IN2014DE00065A - - Google Patents

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Publication number
IN2014DE00065A
IN2014DE00065A IN65DE2014A IN2014DE00065A IN 2014DE00065 A IN2014DE00065 A IN 2014DE00065A IN 65DE2014 A IN65DE2014 A IN 65DE2014A IN 2014DE00065 A IN2014DE00065 A IN 2014DE00065A
Authority
IN
India
Prior art keywords
sample
resin
lnteraction
detected
charged particle
Prior art date
Application number
Inventor
Hill Edward
Bean Stewart
Original Assignee
Carl Zeiss Microscopy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Microscopy Ltd filed Critical Carl Zeiss Microscopy Ltd
Publication of IN2014DE00065A publication Critical patent/IN2014DE00065A/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2254—Measuring cathodoluminescence
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2808—Cathodoluminescence
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

THE INVENTION REFERS TO A METHOD AND A CHARGED PARTICLE BEAM DEVICE ( I ) FOR ANALYZING AN OBJECT (24) USING A CHARGED PARTICLE BEAM INTERACTING WITH THE OBJECT 5 (24). THE OBJECT (24) COMPRISES A SAMPLE (15A) EMBEDDED IN A RESIN (15B). LNTERACTION RADIATION IN THE FORM OF CATHODOLUMINESCENCE LIGHT IS DETECTED FOR IDENTIFYING AREAS IN WHICH THE RESIN (15B) IS ARRANGED AND IN WHICH THE SAMPLE (15A) IS ARRANGED. LNTERACTION PARTICLES ARE DETECTED TO IDENTIFY PARTICLES WITHIN THE RESIN (15B) AND THE SAMPLE (15A) FOR FURTHER ANALYSIS BY USING EDX ANALYSIS. (FIG. 1)
IN65DE2014 2013-01-15 2014-01-09 IN2014DE00065A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP13151344.2A EP2755021B1 (en) 2013-01-15 2013-01-15 Method of analyzing a sample and charged particle beam device for analyzing a sample

Publications (1)

Publication Number Publication Date
IN2014DE00065A true IN2014DE00065A (en) 2015-06-19

Family

ID=47563221

Family Applications (1)

Application Number Title Priority Date Filing Date
IN65DE2014 IN2014DE00065A (en) 2013-01-15 2014-01-09

Country Status (4)

Country Link
US (1) US9159532B2 (en)
EP (1) EP2755021B1 (en)
CN (1) CN104089966B (en)
IN (1) IN2014DE00065A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9190241B2 (en) * 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
TWI685012B (en) * 2014-12-22 2020-02-11 美商卡爾蔡司顯微鏡有限責任公司 Charged particle beam system, method of processing a sample, method of manufacturing a josephson junction and method of creating a plurality josephson junctions
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US11444213B2 (en) * 2017-06-05 2022-09-13 Fondazione Bruno Kessler Radiation detector and radiation detection apparatus
CN107727677A (en) * 2017-09-22 2018-02-23 中国科学院地质与地球物理研究所 The cathodoluminescence imaging method of monazite
DE112018007498T5 (en) * 2018-05-22 2021-01-07 Hitachi High-Tech Corporation Charged carrier beam device and method for adjusting the position of a detector of a charged carrier beam device
CN110376229B (en) * 2019-06-12 2020-09-04 聚束科技（北京）有限公司 Scanning electron microscope with combined detection system and sample detection method
DE102019208661A1 (en) * 2019-06-13 2020-12-17 Carl Zeiss Microscopy Gmbh Method for operating a particle beam device and particle beam device for carrying out the method
US11114274B2 (en) * 2019-12-23 2021-09-07 Carl Zeiss Smt Gmbh Method and system for testing an integrated circuit
US11257657B2 (en) * 2020-02-18 2022-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with interferometer for height measurement

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3834495B2 (en) * 2001-09-27 2006-10-18 株式会社東芝 Fine pattern inspection apparatus, CD-SEM apparatus management apparatus, fine pattern inspection method, CD-SEM apparatus management method, program, and computer-readable recording medium
CN100557431C (en) * 2002-10-08 2009-11-04 应用材料以色列公司 Use the method and the system of X-ray emission monitoring program
CN1820346B (en) * 2003-05-09 2011-01-19 株式会社荏原制作所 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
JP4283201B2 (en) * 2004-10-14 2009-06-24 株式会社荏原製作所 Information recording medium inspection apparatus and method
JP4636897B2 (en) * 2005-02-18 2011-02-23 株式会社日立ハイテクサイエンスシステムズ Scanning electron microscope
EP2388796A1 (en) * 2010-05-21 2011-11-23 FEI Company Simultaneous electron detection
US8908925B2 (en) 2011-02-28 2014-12-09 Schlumberger Technology Corporation Methods to build 3D digital models of porous media using a combination of high- and low-resolution data and multi-point statistics
US9541512B2 (en) * 2011-06-13 2017-01-10 President And Fellows Of Harvard College Multi-color nanoscale imaging based on nanoparticle cathodoluminescence
DE102012217761B4 (en) * 2012-09-28 2020-02-06 Carl Zeiss Microscopy Gmbh Process for avoiding artifacts in serial block face imaging

Also Published As

Publication number Publication date
CN104089966B (en) 2018-07-27
CN104089966A (en) 2014-10-08
US9159532B2 (en) 2015-10-13
US20140197310A1 (en) 2014-07-17
EP2755021A1 (en) 2014-07-16
EP2755021B1 (en) 2016-06-22

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