IN2014DE00065A - - Google Patents
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- Publication number
- IN2014DE00065A IN2014DE00065A IN65DE2014A IN2014DE00065A IN 2014DE00065 A IN2014DE00065 A IN 2014DE00065A IN 65DE2014 A IN65DE2014 A IN 65DE2014A IN 2014DE00065 A IN2014DE00065 A IN 2014DE00065A
- Authority
- IN
- India
- Prior art keywords
- sample
- resin
- lnteraction
- detected
- charged particle
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2254—Measuring cathodoluminescence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2804—Scattered primary beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2806—Secondary charged particle
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2808—Cathodoluminescence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13151344.2A EP2755021B1 (en) | 2013-01-15 | 2013-01-15 | Method of analyzing a sample and charged particle beam device for analyzing a sample |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014DE00065A true IN2014DE00065A (es) | 2015-06-19 |
Family
ID=47563221
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN65DE2014 IN2014DE00065A (es) | 2013-01-15 | 2014-01-09 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9159532B2 (es) |
| EP (1) | EP2755021B1 (es) |
| CN (1) | CN104089966B (es) |
| IN (1) | IN2014DE00065A (es) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9190241B2 (en) * | 2013-03-25 | 2015-11-17 | Hermes-Microvision, Inc. | Charged particle beam apparatus |
| TWI685012B (zh) * | 2014-12-22 | 2020-02-11 | 美商卡爾蔡司顯微鏡有限責任公司 | 帶電粒子束系統、用以處理樣品的方法、用以製造約瑟夫接面的方法與用以產生複數個約瑟夫接面的方法 |
| US10236156B2 (en) | 2015-03-25 | 2019-03-19 | Hermes Microvision Inc. | Apparatus of plural charged-particle beams |
| JP7045371B2 (ja) * | 2017-06-05 | 2022-03-31 | フォンダチオーネ ブルーノ ケスラー | 放射線検出器及び放射線検出装置 |
| CN107727677A (zh) * | 2017-09-22 | 2018-02-23 | 中国科学院地质与地球物理研究所 | 独居石的阴极发光成像方法 |
| US11342155B2 (en) * | 2018-05-22 | 2022-05-24 | Hitachi High-Tech Corporation | Charged particle beam device and method for adjusting position of detector of charged particle beam device |
| CN110376229B (zh) * | 2019-06-12 | 2020-09-04 | 聚束科技（北京）有限公司 | 具备复合式探测系统的扫描电子显微镜和样品探测方法 |
| DE102019208661A1 (de) * | 2019-06-13 | 2020-12-17 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts und Teilchenstrahlgerät zum Ausführen des Verfahrens |
| US11114274B2 (en) * | 2019-12-23 | 2021-09-07 | Carl Zeiss Smt Gmbh | Method and system for testing an integrated circuit |
| US11257657B2 (en) * | 2020-02-18 | 2022-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device with interferometer for height measurement |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3834495B2 (ja) * | 2001-09-27 | 2006-10-18 | 株式会社東芝 | 微細パターン検査装置、ｃｄ−ｓｅｍ装置の管理装置、微細パターン検査方法、ｃｄ−ｓｅｍ装置の管理方法、プログラムおよびコンピュータ読み取り可能な記録媒体 |
| WO2004034044A1 (en) * | 2002-10-08 | 2004-04-22 | Applied Materials Israel, Ltd. | Methods and systems for process monitoring using x-ray emission |
| CN101630623B (zh) * | 2003-05-09 | 2012-02-22 | 株式会社荏原制作所 | 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法 |
| JP4283201B2 (ja) * | 2004-10-14 | 2009-06-24 | 株式会社荏原製作所 | 情報記録媒体検査装置および方法 |
| JP4636897B2 (ja) * | 2005-02-18 | 2011-02-23 | 株式会社日立ハイテクサイエンスシステムズ | 走査電子顕微鏡 |
| EP2388796A1 (en) * | 2010-05-21 | 2011-11-23 | FEI Company | Simultaneous electron detection |
| US8908925B2 (en) | 2011-02-28 | 2014-12-09 | Schlumberger Technology Corporation | Methods to build 3D digital models of porous media using a combination of high- and low-resolution data and multi-point statistics |
| US9541512B2 (en) * | 2011-06-13 | 2017-01-10 | President And Fellows Of Harvard College | Multi-color nanoscale imaging based on nanoparticle cathodoluminescence |
| DE102012217761B4 (de) * | 2012-09-28 | 2020-02-06 | Carl Zeiss Microscopy Gmbh | Verfahren zur Vermeidung von Artefakten beim Serial Block Face Imaging |
-
2013
- 2013-01-15 EP EP13151344.2A patent/EP2755021B1/en active Active
-
2014
- 2014-01-08 US US14/150,012 patent/US9159532B2/en active Active
- 2014-01-09 IN IN65DE2014 patent/IN2014DE00065A/en unknown
- 2014-01-15 CN CN201410017457.3A patent/CN104089966B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN104089966B (zh) | 2018-07-27 |
| US9159532B2 (en) | 2015-10-13 |
| US20140197310A1 (en) | 2014-07-17 |
| CN104089966A (zh) | 2014-10-08 |
| EP2755021A1 (en) | 2014-07-16 |
| EP2755021B1 (en) | 2016-06-22 |
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