singapore Heterolayered ferroelectric thin films and methods of forming same
WO2006006406A1 (ja) * 2004-07-13 2006-01-19 Seiko Epson Corporation 強誘電体薄膜形成用組成物、強誘電体薄膜及び強誘電体薄膜の製造方法並びに液体噴射ヘッド
JP4217906B2 (ja) * 2004-09-17 2009-02-04 セイコーエプソン株式会社 前駆体溶液の製造方法
SG124303A1 (en) * 2005-01-18 2006-08-30 Agency Science Tech & Res Thin films of ferroelectric materials and a methodfor preparing same
FR2886309B1 (fr) * 2005-05-31 2007-08-17 Airbus France Sas Sol pour le revetement par voie sol-gel d'une surface et procede de revetement par voie sol-gel le mettant en oeuvre
US9431598B2 (en) * 2006-11-06 2016-08-30 Drexel University Sol-gel precursors and methods for making lead-based perovskite films
JP2011014820A (ja) * 2009-07-06 2011-01-20 Seiko Epson Corp 圧電体薄膜、液体噴射ヘッドおよび液体噴射装置の製造方法
KR101138239B1 (ko) * 2010-06-23 2012-04-26 한국산업기술대학교산학협력단 고압전 계수 박막의 제조방법
JP5613910B2 (ja) * 2011-05-17 2014-10-29 三菱マテリアル株式会社 Ｐｚｔ強誘電体薄膜の製造方法

Also Published As

Publication number Publication date
US20140287251A1 (en) 2014-09-25
JP6075145B2 (ja) 2017-02-08
KR102019522B1 (ko) 2019-09-06
CN104072132A (zh) 2014-10-01
TW201500580A (zh) 2015-01-01
KR20140116794A (ko) 2014-10-06
CN104072132B (zh) 2017-06-23
TWI591205B (zh) 2017-07-11
EP2784137A1 (en) 2014-10-01
JP2014187266A (ja) 2014-10-02
EP2784137B1 (en) 2016-09-21

Similar Documents

Publication Publication Date Title
IN2014DE00469A (enrdf_load_stackoverflow)
MY171079A (en) Mo-, bi- and fe-comprising multimetal oxide compositions
UY35872A (es) ?composición de limpieza abrasiva, uso y método de limpieza de una superficie, y uso de carbonato de calcio reaccionado en superficie?
CL2015002145A1 (es) Preparación, usos y formas sólidas de ácido obeticólico (divisional de solicitud n° 3475-2014)
MX372771B (es) Composiciones para el cuidado bucal y métodos de uso.
MX2014011710A (es) Composiciones antimicrobianas ambientalmente preferidas.
BR112012016749A2 (pt) "d-aminoácido para uso no tratamento de biofilmes"
MX2017002950A (es) Oxido que contiene cerio y zirconio de alta porosidad.
IN2014DE00748A (enrdf_load_stackoverflow)
CL2012003664A1 (es) Composicion no acuosa para el cuidado bucal que comprende un espesante, un humectante y uno o mas polietilenglicoles liquidos, que tienen un punto de ebullicion menor a 25 ºc y una fase liquida continuada estructurada con cristales de polietilenglicol solidos con un punto de ebullicion de 25 ºc o mas; proceso para prepararla.
WO2015031441A3 (en) Microorganisms engineered to use unconventional sources of phosphorus or sulfur
WO2017218948A3 (en) Strategies to assess and/or produce cell populations with predictive engraftment potential
UY34008A (es) ?formas en estado sólido de inhibidor de hiv, composición farmacéutica, uso de la misma, y procesos para preparar dichas formas?.
MX2016003737A (es) Microorganismo recombinante para la mejora de produccion de productos quimicos finos.
PH12016501094A1 (en) Recombinant microorganism for improved production of fine chemicals
EA201391051A1 (ru) Спеченный материал на основе оксида хрома с присадками
BR112014002940A2 (pt) uso e composição agroquímica de dibutilamidas de ácido carboxílico
MX2016008155A (es) Paño en gel para el cuidado personal y la limpieza del hogar.
WO2015063416A3 (fr) Compositions stables de poly (3,4-ethylenedioxythiophene) et de stabilisants anioniques a acidité limitée
MX394205B (es) Catalizador de desplazamiento de gas de agua.
GB201009453D0 (en) Composition
MX340436B (es) Formulacion farmaceutica estable con descoloramiento limitado.
WO2015038689A3 (en) Cationic antiseptic compositions
WO2017173324A3 (en) Alpha-amylases, compositions & methods
IN2014MN01422A (enrdf_load_stackoverflow)